GB201309975D0 - Optical element arrangement with an optical element split into optical sub-elements - Google Patents

Optical element arrangement with an optical element split into optical sub-elements

Info

Publication number: GB201309975D0
Authority: GB; United Kingdom
Prior art keywords: optical element; optical; elements; sub; split
Prior art date: 2013-05-10
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Withdrawn

Application number

GB201309975A

Other versions

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Carl Zeiss SMT GmbH

Original Assignee

Carl Zeiss SMT GmbH

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2013-05-10

Filing date

2013-05-10

Publication date

2013-07-17

2013-05-10 Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH

2013-05-10 Priority to GB201309975A priority Critical patent/GB2513927A/en

2013-07-17 Publication of GB201309975D0 publication Critical patent/GB201309975D0/en

2014-05-07 Priority to PCT/EP2014/059395 priority patent/WO2014180931A1/en

2014-11-12 Publication of GB2513927A publication Critical patent/GB2513927A/en

Status Withdrawn legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

Health & Medical Sciences (AREA)
Engineering & Computer Science (AREA)
Environmental & Geological Engineering (AREA)
Epidemiology (AREA)
Public Health (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Life Sciences & Earth Sciences (AREA)
Atmospheric Sciences (AREA)
Toxicology (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

GB201309975A 2013-05-10 2013-05-10 Optical element arrangement with an optical element split into optical sub-elements Withdrawn GB2513927A (en)

Priority Applications (2)

Application Number	Priority Date	Filing Date	Title
GB201309975A GB2513927A (en)	2013-05-10	2013-05-10	Optical element arrangement with an optical element split into optical sub-elements
PCT/EP2014/059395 WO2014180931A1 (en)	2013-05-10	2014-05-07	Optical element arrangement with an optical element split into optical sub-elements

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
GB201309975A GB2513927A (en)	2013-05-10	2013-05-10	Optical element arrangement with an optical element split into optical sub-elements

Publications (2)

Publication Number	Publication Date
GB201309975D0 true GB201309975D0 (en)	2013-07-17
GB2513927A GB2513927A (en)	2014-11-12

Family

ID=48805745

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
GB201309975A Withdrawn GB2513927A (en)	2013-05-10	2013-05-10	Optical element arrangement with an optical element split into optical sub-elements

Country Status (2)

Country	Link
GB (1)	GB2513927A (en)
WO (1)	WO2014180931A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE102011076549A1 (en) *	2011-05-26	2012-11-29	Carl Zeiss Smt Gmbh	Optical arrangement in a microlithographic projection exposure apparatus
DE102023116897A1 (en) *	2023-06-27	2025-01-02	Carl Zeiss Smt Gmbh	Projection lens of a projection exposure system and projection exposure system

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6225027B1 (en) *	1998-08-06	2001-05-01	Euv Llc	Extreme-UV lithography system
JP2007528125A (en) *	2004-02-25	2007-10-04	カールツァイスエスエムテーアクチェンゲゼルシャフト	Equipment consisting of at least one optical component
WO2006119970A2 (en) *	2005-05-09	2006-11-16	Carl Zeiss Smt Ag	Assembly for adjusting an optical element
JP4883775B2 (en) *	2006-08-11	2012-02-22	キヤノン株式会社	Optical apparatus, exposure apparatus, and device manufacturing method
DE102010043498A1 (en) *	2010-11-05	2012-05-10	Carl Zeiss Smt Gmbh	Projection objective of a microlithographic projection exposure apparatus designed for EUV, and method for optical adjustment of a projection objective
JP6093753B2 (en) *	2011-03-23	2017-03-08	カール・ツァイス・エスエムティー・ゲーエムベーハー	EUV mirror mechanism, optical system with EUV mirror mechanism, and method of operating an optical system with EUV mirror mechanism
DE102011076549A1 (en) *	2011-05-26	2012-11-29	Carl Zeiss Smt Gmbh	Optical arrangement in a microlithographic projection exposure apparatus
DE102011077223B4 (en) *	2011-06-08	2013-08-14	Carl Zeiss Smt Gmbh	measuring system
EP2726939B1 (en) *	2011-07-01	2020-09-16	Carl Zeiss SMT GmbH	Optical imaging arrangement with individually actively supported components

2013
- 2013-05-10 GB GB201309975A patent/GB2513927A/en not_active Withdrawn
2014
- 2014-05-07 WO PCT/EP2014/059395 patent/WO2014180931A1/en not_active Ceased

Also Published As

Publication number	Publication date
GB2513927A (en)	2014-11-12
WO2014180931A1 (en)	2014-11-13

Publication	Publication Date	Title
GB2540483B (en)	2017-09-13	Improved lenses
HUE037635T2 (en)	2018-09-28	Fuel assembly
EP3078993A4 (en)	2016-12-21	Anti-reflective optical member
PL3014250T3 (en)	2023-07-24	Waveguide structure
GB2524614B (en)	2016-06-15	Ion optical element
EP3081925A4 (en)	2017-07-19	Optical inspection device
TWI562699B (en)	2016-12-11	Display assembly
KR20180085067A (en)	2018-07-25	Optical device
EP3032321A4 (en)	2017-04-05	Optical device
GB2505315B (en)	2014-08-06	Optical amplifier arrangement
GB201307388D0 (en)	2013-06-05	Optical device
EP2965451A4 (en)	2016-11-30	Optical amplifier arrangement
ZA201601220B (en)	2017-04-26	Display assembly
EP3088864A4 (en)	2017-08-23	Optical probe
GB2509808B (en)	2017-05-03	Improved lenses
GB201309975D0 (en)	2013-07-17	Optical element arrangement with an optical element split into optical sub-elements
EP3045939A4 (en)	2017-05-03	Optical element
GB201318990D0 (en)	2013-12-11	Optical sighting
GB2519767B (en)	2018-05-09	Periscope
GB201306982D0 (en)	2013-05-29	Fibre instalaltion
GB201308827D0 (en)	2013-07-03	Display device with optical arrangement at the display output
GB201316226D0 (en)	2013-10-30	Optical diffuser
GB201319925D0 (en)	2013-12-25	Waveguide assembly
AU351717S (en)	2013-11-01	Light
AU351718S (en)	2013-11-01	Light

Legal Events

Date	Code	Title	Description
2015-09-23	WAP	Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)