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GB2198732B - Process for the manufacture of photopolymerisable materials - Google Patents

Process for the manufacture of photopolymerisable materials

Info

Publication number
GB2198732B
GB2198732B GB8630359A GB8630359A GB2198732B GB 2198732 B GB2198732 B GB 2198732B GB 8630359 A GB8630359 A GB 8630359A GB 8630359 A GB8630359 A GB 8630359A GB 2198732 B GB2198732 B GB 2198732B
Authority
GB
United Kingdom
Prior art keywords
manufacture
photopolymerisable materials
photopolymerisable
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB8630359A
Other versions
GB2198732A (en
GB8630359D0 (en
Inventor
Barbara Hohlbein
Norbert Kraus
Dr Uwe Muller
Prof Dr Manfred Ratzsch
Prof Dr Herward Pietsch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Filmfabrik Wolfen VEB
Original Assignee
Filmfabrik Wolfen VEB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Filmfabrik Wolfen VEB filed Critical Filmfabrik Wolfen VEB
Publication of GB8630359D0 publication Critical patent/GB8630359D0/en
Publication of GB2198732A publication Critical patent/GB2198732A/en
Application granted granted Critical
Publication of GB2198732B publication Critical patent/GB2198732B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
GB8630359A 1986-11-22 1986-12-19 Process for the manufacture of photopolymerisable materials Expired - Fee Related GB2198732B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19863639955 DE3639955A1 (en) 1986-11-22 1986-11-22 METHOD FOR PRODUCING PHOTOPOLYMERIZABLE MATERIALS

Publications (3)

Publication Number Publication Date
GB8630359D0 GB8630359D0 (en) 1987-01-28
GB2198732A GB2198732A (en) 1988-06-22
GB2198732B true GB2198732B (en) 1990-07-04

Family

ID=6314557

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8630359A Expired - Fee Related GB2198732B (en) 1986-11-22 1986-12-19 Process for the manufacture of photopolymerisable materials

Country Status (4)

Country Link
CH (1) CH669051A5 (en)
DE (1) DE3639955A1 (en)
FR (1) FR2609189A1 (en)
GB (1) GB2198732B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU660881B1 (en) * 1994-01-25 1995-07-06 Morton International, Inc. Waterborne photoresists having binders neutralized with amino acrylates
WO2011108624A1 (en) * 2010-03-03 2011-09-09 独立行政法人国立循環器病研究センター Polymer of nitrogen-containing compound, method for producing same, and gene transfer agent

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2893868A (en) * 1955-08-22 1959-07-07 Du Pont Polymerizable compositions
US3578458A (en) * 1966-10-05 1971-05-11 Polaroid Corp Ionically cross-linked photopolymerized addition polymers
US3883491A (en) * 1969-06-11 1975-05-13 Lubrizol Corp Novel N-3-aminoalkyl amides, polymers thereof, and method for their preparation
DE2420409B2 (en) * 1974-04-26 1978-05-18 Shigeharu Tokio Matsumoto Photopolymerizable plastic composition
US4176028A (en) * 1977-03-22 1979-11-27 E. I. Du Pont De Nemours And Company Plastisols made with polyelectrolyte binders
DE2966584D1 (en) * 1978-10-27 1984-03-01 Ici Plc Polymerisable compositions, derived coatings and other polymerised products

Also Published As

Publication number Publication date
CH669051A5 (en) 1989-02-15
DE3639955A1 (en) 1988-05-26
GB2198732A (en) 1988-06-22
FR2609189A1 (en) 1988-07-01
GB8630359D0 (en) 1987-01-28

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee