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GB2188774B - Method of forming a conductive pattern on a semiconductor surface - Google Patents

Method of forming a conductive pattern on a semiconductor surface

Info

Publication number
GB2188774B
GB2188774B GB8628789A GB8628789A GB2188774B GB 2188774 B GB2188774 B GB 2188774B GB 8628789 A GB8628789 A GB 8628789A GB 8628789 A GB8628789 A GB 8628789A GB 2188774 B GB2188774 B GB 2188774B
Authority
GB
United Kingdom
Prior art keywords
forming
conductive pattern
semiconductor surface
semiconductor
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8628789A
Other versions
GB2188774A (en
GB8628789D0 (en
Inventor
Subhadra Gupta
Patricia Adzija Palaschak
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Westinghouse Electric Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of GB8628789D0 publication Critical patent/GB8628789D0/en
Publication of GB2188774A publication Critical patent/GB2188774A/en
Application granted granted Critical
Publication of GB2188774B publication Critical patent/GB2188774B/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/024—Electroplating of selected surface areas using locally applied electromagnetic radiation, e.g. lasers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/12—Semiconductors
    • C25D7/123—Semiconductors first coated with a seed layer or a conductive layer
    • C25D7/126—Semiconductors first coated with a seed layer or a conductive layer for solar cells
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/206—Electrodes for devices having potential barriers
    • H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
    • H10P14/46—
    • H10P14/47—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Photovoltaic Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
GB8628789A 1986-04-02 1986-12-02 Method of forming a conductive pattern on a semiconductor surface Expired GB2188774B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US84733986A 1986-04-02 1986-04-02

Publications (3)

Publication Number Publication Date
GB8628789D0 GB8628789D0 (en) 1987-01-07
GB2188774A GB2188774A (en) 1987-10-07
GB2188774B true GB2188774B (en) 1990-10-31

Family

ID=25300378

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8628789A Expired GB2188774B (en) 1986-04-02 1986-12-02 Method of forming a conductive pattern on a semiconductor surface

Country Status (4)

Country Link
JP (1) JPS62232973A (en)
DE (1) DE3643898A1 (en)
FR (1) FR2596921A1 (en)
GB (1) GB2188774B (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4333426C1 (en) * 1993-09-30 1994-12-15 Siemens Solar Gmbh Method for metallising solar cells comprising crystalline silicon
US5882435A (en) * 1993-09-30 1999-03-16 Siemens Solar Gmbh Process for the metal coating of solar cells made of crystalline silicon
AT408158B (en) * 1998-12-28 2001-09-25 Kroener Friedrich Dr Mask for the patterned, electrochemical processing of a silicon chip for solar cell production
US7388147B2 (en) * 2003-04-10 2008-06-17 Sunpower Corporation Metal contact structure for solar cell and method of manufacture
EP1987543A1 (en) * 2006-01-25 2008-11-05 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for producing a metal contact structure of a solar cell
DE102007005161B4 (en) * 2007-01-29 2009-04-09 Nb Technologies Gmbh Process for the metallization of substrates
DE102007010872A1 (en) 2007-03-06 2008-09-18 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Process for the precision machining of substrates and their use
CN105023973A (en) * 2009-04-21 2015-11-04 泰特拉桑有限公司 Method for forming structures in a solar cell
DE102009022337A1 (en) * 2009-05-13 2010-11-18 Gebr. Schmid Gmbh & Co. Method and device for treating a substrate
DE102011110171B3 (en) * 2011-08-16 2012-11-29 Rena Gmbh Forming metallic conductor pattern on surface of substrate made of semiconductor material, comprises providing discrete textured areas of semiconductor material, and carrying out galvanic deposition of metallic seed layer and metal layer
US9293624B2 (en) * 2012-12-10 2016-03-22 Sunpower Corporation Methods for electroless plating of a solar cell metallization layer
US10242789B2 (en) * 2015-06-16 2019-03-26 Murata Manufacturing Co., Ltd. Method for manufacturing ceramic electronic component, and ceramic electronic component
CN108441843B (en) * 2018-03-13 2020-02-18 北京科技大学 Preparation method of laser direct writing pre-formed photocatalytic plating of metal pattern on material surface
CN113851374B (en) * 2021-11-05 2024-09-24 南京航空航天大学 A method for pre-treating the surface of the power-inlet end to improve the efficiency of electrical discharge machining of semiconductor materials

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB847927A (en) * 1955-10-11 1960-09-14 Philco Corp A method and apparatus for the electrolytic treatment of semiconductive bodies
GB1176889A (en) * 1967-02-14 1970-01-07 Ibm A Method of Forming a Pattern of Conductivity on a Substrate
GB1465567A (en) * 1974-10-17 1977-02-23 Nat Res Dev Deposition of materials onto semiconductors
US4217183A (en) * 1979-05-08 1980-08-12 International Business Machines Corporation Method for locally enhancing electroplating rates
GB2106542A (en) * 1981-07-24 1983-04-13 Inoue Japax Res A method and apparatus for electrodeposition
EP0171129A2 (en) * 1984-02-17 1986-02-12 Energy Conversion Devices, Inc. Method of electro-coating a semiconductor device
US4578157A (en) * 1984-10-02 1986-03-25 Halliwell Michael J Laser induced deposition of GaAs
EP0180101A2 (en) * 1984-11-01 1986-05-07 International Business Machines Corporation Deposition of patterns using laser ablation

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE546514A (en) * 1955-04-22 1900-01-01
US3711325A (en) * 1968-12-13 1973-01-16 Texas Instruments Inc Activation process for electroless nickel plating
DE2028819C3 (en) * 1970-06-11 1980-05-29 Siemens Ag, 1000 Berlin Und 8000 Muenchen Process for producing a metal contact with a contact height> 10 µm
FR2288389A1 (en) * 1974-10-17 1976-05-14 Nat Res Dev METAL ELECTRODEPOSITION PROCESS ON SEMICONDUCTOR SUBSTRATES
US4082568A (en) * 1977-05-10 1978-04-04 Joseph Lindmayer Solar cell with multiple-metal contacts
US4239789A (en) * 1979-05-08 1980-12-16 International Business Machines Corporation Maskless method for electroless plating patterns
JPS5723416A (en) * 1980-07-17 1982-02-06 Suwa Seikosha Kk Method of forming pattern of insulating substrate
DD157989A3 (en) * 1980-10-10 1982-12-22 Lothar Gierth METHOD OF STRUCTURED CHEMICAL REDUCTIVE METAL SEPARATION
NL8200561A (en) * 1982-02-15 1983-09-01 Philips Nv METHOD FOR DEPOSITING A METAL
JPS5929474A (en) * 1982-08-11 1984-02-16 Toshiba Corp Solar battery

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB847927A (en) * 1955-10-11 1960-09-14 Philco Corp A method and apparatus for the electrolytic treatment of semiconductive bodies
GB1176889A (en) * 1967-02-14 1970-01-07 Ibm A Method of Forming a Pattern of Conductivity on a Substrate
GB1465567A (en) * 1974-10-17 1977-02-23 Nat Res Dev Deposition of materials onto semiconductors
US4217183A (en) * 1979-05-08 1980-08-12 International Business Machines Corporation Method for locally enhancing electroplating rates
GB2106542A (en) * 1981-07-24 1983-04-13 Inoue Japax Res A method and apparatus for electrodeposition
EP0171129A2 (en) * 1984-02-17 1986-02-12 Energy Conversion Devices, Inc. Method of electro-coating a semiconductor device
US4578157A (en) * 1984-10-02 1986-03-25 Halliwell Michael J Laser induced deposition of GaAs
EP0180101A2 (en) * 1984-11-01 1986-05-07 International Business Machines Corporation Deposition of patterns using laser ablation

Also Published As

Publication number Publication date
DE3643898A1 (en) 1987-10-08
GB2188774A (en) 1987-10-07
GB8628789D0 (en) 1987-01-07
FR2596921A1 (en) 1987-10-09
JPS62232973A (en) 1987-10-13

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19921202