GB2140039B - Solution suitable for polishing copper and its alloys - Google Patents
Solution suitable for polishing copper and its alloysInfo
- Publication number
- GB2140039B GB2140039B GB08412497A GB8412497A GB2140039B GB 2140039 B GB2140039 B GB 2140039B GB 08412497 A GB08412497 A GB 08412497A GB 8412497 A GB8412497 A GB 8412497A GB 2140039 B GB2140039 B GB 2140039B
- Authority
- GB
- United Kingdom
- Prior art keywords
- alloys
- solution suitable
- polishing copper
- polishing
- copper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title 1
- 229910045601 alloy Inorganic materials 0.000 title 1
- 239000000956 alloy Substances 0.000 title 1
- 229910052802 copper Inorganic materials 0.000 title 1
- 239000010949 copper Substances 0.000 title 1
- 238000005498 polishing Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
- C23F3/04—Heavy metals
- C23F3/06—Heavy metals with acidic solutions
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Surface Treatment Of Glass (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PL24204883A PL137972B1 (en) | 1983-05-19 | 1983-05-19 | Agent for polishing copper and its alloys |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| GB8412497D0 GB8412497D0 (en) | 1984-06-20 |
| GB2140039A GB2140039A (en) | 1984-11-21 |
| GB2140039B true GB2140039B (en) | 1986-09-03 |
Family
ID=20017100
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB08412497A Expired GB2140039B (en) | 1983-05-19 | 1984-05-16 | Solution suitable for polishing copper and its alloys |
Country Status (3)
| Country | Link |
|---|---|
| DE (1) | DE3418574C2 (en) |
| GB (1) | GB2140039B (en) |
| PL (1) | PL137972B1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6530824B2 (en) | 2001-03-09 | 2003-03-11 | Rodel Holdings, Inc. | Method and composition for polishing by CMP |
| KR100762424B1 (en) * | 2001-03-12 | 2007-10-02 | 롬 앤드 하스 일렉트로닉 머티리얼스 씨엠피 홀딩스 인코포레이티드 | Polishing method by CPM and composition for same |
| PL246166B1 (en) | 2023-03-01 | 2024-12-09 | Akademia Gorniczo Hutnicza Im Stanislawa Staszica W Krakowie | Polishing solution for copper and its alloys and polishing method |
-
1983
- 1983-05-19 PL PL24204883A patent/PL137972B1/en unknown
-
1984
- 1984-05-16 GB GB08412497A patent/GB2140039B/en not_active Expired
- 1984-05-18 DE DE19843418574 patent/DE3418574C2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB2140039A (en) | 1984-11-21 |
| GB8412497D0 (en) | 1984-06-20 |
| DE3418574C2 (en) | 1986-06-19 |
| PL137972B1 (en) | 1986-08-30 |
| PL242048A1 (en) | 1984-12-03 |
| DE3418574A1 (en) | 1984-11-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PCNP | Patent ceased through non-payment of renewal fee |