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GB2011100A - Photosensitive materials suitable for the production of transfer materials - Google Patents

Photosensitive materials suitable for the production of transfer materials

Info

Publication number
GB2011100A
GB2011100A GB7849668A GB7849668A GB2011100A GB 2011100 A GB2011100 A GB 2011100A GB 7849668 A GB7849668 A GB 7849668A GB 7849668 A GB7849668 A GB 7849668A GB 2011100 A GB2011100 A GB 2011100A
Authority
GB
United Kingdom
Prior art keywords
materials
peroxide
photosensitive
production
transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB7849668A
Other versions
GB2011100B (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Letraset International Ltd
Original Assignee
Letraset International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Letraset International Ltd filed Critical Letraset International Ltd
Priority to GB7849668A priority Critical patent/GB2011100B/en
Publication of GB2011100A publication Critical patent/GB2011100A/en
Application granted granted Critical
Publication of GB2011100B publication Critical patent/GB2011100B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C11/00—Auxiliary processes in photography
    • G03C11/12—Stripping or transferring intact photographic layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

Photosensitive materials are described which may be used for manufacturing dry transfer materials by imagewise exposure and development. The photosensitive system is that of a polymerisable monomer, ferric salt and peroxide. In order to give a practical product, the ferric salts and the peroxide are in different layers containing water- soluble or water-dispersible polymers. There may be two layers containing the ferric salt and monomer, the upper layer also containing a colorant and an adhesive and being overcoated with the peroxide layer. Alternatively, adhesive may be applied to the exposed and developed material before transfer.
GB7849668A 1977-12-21 1978-12-21 Production of transfer materials Expired GB2011100B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB7849668A GB2011100B (en) 1977-12-21 1978-12-21 Production of transfer materials

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB5324277 1977-12-21
GB7849668A GB2011100B (en) 1977-12-21 1978-12-21 Production of transfer materials

Publications (2)

Publication Number Publication Date
GB2011100A true GB2011100A (en) 1979-07-04
GB2011100B GB2011100B (en) 1982-05-26

Family

ID=26267222

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7849668A Expired GB2011100B (en) 1977-12-21 1978-12-21 Production of transfer materials

Country Status (1)

Country Link
GB (1) GB2011100B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4546064A (en) * 1982-04-02 1985-10-08 North American Philips Corporation Positive-working photoresist composition and method for forming a light-absorbing matrix
GB2182888A (en) * 1985-11-13 1987-05-28 Colin George Thompson Method of making transfers
EP0403096A3 (en) * 1989-05-30 1991-11-21 Minnesota Mining And Manufacturing Company High speed photopolymerizable printing plate with initiator in a topcoat

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4546064A (en) * 1982-04-02 1985-10-08 North American Philips Corporation Positive-working photoresist composition and method for forming a light-absorbing matrix
GB2182888A (en) * 1985-11-13 1987-05-28 Colin George Thompson Method of making transfers
EP0403096A3 (en) * 1989-05-30 1991-11-21 Minnesota Mining And Manufacturing Company High speed photopolymerizable printing plate with initiator in a topcoat

Also Published As

Publication number Publication date
GB2011100B (en) 1982-05-26

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee