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GB2343453B - Apparatus for forming polymer film and method of forming film with the apparatus - Google Patents

Apparatus for forming polymer film and method of forming film with the apparatus

Info

Publication number
GB2343453B
GB2343453B GB9921965A GB9921965A GB2343453B GB 2343453 B GB2343453 B GB 2343453B GB 9921965 A GB9921965 A GB 9921965A GB 9921965 A GB9921965 A GB 9921965A GB 2343453 B GB2343453 B GB 2343453B
Authority
GB
United Kingdom
Prior art keywords
forming
film
polymer film
forming polymer
forming film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9921965A
Other versions
GB2343453A (en
GB9921965D0 (en
Inventor
Jun Kawahara
Yoshihiro Hayashi
Akinori Nakano
Mikio Shimizu
Tomohisa Nishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Publication of GB9921965D0 publication Critical patent/GB9921965D0/en
Publication of GB2343453A publication Critical patent/GB2343453A/en
Application granted granted Critical
Publication of GB2343453B publication Critical patent/GB2343453B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/60Deposition of organic layers from vapour phase
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00Processes for applying liquids or other fluent materials
    • B05D1/62Plasma-deposition of organic layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Formation Of Insulating Films (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Polymerisation Methods In General (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Physical Vapour Deposition (AREA)
GB9921965A 1998-09-21 1999-09-16 Apparatus for forming polymer film and method of forming film with the apparatus Expired - Fee Related GB2343453B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26685198A JP3153190B2 (en) 1998-09-21 1998-09-21 Apparatus for producing polymer film and film forming method using this apparatus

Publications (3)

Publication Number Publication Date
GB9921965D0 GB9921965D0 (en) 1999-11-17
GB2343453A GB2343453A (en) 2000-05-10
GB2343453B true GB2343453B (en) 2002-05-15

Family

ID=17436554

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9921965A Expired - Fee Related GB2343453B (en) 1998-09-21 1999-09-16 Apparatus for forming polymer film and method of forming film with the apparatus

Country Status (2)

Country Link
JP (1) JP3153190B2 (en)
GB (1) GB2343453B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6970003B2 (en) 2001-03-05 2005-11-29 Rosemount Inc. Electronics board life prediction of microprocessor-based transmitters

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4997670B2 (en) * 2001-06-29 2012-08-08 日本電気株式会社 Copolymer polymer film production method, copolymer polymer film produced by the above formation method, and semiconductor device using copolymer polymer film
JP4217870B2 (en) * 2002-07-15 2009-02-04 日本電気株式会社 Organosiloxane copolymer film, manufacturing method thereof, growth apparatus, and semiconductor device using the copolymer film
JP2007109865A (en) * 2005-10-13 2007-04-26 Hitachi Kokusai Electric Inc Substrate processing apparatus and semiconductor device manufacturing method
WO2007097024A1 (en) * 2006-02-27 2007-08-30 Youtec Co., Ltd. Vaporizer, semiconductor production apparatus and process of semiconductor production
JP2009094401A (en) * 2007-10-11 2009-04-30 Hitachi Kokusai Electric Inc Substrate processing equipment
GB0802687D0 (en) * 2008-02-14 2008-03-19 P2I Ltd Vapour delivery system
JP4573902B2 (en) * 2008-03-28 2010-11-04 三菱電機株式会社 Thin film formation method
JP5361467B2 (en) * 2009-03-13 2013-12-04 東京エレクトロン株式会社 Vaporizer
KR101132605B1 (en) * 2009-03-13 2012-04-06 도쿄엘렉트론가부시키가이샤 Substrate processing apparatus, trap apparatus, control method of substrate processing apparatus and control method of trap apparatus
KR101198039B1 (en) * 2010-09-20 2012-11-06 에스엔유 프리시젼 주식회사 Apparatus for depositing monomer and Method for exhausting monomer of the same
JP5735401B2 (en) * 2011-11-17 2015-06-17 積水化学工業株式会社 Polymeric monomer supply apparatus and method of operating the apparatus
JP2012094900A (en) * 2012-01-26 2012-05-17 Watanabe Shoko:Kk Bcn based insulating film, method of producing the same and semiconductor device
WO2019064417A1 (en) * 2017-09-28 2019-04-04 シャープ株式会社 Film-forming method and display device production method using same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5780103A (en) * 1996-01-05 1998-07-14 Siemens Aktiengesellschaft Method for forming of a silicon oxide layer on a topography
JPH1117006A (en) * 1997-06-20 1999-01-22 Nec Corp Method for manufacturing semiconductor device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5780103A (en) * 1996-01-05 1998-07-14 Siemens Aktiengesellschaft Method for forming of a silicon oxide layer on a topography
JPH1117006A (en) * 1997-06-20 1999-01-22 Nec Corp Method for manufacturing semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6970003B2 (en) 2001-03-05 2005-11-29 Rosemount Inc. Electronics board life prediction of microprocessor-based transmitters

Also Published As

Publication number Publication date
GB2343453A (en) 2000-05-10
GB9921965D0 (en) 1999-11-17
JP2000100803A (en) 2000-04-07
JP3153190B2 (en) 2001-04-03

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20180916