GB201401015D0 - Substrate carrier - Google Patents
Substrate carrierInfo
- Publication number
- GB201401015D0 GB201401015D0 GBGB1401015.1A GB201401015A GB201401015D0 GB 201401015 D0 GB201401015 D0 GB 201401015D0 GB 201401015 A GB201401015 A GB 201401015A GB 201401015 D0 GB201401015 D0 GB 201401015D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- substrate carrier
- carrier
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P72/7608—
-
- H10P72/7611—
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
-
- H10P72/76—
-
- H10P72/7624—
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB1301124.2A GB201301124D0 (en) | 2013-01-22 | 2013-01-22 | Substrate carrier |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| GB201401015D0 true GB201401015D0 (en) | 2014-03-05 |
| GB2511418A GB2511418A (en) | 2014-09-03 |
| GB2511418B GB2511418B (en) | 2018-04-04 |
Family
ID=47843717
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GBGB1301124.2A Ceased GB201301124D0 (en) | 2013-01-22 | 2013-01-22 | Substrate carrier |
| GB1401015.1A Active GB2511418B (en) | 2013-01-22 | 2014-01-21 | Substrate carrier |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GBGB1301124.2A Ceased GB201301124D0 (en) | 2013-01-22 | 2013-01-22 | Substrate carrier |
Country Status (3)
| Country | Link |
|---|---|
| GB (2) | GB201301124D0 (en) |
| TW (1) | TW201438137A (en) |
| WO (1) | WO2014114927A1 (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101692251B1 (en) * | 2014-08-06 | 2017-01-03 | (주)얼라이드 테크 파인더즈 | Plasma device |
| KR102277918B1 (en) * | 2016-07-09 | 2021-07-14 | 어플라이드 머티어리얼스, 인코포레이티드 | substrate carrier |
| GB201709446D0 (en) * | 2017-06-14 | 2017-07-26 | Semblant Ltd | Plasma processing apparatus |
| CN111613506B (en) * | 2020-05-22 | 2023-10-13 | 北京北方华创微电子装备有限公司 | Fixed components of semiconductor chambers and semiconductor chambers |
| CN112885738B (en) * | 2020-09-03 | 2024-02-23 | 天虹科技股份有限公司 | Wafer fixing mechanism and wafer pre-cleaning machine using the same |
| TWI747611B (en) * | 2020-11-13 | 2021-11-21 | 天虹科技股份有限公司 | Wafer pre-cleaning apparatus |
| TWI761270B (en) * | 2020-11-13 | 2022-04-11 | 天虹科技股份有限公司 | Wafer pre-cleaning apparatus |
| TWI799120B (en) * | 2020-11-13 | 2023-04-11 | 天虹科技股份有限公司 | Wafer pre-cleaning apparatus |
| CN112563164B (en) * | 2020-11-25 | 2022-07-12 | 鑫天虹(厦门)科技有限公司 | Wafer pre-cleaning machine |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4473455A (en) * | 1981-12-21 | 1984-09-25 | At&T Bell Laboratories | Wafer holding apparatus and method |
| US5262029A (en) * | 1988-05-23 | 1993-11-16 | Lam Research | Method and system for clamping semiconductor wafers |
| US5753133A (en) * | 1994-07-11 | 1998-05-19 | Applied Komatsu Technology, Inc. | Method and apparatus for etching film layers on large substrates |
| US8535445B2 (en) * | 2010-08-13 | 2013-09-17 | Veeco Instruments Inc. | Enhanced wafer carrier |
| JP5524139B2 (en) * | 2010-09-28 | 2014-06-18 | 東京エレクトロン株式会社 | Substrate position detection apparatus, film forming apparatus including the same, and substrate position detection method |
-
2013
- 2013-01-22 GB GBGB1301124.2A patent/GB201301124D0/en not_active Ceased
-
2014
- 2014-01-21 WO PCT/GB2014/050162 patent/WO2014114927A1/en not_active Ceased
- 2014-01-21 GB GB1401015.1A patent/GB2511418B/en active Active
- 2014-01-21 TW TW103102073A patent/TW201438137A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| GB2511418B (en) | 2018-04-04 |
| GB2511418A (en) | 2014-09-03 |
| TW201438137A (en) | 2014-10-01 |
| GB201301124D0 (en) | 2013-03-06 |
| WO2014114927A1 (en) | 2014-07-31 |
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