[go: up one dir, main page]

GB2208656B - Pulsed radio frequency plasma apparatus and process - Google Patents

Pulsed radio frequency plasma apparatus and process

Info

Publication number
GB2208656B
GB2208656B GB8816725A GB8816725A GB2208656B GB 2208656 B GB2208656 B GB 2208656B GB 8816725 A GB8816725 A GB 8816725A GB 8816725 A GB8816725 A GB 8816725A GB 2208656 B GB2208656 B GB 2208656B
Authority
GB
United Kingdom
Prior art keywords
radio frequency
frequency plasma
plasma apparatus
pulsed radio
pulsed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB8816725A
Other versions
GB8816725D0 (en
GB2208656A (en
Inventor
Rudolf August Herbert Heinecke
Sureshchandra Mishrilal Ojha
Ian Paul Llewellyn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
STC PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB858516537A external-priority patent/GB8516537D0/en
Application filed by STC PLC filed Critical STC PLC
Priority to GB8816725A priority Critical patent/GB2208656B/en
Publication of GB8816725D0 publication Critical patent/GB8816725D0/en
Publication of GB2208656A publication Critical patent/GB2208656A/en
Application granted granted Critical
Publication of GB2208656B publication Critical patent/GB2208656B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
GB8816725A 1985-06-29 1986-06-27 Pulsed radio frequency plasma apparatus and process Expired - Fee Related GB2208656B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB8816725A GB2208656B (en) 1985-06-29 1986-06-27 Pulsed radio frequency plasma apparatus and process

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB858516537A GB8516537D0 (en) 1985-06-29 1985-06-29 Pulsed plasma apparatus
GB8615825A GB2178062B (en) 1985-06-29 1986-06-27 Pulsed plasma process and apparatus
GB8816725A GB2208656B (en) 1985-06-29 1986-06-27 Pulsed radio frequency plasma apparatus and process

Publications (3)

Publication Number Publication Date
GB8816725D0 GB8816725D0 (en) 1988-08-17
GB2208656A GB2208656A (en) 1989-04-12
GB2208656B true GB2208656B (en) 1990-01-17

Family

ID=26289436

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8816725A Expired - Fee Related GB2208656B (en) 1985-06-29 1986-06-27 Pulsed radio frequency plasma apparatus and process

Country Status (1)

Country Link
GB (1) GB2208656B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4137606C1 (en) * 1991-11-15 1992-07-30 Schott Glaswerke, 6500 Mainz, De
GB0108738D0 (en) 2001-04-06 2001-05-30 Bae Systems Plc Turbulent flow drag reduction
DE102007021386A1 (en) * 2007-05-04 2008-11-06 Christof-Herbert Diener Short-cycle low-pressure plasma system

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1567876A (en) * 1977-02-10 1980-05-21 Northern Telecom Ltd Method of and apparatus for manufacturing a fused tube for forming into an optical fibre with plasma activated deposition in a tube
GB2070340A (en) * 1980-02-07 1981-09-03 Shinetsu Chemical Co Method for surface properties of a disclike shaped article of a vinyl chloridebased resin
US4349582A (en) * 1980-03-18 1982-09-14 Hans Beerwald Gas-discharge method for coating the interior of electrically non-conductive pipes
EP0072069A1 (en) * 1981-08-03 1983-02-16 Koninklijke Philips Electronics N.V. Method of producing preforms for drawing optical fibres and apparatus for the continuous production of optical fibres
GB2105729A (en) * 1981-09-15 1983-03-30 Itt Ind Ltd Surface processing of a substrate material
GB2110870A (en) * 1981-12-04 1983-06-22 Leybold Heraeus Gmbh & Co Kg Apparatus for producing a microwave plasma for the treatment of substrates

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1567876A (en) * 1977-02-10 1980-05-21 Northern Telecom Ltd Method of and apparatus for manufacturing a fused tube for forming into an optical fibre with plasma activated deposition in a tube
GB2070340A (en) * 1980-02-07 1981-09-03 Shinetsu Chemical Co Method for surface properties of a disclike shaped article of a vinyl chloridebased resin
US4349582A (en) * 1980-03-18 1982-09-14 Hans Beerwald Gas-discharge method for coating the interior of electrically non-conductive pipes
EP0072069A1 (en) * 1981-08-03 1983-02-16 Koninklijke Philips Electronics N.V. Method of producing preforms for drawing optical fibres and apparatus for the continuous production of optical fibres
GB2105729A (en) * 1981-09-15 1983-03-30 Itt Ind Ltd Surface processing of a substrate material
GB2110870A (en) * 1981-12-04 1983-06-22 Leybold Heraeus Gmbh & Co Kg Apparatus for producing a microwave plasma for the treatment of substrates

Also Published As

Publication number Publication date
GB8816725D0 (en) 1988-08-17
GB2208656A (en) 1989-04-12

Similar Documents

Publication Publication Date Title
GB2178062B (en) Pulsed plasma process and apparatus
AU7857387A (en) Rapid frequency synthesizer apparatus and method
EP0335675A3 (en) Large area microwave plasma apparatus
GB2180173B (en) Painting process and apparatus
EP0171949A3 (en) Microwave plasma etching apparatus
EP0282310A3 (en) High power extended arc plasma spray method and apparatus
IL87530A0 (en) Frequency counting apparatus and method
EG14994A (en) Plasma spray method and apparatus
GB2121251B (en) Radio frequency communication apparatus and method
EP0184812A3 (en) High frequency plasma generation apparatus
JPS644483A (en) Plasma etching process and equipment
EP0248274A3 (en) Plasma surface treatment method and apparatus
GB2171119B (en) Vacuum processing apparatus and method
GB2119184B (en) High frequency current supply method and apparatus
GB2173132B (en) Boring process and apparatus
EP0249198A3 (en) Plasma treating apparatus
EP0183561A3 (en) Microwave plasma processing process and apparatus
ZW10087A1 (en) Apparatus and process for spraying
ZA859372B (en) Plasma arc forming process and device
IL80864A (en) Plasma jet projectile apparatus and method
EP0460213A4 (en) Method and apparatus for plasma cutting
EP0326531A3 (en) Improved rf plasma processing apparatus
EP0237984A3 (en) Emission analysis method with inductively-coupled radio frequency plasma and apparatus for use in such method
IL90253A (en) Apparatus and method for processing simultaneous radio frequency signals
GB2208656B (en) Pulsed radio frequency plasma apparatus and process

Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20040627