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GB2406711B - Heat-treating methods and systems - Google Patents

Heat-treating methods and systems

Info

Publication number
GB2406711B
GB2406711B GB0427423A GB0427423A GB2406711B GB 2406711 B GB2406711 B GB 2406711B GB 0427423 A GB0427423 A GB 0427423A GB 0427423 A GB0427423 A GB 0427423A GB 2406711 B GB2406711 B GB 2406711B
Authority
GB
United Kingdom
Prior art keywords
systems
heat
treating methods
treating
methods
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0427423A
Other versions
GB0427423D0 (en
GB2406711A (en
Inventor
David Malcolm Camm
J Kiefer Elliott
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mattson Technology Canada Inc
Original Assignee
Vortek Industries Ltd
Mattson Technology Canada Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/729,747 external-priority patent/US6594446B2/en
Application filed by Vortek Industries Ltd, Mattson Technology Canada Inc filed Critical Vortek Industries Ltd
Priority claimed from GB0312620A external-priority patent/GB2387273B/en
Publication of GB0427423D0 publication Critical patent/GB0427423D0/en
Publication of GB2406711A publication Critical patent/GB2406711A/en
Application granted granted Critical
Publication of GB2406711B publication Critical patent/GB2406711B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/12—Heating of the reaction chamber
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00
    • F27B17/0016—Chamber type furnaces
    • F27B17/0025—Chamber type furnaces specially adapted for treating semiconductor wafers
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D19/00—Arrangements of controlling devices
    • H10P34/42—
    • H10P34/422—
    • H10P72/0436—
    • H10P95/90—
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D19/00—Arrangements of controlling devices
    • F27D2019/0003—Monitoring the temperature or a characteristic of the charge and using it as a controlling value
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D99/00—Subject matter not provided for in other groups of this subclass
    • F27D99/0001—Heating elements or systems
    • F27D99/0006—Electric heating elements or system
    • F27D2099/0026—Electric heating elements or system with a generator of electromagnetic radiations

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Furnace Details (AREA)
GB0427423A 2000-12-04 2001-12-04 Heat-treating methods and systems Expired - Fee Related GB2406711B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/729,747 US6594446B2 (en) 2000-12-04 2000-12-04 Heat-treating methods and systems
PCT/CA2001/000776 WO2002047143A1 (en) 2000-12-04 2001-05-30 Heat-treating methods and systems
GB0312620A GB2387273B (en) 2000-12-04 2001-12-04 Heat-treating methods and systems

Publications (3)

Publication Number Publication Date
GB0427423D0 GB0427423D0 (en) 2005-01-19
GB2406711A GB2406711A (en) 2005-04-06
GB2406711B true GB2406711B (en) 2005-06-08

Family

ID=34276804

Family Applications (5)

Application Number Title Priority Date Filing Date
GB0427418A Expired - Fee Related GB2406710B (en) 2000-12-04 2001-12-04 Heat-treating methods and systems
GB0427424A Withdrawn GB2406712A (en) 2000-12-04 2001-12-04 Heat-treating methods and systems
GB0427423A Expired - Fee Related GB2406711B (en) 2000-12-04 2001-12-04 Heat-treating methods and systems
GB0427414A Ceased GB2406709A (en) 2000-12-04 2001-12-04 Heat-treating methods and systems
GB0427426A Withdrawn GB2406725A (en) 2000-12-04 2001-12-04 Heat-treating methods and systems

Family Applications Before (2)

Application Number Title Priority Date Filing Date
GB0427418A Expired - Fee Related GB2406710B (en) 2000-12-04 2001-12-04 Heat-treating methods and systems
GB0427424A Withdrawn GB2406712A (en) 2000-12-04 2001-12-04 Heat-treating methods and systems

Family Applications After (2)

Application Number Title Priority Date Filing Date
GB0427414A Ceased GB2406709A (en) 2000-12-04 2001-12-04 Heat-treating methods and systems
GB0427426A Withdrawn GB2406725A (en) 2000-12-04 2001-12-04 Heat-treating methods and systems

Country Status (1)

Country Link
GB (5) GB2406710B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7781947B2 (en) 2004-02-12 2010-08-24 Mattson Technology Canada, Inc. Apparatus and methods for producing electromagnetic radiation

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02294027A (en) * 1989-05-09 1990-12-05 Sony Corp Method and device for annealing
JPH04355911A (en) * 1991-03-27 1992-12-09 Fujitsu Ltd Manufacturing device for semiconductor device
JPH07245274A (en) * 1994-03-02 1995-09-19 Tokyo Electron Ltd Heat treatment equipment
US5561735A (en) * 1994-08-30 1996-10-01 Vortek Industries Ltd. Rapid thermal processing apparatus and method

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4325006A (en) * 1979-08-01 1982-04-13 Jersey Nuclear-Avco Isotopes, Inc. High pulse repetition rate coaxial flashlamp
JPS5870536A (en) * 1981-10-22 1983-04-27 Fujitsu Ltd Laser annealing method
JPS58106836A (en) * 1981-12-18 1983-06-25 Hitachi Ltd Laser annealing equipment
EP0105230A3 (en) * 1982-09-30 1986-01-15 General Electric Company Triggering and cooling apparatus for laser flashlamps
JPS59211221A (en) * 1983-05-17 1984-11-30 Nippon Denso Co Ltd Heat treatment of ion implanted semiconductor
GB2199693B (en) * 1986-12-02 1990-08-15 Noblelight Ltd Improvements in and relating to flash lamps
JP2605090B2 (en) * 1988-03-28 1997-04-30 東京エレクトロン株式会社 Beam annealing equipment
SG108807A1 (en) * 1989-02-14 2005-02-28 Seiko Epson Corp A semiconductor device and its manufacturing method
JP3466633B2 (en) * 1991-06-12 2003-11-17 ソニー株式会社 Annealing method for polycrystalline semiconductor layer
US5387557A (en) * 1991-10-23 1995-02-07 F. T. L. Co., Ltd. Method for manufacturing semiconductor devices using heat-treatment vertical reactor with temperature zones
JP3440579B2 (en) * 1994-10-05 2003-08-25 ソニー株式会社 Heat treatment method
US6066516A (en) * 1995-06-26 2000-05-23 Seiko Epson Corporation Method for forming crystalline semiconductor layers, a method for fabricating thin film transistors, and method for fabricating solar cells and active matrix liquid crystal devices
US5777437A (en) * 1996-07-01 1998-07-07 Lumenx Technologies Inc. Annular chamber flashlamp including a surrounding, packed powder reflective material
CN1130756C (en) * 1998-02-13 2003-12-10 精工爱普生株式会社 Method for producing semiconductor device and heat treating apparatus

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02294027A (en) * 1989-05-09 1990-12-05 Sony Corp Method and device for annealing
JPH04355911A (en) * 1991-03-27 1992-12-09 Fujitsu Ltd Manufacturing device for semiconductor device
JPH07245274A (en) * 1994-03-02 1995-09-19 Tokyo Electron Ltd Heat treatment equipment
US5561735A (en) * 1994-08-30 1996-10-01 Vortek Industries Ltd. Rapid thermal processing apparatus and method

Also Published As

Publication number Publication date
GB2406712A (en) 2005-04-06
GB2406709A (en) 2005-04-06
GB0427426D0 (en) 2005-01-19
GB2406710A (en) 2005-04-06
GB0427424D0 (en) 2005-01-19
GB0427414D0 (en) 2005-01-19
GB0427423D0 (en) 2005-01-19
GB2406725A (en) 2005-04-06
GB2406711A (en) 2005-04-06
GB0427418D0 (en) 2005-01-19
GB2406710B (en) 2005-06-22

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20051204