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GB201721671D0 - A vacuum pumping arrangement and method of cleaning the vacuum pumping arrangement - Google Patents

A vacuum pumping arrangement and method of cleaning the vacuum pumping arrangement

Info

Publication number
GB201721671D0
GB201721671D0 GBGB1721671.4A GB201721671A GB201721671D0 GB 201721671 D0 GB201721671 D0 GB 201721671D0 GB 201721671 A GB201721671 A GB 201721671A GB 201721671 D0 GB201721671 D0 GB 201721671D0
Authority
GB
United Kingdom
Prior art keywords
vacuum pumping
pumping arrangement
cleaning
arrangement
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB1721671.4A
Other versions
GB2569633A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Edwards Ltd
Original Assignee
Edwards Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edwards Ltd filed Critical Edwards Ltd
Priority to GB1721671.4A priority Critical patent/GB2569633A/en
Publication of GB201721671D0 publication Critical patent/GB201721671D0/en
Priority to US16/955,444 priority patent/US20200355190A1/en
Priority to JP2020533225A priority patent/JP2021507172A/en
Priority to EP18829446.6A priority patent/EP3728858A1/en
Priority to PCT/GB2018/053689 priority patent/WO2019122873A1/en
Publication of GB2569633A publication Critical patent/GB2569633A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00—Axial-flow pumps
    • F04D19/02—Multi-stage pumps
    • F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
    • F04D19/042—Turbomolecular vacuum pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00—Axial-flow pumps
    • F04D19/02—Multi-stage pumps
    • F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
    • F04D19/046—Combinations of two or more different types of pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D29/00—Details, component parts, or accessories
    • F04D29/70—Suction grids; Strainers; Dust separation; Cleaning
    • F04D29/701—Suction grids; Strainers; Dust separation; Cleaning especially adapted for elastic fluid pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00—Axial-flow pumps
    • F04D19/02—Multi-stage pumps
    • F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
    • F04D19/044—Holweck-type pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D23/00—Other rotary non-positive-displacement pumps
    • F04D23/008—Regenerative pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C2360/00—Engines or pumps
    • F16C2360/44—Centrifugal pumps
    • F16C2360/45—Turbo-molecular pumps

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Non-Positive Displacement Air Blowers (AREA)
  • Drying Of Semiconductors (AREA)
GB1721671.4A 2017-12-21 2017-12-21 A vacuum pumping arrangement and method of cleaning the vacuum pumping arrangement Withdrawn GB2569633A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
GB1721671.4A GB2569633A (en) 2017-12-21 2017-12-21 A vacuum pumping arrangement and method of cleaning the vacuum pumping arrangement
US16/955,444 US20200355190A1 (en) 2017-12-21 2018-12-19 Vacuum pumping arrangement
JP2020533225A JP2021507172A (en) 2017-12-21 2018-12-19 Vacuum pumping configuration
EP18829446.6A EP3728858A1 (en) 2017-12-21 2018-12-19 A vacuum pumping arrangement
PCT/GB2018/053689 WO2019122873A1 (en) 2017-12-21 2018-12-19 A vacuum pumping arrangement

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1721671.4A GB2569633A (en) 2017-12-21 2017-12-21 A vacuum pumping arrangement and method of cleaning the vacuum pumping arrangement

Publications (2)

Publication Number Publication Date
GB201721671D0 true GB201721671D0 (en) 2018-02-07
GB2569633A GB2569633A (en) 2019-06-26

Family

ID=61131609

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1721671.4A Withdrawn GB2569633A (en) 2017-12-21 2017-12-21 A vacuum pumping arrangement and method of cleaning the vacuum pumping arrangement

Country Status (5)

Country Link
US (1) US20200355190A1 (en)
EP (1) EP3728858A1 (en)
JP (1) JP2021507172A (en)
GB (1) GB2569633A (en)
WO (1) WO2019122873A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7361640B2 (en) * 2020-03-09 2023-10-16 エドワーズ株式会社 Vacuum pump
JP7427536B2 (en) * 2020-06-12 2024-02-05 エドワーズ株式会社 Vacuum pump
JP7437254B2 (en) * 2020-07-14 2024-02-22 エドワーズ株式会社 Vacuum pumps and vacuum pump cleaning systems
JP2022135716A (en) * 2021-03-05 2022-09-15 エドワーズ株式会社 Vacuum pump and vacuum evacuation device
FR3128748B1 (en) * 2021-11-03 2025-07-18 Pfeiffer Vacuum Turbomolecular vacuum pump and associated cleaning method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61182219A (en) * 1985-02-08 1986-08-14 Nippon Telegr & Teleph Corp <Ntt> Thin film growing method
FR2783883B1 (en) * 1998-09-10 2000-11-10 Cit Alcatel METHOD AND DEVICE FOR AVOIDING DEPOSITS IN A TURBOMOLECULAR PUMP WITH MAGNETIC OR GAS BEARING
US20040014327A1 (en) * 2002-07-18 2004-01-22 Bing Ji Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials
GB0409139D0 (en) * 2003-09-30 2004-05-26 Boc Group Plc Vacuum pump
US20050250347A1 (en) * 2003-12-31 2005-11-10 Bailey Christopher M Method and apparatus for maintaining by-product volatility in deposition process
GB0415560D0 (en) * 2004-07-12 2004-08-11 Boc Group Plc Pump cleaning
KR100706792B1 (en) * 2005-08-01 2007-04-12 삼성전자주식회사 A semiconductor device manufacturing apparatus having a pump unit and a method for cleaning the pump unit
JP2010199497A (en) * 2009-02-27 2010-09-09 Semiconductor Energy Lab Co Ltd Apparatus for manufacturing semiconductor device and method for manufacturing semiconductor device
EP2601413B1 (en) * 2010-08-05 2019-01-16 Ebara Corporation Exhaust system
GB2500610A (en) * 2012-03-26 2013-10-02 Edwards Ltd Apparatus to supply purge gas to a multistage vacuum pump

Also Published As

Publication number Publication date
US20200355190A1 (en) 2020-11-12
EP3728858A1 (en) 2020-10-28
WO2019122873A1 (en) 2019-06-27
JP2021507172A (en) 2021-02-22
GB2569633A (en) 2019-06-26

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)