GB2308733B - Apparatus and method for forming oxide film of semiconductor device - Google Patents
Apparatus and method for forming oxide film of semiconductor deviceInfo
- Publication number
- GB2308733B GB2308733B GB9625267A GB9625267A GB2308733B GB 2308733 B GB2308733 B GB 2308733B GB 9625267 A GB9625267 A GB 9625267A GB 9625267 A GB9625267 A GB 9625267A GB 2308733 B GB2308733 B GB 2308733B
- Authority
- GB
- United Kingdom
- Prior art keywords
- semiconductor device
- oxide film
- forming oxide
- forming
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H10P74/23—
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950059505A KR0165320B1 (en) | 1995-12-27 | 1995-12-27 | Method for establishing soaktime of process semiconductor oxidation |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| GB9625267D0 GB9625267D0 (en) | 1997-01-22 |
| GB2308733A GB2308733A (en) | 1997-07-02 |
| GB2308733B true GB2308733B (en) | 2000-07-05 |
Family
ID=19445217
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB9625267A Expired - Lifetime GB2308733B (en) | 1995-12-27 | 1996-12-04 | Apparatus and method for forming oxide film of semiconductor device |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPH09186151A (en) |
| KR (1) | KR0165320B1 (en) |
| DE (1) | DE19652741B4 (en) |
| GB (1) | GB2308733B (en) |
| TW (1) | TW401610B (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6033921A (en) * | 1998-04-06 | 2000-03-07 | Advanced Micro Devices, Inc. | Method for depositing a material of controlled, variable thickness across a surface for planarization of that surface |
| US6405096B1 (en) * | 1999-08-10 | 2002-06-11 | Advanced Micro Devices, Inc. | Method and apparatus for run-to-run controlling of overlay registration |
| US6607926B1 (en) * | 1999-08-10 | 2003-08-19 | Advanced Micro Devices, Inc. | Method and apparatus for performing run-to-run control in a batch manufacturing environment |
| KR20030005391A (en) * | 2000-05-25 | 2003-01-17 | 어드밴스드 마이크로 디바이시즈, 인코포레이티드 | Method of controlling well leakage for trench isolations of differing depths |
| US6625513B1 (en) * | 2000-08-15 | 2003-09-23 | Applied Materials, Inc. | Run-to-run control over semiconductor processing tool based upon mirror image target |
| JP3993396B2 (en) * | 2001-03-30 | 2007-10-17 | 株式会社東芝 | Manufacturing method of semiconductor device |
-
1995
- 1995-12-27 KR KR1019950059505A patent/KR0165320B1/en not_active Expired - Fee Related
-
1996
- 1996-12-04 GB GB9625267A patent/GB2308733B/en not_active Expired - Lifetime
- 1996-12-18 DE DE19652741A patent/DE19652741B4/en not_active Expired - Fee Related
- 1996-12-19 TW TW085115714A patent/TW401610B/en not_active IP Right Cessation
- 1996-12-26 JP JP8348178A patent/JPH09186151A/en active Pending
Non-Patent Citations (1)
| Title |
|---|
| Patent Abstracts of Japan, [E-315], Vol 9, No 115, page 58 &JP600004223A * |
Also Published As
| Publication number | Publication date |
|---|---|
| KR970054573A (en) | 1997-07-31 |
| DE19652741A1 (en) | 1997-07-03 |
| KR0165320B1 (en) | 1999-02-01 |
| GB9625267D0 (en) | 1997-01-22 |
| DE19652741B4 (en) | 2007-07-05 |
| JPH09186151A (en) | 1997-07-15 |
| GB2308733A (en) | 1997-07-02 |
| TW401610B (en) | 2000-08-11 |
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