GB2258754A - Excimer laser using negative ions to create a gas discharge. - Google Patents
Excimer laser using negative ions to create a gas discharge. Download PDFInfo
- Publication number
- GB2258754A GB2258754A GB9214438A GB9214438A GB2258754A GB 2258754 A GB2258754 A GB 2258754A GB 9214438 A GB9214438 A GB 9214438A GB 9214438 A GB9214438 A GB 9214438A GB 2258754 A GB2258754 A GB 2258754A
- Authority
- GB
- United Kingdom
- Prior art keywords
- laser
- halogen donor
- gas discharge
- lasing medium
- donor molecules
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000002500 ions Chemical class 0.000 title claims description 11
- 239000007789 gas Substances 0.000 claims description 46
- 229910052736 halogen Inorganic materials 0.000 claims description 35
- 150000002367 halogens Chemical class 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 16
- 230000005855 radiation Effects 0.000 claims description 14
- 150000004820 halides Chemical class 0.000 claims description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 9
- 229910052724 xenon Inorganic materials 0.000 claims description 8
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 8
- 229910052754 neon Inorganic materials 0.000 claims description 7
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 6
- 239000011737 fluorine Substances 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 5
- 229910052786 argon Inorganic materials 0.000 claims description 5
- 229910052734 helium Inorganic materials 0.000 claims description 5
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 5
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims description 5
- 229910052743 krypton Inorganic materials 0.000 claims description 5
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 238000001228 spectrum Methods 0.000 claims description 5
- 239000001307 helium Substances 0.000 claims description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 4
- HGCGQDMQKGRJNO-UHFFFAOYSA-N xenon monochloride Chemical group [Xe]Cl HGCGQDMQKGRJNO-UHFFFAOYSA-N 0.000 claims description 3
- 230000005670 electromagnetic radiation Effects 0.000 claims 3
- 238000012423 maintenance Methods 0.000 claims 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims 1
- 239000012159 carrier gas Substances 0.000 description 2
- 239000003574 free electron Substances 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Description
Excimer Laser The present invention relates to lasers which employ rare
gas halides as their lasing medium, that is to say to what are known conventionally as excimer lasers.
Excimer lasers are of the gas discharge type and require preionisation to enable the lasing discharge to take place. In existing excimer lasers this is done by means of short, intense, pulses of ultra violet light or Xrays. However, the liberated electrons rapidly are lost to the halide gas which provides the halogen for the rare gas halide. For example, if the rare gas halide is xenon chloride (Xe Cl) produced in a lasing medium consisting of xenon with 0.2% by volume of hydrogen chloride, then as the rate constant for the reaction HCl + e - H + Cl- is greater than about 10-10 CM3 sec-', for a gas mixture at a pressure of about 3 atmospheres the free electron density decay time is less than about 60 nanoseconds. As the free electron density required for effective preionisation is about 106 electrons CM-3 it can be seen that very high intensity preionisation energy sources are required.
The present invention uses a fundamentally different approach to the preionisation of the excimer lasing medium, greatly reducing the preionisation intensity required.
According to the present invention there is provided a method of operating an electrically excited gas discharge laser wherein the lasing medium includes a rare gas and a halogen donor molecule, including the operations of producing continuously or quasi- continuously within the lasing medium-a population of negative ions of the halogen donor molecule and subsequently removing electrons from the ionised halogen donor molecules to facilitate the establishment of an electric discharge in the lasing medium.
The ionisation of the halogen donor molecules may be achieved by irradiating the lasing medium with continuous or long-pulse X-rays produced by a suitable source or similar radiation from a laser which produces radiation in the ultra violet region of the electromagnetic spectrum. The removal of the electrons from the ionised halogen donor molecules may be achieved by means of an auxiliary laser which produces radiation in the ultra violet region of the electromagnetic spectrum, which may in practice be the same laser as is used to ionise the halogen donor molecule. The auxiliary laser may be a smaller rare gas halide laser or a nitrogen laser. The auxiliary laser may also be used to is produce a desired shape to the output pulses from the main rare gas halide laser.
Suitable lasing media include helium or neon as a carrier gas together with xenon, argon or krypton as an active.rare gas and hydrogen chloride, or fluorine as the halogen donor molecule. Typical proportions may be: He, Ne 1-10 bar: xenon, argon or krypton 10-200 mbar; HCl, F2 1-10 mbar.
A preferred lasing medium has the- constitution Ne 3 bar, Xe 40 mbar, F2 2 mbar.
Also according to the invention there is provided an electrically excited gas discharge laser including a lasing medium comprising an active rare gas and a halogen donor molecule, wherein there is included means for producing continuously or quasi- continuously a population of negative ions of the halogen donor molecule and means for subsequently removing electrons from the ionised halogen donor molecules.
1 - 3 The means for producing the ionised halogen donor molecules can be an X- ray source or a laser producing an output in the ultra violet region of the electromagnetic spectrum. Preferably, the laser has an output wavelength less than 360 mm. Suitable lasers are rare gas halide or nitrogen lasers.
A preferred gaseous lasing medium comprises a mixture of helium or neon as a carrier gas, together with xenon, argon or krypton as an active rare gas and hydrogen fluoride or fluorine as a halogen donor molecule.
The invention will now be described, by way of example, with reference to the accompanying drawings in is which Figure 1 is a schematic representation of an embodiment of the invention and Figure 2 is a schematic representation of another embodiment of the invention.
Referring to Figure 1 of the drawings, a transversely excited rare gas halide gas discharge laser includes a lasing region 1 formed in a clos ed loop of ducting, only a portion 2 of which is shown, through which a mixture of gases including a halogen donor can be circulated. The remainder of the loop of ducting and circulating fans are not shown as they can conform to well known practice and do not form part of the present invention as such. The lasing region 1 includes two output windows 3 and 4, respectively, and a pair of exciting electrodes 5, only one of which is shown as the other is directly beneath it. An optical cavity is formed by a full reflecting mirror 31 and a partially transparent output mirror 41. The lasing medium comprising a mixture of He; Xe F2 in the proportions 1500:20:1 is passed between the electrodes 5 in the direction shown by the arrow 6.
A continuous X-ray source 7 producing some 100 mW of KeV X-rays is so positioned as to irradiate the lasing medium through a window 8 just prior to its entering the lasing region 1. At a total operating pressure of 3 atmospheres, such an X-ray source will produce an ion density of about 109 ions Cm-3, with an ion lifetime to half density of about 1 mS. In practice, the ion lifetime is inversely proportional to the initial ion density and directly proportional to the gas pressure. Gas pressures in the range 1 to 3 atmospheres are suitable.
A pulsed laser 9 which produces radiation having a wavelength less than about 360 nm is arranged to illuminate the region between the electrodes 5 via a beam-folding mirror 10t a dichroic. mirror 11 and the exit window 4 from the lasing region 1. The laser 9 has a power output of about 100 kW cm-2 which is sufficient to liberate some 106 electrons cm-3 from the 109 ions cm-3. This is sufficient to enable a gas discharge to be maintained in the lasing medium. The laser 9 may be a subsidiary rare gas halide laser such as a Xecl laser producing radiation using a wave length of 308 nm, or a.nitrogen laser.
In the embodiment shown in Figure 2, the X-ray source 7 has been replaced by another ultra violet laser 21 of equivalent power output. Other components which correspond to those described with reference to Figure 1 have the same reference numerals. In practice, the lasers 9 and 21 may be one and the same with the electron- liberating pulses obtained by known beam-handling techniques.
An advantage of the use of an auxiliary laser to release the electrons is that the shape of the output pulse from the main laser can be varied by altering the shape of the output pulses from the auxiliary laser.
1
Claims (29)
- Claims - 1. A method of operating an electrically excited gas dischargelaser wherein the lasing medium includes a rare gas and a halogen donor molecule, including the operations of producing continuously or quasicontinuously within the lasing medium a population of negative ions of the halogen donor molecule and subsequently removing electrons from the ionised halogen donor molecules to facilitate the establishment of an electric discharge in the lasing medium.is
- 2. A method according to Claim 1 wherein the ionisation of the halogen donor molecules is achieved by irradiating the lasing medium continuously with electromagnetic radiation the photon energy of which is capable of ionising the halogen donor molecules.
- 3.. A method according to Claim 1 wherein the ionisation of the halogen donor molecules is achieved by irradiating the halogen donor molecules with pulses of electromagnetic radiation the photon energy of which is capable of ionising the halogen donor molecules and the pulse length of which is longer than the lifetime of the ionised halogen donor molecules.
- 4. A method according to Claim 2 or Claim 3 wherein the electromagnetic radiation is X-radiation.
- 5. A method according to Claim 4 wherein the X-radiation has an energy of 50 KeV and a power level of 100 mW.
- 6. A method according to Claim 2 or Claim 3 wherein the frequency of the ionising radiation lies in the ultra violet region of the electromagnetic spectrum.4 6
- 7. A method according to any preceding claim wherein the removal of the electrons from the ionised halogen donor molecules is carried out by irradiating the ionised halogen donor molecules with radiation having a frequency in the ultra violet region of the electromagnetic spectrum.
- 8. A method according to Claim 7 wherein the ultra violet radiation used to remove electrons from the ionised halogen donor molecules is derived from the same source as that 10 used to ionise the halogen donor molecules.
- 9. A method according to Claim 7 or Claim 8 wherein the ionised halogen donor molecules are irradiated with ultra violet light having a wavelength less than 360 nm.is
- 10. A method according to any of Claims 7, 8 or 9 wherein the ultra violet radiation is at a power level of the order of 100 kW cm-2.
- 11. A method according to any of Claims 7 to 11 wherein the ultra violet radiation is derived from a rare gas halide laser.
- 12. A method according to Claim 11 wherein the rare gas halide laser is a xenon chloride laser.
- 13. A method according to any of Claims 7 to 11 wherein the ultra violet radiation is derived from a nitrogen laser.
- 14. An electrically excited gas discharge laser including a gaseous lasing medium comprising a rare gas and a halogen donor molecule, wherein there is included means for producing continuously or quasi-continuously a population of negative ions of the halogen donor molecule and means for subsequently removing electrons from the ionised i halogen donor molecules.
- 15. A gas discharge laser according to Claim 14 wherein the lasing medium comprises helium or neon as a carrier 5 gas. xenon, argon or krypton as the active rare gas and hydroqen chloride or fluorine as the halogen donor molecule.
- 16. A gas discharge laser according to Claim 15 wherein the lasing medium includes helium or neon at a pressure in the range 1-10 bar, xenon, argon or krypton at a pressure in the range 10-200 mbar and hydrogen chloride or fluorine at a pressure in the range 1-10 mbar.
- 17. A gas discharge laser according to Claim 16 wherein the lasing medium comprises neon at a pressure in the range 13 bar, xenon at a pressure of 40 mbar and fluorine at a pressure in the range 2-3 mbar.
- 18. A gas discharge laser according to Claim 17 wherein the lasing medium comprises a mixture of neon, xenon and fluorine at pressures of 3 bar, 40 mbar and 2 mbar respectively.
- 19. A gas discharge laser according to any of Claims 14 to 18 including a pair of electrodes by means of which an electric discharge may be maintained in the lasing medium, a source of ionising radiation arranged to irradiate the gaseous lasing medium so as to ionise the halogen donor molecules prior to their passage between the electrodes and a laser arranged to irradiate the ionised lasing medium as it passes between the electrodes so as to release electrons from the ionised halogen donor molecules thereby to facilitate the creation and maintenance of the electric discharge in the lasing medium.8 -
- 20. A gas discharge laser according to Claim 19 wherein the source of ionising radiation is an auxiliary laser the output from which has a wavelength less than 360 nm.
- 21. A gas discharge laser according to Claim 20 wherein the auxiliary laser is a rare gas halide laser.
- 22. A gas discharge laser according to Claim 21 wherein the auxiliary laser is a xenon chloride laser.
- 23. A gas discharge laser according to Claim 22 wherein the auxiliary laser is a nitrogen laser.
- 24. A gas discharge laser according to any of Claims 20 to is 23 wherein there is included means for directing a proportion of the output of the auxiliary laser through the ionised lasing medium as it passes between the electrodes so as to release electrons from the ionised halogen donor molecules thereby to facilitate the creation and maintenance of the electric discharge in the lasing medium.
- 25. A gas discharge laser according to any of Claims 20 to 24 wherein the auxiliary laser has a power output of at -2 least 100 kW cm
- 26. A gas discharge laser according to Claim 19 wherein the source of ionising radiation is an X-ray source.
- 27. A gas discharge - laser according to Claim 26 wherein the X-ray source is adapted to produce X-rays having an energy of 50 KeV and a power level of at least 100 mW.
- 28. A method of operating a gas discharge laser substantially as hereinbefore described and with reference to the accompanying drawings.
- 29. A gas discharge laser substantially as hereinbefore described and with reference to the accompanying drawings.is
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB919117686A GB9117686D0 (en) | 1991-08-16 | 1991-08-16 | Excimer laser |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| GB9214438D0 GB9214438D0 (en) | 1992-08-19 |
| GB2258754A true GB2258754A (en) | 1993-02-17 |
| GB2258754B GB2258754B (en) | 1995-04-26 |
Family
ID=10700061
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB919117686A Pending GB9117686D0 (en) | 1991-08-16 | 1991-08-16 | Excimer laser |
| GB9214438A Expired - Fee Related GB2258754B (en) | 1991-08-16 | 1992-07-07 | Excimer laser |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB919117686A Pending GB9117686D0 (en) | 1991-08-16 | 1991-08-16 | Excimer laser |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE4226716A1 (en) |
| FR (1) | FR2683400A1 (en) |
| GB (2) | GB9117686D0 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4077017A (en) * | 1975-07-30 | 1978-02-28 | The United States Government As Represented By The U. S. Department Of Energy | Ultraviolet radiation induced discharge laser |
| US4229711A (en) * | 1978-08-23 | 1980-10-21 | The United States Of America As Represented By The Secretary Of The Navy | Metal dihalide photodissociation cyclic laser |
| US4592065A (en) * | 1982-06-25 | 1986-05-27 | Compagnie Industrielle Des Lasers Cilas Alcatel | Gas laser excited by a transverse electrical discharge triggered by photoionization |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4670883A (en) * | 1985-06-03 | 1987-06-02 | The United States Of America As Represented By The Secretary Of The Army | Rare-gas-halide laser performance by the use of two halogen donors |
-
1991
- 1991-08-16 GB GB919117686A patent/GB9117686D0/en active Pending
-
1992
- 1992-07-07 GB GB9214438A patent/GB2258754B/en not_active Expired - Fee Related
- 1992-08-12 DE DE19924226716 patent/DE4226716A1/en not_active Withdrawn
- 1992-08-14 FR FR9210046A patent/FR2683400A1/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4077017A (en) * | 1975-07-30 | 1978-02-28 | The United States Government As Represented By The U. S. Department Of Energy | Ultraviolet radiation induced discharge laser |
| US4229711A (en) * | 1978-08-23 | 1980-10-21 | The United States Of America As Represented By The Secretary Of The Navy | Metal dihalide photodissociation cyclic laser |
| US4592065A (en) * | 1982-06-25 | 1986-05-27 | Compagnie Industrielle Des Lasers Cilas Alcatel | Gas laser excited by a transverse electrical discharge triggered by photoionization |
Also Published As
| Publication number | Publication date |
|---|---|
| DE4226716A1 (en) | 1993-02-18 |
| FR2683400A1 (en) | 1993-05-07 |
| GB9117686D0 (en) | 1991-10-02 |
| GB9214438D0 (en) | 1992-08-19 |
| GB2258754B (en) | 1995-04-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Mikheev | Possibility of amplification of a femtosecond pulse up to he energy 1 kJ | |
| US4258334A (en) | Noble gas-halogen transfer laser method and means | |
| McNeil et al. | Ultraviolet laser action from Cu II in the 2500‐Å region | |
| US4802183A (en) | Microwave excited excimer laser and method | |
| EP0159360B1 (en) | Stimulated emission apparatus | |
| US3887882A (en) | Electric discharge laser with electromagnetic radiation induced conductivity enhancement of the gain medium | |
| CA1264192A (en) | Optically pumped divalent metal halide lasers | |
| GB2258754A (en) | Excimer laser using negative ions to create a gas discharge. | |
| US3881115A (en) | Multiple quantum laser | |
| CA1220812A (en) | Anti-stokes raman upconverter for co.sub.2 lasers | |
| US4628513A (en) | Tunable indium UV anti-Stokes Raman laser | |
| US4228407A (en) | Ion-beam-excited gas laser | |
| US4606030A (en) | Vacuum ultraviolet laser | |
| US4646311A (en) | Multi-component buffer gas mixture for XeF(C→A) laser | |
| CA1146454A (en) | Creation of f.sup. .sub.2color centers | |
| JPH01502067A (en) | Medium for gas lasers excited by ionized particles | |
| US4267525A (en) | Recombination lasers with spatial variations in pumping | |
| TW201843897A (en) | Lasing-gas mixture for excimer laser | |
| Boichenko et al. | Efficient emission from an He—Xe—NF3 mixture pumped by a glow discharge | |
| USH66H (en) | Pulsed plasma generation of extreme ultraviolet radiation | |
| Bunkin et al. | Enhancement of the efficiency of a beam He laser by molecular additives | |
| Florin et al. | Pulsed laser oscillation at 0.7311 µ from F atoms | |
| Chapovsky et al. | Excimer ArF/XeF lasers providing high-power stimulated radiation in Ar/Xe and F lines | |
| Hutchinson | Excimer lasers | |
| Takahashi et al. | Ar 2 excimer emission from a laser-heated plasma in a high-pressure argon gas |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 732E | Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977) | ||
| PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19960707 |