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GB2191633B - Radiation hardened semiconductor devices - Google Patents

Radiation hardened semiconductor devices

Info

Publication number
GB2191633B
GB2191633B GB8713523A GB8713523A GB2191633B GB 2191633 B GB2191633 B GB 2191633B GB 8713523 A GB8713523 A GB 8713523A GB 8713523 A GB8713523 A GB 8713523A GB 2191633 B GB2191633 B GB 2191633B
Authority
GB
United Kingdom
Prior art keywords
semiconductor devices
radiation hardened
hardened semiconductor
radiation
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB8713523A
Other versions
GB2191633A (en
GB8713523D0 (en
Inventor
Kamal Tabatabaie-Alavi
Bruce W Black
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Raytheon Co
Original Assignee
Raytheon Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Raytheon Co filed Critical Raytheon Co
Publication of GB8713523D0 publication Critical patent/GB8713523D0/en
Publication of GB2191633A publication Critical patent/GB2191633A/en
Application granted granted Critical
Publication of GB2191633B publication Critical patent/GB2191633B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/351Substrate regions of field-effect devices
    • H10D62/357Substrate regions of field-effect devices of FETs
    • H10W42/20
GB8713523A 1986-06-11 1987-06-10 Radiation hardened semiconductor devices Expired - Fee Related GB2191633B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US87298486A 1986-06-11 1986-06-11

Publications (3)

Publication Number Publication Date
GB8713523D0 GB8713523D0 (en) 1987-07-15
GB2191633A GB2191633A (en) 1987-12-16
GB2191633B true GB2191633B (en) 1990-02-14

Family

ID=25360747

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8713523A Expired - Fee Related GB2191633B (en) 1986-06-11 1987-06-10 Radiation hardened semiconductor devices

Country Status (4)

Country Link
JP (1) JPS62298177A (en)
DE (1) DE3719535A1 (en)
FR (1) FR2606552B1 (en)
GB (1) GB2191633B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01253957A (en) * 1988-04-04 1989-10-11 Agency Of Ind Science & Technol Gallium arsenide semiconductor memory integrated circuit
FR2667442B1 (en) * 1989-10-23 1995-02-10 Commissariat Energie Atomique SEMICONDUCTORS FOR HIGH-RESISTANCE MICROELECTRONIC COMPONENTS AGAINST IONIZING RADIATION.
TWI261892B (en) * 2001-11-05 2006-09-11 Zycube Co Ltd Semiconductor device using low-k material and method of fabricating the same
CN111291480B (en) * 2020-01-21 2024-10-18 中国科学院微电子研究所 A modeling method and device for MOS device dose rate model
CN115472699B (en) * 2022-09-29 2025-12-23 西安电子科技大学 MOS anti-radiation device with PN junction composite structure and preparation method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0005059A2 (en) * 1978-04-24 1979-10-31 Western Electric Company, Incorporated A semiconductor device having a layered structure and a method of making it
EP0029481A1 (en) * 1979-11-26 1981-06-03 International Business Machines Corporation Field effect semiconductor structure
US4578127A (en) * 1982-08-13 1986-03-25 At&T Bell Laboratories Method of making an improved group III-V semiconductor device utilizing a getter-smoothing layer

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4247862B1 (en) * 1977-08-26 1995-12-26 Intel Corp Ionzation resistant mos structure
JPS58107679A (en) * 1981-12-21 1983-06-27 Mitsubishi Electric Corp Field effect transistor
JPS5963769A (en) * 1982-10-05 1984-04-11 Agency Of Ind Science & Technol high speed semiconductor device
JPS61289673A (en) * 1985-06-18 1986-12-19 Sumitomo Electric Ind Ltd Compound semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0005059A2 (en) * 1978-04-24 1979-10-31 Western Electric Company, Incorporated A semiconductor device having a layered structure and a method of making it
EP0029481A1 (en) * 1979-11-26 1981-06-03 International Business Machines Corporation Field effect semiconductor structure
US4578127A (en) * 1982-08-13 1986-03-25 At&T Bell Laboratories Method of making an improved group III-V semiconductor device utilizing a getter-smoothing layer

Also Published As

Publication number Publication date
GB2191633A (en) 1987-12-16
FR2606552B1 (en) 1991-08-23
JPS62298177A (en) 1987-12-25
GB8713523D0 (en) 1987-07-15
DE3719535A1 (en) 1988-01-28
FR2606552A1 (en) 1988-05-13

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19930610