GB2248070A - An apparatus for removing impurities contained in chrome plating bath - Google Patents
An apparatus for removing impurities contained in chrome plating bath Download PDFInfo
- Publication number
- GB2248070A GB2248070A GB9020548A GB9020548A GB2248070A GB 2248070 A GB2248070 A GB 2248070A GB 9020548 A GB9020548 A GB 9020548A GB 9020548 A GB9020548 A GB 9020548A GB 2248070 A GB2248070 A GB 2248070A
- Authority
- GB
- United Kingdom
- Prior art keywords
- tank
- membrane
- electrolytic solution
- plating bath
- impurities contained
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000007747 plating Methods 0.000 title claims abstract description 32
- 239000012535 impurity Substances 0.000 title claims abstract description 18
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims abstract description 15
- 239000012528 membrane Substances 0.000 claims abstract description 51
- 239000008151 electrolyte solution Substances 0.000 claims abstract description 21
- 230000001376 precipitating effect Effects 0.000 claims abstract description 17
- 238000005086 pumping Methods 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000003792 electrolyte Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- 230000035699 permeability Effects 0.000 description 4
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 239000003014 ion exchange membrane Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- BUAJNGPDPGKBGV-UHFFFAOYSA-N 1-(1-phenylcyclohexyl)piperidin-1-ium;chloride Chemical compound [Cl-].C1CCCC[NH+]1C1(C=2C=CC=CC=2)CCCCC1 BUAJNGPDPGKBGV-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/18—Regeneration of process solutions of electrolytes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Apparatus for removing impurities contained in a chrome plating bath, comprises a membrane tank 1, a precipitating tank 2 and a plating tank 3, at least one membrane cylinder 11 being disposed within the membrane tank for receiving cathode electrolytic solution, the membrane tank communicating with the plating tank 3 for circulation of anode electrolytic solution, and the membrane cylinder being connected with the precipitating tank by pumping means 15 for drawing cathode electrolytic solution to the precipitating tank. The metallic impurities contained in the cathode electrolytic solution can be separated and the regenerated cathode electrolytic solution can be reused for the chrome plating bath. <IMAGE>
Description
TITLE: AN APPARATUS FOR REMOVING IMPURITIES CONTAINED IN THE CHROME PLATING BATH
IN THE CHROME PLATING BATH This invention relates to an apparatus for removing impurities contained in the chrome plating bath.
BACKGROUND OF THE INVENTION
In plating industry, current efficiency used in chrome plating is lower than that of the other metal plating process. The only way to ipprove the quality of chrome plating is to use a clean electrolyte. However, the cupper plating step and the nickel plating step are the necessary steps in the decorative chrome plating.
It will cause impurities generated in the plating tank.
Furthermore, in the hard chrome plating, the substrate to be plated is subject to the etching process and therefore, causes a large amount iron to contaminate the plating bath.
The main disadvantage of chrome plating is electrolYte Poison. The cost for recovering the wastewater including concentrated chromic acid is high and the treatment thereof generates the secondary pollution.
The conventional apparatus for removing metallic impurities contained in the plating bath is unglazed pottery cylinder However the typical unglazed pottery cylinder includes the disadvantages, such as large thickness (10 to 15 mm), low porosity and low permeability (0.0016 ml/cm > ' /hr). Furthermore, the sintering temperature for the preparation of the unglazed pottery cylinder cannot be actually control.
It will cause the membrane to be clogged or be corroded by chromic acid. The other technology for removing metallic impurities contained in the plating bath is ion exchange membrane or fluorinated membrane.
With the use of the afore-mentioned organic films, the temperature and the concentration of chromic acid should be carefully control to prevent the functional groups of the organic films from decomposition. The permeability (6 ml/cm7/hr) of the fluorinated membrane is higher than that of ion exchange membrane. The difference of the liquid level between the inside and ouside of the fluorinated membrane cannot be too large.
The liquid cannot be stirred to prevent liquid from permeating the membrane. The effect of this membrane is reduced due to the above-mentioned Phenomena.
Furthermore, with the use of the membrane, the temperature of the plating bath will raise due to the increase of the electric voltage and hence generate the gas vigorously. The difference of the level inside and outside will greatly increase. Voter should be added to replenish the electrolyte evaporated, therefore, the operation condition of the ion exchange membrane and the fluorinate membrane is limited. The other disadvantage of the membrane is the blocking Problem If the membrane tank is small, the blocked membrane could be washed with HCI and water. If a larger membrane is used, to clean the membrane or change the electrolyte used will be more inconvenient.
SUMMARY OF THE INVENTION
Therefore. the prirary object of this invention is to provide an apparatus for removing impurities contained in the chrome plating bath.
The present apparatus for removing impurities contained in the chrome plating bath comprises a plating tank; a membrane tank; a membrane cylinder disposed within the membrane tank for receiving cathode electrolytic solution; a precipitating tank for receiving cathode electrolytic solution to be precititated; a circulating means communicated with the plating tank and the membrane cylinder for circulating anode electrolytic solution; a pumping means connected with the membrane cylinder and the precipitating tank for pumping cathode electrolytic solution with impurities from the membrane cYlinder to the precipitating tank; and means for returning the regenerated cathode electrolytic solution from the precipitating trank to the membrane cylinder.
The membrane usage in this invention is prepared by a specific ceramic which was sintered at 1100 to 1150 "J to form a product with 2 to 3 mm thickness and 0.1 to 0.2 ml/cm > /hr permeability. The permeability of this invention is 62 to 124 times of that of the conventional art. During the electroplating process, CrW flows from cathode to anode. While the metallic impurities contained in the anode electrolytic solution entered to cathode. Trivalent chromium at anode is electrooxidized to hexavalent chromium at the same time. Therefore, it is a reaction of double sides.
Conventional unglazed pottery cylinder is formed of high density and low porositY structure, so that CrOa flows to anode and metallic impurity flows to cathode slowly. This is the most difference between prior art and the present invention. In this invention, the slurry formed at the membrane cylinder can be drawn to the precipitating tank by a pump to prevent the membrane from blocking and washing.
BRIEF DESCRIPTION OF THE DRAWINGS
Fig. 1 is a brief drawing showing a preferred embodiment of the present apparatus.
DESCR JPTION OF TIlE PREFERRED E!.!BOD IMENT Referring to Fig. 1. the apparatus of this invention comprises a membrane tank 1, a precipitating tank 2 and an electroplating tank 3. Three membrane cylinder 11 respectively disposed within the membrane tank as cathode. The configuration of the membrane cylinder 11 provide an uniform circuit distribution and the operated circuit thereof is 50 to 60 A which is much higher than that of conventional cylinder.
As CrO4 flows from cathode to anode and the metallic impurities enter to cathode. slurry generat.
The cathode electrolytic solution was contained within the membrane cylinder 11 and the anode electrolytic solution was kept ouside of the membrane cylinder 11.
The slurry produced during the electroplating process was held within the membrane cylinder 11. The anode electrolytic solution was clean and was circulated from the membrane tank 1 to the plating tank 3 through tube 12 and returned to the membrane tank 11 through tube 13. The membrane cylinder 11 was connected with the precipitating tank 2 by a tube 14 and a diverter valve 15. Therefore, slurru formed during the plating process was dragout from the bottom portion of the membrane tank 11 to the upper portion of the precipitating tank 2. After precipitating, the precipitate maintained within the bottom of the precipitating tank 2 and the clean cathode electrolytic solution was returned to the membrane cylinder 11 by a tube means 16 and a return pump 17. The membrane cylinder 11 used in this invention will not be blocked by slurry or metallic impurities.
Example 1
The metallic content of the electrolytic solution to be treated comprises 11073 mg/l iron, 650 mg/l copper and 272 mg/l zinc. After 192 hours circulation with the present apparatus having two membrane cylinders 11, the metallic content was 4490 mg/l iron, 172 rg/l copper and 57.3 mg/l zinc. The concentration of trivalent chromium was varied from 15 g/l to 2 g/l.
Example 2
This example utilized a prior apparatus. After 21 hours. 9Y. 40A and 30"J operation. the specific gravity of the electrolyte was charged from 1.22 to 1.18. After 43 hours, the specific gravity is 1.15 and after 137 hours, the specific gravity is 1.07. The average temperature was 60"J. The weight of cathode was increased 2.3 kg and the weight of slurry contained in the cathode was 3.1 kg.
The membrane cylinders 11 each comprise a tube and a wire material encapsulated in said tube.
Claims (3)
1. Apparatus for removing impurities contained in a chrome plating bath, comprising
a plating tank;
a membrane tank;
a membrane cylinder disposed within said membrane tank for receiving cathode electrolytic solution;
a precipitating tank for receiving cathode electrolytic solution to be precipitated;
a circulating means communicated with said plating tank and said membrane tank for circulating anode electrolytic solution;
a pumping means connected with said membrane cylinder and said precipitating tank for pumping cathode electrolytic solution with impurities from said membrane cylinder to said precipitating tank; and
means for returning the regenerated cathode electrolytic solution from said precipitating tank to said membrane cylinder.
2. Apparatus as claimed in Claim 1, wherein said membrane cylinder comprises a tube and a wire material encapsulated in said tube.
3. Apparatus for removing impurities contained in a chrome plating bath, substantially as hereinbefore described with reference to the accompanying drawings.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9020548A GB2248070A (en) | 1990-09-20 | 1990-09-20 | An apparatus for removing impurities contained in chrome plating bath |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9020548A GB2248070A (en) | 1990-09-20 | 1990-09-20 | An apparatus for removing impurities contained in chrome plating bath |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| GB9020548D0 GB9020548D0 (en) | 1990-10-31 |
| GB2248070A true GB2248070A (en) | 1992-03-25 |
Family
ID=10682497
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB9020548A Withdrawn GB2248070A (en) | 1990-09-20 | 1990-09-20 | An apparatus for removing impurities contained in chrome plating bath |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB2248070A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1102899A (en) * | 1964-10-29 | 1968-02-14 | Lancy Lab | Apparatus and process for reconditioning metal treating solutions electrolytically |
| US3909381A (en) * | 1974-11-18 | 1975-09-30 | Raymond John L | Purification of chromium plating solutions by electrodialysis |
| GB1411293A (en) * | 1972-01-19 | 1975-10-22 | Dart Ind Inc | Electrodialysis regeneration of metal containing acid solutions |
| GB2046793A (en) * | 1979-03-30 | 1980-11-19 | Ladney M | Process and apparatus for the regenration of chromic acid baths |
-
1990
- 1990-09-20 GB GB9020548A patent/GB2248070A/en not_active Withdrawn
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1102899A (en) * | 1964-10-29 | 1968-02-14 | Lancy Lab | Apparatus and process for reconditioning metal treating solutions electrolytically |
| GB1411293A (en) * | 1972-01-19 | 1975-10-22 | Dart Ind Inc | Electrodialysis regeneration of metal containing acid solutions |
| US3909381A (en) * | 1974-11-18 | 1975-09-30 | Raymond John L | Purification of chromium plating solutions by electrodialysis |
| GB2046793A (en) * | 1979-03-30 | 1980-11-19 | Ladney M | Process and apparatus for the regenration of chromic acid baths |
Also Published As
| Publication number | Publication date |
|---|---|
| GB9020548D0 (en) | 1990-10-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4104133A (en) | Method of in situ plating of an active coating on cathodes of alkali halide electrolysis cells | |
| US5162079A (en) | Process and apparatus for control of electroplating bath composition | |
| EP0307161B1 (en) | Process for electroplating metals | |
| US7052592B2 (en) | Chromium plating method | |
| US20080164150A1 (en) | Methods of Plating Zinc-Containing Coatings Under Alkaline Conditions | |
| KR101301275B1 (en) | Alkaline Electroplating Bath Having a Filtration Membrane | |
| EP1287182B1 (en) | Cathode for electrochemical regeneration of permanganate etching solutions | |
| US4933051A (en) | Cyanide-free copper plating process | |
| US5827411A (en) | Apparatus for electrolytic treatment of an electrolytic solution | |
| US4935109A (en) | Double-cell electroplating apparatus and method | |
| GB1567200A (en) | Tin-gold electroplating bath and process | |
| US4906340A (en) | Process for electroplating metals | |
| US4832812A (en) | Apparatus for electroplating metals | |
| JP2005076103A (en) | Method of treating plating waste liquid | |
| JPH05239683A (en) | Electrodeposition method of iron | |
| GB2248070A (en) | An apparatus for removing impurities contained in chrome plating bath | |
| US4234401A (en) | Method for recovery and use of zinc from a leach solution | |
| US3400056A (en) | Electrolytic process for preparing electrochemically active cadmium | |
| US3855089A (en) | Process for the electrolytic refining of heavy metals | |
| USRE34191E (en) | Process for electroplating metals | |
| US4734175A (en) | Process for regenerating an electroless copper plating bath | |
| EP0483332B1 (en) | Electrolytic cell for waste water treatment | |
| CN100585014C (en) | A kind of ceramic diaphragm electrolytic cells and its production and application | |
| EP0550002B1 (en) | Method of electrotinning | |
| US6063252A (en) | Method and apparatus for enriching the chromium in a chromium plating bath |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |