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GB2240875B - A method for forming a thin film resistor on an ic wafer - Google Patents

A method for forming a thin film resistor on an ic wafer

Info

Publication number
GB2240875B
GB2240875B GB9022632A GB9022632A GB2240875B GB 2240875 B GB2240875 B GB 2240875B GB 9022632 A GB9022632 A GB 9022632A GB 9022632 A GB9022632 A GB 9022632A GB 2240875 B GB2240875 B GB 2240875B
Authority
GB
United Kingdom
Prior art keywords
wafer
forming
thin film
film resistor
resistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
GB9022632A
Other versions
GB9022632D0 (en
GB2240875A (en
Inventor
William Allan Lane
Andrew David Bain
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heenar Research Ltd
Original Assignee
Analog Research and Development Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from IE900458A external-priority patent/IE900458L/en
Application filed by Analog Research and Development Ltd filed Critical Analog Research and Development Ltd
Publication of GB9022632D0 publication Critical patent/GB9022632D0/en
Publication of GB2240875A publication Critical patent/GB2240875A/en
Application granted granted Critical
Publication of GB2240875B publication Critical patent/GB2240875B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C17/00Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/22Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
    • H01C17/24Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material
    • H01C17/2404Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material by charged particle impact, e.g. by electron or ion beam milling, sputtering, plasma etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01CRESISTORS
    • H01C7/00Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/006Thin film resistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D88/00Three-dimensional [3D] integrated devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Integrated Circuits (AREA)
GB9022632A 1990-02-12 1990-10-18 A method for forming a thin film resistor on an ic wafer Expired - Lifetime GB2240875B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IE900458A IE900458L (en) 1989-02-14 1990-02-12 Holder for Respirator

Publications (3)

Publication Number Publication Date
GB9022632D0 GB9022632D0 (en) 1990-11-28
GB2240875A GB2240875A (en) 1991-08-14
GB2240875B true GB2240875B (en) 1993-09-08

Family

ID=11012916

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9022632A Expired - Lifetime GB2240875B (en) 1990-02-12 1990-10-18 A method for forming a thin film resistor on an ic wafer

Country Status (1)

Country Link
GB (1) GB2240875B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4136198A1 (en) * 1991-11-02 1993-05-06 Deutsche Aerospace Ag, 8000 Muenchen, De METHOD FOR PRODUCING A STRUCTURED THIN FILM RESISTANT LAYER SYSTEM AND CIRCUIT ARRANGEMENT WITH A THIN FILM RESISTANT LAYER SYSTEM PRODUCED IN PARTICULAR THIS METHOD

Also Published As

Publication number Publication date
GB9022632D0 (en) 1990-11-28
GB2240875A (en) 1991-08-14

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)

Free format text: REGISTERED BETWEEN 20100624 AND 20100630

PE20 Patent expired after termination of 20 years

Expiry date: 20101017