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GB201306427D0 - UV protected films - Google Patents

UV protected films

Info

Publication number
GB201306427D0
GB201306427D0 GBGB1306427.4A GB201306427A GB201306427D0 GB 201306427 D0 GB201306427 D0 GB 201306427D0 GB 201306427 A GB201306427 A GB 201306427A GB 201306427 D0 GB201306427 D0 GB 201306427D0
Authority
GB
United Kingdom
Prior art keywords
protected films
films
protected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB1306427.4A
Other versions
GB2514539A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lappeenrannan Teknillinen Yliopisto
Innovia Films Ltd
Original Assignee
Lappeenrannan Teknillinen Yliopisto
Innovia Films Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lappeenrannan Teknillinen Yliopisto, Innovia Films Ltd filed Critical Lappeenrannan Teknillinen Yliopisto
Priority to GB1306427.4A priority Critical patent/GB2514539A/en
Publication of GB201306427D0 publication Critical patent/GB201306427D0/en
Priority to PCT/GB2014/051093 priority patent/WO2014167313A1/en
Publication of GB2514539A publication Critical patent/GB2514539A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45555—Atomic layer deposition [ALD] applied in non-semiconductor technology

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Nanotechnology (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Laminated Bodies (AREA)
GB1306427.4A 2013-04-09 2013-04-09 UV protected films Withdrawn GB2514539A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB1306427.4A GB2514539A (en) 2013-04-09 2013-04-09 UV protected films
PCT/GB2014/051093 WO2014167313A1 (en) 2013-04-09 2014-04-08 Uv protected films

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1306427.4A GB2514539A (en) 2013-04-09 2013-04-09 UV protected films

Publications (2)

Publication Number Publication Date
GB201306427D0 true GB201306427D0 (en) 2013-05-22
GB2514539A GB2514539A (en) 2014-12-03

Family

ID=48483619

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1306427.4A Withdrawn GB2514539A (en) 2013-04-09 2013-04-09 UV protected films

Country Status (2)

Country Link
GB (1) GB2514539A (en)
WO (1) WO2014167313A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112162439A (en) * 2020-10-14 2021-01-01 中国科学技术大学 Method for enhancing optical regulation and control capability of titanium dioxide electrode

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111282450B (en) * 2020-02-24 2021-07-13 天津科技大学 A kind of super-hydrophobic polypropylene porous film, its preparation method and method for improving the hydrophobicity of polypropylene porous film
CN112175220B (en) 2020-09-03 2023-01-03 广东以色列理工学院 High-temperature-resistant modified polypropylene film and preparation method and application thereof
FI20236372A1 (en) * 2023-12-14 2025-06-15 Picosun Oy LIGHT PROTECTION FILMS AND METHODS FOR MANUFACTURING THEREOF

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4048830B2 (en) * 2002-05-16 2008-02-20 株式会社デンソー Organic electronic device elements
US20050172897A1 (en) * 2004-02-09 2005-08-11 Frank Jansen Barrier layer process and arrangement
GB0714418D0 (en) * 2007-07-24 2007-09-05 Innovia Films Ltd UV barrier film
FI122032B (en) * 2008-10-03 2011-07-29 Teknologian Tutkimuskeskus Vtt Fiber product having a barrier layer and process for its preparation
WO2010052190A2 (en) * 2008-11-04 2010-05-14 Universitetet I Oslo Wound dressings
KR20140105503A (en) * 2011-12-02 2014-09-01 사빅 글로벌 테크놀러지스 비.브이. Coated Polymer Films

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112162439A (en) * 2020-10-14 2021-01-01 中国科学技术大学 Method for enhancing optical regulation and control capability of titanium dioxide electrode
CN112162439B (en) * 2020-10-14 2021-10-01 中国科学技术大学 A method to enhance the optical control ability of titanium dioxide electrode

Also Published As

Publication number Publication date
GB2514539A (en) 2014-12-03
WO2014167313A1 (en) 2014-10-16

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)