[go: up one dir, main page]

GB2485714A - Integrated circuit switches, design structure and methods of fabricating the same - Google Patents

Integrated circuit switches, design structure and methods of fabricating the same Download PDF

Info

Publication number
GB2485714A
GB2485714A GB1203306.4A GB201203306A GB2485714A GB 2485714 A GB2485714 A GB 2485714A GB 201203306 A GB201203306 A GB 201203306A GB 2485714 A GB2485714 A GB 2485714A
Authority
GB
United Kingdom
Prior art keywords
fabricating
methods
integrated circuit
same
design structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB1203306.4A
Other versions
GB2485714B8 (en
GB2485714A8 (en
GB2485714B (en
GB201203306D0 (en
Inventor
Felix P Anderson
Thomas L Mcdevitt
Anthony K Stamper
Jonathan Hale Hammond
Julio Carlos Costa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
RF Micro Devices Inc
Original Assignee
International Business Machines Corp
RF Micro Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp, RF Micro Devices Inc filed Critical International Business Machines Corp
Priority to GB1321363.2A priority Critical patent/GB2506770B8/en
Publication of GB201203306D0 publication Critical patent/GB201203306D0/en
Publication of GB2485714A publication Critical patent/GB2485714A/en
Application granted granted Critical
Publication of GB2485714B publication Critical patent/GB2485714B/en
Publication of GB2485714B8 publication Critical patent/GB2485714B8/en
Publication of GB2485714A8 publication Critical patent/GB2485714A8/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0035Constitution or structural means for controlling the movement of the flexible or deformable elements
    • B81B3/004Angular deflection
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0018Structures acting upon the moving or flexible element for transforming energy into mechanical movement or vice versa, i.e. actuators, sensors, generators
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00134Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems comprising flexible or deformable structures
    • B81C1/0015Cantilevers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00261Processes for packaging MEMS devices
    • B81C1/00277Processes for packaging MEMS devices for maintaining a controlled atmosphere inside of the cavity containing the MEMS
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00015Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
    • B81C1/00261Processes for packaging MEMS devices
    • B81C1/00333Aspects relating to packaging of MEMS devices, not covered by groups B81C1/00269 - B81C1/00325
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00Computer-aided design [CAD]
    • G06F30/30Circuit design
    • G06F30/39Circuit design at the physical level
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00Contacts
    • H01H1/0036Switches making use of microelectromechanical systems [MEMS]
    • H10P50/00
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00Specific applications of microelectromechanical systems
    • B81B2201/01Switches
    • B81B2201/012Switches characterised by the shape
    • B81B2201/014Switches characterised by the shape having a cantilever fixed on one side connected to one or more dimples
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/01Packaging MEMS
    • B81C2203/0136Growing or depositing of a covering layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B81MICROSTRUCTURAL TECHNOLOGY
    • B81CPROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2203/00Forming microstructural systems
    • B81C2203/01Packaging MEMS
    • B81C2203/0145Hermetically sealing an opening in the lid

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Evolutionary Computation (AREA)
  • Geometry (AREA)
  • General Engineering & Computer Science (AREA)
  • Micromachines (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Manufacture Of Switches (AREA)

Abstract

Integrated MEMS switches, design structures and methods of fabricating such switches are provided. The method includes forming at least one tab (32a) of sacrificial material (36) on a side of a switching device (34) which is embedded in the sacrificial material. The method further includes stripping the sacrificial material through at least one opening (40) formed on the at least one tab which is on the side of the switching device, and sealing the at least one opening with a capping material (42).
GB1203306.4A 2009-08-27 2010-08-12 Integrated circuit switches, design structure and methods of fabricating the same Expired - Fee Related GB2485714B8 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB1321363.2A GB2506770B8 (en) 2009-08-27 2010-08-12 Integrated circuit switches, design structure and methods of fabricating the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/548,697 US8569091B2 (en) 2009-08-27 2009-08-27 Integrated circuit switches, design structure and methods of fabricating the same
PCT/US2010/045248 WO2011028384A1 (en) 2009-08-27 2010-08-12 Integrated circuit switches, design structure and methods of fabricating the same

Publications (5)

Publication Number Publication Date
GB201203306D0 GB201203306D0 (en) 2012-04-11
GB2485714A true GB2485714A (en) 2012-05-23
GB2485714B GB2485714B (en) 2014-05-14
GB2485714B8 GB2485714B8 (en) 2015-09-23
GB2485714A8 GB2485714A8 (en) 2015-09-23

Family

ID=43533073

Family Applications (2)

Application Number Title Priority Date Filing Date
GB1203306.4A Expired - Fee Related GB2485714B8 (en) 2009-08-27 2010-08-12 Integrated circuit switches, design structure and methods of fabricating the same
GB1321363.2A Expired - Fee Related GB2506770B8 (en) 2009-08-27 2010-08-12 Integrated circuit switches, design structure and methods of fabricating the same

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB1321363.2A Expired - Fee Related GB2506770B8 (en) 2009-08-27 2010-08-12 Integrated circuit switches, design structure and methods of fabricating the same

Country Status (7)

Country Link
US (2) US8569091B2 (en)
JP (1) JP5651178B2 (en)
CN (1) CN102471048A (en)
DE (2) DE112010003412T5 (en)
GB (2) GB2485714B8 (en)
TW (1) TWI529120B (en)
WO (1) WO2011028384A1 (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9892879B2 (en) * 2011-01-11 2018-02-13 Qorvo Us, Inc. Encapsulated micro-electromechanical system switch and method of manufacturing the same
US8569091B2 (en) 2009-08-27 2013-10-29 International Business Machines Corporation Integrated circuit switches, design structure and methods of fabricating the same
US8458888B2 (en) 2010-06-25 2013-06-11 International Business Machines Corporation Method of manufacturing a micro-electro-mechanical system (MEMS)
US8535966B2 (en) * 2010-07-27 2013-09-17 International Business Machines Corporation Horizontal coplanar switches and methods of manufacture
US20120162232A1 (en) * 2010-12-22 2012-06-28 Qualcomm Mems Technologies, Inc. Method of fabrication and resultant encapsulated electromechanical device
US9120667B2 (en) * 2011-06-20 2015-09-01 International Business Machines Corporation Micro-electro-mechanical system (MEMS) and related actuator bumps, methods of manufacture and design structures
US20130106875A1 (en) * 2011-11-02 2013-05-02 Qualcomm Mems Technologies, Inc. Method of improving thin-film encapsulation for an electromechanical systems assembly
US8673670B2 (en) * 2011-12-15 2014-03-18 International Business Machines Corporation Micro-electro-mechanical system (MEMS) structures and design structures
US9166271B2 (en) * 2012-06-01 2015-10-20 Purdue Research Foundation Tunable cavity resonator including a plurality of MEMS beams
US8927312B2 (en) * 2012-10-16 2015-01-06 International Business Machines Corporation Method of fabricating MEMS transistors on far back end of line
US9371222B2 (en) * 2013-03-15 2016-06-21 Honeywell International Inc. Microstructure plating systems and methods
JP5881635B2 (en) * 2013-03-25 2016-03-09 株式会社東芝 MEMS equipment
US9969613B2 (en) 2013-04-12 2018-05-15 International Business Machines Corporation Method for forming micro-electro-mechanical system (MEMS) beam structure
US9496110B2 (en) * 2013-06-18 2016-11-15 Globalfoundries Inc. Micro-electro-mechanical system (MEMS) structure and design structures
US9911563B2 (en) * 2013-07-31 2018-03-06 Analog Devices Global MEMS switch device and method of fabrication
FR3012671B1 (en) * 2013-10-29 2015-11-13 St Microelectronics Rousset INTEGRATED MECHANICAL DEVICE WITH VERTICAL MOVEMENT
CN105523519B (en) * 2014-09-29 2017-08-25 中芯国际集成电路制造(上海)有限公司 MEMS and forming method thereof
JP2016163917A (en) * 2015-03-06 2016-09-08 株式会社東芝 MEMS equipment
US10854761B1 (en) * 2015-03-30 2020-12-01 Southern Methodist University Electronic switch and active artificial dielectric
KR20170135896A (en) 2015-04-02 2017-12-08 도쿄엘렉트론가부시키가이샤 EUV tolerant trenches and hole patterning using dual frequency capacitively coupled plasma (CCP)
EP3442335B1 (en) 2016-04-13 2025-12-03 IMD Natural Solutions GmbH Formulation systems for antimicrobial glycolipids
US10748757B2 (en) 2017-09-21 2020-08-18 Honeywell International, Inc. Thermally removable fill materials for anti-stiction applications
US10727044B2 (en) 2017-09-21 2020-07-28 Honeywell International Inc. Fill material to mitigate pattern collapse
JP2020053569A (en) * 2018-09-27 2020-04-02 ソニーセミコンダクタソリューションズ株式会社 Semiconductor device, solid-state imaging device and method of manufacturing semiconductor device
US10793422B2 (en) * 2018-12-17 2020-10-06 Vanguard International Semiconductor Singapore Pte. Ltd. Microelectromechanical systems packages and methods for packaging a microelectromechanical systems device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5258097A (en) * 1992-11-12 1993-11-02 Ford Motor Company Dry-release method for sacrificial layer microstructure fabrication
US6465280B1 (en) * 2001-03-07 2002-10-15 Analog Devices, Inc. In-situ cap and method of fabricating same for an integrated circuit device
WO2003052364A1 (en) * 2001-12-17 2003-06-26 Infineon Technologies Ag Method for producing a microstructure
US20090101383A1 (en) * 2007-10-22 2009-04-23 Takeshi Miyagi Micromechanical device and method of manufacturing micromechanical device

Family Cites Families (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5546557A (en) 1993-06-14 1996-08-13 International Business Machines Corporation System for storing and managing plural logical volumes in each of several physical volumes including automatically creating logical volumes in peripheral data storage subsystem
EP0650289A1 (en) 1993-10-04 1995-04-26 Eastman Kodak Company Method and apparatus for generating a halftone pattern for a multi-level output device
US5578976A (en) 1995-06-22 1996-11-26 Rockwell International Corporation Micro electromechanical RF switch
US6872984B1 (en) 1998-07-29 2005-03-29 Silicon Light Machines Corporation Method of sealing a hermetic lid to a semiconductor die at an angle
US6605043B1 (en) 1998-11-19 2003-08-12 Acuson Corp. Diagnostic medical ultrasound systems and transducers utilizing micro-mechanical components
EP1135328A1 (en) 1998-12-02 2001-09-26 Massachusetts Institute Of Technology Integrated palladium-based micromembranes for hydrogen separation and hydrogenation/dehydrogenation reactions
US6127812A (en) 1999-02-16 2000-10-03 General Electric Company Integrated environmental energy extractor
WO2003007049A1 (en) 1999-10-05 2003-01-23 Iridigm Display Corporation Photonic mems and structures
US7071520B2 (en) * 2000-08-23 2006-07-04 Reflectivity, Inc MEMS with flexible portions made of novel materials
US6822304B1 (en) * 1999-11-12 2004-11-23 The Board Of Trustees Of The Leland Stanford Junior University Sputtered silicon for microstructures and microcavities
US7008812B1 (en) * 2000-05-30 2006-03-07 Ic Mechanics, Inc. Manufacture of MEMS structures in sealed cavity using dry-release MEMS device encapsulation
US7153717B2 (en) * 2000-05-30 2006-12-26 Ic Mechanics Inc. Encapsulation of MEMS devices using pillar-supported caps
US6808954B2 (en) * 2001-09-07 2004-10-26 Intel Corporation Vacuum-cavity MEMS resonator
WO2003040338A2 (en) * 2001-11-09 2003-05-15 Coventor, Incorporated Micro-scale interconnect device with internal heat spreader and method for fabricating same
US6953985B2 (en) 2002-06-12 2005-10-11 Freescale Semiconductor, Inc. Wafer level MEMS packaging
US7265429B2 (en) 2002-08-07 2007-09-04 Chang-Feng Wan System and method of fabricating micro cavities
JP4333417B2 (en) 2003-04-02 2009-09-16 ソニー株式会社 Micromachine manufacturing method
US7145213B1 (en) 2004-05-24 2006-12-05 The United States Of America As Represented By The Secretary Of The Air Force MEMS RF switch integrated process
DE102004032837A1 (en) 2004-07-02 2006-02-09 Beiersdorf Ag Use of active compound combinations of one or more biochinones and one or more isoflavones for improving the skin contours
US7259449B2 (en) 2004-09-27 2007-08-21 Idc, Llc Method and system for sealing a substrate
US7684104B2 (en) * 2004-09-27 2010-03-23 Idc, Llc MEMS using filler material and method
US7234357B2 (en) 2004-10-18 2007-06-26 Silverbrook Research Pty Ltd Wafer bonded pressure sensor
WO2006042357A1 (en) 2004-10-18 2006-04-27 Silverbrook Research Pty Ltd Micro-electromechanical pressure sensor
EP1843971B1 (en) 2005-02-04 2016-04-13 Imec Method for encapsulating a device in a microcavtiy
US7283347B2 (en) * 2005-08-31 2007-10-16 The United States Of America As Represented By The Secretary Of The Air Force Low cost digital variable capacitor
GB0522471D0 (en) * 2005-11-03 2005-12-14 Cavendish Kinetics Ltd Memory element fabricated using atomic layer deposition
US8653699B1 (en) 2007-05-31 2014-02-18 Rf Micro Devices, Inc. Controlled closing of MEMS switches
JP2008296336A (en) * 2007-05-31 2008-12-11 Toshiba Corp Hollow sealing structure and method for manufacturing hollow sealing structure
US8319312B2 (en) * 2007-07-23 2012-11-27 Wispry, Inc. Devices for fabricating tri-layer beams
JP5412031B2 (en) * 2007-07-24 2014-02-12 ローム株式会社 MEMS sensor
JP2009043537A (en) * 2007-08-08 2009-02-26 Toshiba Corp MEMS switch and manufacturing method thereof
JP4581011B2 (en) 2008-01-25 2010-11-17 株式会社東芝 Electrical parts and manufacturing method
US8421478B2 (en) * 2008-01-25 2013-04-16 International Business Machines Corporation Radio frequency integrated circuit with on-chip noise source for self-test
JP2009178815A (en) * 2008-01-31 2009-08-13 Toshiba Corp Micromachine device and method of manufacturing micromachine device
US8569091B2 (en) 2009-08-27 2013-10-29 International Business Machines Corporation Integrated circuit switches, design structure and methods of fabricating the same
US20110233674A1 (en) * 2010-03-29 2011-09-29 International Business Machines Corporation Design Structure For Dense Layout of Semiconductor Devices

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5258097A (en) * 1992-11-12 1993-11-02 Ford Motor Company Dry-release method for sacrificial layer microstructure fabrication
US6465280B1 (en) * 2001-03-07 2002-10-15 Analog Devices, Inc. In-situ cap and method of fabricating same for an integrated circuit device
WO2003052364A1 (en) * 2001-12-17 2003-06-26 Infineon Technologies Ag Method for producing a microstructure
US20090101383A1 (en) * 2007-10-22 2009-04-23 Takeshi Miyagi Micromechanical device and method of manufacturing micromechanical device

Also Published As

Publication number Publication date
DE112010003412T5 (en) 2012-08-16
WO2011028384A1 (en) 2011-03-10
TW201121876A (en) 2011-07-01
GB2506770B (en) 2014-08-20
GB2485714B8 (en) 2015-09-23
GB2506770B8 (en) 2015-09-23
CN102471048A (en) 2012-05-23
GB2485714A8 (en) 2015-09-23
TWI529120B (en) 2016-04-11
GB201321363D0 (en) 2014-01-15
US9284185B2 (en) 2016-03-15
JP2013503446A (en) 2013-01-31
GB2506770A (en) 2014-04-09
JP5651178B2 (en) 2015-01-07
US20110049649A1 (en) 2011-03-03
DE112010006130B3 (en) 2019-06-27
GB2485714B (en) 2014-05-14
US8569091B2 (en) 2013-10-29
GB2506770A8 (en) 2015-09-23
GB201203306D0 (en) 2012-04-11
US20140017844A1 (en) 2014-01-16

Similar Documents

Publication Publication Date Title
GB2485714A (en) Integrated circuit switches, design structure and methods of fabricating the same
PL2267869T3 (en) Hermetic sealing assembly and electrical device including the same
WO2015117998A3 (en) Pyrotechnic circuit breaker
IN2012DN04849A (en)
WO2013015571A3 (en) Electronic device and operating method thereof
WO2013012342A3 (en) Electrolyser frame concept, method and use
WO2008097551A3 (en) Iii-nitride semiconductor device
WO2009144619A3 (en) Mems devices
WO2011105695A3 (en) Electronic device and method for operating an electronic device
GB2494355A (en) Micro-electro-mechanical system structures
WO2007006001A3 (en) Iii-nitride enhancement mode devices
TW200733235A (en) Method of making openings in a layer of a semiconductor device
WO2009142982A3 (en) Metal gate structure and method of manufacturing same
WO2010065459A3 (en) Method of etching organosiloxane dielectric material and semiconductor device thereof
IL190678A0 (en) Circuit interrupter assembly and method of making the same
WO2007145790A3 (en) An integrated circuit device having barrier and method of fabricating the same
SG155877A1 (en) Integrated circuit system employing sacrificial spacers
WO2011056455A3 (en) Dielectric material with non-halogenated curing agent
WO2006065360A3 (en) Medical devices formed with a sacrificial structure and processes of forming the same
WO2010115025A3 (en) Device and methods for isolating cells
WO2018122761A3 (en) Hybrid structures and methods of making the same
PL385807A1 (en) Circuit interrupter device and method of operation of the circuit interrupter device
TW200704582A (en) Semiconductor composite device and method of manufacturing the same
GB0706925D0 (en) Break pane of plastics material for an alarm call point device, alarm call point device with break pane and method for producing the break pane
PL1911054T3 (en) Electromechanical circuit breaker and method of breaking the current in said electromechanical circuit breaker

Legal Events

Date Code Title Description
746 Register noted 'licences of right' (sect. 46/1977)

Effective date: 20140527

S117 Correction of errors in patents and applications (sect. 117/patents act 1977)

Free format text: REQUEST FILED; REQUEST FOR CORRECTION UNDER SECTION 117 FILED ON 22 APRIL 2015

S117 Correction of errors in patents and applications (sect. 117/patents act 1977)

Free format text: CORRECTIONS ALLOWED; REQUEST FOR CORRECTION UNDER SECTION 117 FILED ON 22 APRIL 2015 ALLOWED ON 09 JULY 2015.

S13A Application for inventor to be mentioned (section 13(1)/patents act 1977)

Free format text: APPLICATION FILED; APPLICATION FOR A PERSON TO BE MENTIONED AS INVENTOR UNDER RULE 10(2) BY INTERNATIONAL BUSINESS MACHINES CORPORATION AND RF MICRO DEVICES, INC FILED ON 14 MAY 2015

S13A Application for inventor to be mentioned (section 13(1)/patents act 1977)

Free format text: APPLICATION ALLOWED; PATENTS RULES 2007. AS A RESULT, IT WAS FOUND THAT JULIO CARLOS COSTA AND JONATHAN HALE HAMMOND SHOULD BE MENTIONED AS JOINT INVENTORS IN THE PUBLISHED PATENT APPLICATIONS AND GRANTED PATENTS FOR THE INVENTIONS AND THAT AN ADDENDUM SLIP MENTIONING THEM AS JOINT INVENTORS BE PREPARED FOR THE PUBLISHED APPLICATIONS AND GRANTED PATENTS FOR THE INVENTIONS.

PCNP Patent ceased through non-payment of renewal fee

Effective date: 20160812