GB2079323A - Nitrogen-containing nickel coatings for solar collectors - Google Patents
Nitrogen-containing nickel coatings for solar collectors Download PDFInfo
- Publication number
- GB2079323A GB2079323A GB8118619A GB8118619A GB2079323A GB 2079323 A GB2079323 A GB 2079323A GB 8118619 A GB8118619 A GB 8118619A GB 8118619 A GB8118619 A GB 8118619A GB 2079323 A GB2079323 A GB 2079323A
- Authority
- GB
- United Kingdom
- Prior art keywords
- coating
- nickel
- substrate
- nitrogen
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 93
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 54
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 26
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 title description 2
- 239000011248 coating agent Substances 0.000 claims abstract description 82
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 52
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 26
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 26
- 238000010521 absorption reaction Methods 0.000 claims abstract description 25
- 238000004544 sputter deposition Methods 0.000 claims abstract description 22
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000012298 atmosphere Substances 0.000 claims abstract description 11
- 229910052786 argon Inorganic materials 0.000 claims abstract description 7
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 4
- -1 nickel nitride Chemical class 0.000 claims description 3
- 229910000480 nickel oxide Inorganic materials 0.000 claims description 3
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims description 3
- 239000011521 glass Substances 0.000 abstract description 11
- 229910052751 metal Inorganic materials 0.000 abstract description 8
- 239000002184 metal Substances 0.000 abstract description 8
- 229910000831 Steel Inorganic materials 0.000 abstract description 4
- 239000010959 steel Substances 0.000 abstract description 4
- 230000009102 absorption Effects 0.000 description 11
- 230000003595 spectral effect Effects 0.000 description 8
- 238000001179 sorption measurement Methods 0.000 description 6
- 239000004411 aluminium Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 239000006096 absorbing agent Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S70/00—Details of absorbing elements
- F24S70/20—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption
- F24S70/225—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption for spectrally selective absorption
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S70/00—Details of absorbing elements
- F24S70/20—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption
- F24S70/25—Coatings made of metallic material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Combustion & Propulsion (AREA)
- Sustainable Energy (AREA)
- Thermal Sciences (AREA)
- Sustainable Development (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
A selective absorption coating (12) for solar collectors, comprising nitrogen-treated nickel having a nitrogen content of from 0.1 to approximately 2% is made by a process comprising the step of applying to a substrate (10) nitrogen-treated nickel coating (12) by means of cathode spluttering using a metallic nickel cathode in an argon sputtering atmosphere having a nitrogen content of at least 0.2% by volume, the substrate (10) being maintained at a temperature of between 100 and 400 DEG C and the nickel cathode being maintained at a temperature of more than 200 DEG C. The coating, which is dendritic on the side remote from the substrate, may be applied to glass or metal (eg Al, steel). <IMAGE>
Description
SPECIFICATION
Selective-absorption coating for solar collectors and process for production thereof
This invention relates to a selective-absorption coating for solar collectors, in which a coating of nitrogen-treated nickel is disposed on a substrate, and to a process for the production of a coating of this kind.
German Auslegeschrift 25 51 832 describes a selective absorption coating, and a process for production thereof in which a nickel coating is first applied to a metal substrate by electroplating, and the nickel coating is subsequently treated in a glow discharge in a nitrogen atmosphere so that some of the nickel is changed to nickel nitride. It has been found that the selectivity of the selective-absorption coatings produced in this way, that is the ratio of the absorptivity in the wavelength range below 2.0 pm to the emissive power in the wavelength range above 2.0,am, is unsatisfactory. Furthermore, this process is suitable only for applying a selectiveadsorption coating to metal substrates, which is a relatively labour-intensive operation.
German Auslegeschrift 2539 101 describes a solar absorber in which a dendritictungsten structure is dosposed on the substrate, the latter consisting of sapphire, stainless steel or polished tunsten. The dendritic structure is produced by the CVD process, which may result in environmental pollution problems. The selectivity of the selective absorption coating described in DAS 2539 101 is also inadequate for practical requirements, quite apart from the relatively costly production of the coating. DAS 27 05 337 discloses a similar solar absorber with similar problems, in which the highly structured metal surface, having a particle size of less than 2 um, has to be produced electromechanically.
"Solar Energy", Vol. 19. 1977, pages 429 to 432, describes a process for the production of a selective-absorption coating by cathode sputtering, to give coatings of the composition ZrOxNy. The selectivity of the coatings produced in this way does not have the high values desirable in practice.
It is an object of this invention to provide a selective-absorption coating and a process for the production thereof whereby improved selectivity can be achieved.
It is a further object of the invention to enable coating of non-metallic substrates inexpensively and without pollution of the environment.
According to a first aspect of the invention, there is provided a selective-absorption coating for solar collectors, which coating comprises nitrogen-treated nickel having a nitrogen content of from 0.1 to approximately 2% by weight.
According to a second aspect of the invention, there is provided a process for the production of a selective-adsorption coating for solar collectors, which process comprises the step of applying to a substrate a nitrogen-treated nickel coating by means of a cathode sputtering using a metallic nickel cathode in an argon sputtering atmosphere having a nitrogen content of at least 0.2% by volume, the substrate being maintained at a temperature of between 100 and 400 C and the nickel cathode being maintained at a temperature of more than 200 C.
Preferably, the nitrogen content of the sputtering atmosphere is less than 20% by volume.
The invention is based on the surprising finding that it is possible to obtain a dramatic increase in the selectivity of the selective-absorption coating of the kind in question by giving the nitrogen-treated nickel coating a nitrogen content of 0.1 to approximately 2% by weight, which results in an appreciable improvement in selectivity in comparison with nitrogen contents outside that range. Preferably the nitrogen should be present at least partially in dissolved form in metallic nickel. The nitrogen can be present at least partially in the form of nickel nitride. The layer may also have a certain nickel oxide content.A selective-adsorption coating produced according to the invention, with a dendritic structure on the side remote from the substrate, resulting in the selective-absorption coating becoming effective textural filter, is remarkable in that it can advantageously also be produced on non-metallic substrates, such as glass, by cathode sputtering units using large-area cathodes, environment pollution being much less than with CVD for electrolytic processes.
For a better understanding of the present invention, and to show how the same may be put into effect, reference will now be made, by way of example, to the accompanying drawings, in which:
FIGURE 1 shows a diagrammatic sectional view of a selective absorption coating embodying the invention applied to a glass substrate;
FIGURE 2 is a photograph of the coating of Figure 1 taken by means of a sensing electron microscope, beam voltage 40 kV;
FIGURE 3 is a graph showing the spectral reflection of a selective coating embodying the invention, against the wavelength, with the coating time (in minutes) as a parameter;;
FIGURE 4 is a graph showing the solar absorption of a coating embodying the invention (on aluminium) in the range below 2.0,am against the hemispherical emission in the range below 2.0,am at 40"C, with the coating time (in minutes) as a parameter; and
FIGURE 5 is a graph showing the spectral reflection of a selective coating embodying the invention on glass, measured from the glass side and the coated side against the wavelength.
Referring to the exemplary embodiment of the invention shown in Figure 1, a nitrogen-containing nickel coating 12 produced by cathode sputtering is applied to a substrate 10, which in this case consists of a pane of glass. The dendritic structure of the surface of the nickel coating 12 remote from the substrate 10, having a particle size of less than 0.5 ;ism, is clearly seen in the photomicrograph of Figure 2, which was taken with a scanning electron microscope (lines illustrated = 1 iim). The coating was produced at a substrate temperature of 300 C and a cathode temperature of 280"C by cathode sputtering, using a metal nickel cathode measuring 100 x 40 cm2 (1 x 0.4 m2).The pressure was 0.1 torr (13.33 Pa); the sputtering atmosphere consisted of argon (99.8% by
volume), with an N2 content of 0.2% by volume,
pre-evacuation to 1 x 10-5 torr (1.33 x 10-3 Pa) being
carried out before the sputtering atmosphere was
produced. The coating time was 20 minutes. Of
course a selective-adsorption coating of the kind
shown in Figures 1 and 2 can be produced not only
on a glass substrate, but also on metal substrates
such as aluminium, copper, steel or refined steel.
The following Examples further illustrate the pres
ent invention:
Example 1
After pre-evacuation to 1 x 10-5 torr (1.33 x 10-3
Pa), a selective-absorption coating was produced on a glass substrate of a thickness of 0.5 mm in a sputtering atmosphere having the following composition: 99.8% by volume argon, 0.2% volume N2 (gas flow), the pressure being 0.1 torr (13.33 Pa). The coating time was 10 minutes, the cathode sputtering voltage 3 kV. The selective-absorption coating produced in this way had a surface resistance of 1.4 to 1.7 Q m-2. It should also be noted that the substrate was kept at about 2000C during the cathode sputtering operation, a cathode temperature of about 250"C having been measured after completion of the cathode sputtering operation.
Example 2
A selective-absorption coating was produced by means of a cathode sputter voltage of 2 kV, a coating time of 20 minutes, and a substrate temperature of 360"C, the substrate consisting of 0.1 mm thick aluminium sheet, the sputtering atmosphere containing 98.5% by volume of argon and 1.5% by volume of N2. The other conditions were the same as in
Example 1.
Example 3
A selective-absorption coating was produced on a refined steel absorber bar measuring 2 x 0.8 m2, the coating time being 30 minutes, the cathode sputter voltage 2.5 kV and the final cathode tem perautre 280"C. The other conditions were the same as in
Example 2.
All the processes described in the above examples gave selective, absorption coatings of outstanding selectivity.
The advantages and properties of the selectiveabsorption coatings embodying the invention will now be described with reference to Figure 3 to 5 of the accompanying drawings.
Because of the dendritic structure and the nitrogen content specific to the invention, selectiveadsorption coatings produced according to the invention will be seen (Figure 3) to have a very low spectral reflection rather like a textural filter in the wavelength range below 2.0 < m, even at relatively short coating times, Figure 3 illustrating the spectral reflection of selective coatings on aluminium with the coating time given in minutes as a parameter. No interference can be seen in respect of the metal substrate. The 20-minute curve was obtained with a selective-adsorption coating produced as in Exam
ple 2.
Figure 4 is a graph of the solar absorption of the same coatings against the emission. The solar
adsorption is the mean value of the spectral adsorption values corrected with Moon's standardized solar
intensity, m = 2. As will be apparent from the graph,
a coating time of 8 minutes gives optimum values,
because if the coating time is extended the emission
increases more rapidly with an insignificant increase
in absorption. It has been found that an absorption to emission ratio (selectivity) of 20 can be obtained on aluminium with approximately 95% absorption.
Figure 5 is a graph of the spectral reflection of a coating produced on glass in accordance with
Example 1, as measured from the glass and from the coating sides against wavelength. It will be seen that a dendritic structure produced according to the
invention on an initially non-structured metallic nickel coating grows on the glass substrate.
The solar absorptions in the solar spectral range were determined by spectral reflection measurements using a Zeiss PMQ3 meter with an MQ3 spectrometer, and a PA 3 Ulbricht sphere attachment. A comparison with results obtained with a specular spectrometer and with a diffuse spectrometer shows that the diffuse components of the reflected light are also adequately handled.
It will be apparent from the above results that the reactive sputtering of nickel in an Ar/Nz atmosphere on metal and non-metal substrates in accordance with the invention gives coatings of high selectivity.
The main factors responsible for this appear to be a low-oxygen, preferably an oxygen-free atmosphere, and a nitrogen content of at least 0.2% by volume of
N2 in argon as the sputtering gas, a substrate temperature of between 100 C and about 400"C and in addition a high cathode temperature (final cathode temperatures of about 250"C and more were regularly measured at the end of the coating operation).
The high temperatures required preferably obtained with minimum nickel cathode cooling and a suitable choice of high cathode voltage for example DC or low-frequency AC. Because of the high affinity of nickel for oxygen, any contamination of the sputtering gas by an O2 partial pressure comparable to the
N2 content results usually in opalescent nickel oxide coatings of lower selectively and with inferior solar absorption.
Claims (27)
1. Aselective-absorption coating for solar collectors, which coating comprises nitrogen-treated nickel having a nitrogen content of from 0.1 to 2% by weight.
2. A coating according to Claim 1, wherein the nitrogen is present at least partially in dissolved form in elemental nickel.
3. A coating according to Claim 1 or 2, wherein the nitrogen is at least partially fixed in the form of nickel nitride.
4. A coating according to any one of the preceding claims, which coating comprises a proportion of nickel oxide.
5. A coating according to any one of the preceding claims, wherein a first zone of the coating has a substantially higher nitrogen concentration than a second zone of the coating.
6. Acoating according to anyone of the preceding claims, wherein at least a part of the coating has a dendritic structure.
7. A coating according to claim 6, wherein the dendritic structure has a particle size of less than 0.5 ym.
8. Acoating according to any one of the preceding claims, wherein a part of the coating has a smooth metallic structure.
9. A coating according to any one of the preceding claims, wherein the coating is applied to a substrate.
10. A coating according to claims 9, wherein the zone of the coating remote from the substrate has a substantially higher nitrogen concentration than the zone facing the substrate.
11. A coating according to Claim 9 or 10, wherein the coating has a dendritic structure at least in the zone remote from the substrate.
12. A coating according to Claim 11, wherein the dendritic structure has a particle size of less than 0.5 Clam.
13. A coating according to any one of Claims 9 to 12, wherein the zone of the coating facing the substrate has a smooth metallic structure.
14. A process for the production of a selectiveadsorption coating for solar collectors, which process comprises the step of applying to a substrate a nitrogen-treated nickel coating by means of cathode sputtering using a metallic nickel cathode in an argon sputtering atmosphere having a nitrogen content of at least 0.2% by volume, the substrate being maintained at a temperature of between 100 and 400"C and the nickel cathode being maintained at a temperature of more than 200"C.
15. A process according to Claim 14, wherein the nitrogen content of the sputtering atmosphere is less than 20% by volume.
16. A process according to Claim 14 or 15, wherein the nickel cathode is maintained at a temperature of more than 250"C.
17. A process according to any one of Claims 14 to 16, wherein the cathode sputtering is carried out at a pressure of approximately 0.1 torr.
18. A process according to any one of Claims 15 to 17, wherein the cathode sputtering is carried out at a voltage of approximately 2 to 3 kV.
19. A process according to any one of Claims 15 to 18, wherein the coating is carried out over a period of less than 20 minutes.
20. A process according to Claim 19, wherein the coating carried out over a period of approximately 8 minutes.
21. A process according to any one of Claims 14 to 20, which further comprises the step of preevacuation to approximately 1 x 10-5 torr prior to carrying outthe coating operation.
22. A process for the production of a selectiveabsorption coating for solar collectors, substantially as hereinbefore described with reference to Figures 1 and 2.
23. A process for the production of a selectiveabsorption coating for solar collectors, substantially as hereinbefore described in Example 1.
24. A process for the production of a selectiveabsorption coating for solar collectors, substantially as hereinbefore described in Example 2.
25. A process for the production of a selectiveabsorption coating for solar collectors, substantially as hereinbefore described in Example 3.
26. A product whenever produced by the process of any one of Claims 14 to 25.
27. Any novel feature or combination of features disclosed herein.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3022714A DE3022714C2 (en) | 1980-06-18 | 1980-06-18 | Process for producing a selectively absorbing coating for solar collectors and a coating produced therefrom |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB2079323A true GB2079323A (en) | 1982-01-20 |
Family
ID=6104849
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB8118619A Withdrawn GB2079323A (en) | 1980-06-18 | 1981-06-17 | Nitrogen-containing nickel coatings for solar collectors |
Country Status (4)
| Country | Link |
|---|---|
| BE (1) | BE889262A (en) |
| DE (1) | DE3022714C2 (en) |
| FR (1) | FR2486636A1 (en) |
| GB (1) | GB2079323A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1984004110A1 (en) * | 1983-04-18 | 1984-10-25 | Battelle Development Corp | HARD LAYER FORMED BY INCORPORATING NITROGEN INTO Mo OU W METAL AND METHOD FOR OBTAINING THIS LAYER |
| US4574778A (en) * | 1984-03-19 | 1986-03-11 | Hydro-Quebec | Preparing selective surfaces for solar collectors by dry oxidation and selective surfaces so obtained |
| US6171458B1 (en) * | 1996-09-16 | 2001-01-09 | Sunstrip Ab | Method for manufacturing an absorbent layer for solar collectors, a device for performing the method and an absorbent layer for solar collectors |
| CN100487337C (en) * | 2007-01-22 | 2009-05-13 | 罗赞继 | Selective absorbing composite membrane coated absorber plate core of solar energy and making method thereof |
| CN1995864B (en) * | 2006-12-13 | 2010-05-19 | 周晓欣 | Solar heat-collecting sheet and its manufacturing method and heat absorbing plate of solar heat collector |
| WO2017097236A1 (en) * | 2015-12-10 | 2017-06-15 | 淄博环能海臣环保技术服务有限公司 | Solar-selective absorbing coating with single aluminum target and magnetron sputtering |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2551832C2 (en) * | 1975-11-19 | 1983-02-03 | Dornier System Gmbh, 7990 Friedrichshafen | Method for producing a selectively absorbing surface for solar collectors and device for carrying out the method |
| DE2705337B2 (en) * | 1977-02-09 | 1979-02-15 | Dornier System Gmbh, 7990 Friedrichshafen | Process for the production of selectively solar-absorbing surface structure filters |
| US4098956A (en) * | 1976-08-11 | 1978-07-04 | The United States Of America As Represented By The Secretary Of The Interior | Spectrally selective solar absorbers |
| IL56481A (en) * | 1978-01-25 | 1983-11-30 | Euratom | Preparation of selective surfaces for high temperature solar energy collectors |
-
1980
- 1980-06-18 DE DE3022714A patent/DE3022714C2/en not_active Expired
-
1981
- 1981-06-17 FR FR8111910A patent/FR2486636A1/en not_active Withdrawn
- 1981-06-17 BE BE0/205127A patent/BE889262A/en not_active IP Right Cessation
- 1981-06-17 GB GB8118619A patent/GB2079323A/en not_active Withdrawn
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1984004110A1 (en) * | 1983-04-18 | 1984-10-25 | Battelle Development Corp | HARD LAYER FORMED BY INCORPORATING NITROGEN INTO Mo OU W METAL AND METHOD FOR OBTAINING THIS LAYER |
| US4574778A (en) * | 1984-03-19 | 1986-03-11 | Hydro-Quebec | Preparing selective surfaces for solar collectors by dry oxidation and selective surfaces so obtained |
| US6171458B1 (en) * | 1996-09-16 | 2001-01-09 | Sunstrip Ab | Method for manufacturing an absorbent layer for solar collectors, a device for performing the method and an absorbent layer for solar collectors |
| CN1995864B (en) * | 2006-12-13 | 2010-05-19 | 周晓欣 | Solar heat-collecting sheet and its manufacturing method and heat absorbing plate of solar heat collector |
| CN100487337C (en) * | 2007-01-22 | 2009-05-13 | 罗赞继 | Selective absorbing composite membrane coated absorber plate core of solar energy and making method thereof |
| WO2017097236A1 (en) * | 2015-12-10 | 2017-06-15 | 淄博环能海臣环保技术服务有限公司 | Solar-selective absorbing coating with single aluminum target and magnetron sputtering |
Also Published As
| Publication number | Publication date |
|---|---|
| BE889262A (en) | 1981-10-16 |
| DE3022714C2 (en) | 1982-09-09 |
| DE3022714A1 (en) | 1982-03-04 |
| FR2486636A1 (en) | 1982-01-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |