GB201802848D0 - Plasma monitoring system - Google Patents
Plasma monitoring systemInfo
- Publication number
- GB201802848D0 GB201802848D0 GBGB1802848.0A GB201802848A GB201802848D0 GB 201802848 D0 GB201802848 D0 GB 201802848D0 GB 201802848 A GB201802848 A GB 201802848A GB 201802848 D0 GB201802848 D0 GB 201802848D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- monitoring system
- plasma monitoring
- plasma
- monitoring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000012544 monitoring process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
- G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L21/00—Vacuum gauges
- G01L21/30—Vacuum gauges by making use of ionisation effects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L27/00—Testing or calibrating of apparatus for measuring fluid pressure
- G01L27/002—Calibrating, i.e. establishing true relation between transducer output value and value to be measured, zeroing, linearising or span error determination
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H01J37/32972—Spectral analysis
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H01J37/32981—Gas analysis
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N2021/8411—Application to online plant, process monitoring
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB1802848.0A GB201802848D0 (en) | 2018-02-22 | 2018-02-22 | Plasma monitoring system |
| PCT/GB2019/050484 WO2019162681A1 (en) | 2018-02-22 | 2019-02-21 | Plasma monitoring system |
| EP19708633.3A EP3997445A1 (en) | 2018-02-22 | 2019-02-21 | Plasma monitoring system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB1802848.0A GB201802848D0 (en) | 2018-02-22 | 2018-02-22 | Plasma monitoring system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB201802848D0 true GB201802848D0 (en) | 2018-04-11 |
Family
ID=61903134
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GBGB1802848.0A Ceased GB201802848D0 (en) | 2018-02-22 | 2018-02-22 | Plasma monitoring system |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP3997445A1 (en) |
| GB (1) | GB201802848D0 (en) |
| WO (1) | WO2019162681A1 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102703191B1 (en) * | 2019-09-20 | 2024-09-04 | 인피콘 아크티엔게젤샤프트 | Method for determining pressure and pressure sensor |
| CN113624391B (en) * | 2020-05-08 | 2023-04-07 | 中国石油天然气股份有限公司 | H in oil field gathering and transportation pipeline 2 S and CO 2 Method for obtaining partial pressure |
| CN112082691B (en) * | 2020-08-24 | 2022-10-28 | 西安交通大学 | Low-pressure measuring method and device based on laser plasma imaging |
| US12406837B2 (en) * | 2022-06-15 | 2025-09-02 | Applied Materials, Inc. | Reaction cell for species sensing |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5233131B2 (en) * | 2007-02-23 | 2013-07-10 | 株式会社Ihi | Carburizing apparatus and carburizing method |
-
2018
- 2018-02-22 GB GBGB1802848.0A patent/GB201802848D0/en not_active Ceased
-
2019
- 2019-02-21 EP EP19708633.3A patent/EP3997445A1/en active Pending
- 2019-02-21 WO PCT/GB2019/050484 patent/WO2019162681A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO2019162681A1 (en) | 2019-08-29 |
| EP3997445A1 (en) | 2022-05-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AT | Applications terminated before publication under section 16(1) |