GB201522137D0 - Method of imaging defects using an electron microscope - Google Patents
Method of imaging defects using an electron microscopeInfo
- Publication number
- GB201522137D0 GB201522137D0 GBGB1522137.7A GB201522137A GB201522137D0 GB 201522137 D0 GB201522137 D0 GB 201522137D0 GB 201522137 A GB201522137 A GB 201522137A GB 201522137 D0 GB201522137 D0 GB 201522137D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- electron microscope
- imaging defects
- defects
- imaging
- microscope
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 230000007547 defect Effects 0.000 title 1
- 238000003384 imaging method Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/203—Measuring back scattering
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
- G01N2223/053—Investigating materials by wave or particle radiation by diffraction, scatter or reflection back scatter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/40—Imaging
- G01N2223/418—Imaging electron microscope
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/611—Specific applications or type of materials patterned objects; electronic devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24592—Inspection and quality control of devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2803—Scanning microscopes characterised by the imaging method
- H01J2237/2804—Scattered primary beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2813—Scanning microscopes characterised by the application
- H01J2237/2817—Pattern inspection
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB1522137.7A GB201522137D0 (en) | 2015-12-15 | 2015-12-15 | Method of imaging defects using an electron microscope |
| PCT/GB2016/053912 WO2017103575A1 (en) | 2015-12-15 | 2016-12-12 | Method of imaging defects using an electron microscope |
| GB1809532.3A GB2561112B (en) | 2015-12-15 | 2016-12-12 | Method of imaging defects using an electron microscope |
| GB1621062.7A GB2545570A (en) | 2015-12-15 | 2016-12-12 | Method of imaging defects using an electron microscope |
| TW105141397A TW201732280A (en) | 2015-12-15 | 2016-12-14 | Method of imaging defects using an electron microscope |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB1522137.7A GB201522137D0 (en) | 2015-12-15 | 2015-12-15 | Method of imaging defects using an electron microscope |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB201522137D0 true GB201522137D0 (en) | 2016-01-27 |
Family
ID=55274804
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GBGB1522137.7A Ceased GB201522137D0 (en) | 2015-12-15 | 2015-12-15 | Method of imaging defects using an electron microscope |
| GB1809532.3A Active GB2561112B (en) | 2015-12-15 | 2016-12-12 | Method of imaging defects using an electron microscope |
| GB1621062.7A Withdrawn GB2545570A (en) | 2015-12-15 | 2016-12-12 | Method of imaging defects using an electron microscope |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1809532.3A Active GB2561112B (en) | 2015-12-15 | 2016-12-12 | Method of imaging defects using an electron microscope |
| GB1621062.7A Withdrawn GB2545570A (en) | 2015-12-15 | 2016-12-12 | Method of imaging defects using an electron microscope |
Country Status (3)
| Country | Link |
|---|---|
| GB (3) | GB201522137D0 (en) |
| TW (1) | TW201732280A (en) |
| WO (1) | WO2017103575A1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2022541391A (en) | 2019-07-26 | 2022-09-26 | エーエスエムエル ネザーランズ ビー.ブイ. | Multiple landing energy scanning electron microscope system and method |
| US20250246399A1 (en) * | 2021-10-12 | 2025-07-31 | Asml Netherlands B.V. | Energy band-pass filtering for improved high landing energy backscattered charged particle image resolution |
| IL303495B2 (en) * | 2023-06-06 | 2024-12-01 | Applied Materials Israel Ltd | Estimating defect depth in a semiconductor sample |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8723115B2 (en) * | 2012-03-27 | 2014-05-13 | Kla-Tencor Corporation | Method and apparatus for detecting buried defects |
| JP2014216213A (en) * | 2013-04-26 | 2014-11-17 | 株式会社日立ハイテクノロジーズ | Charged particle microscope device and method for acquiring image by charged particle microscope device |
| US9449788B2 (en) * | 2013-09-28 | 2016-09-20 | Kla-Tencor Corporation | Enhanced defect detection in electron beam inspection and review |
| US9767986B2 (en) * | 2014-08-29 | 2017-09-19 | Kla-Tencor Corporation | Scanning electron microscope and methods of inspecting and reviewing samples |
-
2015
- 2015-12-15 GB GBGB1522137.7A patent/GB201522137D0/en not_active Ceased
-
2016
- 2016-12-12 WO PCT/GB2016/053912 patent/WO2017103575A1/en not_active Ceased
- 2016-12-12 GB GB1809532.3A patent/GB2561112B/en active Active
- 2016-12-12 GB GB1621062.7A patent/GB2545570A/en not_active Withdrawn
- 2016-12-14 TW TW105141397A patent/TW201732280A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| GB201621062D0 (en) | 2017-01-25 |
| GB2545570A (en) | 2017-06-21 |
| GB2561112B (en) | 2021-06-16 |
| WO2017103575A1 (en) | 2017-06-22 |
| TW201732280A (en) | 2017-09-16 |
| GB201809532D0 (en) | 2018-07-25 |
| GB2561112A (en) | 2018-10-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| IL279706B (en) | Scanning electron microscope and methods of inspecting and reviewing samples | |
| EP3318865A4 (en) | Fluorescent microscopic imaging method and apparatus | |
| GB2538333B (en) | Method for making an object | |
| IL254905A0 (en) | Method and apparatus for solid freeform fabrication of objects with improved resolution background | |
| EP3162011A4 (en) | An apparatus and method enhancing quality of service architecture for lte | |
| EP3215711A4 (en) | Electromagnetic imaging for structural inspection | |
| GB2556761B (en) | Image contrast enhancement method | |
| EP3262455A4 (en) | Imaging device and method for imaging specimens | |
| EP3131468A4 (en) | Method of imaging | |
| EP3318912A4 (en) | Phase contrast microscope and imaging method | |
| IL254325A0 (en) | Method and apparatus for microscopy | |
| GB2547760B (en) | Method of image processing | |
| GB2524227B (en) | Method of forming an imaging reference device | |
| GB201607804D0 (en) | Inspection method | |
| EP3318913A4 (en) | Phase difference microscope and imaging method | |
| EP3534152A4 (en) | Method for preparing sample for x-ray imaging | |
| GB2546610B (en) | Method of image processing | |
| GB2561112B (en) | Method of imaging defects using an electron microscope | |
| EP3278176A4 (en) | Method and apparatus for an imaging lens | |
| GB2546957B (en) | Surface inspection of an object using multiple images | |
| EP3340604A4 (en) | Method and apparatus for obtaining focal point | |
| PL3113077T3 (en) | Method for image feature point description | |
| GB201511036D0 (en) | Imaging method | |
| HUE061957T2 (en) | Method for producing cathode particles | |
| GB201701919D0 (en) | Method of image analysis |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AT | Applications terminated before publication under section 16(1) |