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GB2365985B - Self contained photosensitive material - Google Patents

Self contained photosensitive material

Info

Publication number
GB2365985B
GB2365985B GB0118886A GB0118886A GB2365985B GB 2365985 B GB2365985 B GB 2365985B GB 0118886 A GB0118886 A GB 0118886A GB 0118886 A GB0118886 A GB 0118886A GB 2365985 B GB2365985 B GB 2365985B
Authority
GB
United Kingdom
Prior art keywords
photosensitive material
self contained
contained photosensitive
self
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0118886A
Other versions
GB2365985A (en
GB0118886D0 (en
Inventor
Tetsuya Higuchi
Takahiro Uchibori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CYCOLOR SYSTEM CO Ltd
Eastman Kodak Co
Original Assignee
CYCOLOR SYSTEM CO Ltd
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000277266A external-priority patent/JP2002055445A/en
Application filed by CYCOLOR SYSTEM CO Ltd, Eastman Kodak Co filed Critical CYCOLOR SYSTEM CO Ltd
Publication of GB0118886D0 publication Critical patent/GB0118886D0/en
Publication of GB2365985A publication Critical patent/GB2365985A/en
Application granted granted Critical
Publication of GB2365985B publication Critical patent/GB2365985B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
GB0118886A 2000-08-10 2001-08-02 Self contained photosensitive material Expired - Fee Related GB2365985B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000277266A JP2002055445A (en) 2000-08-10 2000-08-10 Self-color forming photosensitive and pressure sensitive recording material, method for producing the same and image forming method for the same
US09/761,014 US6635399B2 (en) 2000-08-10 2001-01-16 One base photosensitive imaging system

Publications (3)

Publication Number Publication Date
GB0118886D0 GB0118886D0 (en) 2001-09-26
GB2365985A GB2365985A (en) 2002-02-27
GB2365985B true GB2365985B (en) 2004-05-26

Family

ID=26599804

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0118886A Expired - Fee Related GB2365985B (en) 2000-08-10 2001-08-02 Self contained photosensitive material

Country Status (5)

Country Link
CN (1) CN1355445A (en)
CA (1) CA2354784A1 (en)
DE (1) DE10138440A1 (en)
GB (1) GB2365985B (en)
HK (1) HK1046169B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6964836B2 (en) * 2002-03-15 2005-11-15 Eastman Kodak Company Photosensitive microcapsules containing a synthetic viscosity modifier in the continuous phase
US6838226B2 (en) * 2003-05-20 2005-01-04 Eastman Kodak Company Imaging member with microgel protective layer
US6899996B2 (en) * 2003-05-20 2005-05-31 Eastman Kodak Company Method of preparing imaging member with microgel protective layer
CN102004391A (en) * 2010-10-25 2011-04-06 中国乐凯胶片集团公司 Plastic coated paper base for double-sided imaging
US20240184198A1 (en) * 2022-12-02 2024-06-06 Polaroid Ip B.V. Crosstalk reduction of microcapsule imaging system

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4766050A (en) * 1987-03-27 1988-08-23 The Mead Corporation Imaging system with integral cover sheet
EP0323887A2 (en) * 1988-01-06 1989-07-12 Fuji Photo Film Co., Ltd. Heat-sensitive diazo recording materials
US5783353A (en) * 1994-06-10 1998-07-21 Cycolor, Inc. Self-contained imaging assembly
US6030740A (en) * 1998-03-12 2000-02-29 Cycolor, Inc. Two-sided imaging material
US6080520A (en) * 1999-05-26 2000-06-27 Cycolor, Inc. Imaging system having opaque support
US6127084A (en) * 1998-10-23 2000-10-03 Cycolor, Inc. Photosensitive material employing microcapsules containing a hygroscopic polymer in the internal phase

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4766050A (en) * 1987-03-27 1988-08-23 The Mead Corporation Imaging system with integral cover sheet
EP0323887A2 (en) * 1988-01-06 1989-07-12 Fuji Photo Film Co., Ltd. Heat-sensitive diazo recording materials
US5783353A (en) * 1994-06-10 1998-07-21 Cycolor, Inc. Self-contained imaging assembly
US6030740A (en) * 1998-03-12 2000-02-29 Cycolor, Inc. Two-sided imaging material
US6127084A (en) * 1998-10-23 2000-10-03 Cycolor, Inc. Photosensitive material employing microcapsules containing a hygroscopic polymer in the internal phase
US6080520A (en) * 1999-05-26 2000-06-27 Cycolor, Inc. Imaging system having opaque support

Also Published As

Publication number Publication date
CN1355445A (en) 2002-06-26
GB2365985A (en) 2002-02-27
HK1046169B (en) 2004-11-26
CA2354784A1 (en) 2002-02-10
GB0118886D0 (en) 2001-09-26
HK1046169A1 (en) 2002-12-27
DE10138440A1 (en) 2002-03-07

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
REG Reference to a national code

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PCNP Patent ceased through non-payment of renewal fee

Effective date: 20070802