GB2342929A - Vapourisation device - Google Patents
Vapourisation device Download PDFInfo
- Publication number
- GB2342929A GB2342929A GB9924608A GB9924608A GB2342929A GB 2342929 A GB2342929 A GB 2342929A GB 9924608 A GB9924608 A GB 9924608A GB 9924608 A GB9924608 A GB 9924608A GB 2342929 A GB2342929 A GB 2342929A
- Authority
- GB
- United Kingdom
- Prior art keywords
- release agent
- evaporation vessel
- jet body
- vessel
- vaporisation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009834 vaporization Methods 0.000 title claims description 33
- 238000001704 evaporation Methods 0.000 claims abstract description 45
- 230000008020 evaporation Effects 0.000 claims abstract description 45
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 37
- 238000000151 deposition Methods 0.000 claims abstract description 4
- 239000007888 film coating Substances 0.000 claims abstract description 3
- 238000009501 film coating Methods 0.000 claims abstract description 3
- 238000003860 storage Methods 0.000 claims description 17
- 238000005485 electric heating Methods 0.000 claims 1
- 238000009434 installation Methods 0.000 description 9
- 238000000576 coating method Methods 0.000 description 8
- 238000009833 condensation Methods 0.000 description 6
- 230000005494 condensation Effects 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000009835 boiling Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000005352 clarification Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Nozzles (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Abstract
A vaporsation device, for vapour depositing a release agent strip in the form of longitudinal strips on a film 8 in a film coating plant, has an evaporation vessel 1 heated with an electric heater 5 for the release agent and a jet body 3 with outlet openings 7 for directing the produced release agent vapour against the film 8. The jet body 3 is designed as a closed hollow body, and the evaporation vessel 1 is connected in a lockable manner to the jet body 3 by means of a shut-off device 4.
Description
2342929 VAPORISATION DEVICE The invention relates to a vaporisation device
for vapour depositing a release agent strip in the form of longitudinal strips on a film in a film coating plant, which has an evaporation vessel heated with an electric heater for the release agent and a jet body with outlet openings for directing the produced release agent vapour against the film.
A vaporisation device of the above type is the subject matter of DE 43 09 717. The vaporisation device described in this document comprises a horizontally arranged cylinder as the evaporation vessel, which on the side facing the film has a hole, which is covered by a jet body in the form of a bar. The film on which the vapour is to be deposited is moved along this bar. The evaporation vessel must therefore be at least as long as the film is wide. The volume of the evaporation vessel is dimensioned so that the release agent stored therein is sufficient, such that the release agent only has to be replenished when the coating installation is re-filled anyway, more particularly when a new supply roll with the foil to be coated is installed.
A disadvantage of the known vaporisation device is the fact that due to the large release agent reservoir, during flooding and subsequent evacuation of the vaporisation vessel, a relatively large quantity of the release agent evaporates totally unnecessarily and coats parts of the installation with condensation. Here it should be bome in mind that during evacuation, the boiling temperature of the release agent is reduced due to the falling pressure and the quantity evaporated therefore increases if the heating of the evaporation vessels is not reduced accordingly. However, due to the large volume of the vaporisation device, this is not possible quickly enough in practice. A further disadvantage of the known vaporisation device is that the time taken to heat the vaporisation device is undesirably long due to the large mass of the vaporisation device, so that the time before it is ready to operate is correspondingly long.
The invention is based on the problem of creating a vaporisation device of the type named above in which the release agent losses during flooding and evacuation of the coating installation are as low as possible and the vaporisation device is ready to operate as quickly as possible. 5 This problem is solved in accordance with the invention in that the jet body is designed as a closed hollow body and the evaporation vessel is connected in a locking manner to the jet body by means of a shut-off device.
In accordance with the present invention, as the evaporation vessel is connected to the jet bodies in a locking manner and is designed as a separate component, vapour emission from the vaporisation device can be reliably suppressed at little expense if no vapour is needed for condensation on the film. In this way, during flooding and evacuation of the coating 15 installation, an inflow of vapour into the installation and resultant condensation on parts of the installation can be prevented, whereby the release agent consumption during the coating process can be considerably reduced. The spatial separation of the evaporation vessel and the jet body prevents the occurrence of uncontrolled squirts of release agent or other 20 soiling condensation on the film. Furthermore, through constant heating of the evaporation vessel, the vaporisation device can be kept constantly ready for operation. On starting up the installation, only the shut-off device has to be opened in order to allow vapour to immediately flow to the film to be treated. The vaporisation device in accordance with the invention is 25 particularly suitable for manufacturing capacitor films. Instead of depositing release agent on a film in the form of longitudinal strips, thelockable evaporation vessel can also be assigned to a conventional pattern carrier in order to provide longitudinal uninterrupted areas of release agent on a film. An arrangement with an evaporation vessel and a pattern carrier is, for 30 example, disclosed in DE 43 11 581.
In accordance with the present invention, as the evaporation vessel and the jet body are separate components, the evaporation vessel does not need to be as wide as the film to be coated. It can therefore be of particularly small volume, making it possible for a rapid response of the evaporator rate to process conditions, for example metal vapour rate fluctuations or variations in the film speed. For example, with the invention by altering the temperature of the evaporation vessel the width of the deposited release agent strips can be precisely regulated.
The jet body can be designed for connection with the casing of existing evaporation vessels where it is designed as a cylinder lying approximately horizontal.
An ordinary shut-off valve intended for pipelines can be used as the locking device if, in accordance with a further embodiment of the invention, the evaporation vessel is arranged underneath the jet body and is connected to the jet body via a pipeline having the shut-off device. Such a shut-off valve in the pipeline is also able to operate reliably in the high vacuum that exists in installations during the coating process.
The evaporation vessel can be of particularly small volume, whereby the performance control of the vaporisation device can react quickly when a storage vessel containing release agent is connected to the evaporator vessel to refill the evaporation vessel with release agent.
Refilling of the evaporator vessel with release agent can take place while the installation is in operation if the storage vessel is connected via a refilling pipeline and a pressure-equalisation pipeline to the evaporation vessel.
Refilling of the release agent can, if necessary, be carried out solely by opening a valve, without the need for forced transportation, if the storage vessel is positioned higher than the evaporation vessel and there is a shut-off valve in the refilling pipeline.
However, refilling can also take place continuously and without operating a shut-off valve, if, in accordance with a further embodiment of the invention, the storage vessel and the evaporation vessel are arranged at the same height and the refilling pipeline is always open.
The oil consumption of the vaporisation device is particularly low if its outlet openings have a rectangular cross-section. Such an outlet opening shape also results in a lower proportion of residual oil on the film to be coated and a particularly good edge sharpness to the covered areas.
Condensation of vapour in the jet body can be easily prevented by ensuring that the jet body has electrical heating.
The present invention allows implementation in various forms. For further clarification of its basic principle, two embodiments are schematically shown in the drawings and are described below, wherein:
Fig. 1 is a perspective view of a vaporisation device in accordance with the present invention; and Fig. 2 is a side view of a second embodiment of a vaporisation device in accordance with the present invention.
The vaporisation device shown in figure 1 has an evaporation vessel 1, which has a connection via a pipeline 2 with a jet body 3. A shut-off device 4 is arranged in the pipeline 2, making it possible to prevent vapour penetration from the evaporation vessel 1 into the jet body 3.
The evaporation vessel 1 has an electric heater 5 and, for temperature regulation and thus regulation of the rate of vaporisation of the release agent, a temperature sensor 6. 30 The jet body 3 has on its upper side outlet openings 7 with a rectangular cross-section that are arranged in a row one after the other. The release agent vapour is dispensed through the outlet openings 7 to reach a film 8, shown in broken lines, and by way of condensation thereon forms strips extending in the longitudinal direction of the film 8. In a subsequent coating process these strips of release agent are not coated with metal, as the release agent evaporates during the coating process and thus prevents metal being deposited. As the drawing shows, the film 8 is in contact with the jet body 3 in the region of the outlet openings 7 and the immediate surroundings over a very small area of its coating surface. To heat the jet body 3, electrical current can be caused to flow through its casing. However, indirect heating of the jet body 3 is also possible in order to prevent the vapour entering the jet body 3 condensing inside.
The evaporation vessel 1 can be of sufficiently large volume that, when filled with release agent, it is sufficient for at least one batch to be coated in a process cycle. However, it is also possible to arrange an unheated storage vessel 9 containing release agent which, via a refilling pipeline 10, is connected to the evaporation vessel 1. In the embodiment shown in fig. 1, a shut-off valve 11 is arranged in the refilling pipeline 10. The storage vessel 9 is pressure-sealed, but above the surface of the release agent contained therein, the storage vessel 9 is connected to the upper side of the evaporation vessel 1 via a pressure equalisation pipeline 12. If the storage vessel 9 is positioned higher than the evaporation vessel 1, after opening the shut-off valve 11, the release agent flows from the storage vessel 9 into the evaporation vessel 1. The storage vessel 9 allows the evaporation vessel 1 to be operable with a particularly small quantity of release agent and with additional release agent flowing into the evaporation vessel 1 during the process.
With the embodiment shown in fig. 2 the evaporation vessel 1 and the storage vessel 9 are at the same height. A shut-off valve in the refilling pipeline 10 can therefore be dispensed with. Just as in the previously described embodiment, the pressure equalisation pipeline 12 is always open.
The fluid level in the evaporation vessel 1 and the storage vessel 9 is always the same due to the refilling pipeline 10. To change the evaporation rate, however, only the relatively small proportion of release agent in the evaporation vessel 1 has to be heated to a greater or lesser degree, rather than the remaining quantity of release agent held in the storage vessel 9.
Claims (10)
1. A vaporisation device for vapour depositing a release agent strip in the form of longitudinal strips on a film in a film coating plant, the vaporisation device having an evaporation vessel heated with an electric heater for the release agent and a jet body with outlet openings for directing the release agent vapour produced against the film, characterised in that the jet body (3) is formed as a closed hollow body and the evaporation vessel (1) is connected to the jet body (3) in a lockable manner by means of a shut-off device (4).
2. A vaporisation device according to claim 1, characterised in that the jet body (3) is designed as a cylinder arranged in a substantially horizontal position.
3. A vaporisation device according to claims 1 and 2, characterised in that the evaporation vessel (1) is arranged beneath the jet body (3) and is connected to the jet body (3) via a pipeline (2) provided with the shut-off device (4).
4. A vaporisation device according to at least one of the preceding claims, characterised in that a storage vessel (9) for refilling release agent into the evaporation vessel (1) is connected to the evaporation vessel (1).
5. A vaporisation device according to claim 4, characterised in that the storage vessel (9) is connected to the evaporation vessel (1) via a refilling pipeline (10) and a pressure equalisation pipeline (12).
6. A vaporisation device according to claim 4, characterised in that the 30 storage vessel (9) is arranged higher than the evaporation vessel (1) and a shut-off valve (11) is located in the refilling pipeline (10).
7. A vaporisation device according to claim 5, characterised in that the storage vessel (9) and the evaporation vessel (1) are arranged at the same height and the refilling pipeline (10) is always open.
8. A vaporisation device according to at least one of the preceding claims, characterised in that the outlet openings (7) have a rectangular cross-section.
9. A vaporisation device according to at least one of the preceding claims, characterised in that the jet body (3) has electric heating. 10
10. A vaporisation device substantially as herein before described with reference to and as shown in the accompanying drawings.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19848177A DE19848177A1 (en) | 1998-10-20 | 1998-10-20 | Vapor deposition of release agent for capacitor film has a closed hollow body evaporation vessel connected to the jet body with a shut off device |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| GB9924608D0 GB9924608D0 (en) | 1999-12-22 |
| GB2342929A true GB2342929A (en) | 2000-04-26 |
| GB2342929B GB2342929B (en) | 2003-05-21 |
Family
ID=7884969
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB9924608A Expired - Lifetime GB2342929B (en) | 1998-10-20 | 1999-10-18 | Vaporisation device |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP4230068B2 (en) |
| KR (1) | KR100614131B1 (en) |
| CN (1) | CN1240872C (en) |
| DE (1) | DE19848177A1 (en) |
| GB (1) | GB2342929B (en) |
| IT (1) | IT1313766B1 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100412226C (en) * | 2004-10-18 | 2008-08-20 | 中华映管股份有限公司 | Method for manufacturing front substrate of plasma display, vapor deposition process and vapor deposition apparatus |
| CN100491584C (en) * | 2005-09-22 | 2009-05-27 | 中国科学院半导体研究所 | Preparation method of different refractive index film layers |
| US7899308B2 (en) | 2005-10-26 | 2011-03-01 | Applied Materials Gmbh & Co. Kg | Evaporation device with receptacle for receiving material to be evaporated |
| FR2956412A1 (en) * | 2010-02-16 | 2011-08-19 | Astron Fiamm Safety | CONSTANT VOLUME SHUT-OFF VALVE OF A VAPOR PHASE DEPOSITION SOURCE |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10128091C1 (en) * | 2001-06-11 | 2002-10-02 | Applied Films Gmbh & Co Kg | Device for coating a flat substrate used in the production of flat TV screens with organic illuminating diodes comprises a fixed vaporizer source for vaporizing materials |
| DE10330401B3 (en) * | 2003-07-04 | 2005-02-24 | Applied Films Gmbh & Co. Kg | Method and device for the area-wise application of release agents |
| EP1788112B1 (en) * | 2005-10-26 | 2011-08-17 | Applied Materials GmbH & Co. KG | Vapour deposition apparatus |
| DE102008026001B4 (en) * | 2007-09-04 | 2012-02-16 | Von Ardenne Anlagentechnik Gmbh | Method and device for producing and processing layers on substrates under a defined process atmosphere and heating element |
| WO2011065998A1 (en) * | 2008-12-18 | 2011-06-03 | Veeco Instruments Inc. | Linear deposition source |
| WO2011065999A1 (en) * | 2008-12-18 | 2011-06-03 | Veeco Instruments Inc. | Linear deposition source |
| TW201118961A (en) * | 2009-11-30 | 2011-06-01 | Veeco Instr Inc | Linear deposition source |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4309717A1 (en) * | 1993-03-25 | 1994-09-29 | Leybold Ag | Method for evaporation coating of a layer |
| US5863336A (en) * | 1996-04-08 | 1999-01-26 | General Electric Company | Apparatus for fabrication of superconductor |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3922187A1 (en) * | 1989-07-06 | 1991-01-17 | Leybold Ag | DEVICE FOR PRODUCING METAL-FREE STRIPS ON FILM COATS COATED IN A VACUUM, IN PARTICULAR FOR CAPACITORS |
-
1998
- 1998-10-20 DE DE19848177A patent/DE19848177A1/en not_active Withdrawn
-
1999
- 1999-10-06 IT IT1999MI002081A patent/IT1313766B1/en active
- 1999-10-12 KR KR1019990043933A patent/KR100614131B1/en not_active Expired - Fee Related
- 1999-10-18 GB GB9924608A patent/GB2342929B/en not_active Expired - Lifetime
- 1999-10-18 JP JP29559499A patent/JP4230068B2/en not_active Expired - Fee Related
- 1999-10-19 CN CNB991215710A patent/CN1240872C/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4309717A1 (en) * | 1993-03-25 | 1994-09-29 | Leybold Ag | Method for evaporation coating of a layer |
| US5863336A (en) * | 1996-04-08 | 1999-01-26 | General Electric Company | Apparatus for fabrication of superconductor |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100412226C (en) * | 2004-10-18 | 2008-08-20 | 中华映管股份有限公司 | Method for manufacturing front substrate of plasma display, vapor deposition process and vapor deposition apparatus |
| CN100491584C (en) * | 2005-09-22 | 2009-05-27 | 中国科学院半导体研究所 | Preparation method of different refractive index film layers |
| US7899308B2 (en) | 2005-10-26 | 2011-03-01 | Applied Materials Gmbh & Co. Kg | Evaporation device with receptacle for receiving material to be evaporated |
| FR2956412A1 (en) * | 2010-02-16 | 2011-08-19 | Astron Fiamm Safety | CONSTANT VOLUME SHUT-OFF VALVE OF A VAPOR PHASE DEPOSITION SOURCE |
| WO2011101326A1 (en) * | 2010-02-16 | 2011-08-25 | Astron Fiamm Safety | Constant volume closure valve for vapor phase deposition source |
Also Published As
| Publication number | Publication date |
|---|---|
| ITMI992081A0 (en) | 1999-10-06 |
| IT1313766B1 (en) | 2002-09-17 |
| GB9924608D0 (en) | 1999-12-22 |
| CN1251866A (en) | 2000-05-03 |
| CN1240872C (en) | 2006-02-08 |
| KR20000028990A (en) | 2000-05-25 |
| JP4230068B2 (en) | 2009-02-25 |
| JP2000129429A (en) | 2000-05-09 |
| GB2342929B (en) | 2003-05-21 |
| KR100614131B1 (en) | 2006-08-22 |
| ITMI992081A1 (en) | 2001-04-06 |
| DE19848177A1 (en) | 2000-04-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 732E | Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977) |