GB2240875B - A method for forming a thin film resistor on an ic wafer - Google Patents
A method for forming a thin film resistor on an ic waferInfo
- Publication number
- GB2240875B GB2240875B GB9022632A GB9022632A GB2240875B GB 2240875 B GB2240875 B GB 2240875B GB 9022632 A GB9022632 A GB 9022632A GB 9022632 A GB9022632 A GB 9022632A GB 2240875 B GB2240875 B GB 2240875B
- Authority
- GB
- United Kingdom
- Prior art keywords
- wafer
- forming
- thin film
- film resistor
- resistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
- H01C17/22—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming
- H01C17/24—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material
- H01C17/2404—Apparatus or processes specially adapted for manufacturing resistors adapted for trimming by removing or adding resistive material by charged particle impact, e.g. by electron or ion beam milling, sputtering, plasma etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01C—RESISTORS
- H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
- H01C7/006—Thin film resistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D88/00—Three-dimensional [3D] integrated devices
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IE900458A IE900458L (en) | 1989-02-14 | 1990-02-12 | Holder for Respirator |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| GB9022632D0 GB9022632D0 (en) | 1990-11-28 |
| GB2240875A GB2240875A (en) | 1991-08-14 |
| GB2240875B true GB2240875B (en) | 1993-09-08 |
Family
ID=11012916
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB9022632A Expired - Lifetime GB2240875B (en) | 1990-02-12 | 1990-10-18 | A method for forming a thin film resistor on an ic wafer |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB2240875B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4136198A1 (en) * | 1991-11-02 | 1993-05-06 | Deutsche Aerospace Ag, 8000 Muenchen, De | METHOD FOR PRODUCING A STRUCTURED THIN FILM RESISTANT LAYER SYSTEM AND CIRCUIT ARRANGEMENT WITH A THIN FILM RESISTANT LAYER SYSTEM PRODUCED IN PARTICULAR THIS METHOD |
-
1990
- 1990-10-18 GB GB9022632A patent/GB2240875B/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| GB9022632D0 (en) | 1990-11-28 |
| GB2240875A (en) | 1991-08-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 732E | Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977) |
Free format text: REGISTERED BETWEEN 20100624 AND 20100630 |
|
| PE20 | Patent expired after termination of 20 years |
Expiry date: 20101017 |