GB2011710A - Semiconductor structures - Google Patents
Semiconductor structuresInfo
- Publication number
- GB2011710A GB2011710A GB7848675A GB7848675A GB2011710A GB 2011710 A GB2011710 A GB 2011710A GB 7848675 A GB7848675 A GB 7848675A GB 7848675 A GB7848675 A GB 7848675A GB 2011710 A GB2011710 A GB 2011710A
- Authority
- GB
- United Kingdom
- Prior art keywords
- transistor
- groove
- region
- planar
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 3
- 230000005669 field effect Effects 0.000 abstract 2
- 238000002347 injection Methods 0.000 abstract 1
- 239000007924 injection Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/02—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
- H03K19/08—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices
- H03K19/094—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors
- H03K19/0944—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET
- H03K19/09441—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET of the same canal type
- H03K19/09443—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET of the same canal type using a combination of enhancement and depletion transistors
- H03K19/09445—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET of the same canal type using a combination of enhancement and depletion transistors with active depletion transistors
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/02—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
- H03K19/08—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices
- H03K19/094—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors
- H03K19/09403—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using junction field-effect transistors
- H03K19/09414—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using junction field-effect transistors with gate injection or static induction [STIL]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/84—Combinations of enhancement-mode IGFETs and depletion-mode IGFETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/211—Design considerations for internal polarisation
- H10D89/213—Design considerations for internal polarisation in field-effect devices
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Computing Systems (AREA)
- General Engineering & Computer Science (AREA)
- Mathematical Physics (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Abstract
A semiconductor structure for use in logic circuits comprising a planar insulated- gate field-effect transistor (5- 13) and at least one V-groove insulated- gate field-effect transistor 23-33 formed on a common substrate (1, 3) the drain of the V-groove transistor being constituted by a region (23 or 25) of the same conductivity type as the substrate formed within the drain region (7) of the planar transistor so that the substrate forms the V-groove transistor source region and part (31 or 33) of the drain region of the planar transistor forms the V-groove transistor channel region. The structure is adapted for use as a so- called integrated-injection logic (I<2>L) structure. <IMAGE>
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB7848675A GB2011710B (en) | 1977-12-28 | 1978-12-15 | Semiconductor structures |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB5393177 | 1977-12-28 | ||
| GB7848675A GB2011710B (en) | 1977-12-28 | 1978-12-15 | Semiconductor structures |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| GB2011710A true GB2011710A (en) | 1979-07-11 |
| GB2011710B GB2011710B (en) | 1982-04-07 |
Family
ID=26267384
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB7848675A Expired GB2011710B (en) | 1977-12-28 | 1978-12-15 | Semiconductor structures |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB2011710B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2130790A (en) * | 1982-10-26 | 1984-06-06 | Plessey Co Plc | Integrated injection logic device |
| EP0158401A1 (en) * | 1984-04-09 | 1985-10-16 | Koninklijke Philips Electronics N.V. | Semiconductor device comprising insulated gate field effect transistors |
| DE19501556A1 (en) * | 1994-01-20 | 1995-07-27 | Mitsubishi Electric Corp | Semiconductor component with trench structure |
-
1978
- 1978-12-15 GB GB7848675A patent/GB2011710B/en not_active Expired
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2130790A (en) * | 1982-10-26 | 1984-06-06 | Plessey Co Plc | Integrated injection logic device |
| EP0158401A1 (en) * | 1984-04-09 | 1985-10-16 | Koninklijke Philips Electronics N.V. | Semiconductor device comprising insulated gate field effect transistors |
| US4695865A (en) * | 1984-04-09 | 1987-09-22 | U.S. Philips Corporation | Integrated logic circuit having insulated gate field effect transistors |
| DE19501556A1 (en) * | 1994-01-20 | 1995-07-27 | Mitsubishi Electric Corp | Semiconductor component with trench structure |
| US5541425A (en) * | 1994-01-20 | 1996-07-30 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device having trench structure |
| US5795792A (en) * | 1994-01-20 | 1998-08-18 | Mitsubishi Denki Kabushiki Kaisha | Method of manufacturing a semiconductor device having a trench structure |
| DE19501556C2 (en) * | 1994-01-20 | 1999-03-04 | Mitsubishi Electric Corp | Semiconductor device with a trench structure, use of a semiconductor device with a trench structure and method for producing a semiconductor device with a trench structure |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2011710B (en) | 1982-04-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PCNP | Patent ceased through non-payment of renewal fee |