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GB2180262B - Methods of forming substances on substrates by reactive sputtering - Google Patents

Methods of forming substances on substrates by reactive sputtering

Info

Publication number
GB2180262B
GB2180262B GB8522056A GB8522056A GB2180262B GB 2180262 B GB2180262 B GB 2180262B GB 8522056 A GB8522056 A GB 8522056A GB 8522056 A GB8522056 A GB 8522056A GB 2180262 B GB2180262 B GB 2180262B
Authority
GB
United Kingdom
Prior art keywords
substrates
methods
reactive sputtering
forming substances
substances
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
GB8522056A
Other versions
GB2180262A (en
GB8522056D0 (en
Inventor
Christopher John Wort
Stuart Philip Speakman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GE Healthcare UK Ltd
Plessey Co Ltd
Original Assignee
GE Healthcare UK Ltd
Plessey Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GE Healthcare UK Ltd, Plessey Co Ltd filed Critical GE Healthcare UK Ltd
Priority to GB8522056A priority Critical patent/GB2180262B/en
Publication of GB8522056D0 publication Critical patent/GB8522056D0/en
Publication of GB2180262A publication Critical patent/GB2180262A/en
Application granted granted Critical
Publication of GB2180262B publication Critical patent/GB2180262B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0047—Activation or excitation of reactive gases outside the coating chamber
    • C23C14/0052—Bombardment of substrates by reactive ion beams
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB8522056A 1985-09-05 1985-09-05 Methods of forming substances on substrates by reactive sputtering Expired - Lifetime GB2180262B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB8522056A GB2180262B (en) 1985-09-05 1985-09-05 Methods of forming substances on substrates by reactive sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8522056A GB2180262B (en) 1985-09-05 1985-09-05 Methods of forming substances on substrates by reactive sputtering

Publications (3)

Publication Number Publication Date
GB8522056D0 GB8522056D0 (en) 1985-10-09
GB2180262A GB2180262A (en) 1987-03-25
GB2180262B true GB2180262B (en) 1990-05-09

Family

ID=10584765

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8522056A Expired - Lifetime GB2180262B (en) 1985-09-05 1985-09-05 Methods of forming substances on substrates by reactive sputtering

Country Status (1)

Country Link
GB (1) GB2180262B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2208390B (en) * 1987-08-06 1991-03-27 Plessey Co Plc Thin film deposition process
US4885070A (en) * 1988-02-12 1989-12-05 Leybold Aktiengesellschaft Method and apparatus for the application of materials
US4851095A (en) * 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
US5225057A (en) * 1988-02-08 1993-07-06 Optical Coating Laboratory, Inc. Process for depositing optical films on both planar and non-planar substrates
US5618388A (en) * 1988-02-08 1997-04-08 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
US5798027A (en) * 1988-02-08 1998-08-25 Optical Coating Laboratory, Inc. Process for depositing optical thin films on both planar and non-planar substrates
DE3920835C2 (en) * 1989-06-24 1997-12-18 Leybold Ag Device for coating substrates
GB8921666D0 (en) * 1989-09-26 1989-11-08 Peatgrange Ivd Limited Ion vapour deposition apparatus and method
EP0598422B1 (en) * 1992-10-15 2000-09-13 Koninklijke Philips Electronics N.V. Method of forming a Ti and a TiN layer on a semiconductor body by a sputtering process, comprising an additional step of cleaning the target
US6258218B1 (en) 1999-10-22 2001-07-10 Sola International Holdings, Ltd. Method and apparatus for vacuum coating plastic parts
US6440280B1 (en) 2000-06-28 2002-08-27 Sola International, Inc. Multi-anode device and methods for sputter deposition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1118757A (en) * 1965-10-11 1968-07-03 Ibm Method of depositing silicon nitride films
GB1338370A (en) * 1971-09-28 1973-11-21 Ibm Method of fabricating nitrides of gallium and indium
EP0064288A1 (en) * 1981-05-04 1982-11-10 Optical Coating Laboratory, Inc. Method and apparatus for the production and utilization of activated molecular beams

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1118757A (en) * 1965-10-11 1968-07-03 Ibm Method of depositing silicon nitride films
GB1338370A (en) * 1971-09-28 1973-11-21 Ibm Method of fabricating nitrides of gallium and indium
EP0064288A1 (en) * 1981-05-04 1982-11-10 Optical Coating Laboratory, Inc. Method and apparatus for the production and utilization of activated molecular beams

Also Published As

Publication number Publication date
GB2180262A (en) 1987-03-25
GB8522056D0 (en) 1985-10-09

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Legal Events

Date Code Title Description
732 Registration of transactions, instruments or events in the register (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19950905