GB2148182A - Metal-clad laminate construction - Google Patents
Metal-clad laminate construction Download PDFInfo
- Publication number
- GB2148182A GB2148182A GB08328732A GB8328732A GB2148182A GB 2148182 A GB2148182 A GB 2148182A GB 08328732 A GB08328732 A GB 08328732A GB 8328732 A GB8328732 A GB 8328732A GB 2148182 A GB2148182 A GB 2148182A
- Authority
- GB
- United Kingdom
- Prior art keywords
- metal
- layer
- copper
- coupling agent
- clad laminate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010276 construction Methods 0.000 title description 2
- 239000007822 coupling agent Substances 0.000 claims abstract description 47
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 39
- 229910052802 copper Inorganic materials 0.000 claims abstract description 39
- 239000010949 copper Substances 0.000 claims abstract description 39
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 229910052751 metal Inorganic materials 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims abstract description 13
- 239000002131 composite material Substances 0.000 claims abstract description 6
- 238000004519 manufacturing process Methods 0.000 claims abstract description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical group [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 16
- 239000011787 zinc oxide Substances 0.000 claims description 12
- 238000000151 deposition Methods 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 6
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 4
- 239000005751 Copper oxide Substances 0.000 claims description 4
- 230000032683 aging Effects 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 229910000431 copper oxide Inorganic materials 0.000 claims description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 239000003365 glass fiber Substances 0.000 claims description 2
- 150000001282 organosilanes Chemical group 0.000 claims description 2
- 229920005989 resin Polymers 0.000 claims description 2
- 239000011347 resin Substances 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical group O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 2
- 229910001887 tin oxide Inorganic materials 0.000 claims description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 1
- 238000010030 laminating Methods 0.000 claims 1
- 239000011701 zinc Substances 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 238000002360 preparation method Methods 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 238000003475 lamination Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000007719 peel strength test Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- -1 N-vinylbenzyl-amino Chemical group 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 125000001475 halogen functional group Chemical group 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- MRLBXVQKUIIMQT-UHFFFAOYSA-N N-[[dimethoxy(propyl)silyl]oxymethyl]ethanamine Chemical compound C(C)NCO[Si](OC)(OC)CCC MRLBXVQKUIIMQT-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 241000534944 Thia Species 0.000 description 1
- HBKVUWMWOSEXRG-UHFFFAOYSA-N [(isocyanoiminohydrazinylidene)hydrazinylidene]carbamic acid Chemical group C(=O)(O)N=NN=NN=N[N+]#[C-] HBKVUWMWOSEXRG-UHFFFAOYSA-N 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229920005610 lignin Polymers 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/06—Interconnection of layers permitting easy separation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
- H05K3/025—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates by transfer of thin metal foil formed on a temporary carrier, e.g. peel-apart copper
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2250/00—Layers arrangement
- B32B2250/03—3 layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2305/00—Condition, form or state of the layers or laminate
- B32B2305/08—Reinforcements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2311/00—Metals, their alloys or their compounds
- B32B2311/12—Copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2311/00—Metals, their alloys or their compounds
- B32B2311/16—Tin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2311/00—Metals, their alloys or their compounds
- B32B2311/20—Zinc
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0302—Properties and characteristics in general
- H05K2201/0317—Thin film conductor layer; Thin film passive component
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0147—Carriers and holders
- H05K2203/0152—Temporary metallic carrier, e.g. for transferring material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0315—Oxidising metal
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laminated Bodies (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
A metal-clad laminate having special utility in the production of high resolution printed circuit patterns and preparation thereof comprises a substitute e.g. a resin-bonded, glass-reinforced substrate 17 having opposed first and second major surfaces, a layer 16 of coupling agent covering and bonded to one of these surfaces, a layer 13 of ultra-thin copper adjacent the layer of coupling agent, and a composite bonding layer 14' disposed between the copper layer and the layer of coupling agent, the composite bonding layer comprising copper alloyed with a second metal and oxide of the second metal. <IMAGE>
Description
SPECIFICATION
Metal-clad laminate construction
This invention relates to a metal-clad laminate particularly adaptable to the preparation of high resolution
printed circuit boards. This invention is related to that disclosed and claimed in copending patent applications Serial No.227,290 - Lifshin et al., filed January 1981 and Serial No. 189,003 - Lifshin et al., filed September 1980, both applications being assigned to the assignee hereof. Serial No. 189,003 discloses a method for chemically bonding an ultra-thin copper film to a resin-bonded substrate and the products resulting from the method.Serial No. 227,290 is directed to the method of depositing copper on a carrier surface while controlling the adhesion therebetween by maintaining the carrier surface at a temperature in the range of from about 1 00" to about 250or. The aforementioned applications are incorporated by reference.
Among the disclosures in the prior art pertinent to this invention is U.S. Patent No. 3,984,598 - Sarazin et al.
According to the Sarazin et al. teachings, a thin layer of copper (or other conductive metal, e.g. nickel, tin, gold, etc.) is plated on a transfer carrier surface treated with a release agent, subjected to a high current density to roughen the surface of the copper, the copper is oxidized and the copper oxide is then coated with coupling agent. The treated copper surface is next hot pressed against a resin-bonded substrate and the transfer carrier is separated from the copper layer which remains bonded to the resin-bonded substrate.
As used herein, and in the appended claims, the term "carrier" includes aluminum sheet material which is of gauge thickness such that it can be run through a processing line and rolled for storage or shipment, and also includes such sheet material of other metals such as copper as well as of plastics such as duPont commercial products known as MYLAR and KAPTON and other organic polymeric materials of similar flexibility.All these materials share the ability to withstand the processing temperatures involved in this invention and have the strength at the temperature of deposition of a copper film thereon and the characteristics of inertness and bondability to copper films necessary to preserve the integrity of the copper film-carrier sheet combination through subsequent processing and substrate attachment and to permit mechanical stripping of the carrier sheet without damaging the copper film.
"Ultra-thin" designates a thickness of less than about 16 microns.
"Film" and "foil" in this same context mean, respectively, an ultra-thin coating and the combination of such ultra-thin coating with an applied coating of oxide of a non-copper metal.
"Vapor deposition" means and includes sputtering, physical evaporation (i.e., electron beam, inductive and/or resistive evaporation), chemical vapor deposition, and ion plating.
"Substrate", as that term is used in this specification and the appended claims, means and refers to that part of the copper-clad laminate product or other article of manufacture of this invention, which serves as the physical support means for the metal film or foil. The substrate material is preferably epoxy reinforced with glass fiber provided for lamination with the epoxy resin in the form of a prepreg cured during the lamination step. Other thermosetting resins such as phenolic resins, melamine resins, silicones, polyimide resins, acrylic resins, polyester resins, etc. may also be used and, as well, other base materials such as paper, fabrics, lignin, asbestos, synthetic fibers such as rayon, nylon, etc. may be used. One requirement of the substrates useful in this invention is the availability of coupling agents able to bond well to the substrate surface.
"Interacted coupling agent layer" means a layer of coupling agent molecules that have at least in large part chemically interacted with both the oxide layer and the surface of the substrate.
A film of copper, preferably 1 to 16 microns in thickness, is vapor deposited on a carrier. This film of copper is coated with a thin vapor deposited layer of a metal oxide under conditions (i.e. vacuum and temperature) which preclude copper oxide formation. The layer of metal oxide is then coated with a coupling agent. This assembly is then laminated with a suitable substrate (i.e. one to whose surface the coupling agent will bond) by the application of heat and pressure. The carrier may be removed at the time of manufacture of this assembly (i.e. a circuit board) or may remain in place for removal at a later time.
The oxide, which has as its metal component a metal other than copper, is one which decomposes to a slight degree under the process conditions imposed during evaporation. During lamination, the metallic component released from the decomposed oxide alloys with the copper. This usually results in discreet "islands" of alloy at the interface between the oxide layer and copper. It is believed that these alloy concentrations add significantly to the high peel strength in the resultant product. At the same time, decomposition of small quantities of the oxide being deposited produces some amount of sub-oxide in the oxide layer. The coupling agent provides the interconnection required between the oxide layer and the surface of the substrate.Peel strengths of greater than 9 Ibs/in have been obtained using zinc oxide as the oxide component, particularly when the laminated product is given a subsequent heat treatment. Further improvement in peel strength (as much as 20 percent) is experienced as the result of short term (about 4 days) aging.
The features of this invention believed to be novel and unobvious over the prior art are set forth with particularity in the appended claims. The invention itself, however, as to the organization, method of operation and objects and advantages thereof, may best be understood by reference to the following description taken in conjunction with the accompanying drawing wherein:
Figure 1 is a schematic cross-sectional view of the initial stage of production of the metal-clad laminate of this invention;
Figure 2 is a view similar to Figure 1 representing the assembly immediately prior to lamination; and
Figure 3 is a schematic cross-sectional view of the metal-clad laminate of this invention with the carrier sheet partially removed.
Manner and process of making and using the invention
The invention described in S.N. 227,290 is employed to condition carrier sheet 12 in respect to temperature so that copper film 13 can be formed directly thereon by vapor deposition and the adhesion of copper film 13 to carrier sheet 12 is such that these components can be separated by applying a force of between about 0.20 and 2.0 Ibs/in. Preferably, the requisite force will be in the range of about 0.20 to 1.0 Ibs/in. Prior to conduct of the process, the carrier surface is to be clean, i.e. free from adhering oil and dirt and should be relatively smooth and free from gross physical irregularities.During the actual deposition process, which is conducted under vacuum, the surface of carrier 12 is maintained at a temperature in the range of from about 100 to about 200 C. It is important that the deposition chamber be well-sealed so that the vacuum pump can be used to control the oxygen and water vapor content to a negligible level during copper deposition to minimize copper oxide formation.
The copper film 13 having been deposited, preferably in a thickness of from 1 to 16 microns (although thicker layers can be used), copper film 13 is then coated with layer 14 (e.g. zinc oxide) by vapor decomposition (usually in the same deposition chamber) in a relatively uniform thickness ranging from about 10 to 500 Angstroms (preferably in the range 10-100 Angstroms under vacuum with controlled oxygen and water vapor content as monitored by a residual gas analyzer. This oxide layer so deposited thereafter receives layer 16 of a solution of coupling agent. The coupling agent preferably comprises an organosilane, such as y-aminopropyltriethoxysilane.When the coupling agent material has dried, the assembly of carrier sheet 12, copper 13, oxide layer 14 and coupling agent layer 16 is bonded to the glass-reinforced epoxy board 17 using a temperature of about 175 C simultaneously with the application of pressure of about 150 psi for a time of about 30 to about 40 minutes at temperature. The rate of temperature rise is controlled to optimize the rates of curing and epoxy squeeze-out.
Example 1
Approximately 5 microns of copper was deposited by evaporation onto a 2 mil thick sheet of aluminum foil. An approximately 100 Angstrom thick layer of zinc oxide was deposited over the copper film at a pressure of 4-5 x 10-4torr in a vacuum chamber. This composite was therm removed from the vacuum chamber and the zinc oxide layer was coated with N-#(N-vinylbenzyl-amino)ethyl-#-aminoprnpyltrimethoxy silane-monohydrogen chloride coupling agent (Dow Corning Z-6032). The coupling agent solution was prepared by adding 0.5% of coupling agent to water at a pH corrected to 4 using acetic acid. The coupling agent deposited was permitted to dry in air at 1 000C for five minutes.Thereafter, this assembly was placed upon a glass-reinforced epoxy board with the coupling agent in contact with the surface of the board. The assembly was bonded to the board using a maximum temperature of 178 C and a maximum pressure of 150 psi for 35 minutes at temperature. Subsequent to lamination, the aluminum foil was removed, and the thin film of copper was built up by electroplating to about 1 mil to facilitate the conduct of a peel test. Peel strengths from 8.8 to 9.6 Ibs/in were measured with different samples prepared by this process.
Peel strength tests were conducted on a series of samples prepared using different oxides and various coupling agent solutions and it was found by trying various combinations of oxide and coupling agents superior combinations could be routinely determined. Table I below sets forth some of the test results, each result being report as a range of values (ibs/inch) obtained from several tests.
TABLE I
Coupling
Agent SnO ZnO NiO FeO Awl203 A-187 1.20/4.00 - 2.08/4.96 1.6/2.8 4.0/8.8 A-1100 5.2/6.05 - 3.20/4.96 1.6/3.20 4.08/4.64
A-1120 3.36/3.84 - 2.96/5.76 1.12/2.72 2.00/3.60 Z-6032 4.24/5.68 7.0/10.8 1.2/2.0 1.68/2.64 1.04/2.80 Z-6040 3.92/5.28 - 2.40/3.60 .88/1.76 4.0/4.64
NONE 1.6/3.5 2.6/4 2~4/3.5 1.9/2.7 2.24/2.64 The coupling agents A-187, A-1 100 and A-1120 are manufactured by Union Carbide Corp. and those designated Z-6032 and Z-6040 are manufactured by Dow Corning Corp. The layer of coupling agent solution should be able to uniformly wet the surface contacted and should contain sufficient coupling agent to accommodate most of the binding sites on the adjacent surfaces. Drying of the coupling agent solution should be accomplished below about 1 OO"C. The coupling agents identified in Table I are all organofunctional silanes and have composition as follows:
Mfgr.
Designation Name
A-187 #glycidoxyprnpyltrimethoxy silane
A-1100 y-aminopropyltriethoxysilane A-1120 N-ss-(aminoethyl)-y-aminopropyl- trimethoxysilane
Z-6032 N-#-(N-vinylbenzylamino)ethyl- aminopropyltrimethoxy silane.monohydrogen chloride
(40% silane in methanol)
Z-6040 ,',-glycidoxyprnpyltrimethoxysilane The preferred solvent system is methanol and water; however, other conventional solvents can be used.
The concentration of coupling agent in the solvent system can be in the range of from 0.1 to 5 volume percent with the preferred range being about 0.2 to about 1.0 volume percent. Optimization is obtained by routine testing.
The following example describes preparation of the coupling agent solution successfully used with zinc oxide and glass reinforced epoxy resin.
Example 2
Coupling agent Z-6032 (40 percent silane in methanol) is added to distilled water the pH of which has previously been adjusted to 3.5 - 5.0 with acetic acid. The coupling agent (5% by volume) is added to the pH adjusted water and then mixed with methanol to produce a final concentration of 0.5 percent by volume coupling agent.
Coupling agents are simply molecules that possess two different kinds of reactivity. Most of the coupling agents used to establish a chemical bond with inorganic surfaces are organo-functional silanes. Silane coupling agents may be represented by the genera formula: R'nSiR4-n where R' is a saturated, unsaturated or aromatic hydrocarbon residue functionalized by a member selected from the group consisting of amino, carbonyl, carboxy, isocyano, azo, diazo, thio, thia dithia isothiocyano oxo, oxa, halo, ester, nitroso, sulfhydryl halocarbonyl, amido, sulfoamido and multiples and combinations thereof; R is a hydrolyzable group compatible with R' selected from the group consisting of alkoxy, phenoxy, halo, amino, dialkylamino and tertiary peroxyalkyl; and n is an integer having a value of 1-3.
The preferred coupling agents for the practice of this invention are those designated Z-6032 (with zinc oxide) and A-i 100 (with tin oxide) applied by dipping. Other suitable methods of application are spraying, brushing, immersion, etc.
Unexpectedly, it has been found that the peel strength of the product produced by this process (through the lamination step) is enhanced significantly either by subjecting the laminate to a heating step or by aging the laminate at room temperature (i.e. about 68"F).
The improvement produced by either of these treatments was discovered quite by accident. Pieces of sample laminate [ZnO as the oxide layer with Z6032 as the coupling agent (peel strengths of 3-6.2 Ibs/in and
SnO as the oxide layer with Al 100 as the coupling agent (peel strengths of 5.2 - 6.05 lbs/in) ] were subjected to a simple test procedure used to determine whether objectionable gas content is present in the substrate.
In this procedure the samples are coated with silicone oil and deposited in a pot of molten solder (265"C, 20 second exposure). If the gas content is objectionably high, blisters will form under the copper layer and such performance forms a basis for product rejection. Subsequent peel strength tests of these samples (which passed the "solder float test") showed surprising increases: the ZnO sample yielded 8.6 - 10.8 Ibs/in; the
SnO sample yielded 6.8 - 9.0 Ibs/in. Still another testing sequence has verified the bond strength increase, when the laminate is heated. Thus, ZnO laminate samples peel tested at 125"C exhibited higher peel strengths than those treated at room temperature.Commercially available laminates tested under the same conditions produced a decrease in peel strength at the elevated temperature.
Thus, it has been found through additional investigation that even though the lamination process is conducted under pressure and at temperature, this temperature exposure does not optimize the peel strength. However, if the laminate is subject to a re-heat (temperature exposure: about 1 25"C to about 300 C) for a time ranging from about 20 seconds to several minutes, a significant increase in peel strength is obtained.
A suitable piece of apparatus for such a reheat step is one in which the heating is done by vapor transport, as is the mode of heating in solder reflow apparatus.
Peel strength tests conducted on laminations prepared by the practice of this invention (excluding the heating step described above) and aged for periods of at least 3-4 days have normally demonstrated increases in peel strength readings of as much as 1 Ib/in, and in no case has the peel strength decreased with age. A test conducted over a 5-month period on laminate produced with zinc oxide and Z-6032 coupling agent has exhibited significant improvement in peel strength, which was maintained with further aging.
TABLE II
Peel strength
Date FIbslinJ 2/16/82 4-5
2/22/82 5.4-10
7/27/82 5.6-9
Claims (15)
1. A metal-clad laminate comprising a substrate, an interacted coupling agent layer extending over and bonded to major surface of said substrate, a layer of ultra-thin copper adjacent said layer of interacted coupling agent and a composite bonding layer interconnecting said copper layer and said interacted coupling agent layer, said composite bonding layer comprising regions of copper alloyed with a second metal embedded in oxide of said second metal.
2. The metal-clad laminate of claim 1 wherein the substrate is a sheet of resin reinforced with glass fibers.
3. The metal-clad laminate of claim 1 wherein the second metal is selected from the group consisting of zinc and tin.
4. The metal-clad laminate of claim 1 wherein oxide of an additional non-copper metal is present in the composite bonding layer.
5. The metal-clad laminate of claim 1 wherein the coupling agent is organosilane-based.
6. The metal-clad laminate of claim 5 wherein the oxide is tin oxide and the coupling agent is #aminoprnpyItriethyoxysilane-based.
7. The metal-clad laminate of claim 5 wherein the oxide is zinc oxide and the coupling agent is N-(3-(N-vinylbenzyl-amino)ethyl)-#aminoprnpyltrimethoxysilane.monohydrngen chloride-based.
8. The metal-clad laminate of claim 1 wherein a carrier sheet is adhered to the surface of the layer of ultra thin copper.
9. The method of making a copper-clad laminate comprising the steps of:
(a) maintaining a carrier sheet with the temperature of a major surface thereof in the temperature range from about 1 000C to about 250 C.
(b) forming a copper film on said major surface by vapor depositing copper directly thereon,
(c) depositing a layer of an oxide of a second metal over said copper film under conditions of temperature and pressure substantially precluding the formation of copper oxide,
(d) coating said oxide layer with a solution containing coupling agent, which layer is permitted to dry,
(e) drying said coupling agent and
(f) laminating the resulting assembly to a major surface of a substrate at elevated temperature and pressure, said substrate major surface having binding sites available for said coupling agent.
10. The method of claim 9 including the additional step of heating the resulting laminate to a temperature in the range of from about 1 25"C to about 300on for a time ranging from about 20 seconds to about several minutes.
11. The method of claim 9 including the additional step of aging the resulting laminate for a period of at least about 4 days.
12. The method of claim 9 including the additional step of stripping the carrier sheet from the resulting laminate.
13. The product resulting from practice of the method of claim 9.
14. A metal-clad laminate substantially as herein described and as illustrated in Figure 3 of the accompanying drawings.
15. A method of making a copper-clad laminate substantially as herein described with reference to either of the Examples herein.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3339715A DE3339715C2 (en) | 1983-11-03 | 1983-11-03 | Copper-clad laminate and process for its production |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| GB8328732D0 GB8328732D0 (en) | 1983-11-30 |
| GB2148182A true GB2148182A (en) | 1985-05-30 |
| GB2148182B GB2148182B (en) | 1987-02-11 |
Family
ID=6213329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB08328732A Expired GB2148182B (en) | 1983-11-03 | 1983-10-27 | Metal-clad laminate construction |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE3339715C2 (en) |
| GB (1) | GB2148182B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4499152A (en) * | 1982-08-09 | 1985-02-12 | General Electric Company | Metal-clad laminate construction |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3984598A (en) * | 1974-02-08 | 1976-10-05 | Universal Oil Products Company | Metal-clad laminates |
| US4357395A (en) * | 1980-08-22 | 1982-11-02 | General Electric Company | Transfer lamination of vapor deposited foils, method and product |
| US4383003A (en) * | 1980-09-22 | 1983-05-10 | General Electric Company | Transfer lamination of copper thin sheets and films, method and product |
| GB2091634B (en) * | 1981-01-22 | 1984-12-05 | Gen Electric | Transfer lamination of vapour deposited copper thin sheets and films |
| US4364731A (en) * | 1981-01-29 | 1982-12-21 | Board Of Regents, The University Of Texas System | Methods for producing adhesive bonds between substrate and polymer employing an intermediate oxide layer |
-
1983
- 1983-10-27 GB GB08328732A patent/GB2148182B/en not_active Expired
- 1983-11-03 DE DE3339715A patent/DE3339715C2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| DE3339715A1 (en) | 1985-05-15 |
| GB8328732D0 (en) | 1983-11-30 |
| GB2148182B (en) | 1987-02-11 |
| DE3339715C2 (en) | 1994-04-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19961027 |