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GB2182061B - Substrate treatment apparatus - Google Patents

Substrate treatment apparatus

Info

Publication number
GB2182061B
GB2182061B GB8625410A GB8625410A GB2182061B GB 2182061 B GB2182061 B GB 2182061B GB 8625410 A GB8625410 A GB 8625410A GB 8625410 A GB8625410 A GB 8625410A GB 2182061 B GB2182061 B GB 2182061B
Authority
GB
United Kingdom
Prior art keywords
treatment apparatus
substrate treatment
substrate
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
GB8625410A
Other versions
GB8625410D0 (en
GB2182061A (en
Inventor
Ronald Edward Enstrom
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB858526241A external-priority patent/GB8526241D0/en
Priority claimed from US06/802,744 external-priority patent/US4703718A/en
Application filed by RCA Corp filed Critical RCA Corp
Publication of GB8625410D0 publication Critical patent/GB8625410D0/en
Publication of GB2182061A publication Critical patent/GB2182061A/en
Application granted granted Critical
Publication of GB2182061B publication Critical patent/GB2182061B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
GB8625410A 1985-10-24 1986-10-23 Substrate treatment apparatus Expired - Lifetime GB2182061B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB858526241A GB8526241D0 (en) 1985-10-24 1985-10-24 Inlet chamber for mocvd reactor
US06/802,744 US4703718A (en) 1985-11-29 1985-11-29 Vapor deposition apparatus and method of using same

Publications (3)

Publication Number Publication Date
GB8625410D0 GB8625410D0 (en) 1986-11-26
GB2182061A GB2182061A (en) 1987-05-07
GB2182061B true GB2182061B (en) 1990-02-21

Family

ID=26289926

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8625410A Expired - Lifetime GB2182061B (en) 1985-10-24 1986-10-23 Substrate treatment apparatus

Country Status (2)

Country Link
CA (1) CA1280055C (en)
GB (1) GB2182061B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2177119B (en) * 1985-06-26 1989-04-26 Plessey Co Plc Organometallic chemical vapour deposition
KR960015375B1 (en) * 1994-06-08 1996-11-11 현대전자산업 주식회사 Ferroelectric thin film manufacturing apparatus and ferroelectric thin film manufacturing method using the same

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB859688A (en) * 1958-03-11 1961-01-25 Pilkington Brothers Ltd Improvements in or relating to mixing apparatus
GB998211A (en) * 1962-01-29 1965-07-14 Hughes Aircraft Co Method of producing monocrystalline semiconductor material
GB1022477A (en) * 1962-12-14 1966-03-16 Int Rectifier Corp Improvements in or relating to epitaxial deposition of semiconductor devices
GB1184220A (en) * 1967-01-19 1970-03-11 Rca Corp Vapor Deposition of Insulating Coatings
GB1202573A (en) * 1966-09-01 1970-08-19 Western Electric Co Methods of depositing thin films on substrates by means of gas plasmas
GB1462253A (en) * 1973-06-29 1977-01-19 Ibm Methods of depositing silicon dioxide layers on silicon substrates
GB1601699A (en) * 1977-11-03 1981-11-04 Gen Eng Radcliffe Method and apparatus for dispersing a liquid additive throughout a plastics material
EP0140660A2 (en) * 1983-10-31 1985-05-08 Dow Corning Corporation Method of forming amorphous polymeric halosilane films and products produced therefrom

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB859688A (en) * 1958-03-11 1961-01-25 Pilkington Brothers Ltd Improvements in or relating to mixing apparatus
GB998211A (en) * 1962-01-29 1965-07-14 Hughes Aircraft Co Method of producing monocrystalline semiconductor material
GB1022477A (en) * 1962-12-14 1966-03-16 Int Rectifier Corp Improvements in or relating to epitaxial deposition of semiconductor devices
GB1202573A (en) * 1966-09-01 1970-08-19 Western Electric Co Methods of depositing thin films on substrates by means of gas plasmas
GB1184220A (en) * 1967-01-19 1970-03-11 Rca Corp Vapor Deposition of Insulating Coatings
GB1462253A (en) * 1973-06-29 1977-01-19 Ibm Methods of depositing silicon dioxide layers on silicon substrates
GB1601699A (en) * 1977-11-03 1981-11-04 Gen Eng Radcliffe Method and apparatus for dispersing a liquid additive throughout a plastics material
EP0140660A2 (en) * 1983-10-31 1985-05-08 Dow Corning Corporation Method of forming amorphous polymeric halosilane films and products produced therefrom

Also Published As

Publication number Publication date
CA1280055C (en) 1991-02-12
GB8625410D0 (en) 1986-11-26
GB2182061A (en) 1987-05-07

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19981023