GB2119970B - Film deposition equipment - Google Patents

Film deposition equipment

Info

Publication number: GB2119970B
Authority: GB; United Kingdom
Prior art keywords: film deposition; deposition equipment; equipment; film; deposition
Prior art date: 1982-03-26
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

GB8308253A

Other versions

GB2119970A (en

GB8308253D0 (en

Inventor

Kazuo Sato

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Faurecia Clarion Electronics Co Ltd

Original Assignee

Clarion Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1982-03-26

Filing date

1983-03-25

Publication date

1985-11-27

1983-03-25 Application filed by Clarion Co Ltd filed Critical Clarion Co Ltd

1983-05-05 Publication of GB8308253D0 publication Critical patent/GB8308253D0/en

1983-11-23 Publication of GB2119970A publication Critical patent/GB2119970A/en

1985-11-27 Application granted granted Critical

1985-11-27 Publication of GB2119970B publication Critical patent/GB2119970B/en

Status Expired legal-status Critical Current

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation

Landscapes

Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)

GB8308253A 1982-03-26 1983-03-25 Film deposition equipment Expired GB2119970B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP4991982A JPS58167767A (en)	1982-03-26	1982-03-26	Formation of thin film

Publications (3)

Publication Number	Publication Date
GB8308253D0 GB8308253D0 (en)	1983-05-05
GB2119970A GB2119970A (en)	1983-11-23
GB2119970B true GB2119970B (en)	1985-11-27

Family

ID=12844413

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
GB8308253A Expired GB2119970B (en)	1982-03-26	1983-03-25	Film deposition equipment

Country Status (2)

Country	Link
JP (1)	JPS58167767A (en)
GB (1)	GB2119970B (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4553853A (en) *	1984-02-27	1985-11-19	International Business Machines Corporation	End point detector for a tin lead evaporator
JPS61242631A (en) *	1985-04-20	1986-10-28	Nippon Soken Inc	Method and device for producing ultrafine particles of compound
JPH0699798B2 (en) *	1985-10-29	1994-12-07	東洋メタライジング株式会社	Method for producing transparent gas barrier film
JPS6329243A (en) *	1986-07-22	1988-02-06	Nok Corp	Thin film temperature sensing element
GB9005321D0 (en) *	1990-03-09	1990-05-02	Matthews Allan	Modulated structure composites produced by vapour disposition
CH686253A5 (en) *	1992-08-28	1996-02-15	Balzers Hochvakuum	A method for controlling the degree of reaction and coating plant.
DE69308859T3 (en) *	1993-11-09	2000-11-02	Galileo Vacuum Systems S.R.L., Prato	Method and device for producing a plastic film with a dielectric layer
EP2484796A1 (en) *	2011-02-04	2012-08-08	Pivot a.s.	Magnetron sputtering process
CN113930738B (en) *	2020-06-29	2023-09-12	宝山钢铁股份有限公司	Metal vapor modulation device for vacuum coating and modulation method thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5210872A (en) *	1975-07-16	1977-01-27	Matsushita Electric Ind Co Ltd	Apparatus for production of compound thin films
FR2371009A1 (en) *	1976-11-15	1978-06-09	Commissariat Energie Atomique	METHOD FOR CONTROL OF LAYER DEPOSIT BY REACTIVE SPRAYING AND IMPLEMENTATION DEVICE
DE2821119C2 (en) *	1978-05-13	1983-08-25	Leybold-Heraeus GmbH, 5000 Köln	Method and arrangement for regulating the discharge process in a cathode sputtering system
DE2834813C2 (en) *	1978-08-09	1983-01-20	Leybold-Heraeus GmbH, 5000 Köln	Method and device for regulating the evaporation rate of oxidizable substances during reactive vacuum evaporation
GB2084197B (en) *	1980-09-23	1984-02-22	Univ Delaware	Deposition material by vacuum evaporation

1982
- 1982-03-26 JP JP4991982A patent/JPS58167767A/en active Pending
1983
- 1983-03-25 GB GB8308253A patent/GB2119970B/en not_active Expired

Also Published As

Publication number	Publication date
GB2119970A (en)	1983-11-23
GB8308253D0 (en)	1983-05-05
JPS58167767A (en)	1983-10-04

Publication	Publication Date	Title
GB2120845B (en)	1986-01-29	Combination film
GB8300948D0 (en)	1983-02-16	Film depositing apparatus
GB8302743D0 (en)	1983-03-02	Film
GB8420725D0 (en)	1984-09-19	Forming deposition film
DE3369660D1 (en)	1987-03-12	Laminate film
GB8410203D0 (en)	1984-05-31	Coating apparatus
GB8326483D0 (en)	1983-11-02	Coating apparatus
GB8310621D0 (en)	1983-05-25	Cameras
GB2126613B (en)	1986-10-29	Cables
GB8311173D0 (en)	1983-06-02	Deposition apparatus
GB2129950B (en)	1985-12-11	Camera
GB8312897D0 (en)	1983-06-15	Coating apparatus
EP0085531A3 (en)	1984-07-11	Multilayer film
GB8315911D0 (en)	1983-07-13	Oriented multi-layer films
DE3376077D1 (en)	1988-04-28	Coating apparatus
GB2168623B (en)	1987-04-29	Coating apparatus
GB2132381B (en)	1986-11-26	Camera
GB2119970B (en)	1985-11-27	Film deposition equipment
GB8307434D0 (en)	1983-04-27	Suctionirrigation equipment
GB8317607D0 (en)	1983-08-03	Film
GB2134418B (en)	1987-03-18	Powder deposition apparatus
GB8319268D0 (en)	1983-08-17	Cassette
GB2125979B (en)	1986-10-08	Camera
EP0090079A3 (en)	1985-01-23	Substrate
GB2118865B (en)	1985-09-25	Coating apparatus

Legal Events

Date	Code	Title	Description
1993-04-14	746	Register noted 'licences of right' (sect. 46/1977)	Effective date: 19930318
1996-11-13	PCNP	Patent ceased through non-payment of renewal fee	Effective date: 19960325