GB2070797A - Electrophotographic materials - Google Patents
Electrophotographic materials Download PDFInfo
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- GB2070797A GB2070797A GB8106951A GB8106951A GB2070797A GB 2070797 A GB2070797 A GB 2070797A GB 8106951 A GB8106951 A GB 8106951A GB 8106951 A GB8106951 A GB 8106951A GB 2070797 A GB2070797 A GB 2070797A
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- selenium
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- 239000000463 material Substances 0.000 title claims abstract description 53
- 229910052711 selenium Inorganic materials 0.000 claims abstract description 60
- 239000011669 selenium Substances 0.000 claims abstract description 60
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims abstract description 58
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910052737 gold Inorganic materials 0.000 claims abstract description 20
- 239000010931 gold Substances 0.000 claims abstract description 20
- 229910000967 As alloy Inorganic materials 0.000 claims abstract description 13
- QLNFINLXAKOTJB-UHFFFAOYSA-N [As].[Se] Chemical compound [As].[Se] QLNFINLXAKOTJB-UHFFFAOYSA-N 0.000 claims abstract description 13
- 230000005525 hole transport Effects 0.000 claims abstract description 8
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- 238000010292 electrical insulation Methods 0.000 claims abstract 2
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- 239000002800 charge carrier Substances 0.000 claims description 30
- 238000007600 charging Methods 0.000 claims description 25
- 238000003384 imaging method Methods 0.000 claims description 20
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 17
- 229910052782 aluminium Inorganic materials 0.000 claims description 17
- 229910052785 arsenic Inorganic materials 0.000 claims description 16
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 16
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 15
- 229910052736 halogen Inorganic materials 0.000 claims description 14
- 150000002367 halogens Chemical class 0.000 claims description 14
- 238000002347 injection Methods 0.000 claims description 14
- 239000007924 injection Substances 0.000 claims description 14
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- 229910052714 tellurium Inorganic materials 0.000 description 14
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- 239000000956 alloy Substances 0.000 description 10
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- 238000005530 etching Methods 0.000 description 4
- 239000008188 pellet Substances 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
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- 241000894007 species Species 0.000 description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 2
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 2
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- 238000007740 vapor deposition Methods 0.000 description 2
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- 229910001868 water Inorganic materials 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 241000149947 Coronarchaica corona Species 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 206010067482 No adverse event Diseases 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
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- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
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- 229910052731 fluorine Inorganic materials 0.000 description 1
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- 230000000977 initiatory effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
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- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/043—Photoconductive layers characterised by having two or more layers or characterised by their composite structure
- G03G5/0433—Photoconductive layers characterised by having two or more layers or characterised by their composite structure all layers being inorganic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/10—Bases for charge-receiving or other layers
- G03G5/102—Bases for charge-receiving or other layers consisting of or comprising metals
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
A multi-layer electrophotographic material has a layer of trigonal selenium or gold to act as hole-injecting material; a layer of halogen-doped selenium- arsenic alloy to act as hole- transport material; a layer of a selenium- tellurium alloy as charge- generator material, and a layer of organic resin electrical insulation.
Description
SPECIFICATION
Multi-layer photoresponsive device
This invention is generally directed to a photoresponsive imaging device, and more specifically to layered photoresponsive devices, and the use of such devices in electrophotographic imaging systems.
Electrographic copying, and more specifically xerography as described in U.S. Patent 2,297,691, involves the development of an electrostatic latent image on a photoreceptor, which is comprised of a conductive substrate having on its surface a layer of photoconductive insulating material. In some instances there is included a thin barrier layer between the substrate and the photoconductive layer, such as aluminium oxide, to prevent charge injection from the substrate to the photoconductive layer upon charging of the plate surface.
In one known method a latent image is formed on the photoreceptor surface by first charging the plate in the dark, such as by exposing it to a cloud of corona ions, and imaging by exposing the plate to a light and shadow image, for the purpose of selectively discharging the photoreceptor, whereby a latent image corresponding to the shadow areas is formed. The latent electrostatic image is then developed by contacting the plate surface with a developing material such as toner, which will adhere to the latent image due to electrostatic attraction. The toned image can then be transferred to a substrate such as paper, followed by subsequent fusing of the toner into the paper thereby forming a permanent copy.
The imaging surface of the photoreceptor is then cleaned by any of several known methods, including charging,the purpose of the cleaning generally being to remove any residual toner and/or the electrostatic latent image. Also the electrostatic latent image can be used in a number of other ways such as, for example, electrostatic scanning systems may be employed to read the latent image or the latent image can be transferred to other materials by TESI techniques and stored. The developed image can also be read or permanently affixed to the photoconductor when the imaging layer is not to be reused.
Numerous types of photoreceptors can be used in the above-described method, and are well-known, such photoreceptors including the example, organic materials like polyvinylcarbazole, inorganic materials such as selenium and selenium alloys, and mixtures thereof. Photoreceptors are also known wherein the charge carrier generation and charge carrier transport functions are accomplished by discrete contiguous layers.
Also known are photoreceptors which include an overcoating layer of an electrically insulating polymeric material, and in conjunction with this overcoated type photoreceptor there have been proposed a number of imaging methods, such as the method described, for example, in the text by R.M. Schaffert on
Electrophotography published by Focal Press Limited, London, 1975. In one process there is used a non-ambipolar photoconductor wherein charge carriers are injected from the substrate electrode into the photoconductor surface. In such a system in order to obtain high quality images the injecting electrode must satisfy the requirements that it injects charge carriers efficiently and uniformly into the photoconductor.
While imaging systems and devices have been described, similar to the device of the present invention such devices are primarily directed to layered structures comprised mostly of organic substances, for example the transport layer can be organic, and different types of injecting electrodes can be used. While these devices function adequately, there continues to be a need for improved photoreceptor devices, and more specifically layered inorganic photoreceptor devices which have excellent injecting properties, and therefore can be used in electrophotographic systems for the purpose of obtaining images of high quality over a long period of time.
In accordance with the present invention there is provided a layered inorganic photosensitive device which can be used in various imaging systems, such as electrographic systems employing a double charging sequence the device comprising a substrate or supporting base having on its surface a layer of hole-injecting materials comprised of trigonal selenium, or gold, a hole-transport layer in operative contact with the hole-injecting layer, the transport layer being comprised of a halogen-doped selenium arsenic alloy, wherein the percentage by weight of selenium present is from 99.5 percent to 99.9 percent, the percentage by weight of arsenic present is from 0.1 percent to 0.5 percent; a charge-generating material overcoted on the transport layer, this material being comprised of inorganic photoconductive substances, and as a protective layer, a layer of insulating organic resin overlaying the charge-generating layer. About 10 parts per million to about 200 parts per million of halogen material is present, in the transport layer.
In one preferred embodiment of the present invention the substrate is a conductive material, such as aluminium, the hole-injecting layer is trigonal selenium, or gold, the hole-transport layer is a halogen doped selenium arsenic alloy, wherein the amount of selenium present by weight is from 99.5 to 99.9 percent, the amount of arsenic present by weight is from 0.1 percent to 0.5 percent, and the halogen material is present in an amount of frorn 50 parts per million, to 10D parts per million, the charge-generating layer is an alloy of selenium tellurium,-andthe overcoatirrg. layer is polyester, or polyurethane material The trigönal selenium hole-injecting material can be prepared by vapor deposition in a vacuum coater of selenium onto a supporting substrate.The transport layer is then.overcoated on the trigonal selenium injecting layer, followed bycoating of the generating layer on the transport layer, and optionally an organic insulating resm layer is overcoated on the- generating layer; as indicated herein. Generally a strong bond is formed between the hole-injecting layer and thasubstrate, and the hole-injecting.layer and the transport layer. Subsequent deposition-of the transport and generation layers is conducted in a vacuum chambert e.g.
a 24 inch vacuum coater. Heating of the substrate during the deposition is preferably accomplished using a temperture-controlled mandrel in contact with the rear of the substrate. This mode of heating (in distinction for instance to glow discharge heating) minimizes additional oxide formations on the etched aluminium surface and allows better control of the substrate temperature during the entire photoconductor evaporation process. Depending on the tyupe of photoreceptor device desired the process conditions can vary accordingly, as indicated herein.
The substrate, which is comprised in one embodiment of a flexible high purity aluminium sheet usually has to be treated in order that initiation of the crystallization of high purity selenium will occur. Thus, for example, the aluminium sheet which is highly polished is abraded with Scotch Brite until a matte finish is obtained, followed by etching with an Efferal solution. In another embodiment, when a rigid cylindrical drum is used as the substrate, the aluminum drum is first subjected to a mild caustic etch using a known mixture of trisodium phosphate, sodium carbonate and water. Additionally, prior to use, a further etching with an
Efferal solution can be employed.
The trigonal selenium injecting layer which is in operative contact with the substrate such as an aluminium sheet is prepared by evaporating a weighed amount of high purity selenium from a separate boat. The weighed amount will be dependent on the specific vacuum coater configuration but is calibrated to yield the desired thickness, as indicated hereinafter of trigonal selenium on the substrate. The substrate temperature during this evaporation is ideally maintained at 95 to 1 20 C. The selenium evaporation rate is adjusted in orderthatthe rate of condensation of vapors on the substrate is not greater than the rate of conversion of amorphous to crystalline selenium at the substrate temperature, since this ensures that the crystalline injector trigonal selenium layer is formed simultaneously upon contact.If an amorphous layer is allowed to deposit followed by slow conversion to the crystalline form there may result a serious reduction in hole injection efficiency and/or reduction in the adhesion of the hole-injecting layer to the substrate.
The gold injecting material can be prepared by sequential vapor deposition in a vacuum coater of gold onto a supporting substrate. The gold is treated with glow discharge to render the hole-injection layer more efficient. This minimizes additional oxide formation on the etched substrate, aluminium, and renders the gold more active as a hole-injecting material. The transport layer is then overcoated on the gold injecting
layer, followed by coating of the generting layer, on the transport layer, and optionally an organic insulating
resin layer is overcoated on the generating layer, as indicated herein. Upon final curing of the photoreceptor device generally a strong bond is formed between the gold hole-injecting layer and the substrate, and the hole-injecting layer and the transport layer.Depending on the type of photoreceptor device desired the
process conditions can vary accordingly.
The substrate, as with the trigonal selenium, can be a flexible high purity aluminum sheet, and should be treated prior to deposition of the gold. Thus, for example, a polished aluminum sheet is abraded with Scotch
Brite until a matte finish is obtained, followed by etching with an Efferal solution. In another embodiment when a rigid cylindrical aluminum drum is used as the substrate, it is first subjected to a mild caustic etch using a known mixture of trisodium phosphate, sodium carbonate and water. In addition, prior to use, a further etching with an Efferal solution can be employed.
The transport layer which is comprised of a halogen doped selenium arsenic alloy is evaporated by current state-of-the-art techniques, in order to result in a layer of the desired thickness, as described hereinafter, for example up to about 60 microns. The amount of alloy present in the evaporation boats will depend on the specific coater configuration, and other process variables but is calibrated to yield the desired transport layer thickness.Chamber pressure during operation is of the order of less than 4 x 105Torr. Evaporation can be completed over a period of time which ranges from 15 to 25 minutes during which the temperature of the crucible containing the molten alloy increases from about 25"C to about 300"C. Other times and temperatures outside these ranges are also usable as will be understood by those skilled in the art. During deposition of the transport layer it is desirable that the substrate temperature be maintained in the range of from 60"C to 800C.
The generating layer which is comprised in one embodiment of an alloy of selenium tellurium, 75 to 80 percent selenium, and 20 percent to 25 percent of tellurium, is prepared by grinding the selenium tellurium alloy, and preparing pellets from the ground material so as to result in a layer of the desired thickness as indicated herein, for example, up to 5 microns. The pellets are evaporated from crucibles using a timeltemperature crucible program designed to minimize the fractionation of the alloy during evaporation.
In this manner the concentration of tellurium across the generating layer can be maintained reasonably close to the composition of the pellets (a "flat" tellurium profile). A typical crucible program for this step will form a 0.6 micron generating layer in about 12 to about 15 minutes during which time the crucible temperature is increased from 25"C to 385"C.
In some instances deviation of the surface tellurium content above and below 25 percent can result in higher and lower photoresponsive sensitivity and corresponding higher or lower dark decay rates.
The above device comprised of a substrate, overcoated with an injecting layer of trigonal selenium, or gold, which in turn is overcoated with the transport layer indicated, the transport layer containing a generating layerthereover can then be overcoated with an insulating organic resin layer. Typically, a layer having a thickness of from about 5 microns to about 25 microns of a polyurethane resin is deposited by solution spray coating, although other resins and other techniques of resin deposition may be used.
In one preferred method of operation the above described layer photoreceptor device is charged a first time with electrostatic charges of a negative charge polarity, subsequently charged a second time with electrostatic charges of a positive polarity for the purpose of substantially neutralizing the charges residing on the electrically insulating surface of the member, and subsequently exposing the member to an imagewise pattern of activating electromagnetic radiation thereby forming an electrostatic latent image. The image can then be developed to form a visible image which is transferred to a receiving member The imaging member may be subsequently reused to form additional reproductions after the erase and cleaning steps have been accomplished.
The present invention will now be described by way of example with reference to tghe accompanying drawing, in which:
Figure lisa partially schematic cross-sectional view of the layered photoreceptor device of the present invention, and
Figures 2A to 2C illustrate the imaging steps employed.
Illustrated Figure lisa photoreceptor device generally designated 10, comprising a substrate layer 12, overcoatedwith a hole injecting layer 14, comprised of trigonal selenium, or gold, which in turn is overcoated with a transport layer 16, which is comprised of a halogen doped selenium arsenic alloy as defined herein, which layer in turn is overcoated with a generating layer 18, comprised of inorganic photoconductive substances, such as alloys of selenium tellurium, and as an optional layer a hole trapping layer 19, and finally an overcoating layer 20 of an insulating organic resin such as a polyurethane or polyester.
Substrate layer 12 may comprise any suitable material having the requisite mechanical properties, thus for example, this substrate can be-comprised of a layer of an organic or inorganic material having a conductive surface layer thereon, or conductive materials such as aluminium, nickel, and the like. One of the primary purposes of the substrate is for support, and systems can be envisioned where the substrate can be dispensed with entirely. The thickness of thesubstrate layer; which in some instances can be an optional layer, is dependent upon many factors including economic considerations, and design of the machine within which the photoresponsive device is to be used.Thus this layer may be of substantial thickness for example up to 5 mm-or of nfinimum-thickness, that is approximately 0.12 mm provided there are no adverse effects on the system. Generally, however, the thickness of this layer ranges from 0.12 to 2.5 mm. The substrate can be flexible, or rigid, and-may have many-different configurations,-such as for example, a plate, a cylindrical drum, a scroll, and endless flexible belt,- and the like.
The hole injecting layer 14, which is comprised of trigonal-selenium, or gold, injects charge carriers or holes into layer 16 under the influence of an electrical field. The injected charge carriers should be of the same polarity as the mobile carriers transported by the transport layer, layer 16, during the imaging process.
The thickness of the trigonal selenium layer ranges from about 0.5 microns to about 10 microns and preferably from about 1 micron to about 5 microns, while the thickness of the gold injecting layer ranges from about 0.02 microns to 10 microns. The minimum and maximum thickness of this layer is generally determined by the electrical properties desired, and it is not intended to be limited to the specific thickness disclosed. Also the charge carrier (hole) injecting layer, and the charge carrier transport layer require a particular work function relationship in order that the hole injection from the former into the latter can be effectively accomplished, while minimizing the injection of the opposite sign carriers.
The transport layer 16 is comprised of a halogen-doped selenium arsenic alloy, wherein the percent of selenium present ranges from 99.5 percent to 99.9 perecent, and the percentage of arsenic present ranges from 0.1 percent to 0.5 percent. The amount of halogen, chlorine, fluorine, iodine, or bromine present ranges from about 10 parts per million, to about 200 parts per million, with the preferred range being from about 50 parts per million, to about 100 parts per million. The preferred halogen is chlorine. Thus, for example, while other alloys have cyclic residual potentials of 200 volts or more after 1,000 copy cycles in an electrophotographic system, with the alloy of the present invention residuals of zero (0) to 25 volts results after the same number of cycles.This layer generally ranges in thickness from about 5 to about 60 microns and preferable from about 25 microns to about 50 microns. Other inorganic photoconductors can be used for this layer including for example amorphous-selenium, various other selenium alloys including selenium tellurium, arsenic sulfur selenium, selenium doped with various halogen materials, and other suitable panchromatic inorganic substances.
The inorganic photoconductive generating layer 18 in one embodiment is comprised of a selenium tellurium alloy, with the percentage of selenium being from about 70 percent to about 90 percent, and the percentage of tellurium being from about 10 percent to about 30 percent. Preferably about 75 percent of selenium, and 25 percent of tellurium is present in the generating layer 18. This layer ranges in thickness of from about 0.1 micron to about 5 microns, and preferably from 0.2 to about 1 micron. The generating layer generally is of a thickness which is sufficient to absorb at least 90% or more of the incident radiation which is directed upon it in the imagewise exposure step.
The electrically insulating overcoating layer 20 is generally from about 5 to about 25 microns in thickness, and preferably from about 12 to about 18 microns in thickness. Generally this layer provides a protective function, in that the photoconductive material surface is kept from being contacted by toner and ozone which is generated during the imaging cycles, and from physical damage from scratching and the like. The overcoating layer also prevents corona charges from penetrating through it into the charge generating layer 18 or from being injected into it by the latter. Preferably therefore, layer 20 comprises material having high resistance to charge carrier injection and low carrier mobilities.The minimum thickness of this layer is determined by the function the layer must provide, whereas the maximum thickness is determined by mechanical considerations and the resolution capability desired for the photoresponsive device. Typical suitable overcoating materials include polyethylenes, polycarbonates, polystyrenes, polyesters, polyurethanes, and the like, with polyurethanes commercially available from Mobil Corporation or Kansai
Paint Company, and polyesters commercially available from Goodyear Chemical Company being the preferred overcoating layer.
The formation of the insulating layer over the charge generating layer may be accomplished by any one of several methods known in the art such as spraying, dipping, roll coating and the like, by which a solution of one layer material is applied. By evaporation of the solvent, a hard resistive layer is left. Non-solution methods may also be used.
The operation of the member of the present invention is illustrated in Figures 2A-2C. In this illustrative explanation the initial charging step is carried out with negative polarity. As noted previously, the method is not limited to this embodiment. Moreover, the description of the method will be given in conjunction with a proposed theoretical mechanism, by which the method is though to be operative, in order to better aid those skilled in the art to understand and practice the invention. It should be noted, however, that the method has been proved to be operable and highly effective through actual experimentation and any inaccuracy in the proposed theoretical mechanism of operation is not to be construed as being limiting of the invention.
Referring to Figure 2A, there is seen the condition of the photoreceptor after it has been electrically charged negatively a first time, uniformly across its surface in the absence of illumination, by any suitable electrostatic charging apparatus such as corotron. The negative charges reside on the surface of electrically insulating layer 20. As a consequence of the charging an electrical field is established across the photoreceptor and as a consequence of the electrical field and the work function relationship between layers 14 and 16, holes are injected from the charge carrier injecting layer into the charge carrier transport layer.
The holes injected into the charge carrier transport layer are transported through the layer, enter into the charge carrier generating layer 18 and travel through the latter until they reach the interface between the charge carrier generating layer 18 and the electrically insulating layer 20, where they become trapped. The charges thus trapped at the interface establish an electrical field across the electrically insulating layer 20.
Thus, it is seen that in the embodiment where negative charging is carried out in the first charging step, charge carrier injecting layer 14 and charge carrier transport layer 16 must compromise materials which will allow injection of holes from the former into the latter, and allow the holes to reach the interface between layer 18 and electrically insulating layer 20.
Subsequently, the member is charged a second time again in the absence of illumination, with a polarity opposite to that used in the first charging step in order to substantially neutralize the charges residing on the surface of the member. In this illustrative instance, the second charging of the member is with positive polarity. After the second charging step the surface of the photoreceptor should be substantially free of electrical charges. The substantially neutralized surface is created by selecting a charging voltage, such that the same number of positive charges are deposited as negative charges previously deposited. By "substantially neutralized" within the context of this invention is meant that the voltage across the photoreceptor, is substantially zero.
Figure 2B illustrates the condition of the photoreceptor after the second charging step. In this illustration no charges are shown on the surface of the member. The positive charges residing at the interface of layers 18 and 20 as a result of the first charging step remain trapped at the interface, at the end of the second charging step. However, there is now a uniform layer of negative charges located at the interface layers 14 and 16.
Therefore the net result of the second charging step is to establish a uniform electrical field across the charge carrier transport and charge carrier generating layers. To achieve this result it is critical that the negative charges be located at the interface between charge carrier injecting layer 14 and charge carrier transport layer 16, and be prevented from entering into and being transported through the transport layer.
For this reason it is mandatory to utilize a charge carrier transport material which will allow injection of only one species of charge carrier, namely holes in this illustrative instance. This is especially necessary when a charge carrier transport material is used which is capable of transporting both species of charge carriers.
Subsequently, reference Figure 2C, the member is exposed to an imagewise pattern of electromagnetic radiation to which the charge carrier generating material comprising layer 18 is responsive. The exposure of the member may be effected through the electrically insulating overcoating. As a result of the imagewise exposure an electrostatic latent image is formed in the photoreceptor. This is because hole electron pairs are generated in the light-struck areas of the charge carrier generating layer. The light-generated holes are injected into the charge carrier transport layer and travel through it to be neutralized by the negative charges located at the interface between layers 14 and 16. The light-generated electrons neutralize the positive charges trapped at the interface between layers 18 and 20. In the areas of the member which did not receive any illumination, the positive charges remain in their original position. Thus, there continues to be an electrical field across the charge carrier transport and charge carrier generating layers in areas which do not receive any illumination, whereas the electrical field across the same layers in the areas which receive illumination is discharged to some low level (Figure 2C).
The electrostatic latent image formed in the member may be developed to form a visible image by any of the well-known xerographic development techniques, for example, cascade, magnetic brush, liquid development and the like. The visible image is typically transferred to a receiver member by any conventional transfer technique and affixed thereto. While it is preferable to develop the electrostatic latent image with marking material the image may be used in a host of other ways such as, for example, "reading" the latent image with an electrostatic scanning system.
When the photoreceptor device of the present invention is to be reused to make additional reproductions, as in the case in a recyclable xerographic apparatus, any residual charge remaining on the photoreceptor after the visible image has been transferred to a receiver member typically is removed therefrom prior to each repetition of the cycle as is any residual toner material remaining after the transfer step. Generally, the residual charge can be removed from the photoreceptor by ionizing the air above the electrically insulating overcoating of the photoreceptor, while the photoconductive carrier generating layer is uniformly illuminated and grounded.For example, charge removal can be effected by A.C. corona discharge in the presence of illumination from a light source, or preferably a grounded conductive brush could be brought into contact with the surface of the photoreceptor in the presence of such illumination. This latter mode also will remove any residual toner particles remaining on the surface of the photoreceptor.
There can also be used in the device of the present invention as an optional separate layer, a hole-trapping layer situated between the generating layer and the overcoating layer, the hole trapping layer being of the same materials as described with regard to the hole-transport layer. Thus the hole-trapping layer and the hole-transport layer can be substantially similar in their composition or they may be different Thus the hole-trapping layer is comprised of halogen-doped, selenium arsenic alloy wherein the percentage by weight of selenium is from about 95 percent to about 99.5 and preferably from about 99 percent to about 99.9 percent with the percentage by weight of arsenic present being from abkout 0.1 percent to about 5.0 percent, and preferably 0.1 to 1 percent and the halogen material is present in an amount of from about 10 parts per million to about 200 parts per million and preferably, from 20 parts per million to 100 parts per milliion. Also the hole trapping layer can be comprised of selenium, arsenic-sulfur selenium alloys, organic materials such as aromatic amines and the like.
The thickness of the hole trapping layer ranges from about 0.01 microns to about 5 microns, and preferably from about 0.01 microns to about 1 micron. The minimum thickness of the hole trapping layer may be less, or more, however, it must be of sufficient thickness so as to provide for sufficient trapping of holes at the overcoating interface. The maximum thickness is determined by the amount of light absorption in the trapping layer. Ideally, it is desirable to have substantially all the light absorbed in the highly sensitive generator layer (Se-Te). Trapping layers such as selenium alloys absorb much of the light (the amount depending on thickness and the wavelength). Photogeneration of mobile carriers (holes) is less efficient in the trapping layer than in the generator layer, thus sensitivity is reduced.Accordingly, it is desirable to provide a thin trapping layer, as thin as possible, consistent with efficient trapping of the injected holes coming from the rear of the structure.
The hole-trapping layer which is between the generating layer and the overcoating insulating layer is of importance since if the holes, that is, positive charges, are not substantially retained at the interface between the above two mentioned layers, the efficiency of the photoreceptor device is adversely affected when such holes are allowed to freely migrate back to the generator layer. If some of the holes are allowed to migrate they will travel towards the electrode layer, and neutralize the negative charges located between the hole injecting layer and the transport layer thus reducing the overall voltage useful for this succeeding imaging process. This would adversely affect the imaging system as well as lower the efficiency of the device and render the cyclic characteristics of such device unstable.It is important to note that the device is operative without the trapping layer, however, depending upon the amount and the frequency with which the holes travel throughout the system, the amount of holes retained at the generator insulator interface varies resulting in cyclic unstability. The photoresponsive device may remain photosensitive without the trapping layer, however, higher initial fields will be needed in order to render the device efficient; the disadvantage of using higher fields is that it causes breakdown in the system, and more ozone is generated, thus posing an environmental problem in some situations. It is preferable to use lower voltages as this is more efficient and more stable and further with the hole trapping layer the dark decay of the system, that is, leakages of charges, will improve significantly so as to substantially reduce dark decay.
The trapping layer can be prepared by many different methods. In one method, there is used a separate crucible within a vacuum coater containing a small quantity of a selenium arsenic-alloy, whose weight has been previously calibrated to give the desired thickness of trapping layer. Following formation of the generator layer, the alloy material is evaporated using a specified time/temperature program. Atypical program might involve 5 minutes evaporation during which the crucible temperature is increased from 80"C to 415"C.
In another embodiment the following method was used to prepare the trapping layer. Subsequent to formation of the injecting layer, the crucible from which the selenium, or gold, was completely evaporated to form the injecting layer is allowed to partially cool, and is maintained a constant soak temperature (typical 80"C). This temperature is sufficiently low to allow a small quantity of the transport layer vapors which are subsequently formed during transport layer formation to deposit on the injection layer crucible. Following the generator layer formation, the injector boat on which a small quantity of transport layer material has condensed, the temperature is increased from about 80"C to about 415OC in about 4 minutes, and the condensate reevaporates.The reevaporated material deposits on top of the generator layer to form the trapping layer.
The invention will now be described with respect to specific preferred embodiments thereof, it being understood that these examples are intended to be illustrative only and the invention is not intended to be limited to the materials, conditions, process parameters and the like recited herein. All parts and percentages are by weight unless otherwise indicated.
Example 1 A photoresponsive device was prepared by sequentially evaporating several discrete inorganic layers onto a 0.12 mm abraded and etched aluminium substrate in a standard vacuum coater at a background pressure of 1-2 x 1 04Torr, millimeters of Hg.
The aluminium substrate was first heated to 110-119 C and while held in this temperature range high purity selenium was deposited thereon, from a stainless steel boat whose temperature was raised from 25-330"C over a period of 13 minutes. Upon contact with the heated substrate the condensing selenium vapors immediately formed a trigonal selenium layer of about a 3 micron thickness. The substrate temperature was then decreased to 65-80"C in preparation for the subsequent depositions.
The transport layer was then formed by depositing onto the trigonal selenium layer, from a crucible, a 60 micron layer of selenium arsenic alloy of the composition 0.33 percent arsenic, 20 parts per million chlorine and 99.6 percent selenium. During this step the substrate temperature was maintained at 65-70"V, the alloy crucible temperature was increased from about 25 to about 290"C, and the evaporation was completed in 27 minutes.
With the substrate temperature in the range of 66-67"C, the generator layer was then deposited on top of the transport layer. Pressed pellets of a powdered selenium tellurium alloy, 75 percent selenium, 25 percent tellurium were evaporated over a period of 11 minutes from the crucible whose temperature was increased from 190 to 405"C. A 0.3 micron layer of selenium tellurium alloy resulted. The above three layered structure was then overcoated with an 18 micron layer of Vitel, a polyester resin, (commercially available from
Goodyear Chemical Company) by conventional solution spraying techniques.
Example Il A photoresponsive device was prepared in essentially the same manner as in Example I with the exception that a cylindrical aluminum tube, approximately 1.17 mm diametere x 406 mm long, was used as the substrate, the transport material was comprised of an alloy consisting of 0.12 percent arsenic, 87 parts per million chlorine, and 99.9 percent selenium, the generating layer was 0.6 microns in thickness, and the overcoating layer was a polyurethane material instead of polyester.
Example 111 The procedure of Example I was repeated with the exception that the transport layer was comprised of 0.5 percent arsenic, 99.5 percent selenium, and 20 parts per million of chlorine.
Example IV
The procedure of Example II was repeated with the exception that the transport layer is comprosed of 0.2 percent arsenic, 99.8 percent selenium, and 100 parts per million of chlorine.
Example V
The procedure of Example II was repeated with the exception that the transport layer was comprised of 0.33 percent arsenic, 0.6 percent selenium, and 100 parts per million of chlorine.
Example Vl The procedure of Example II was repeated with the exception that the transport layer was comprised of 0.4 percent arsenic, 99.6 percent selenium, and 200 parts per million of chlorine.
Example Vll The procedure of Example I was repeated with the exception that the generating layer was comprised of a selenium-tellurium alloy, containing 80 percent selenium, and 20 percent tellurium, and had a thickness of 0.6 microns.
When the photoresponsive devices of Examples I, II, III, IV, V, VI and VII were used to form images using the double charging imaging process described in detail hereinbefore (reference Figures 2A-2C), there resulted images of good quality and high resolution comparable to images formed with conventional photoreceptors, using known xerographic imaging methods, single charging. The comparisons were based on visual observations.
Example Vlil Gold wire of 0.5 mm diameter was obtained from Engelhard Industries, Carteret, New Jersey, is cut into lengths of 12 to 25 mm and evaporated from a molybdenum crucible onto an aluminium substrate, 3.75 mm in thickness, at room temperature and a pressure of 10 4 millimeters (mm) of mercury (Hg). The resultant gold film of about 0.1 microns thickness is then treated with a glow discharge plasma at a pressure of 50 microns of mercury and simultaneously heated to 45"C. A film 60 microns in thickness of a halogen doped selenium arsenic alloy (99.6 selenium, 0.33 percent arsenic, 20 ppm chlorine, which layer functions both as the transport layer, and as the generating layer), is then evaporated onto the gold at 60"C and 104mmHg.
There results from the above method a layered inorganic photoresponsive device comprised of an aluminum substrate, overcoated with a gold injecting layer, which in turn is overcoated with a charge transport, charge generating composite layer of a halogen doped arsenic selenium alloy.
Example IX
A layered inorganic photoresponsive device was prepared in accordance with Example VIII, with the exception that there was coated on the halogen doped selenium arsenic alloy layer, as a separate layer, a generating layer, 0.3 microns in thickness, comprised of an alloy of selenium, 75 weight percent, tellurium, 21 weight percent, and arsenic 4 weight percent; resulting in a layered photoresponsive device.
Example X
The procedure of Example IX is repeated with the exception that there was coated on the generating layer, a hole trapping layer, 0.1 microns in thickness, comprised of a selenium-arsenic alloy, containing 98 percent selenium and 2 percent arsenic.
Example Xl The photoresponsive devices as prepared in Example VEIL, and IX were overcoated at room temperature, with an organic polyurethane overcoating, 12 microns in thickness by use of a spray gun.
These overcoated photoreceptor devices when used in an imaging system employ double charging, that is, charging with uniform negative charges, followed by charging with an equal number of positive charges, resulted in images of high quality, and excellent resolution.
Example Xll The photoresponsive devices as prepared in Example VIII, and IX, were compared with photoresponsive devices with injections layers of other materials with the following results:
Material Hole Injection Efficiency
Gold 100%
Copper 14%
Cadmium 10%
Zinc 13%
Chromium 12%
Example Xlil A photoresponsive device was prepared in essentially the same manner as in Example I, with the addition that a trapping layer, 0.1 microns in thickness, was formed on top of the selenium tellurium generating layer.
The trapping layer was prepared by evaporation of a weighed amount of an alloy comprised of 0.33 percent arsenic, 20 parts per million chlorine, and 99.6 percent selenium, from a heated crucible in a separate evaporation step.
The trigonal selenium injector layer was formed by evaporation of selenium from a heated crucible as in
Example 1. This crucible from which the selenium has been evaporated is charged with an amount of the above alloy calibrated to result in a deposited thickness of 0.1 micron. Additionally, there were used two other crucibles, (as in Example 1), one crucible containing the material for the transport layer, and the other containing the material for the generator layer, and the materials from these crucibles were evaporated as accomplished in Example 1. Following this the temperature of the crucible containing the material for the hole trapping layer was raised from about 175"C to about 340"C, and evaporation was accomplished over a period of about 3 minutes.The completed four layer device, comprised of a hole injector layer, overcoated with a transport layer, which in turn is overcoated with a generator layer, and finally a hole trapping layer, was overcoated with a polyester resin (Vitel), 15 microns in thickness.
Example XIV
A photoresponsive device was prepared in essentially the same manner as in Example II with the exception that a hole trapping layer was formed over the generator layer by a re-evaporation technique.
During evaporation of the transport layer and the generator layer, the trigonal selenium crucible (from which the injector layer material had been evaporated) was allowed to remain at ambient temperature, namely, the temperature of the coating apparatus. During this period its temperature increased from about 35"C to about 80"C and a small quantity of the transport layer material deposited thereon is used to make the injector layer.
(In distinction, in Example II, this empty crucible was maintained at about 250"C during the transport and generator evaporations so that no material condensed thereon).
After deposition of the generator layer the temperature of the aforementioned crucible was increased from 80"C to about 415"C, thereby evaporating the small quantity of deposited trapping material and condensing it on top of the generator layer thereby forming the hole trapping layer top coat of 0.01 microns thickness.
When the photoresponsive devices of Examples XIII and XIV were used to form images using the double charging imaging process described in detail hereinbefore (reference Figures 2A-2C), there resulted images of good quality and high resolution comparable to images formed with conventional photoreceptors, using known xerographic imaging methods, single charging. The comparisons are based on visual observations.
Claims (8)
1. Alayered photoresponsive device including:
(a) a layer of first material capable of injecting holes into a layer of second material on its surface, the first layer being of trigonal selenium or gold;
(b) the second layer being of hole-transport material in operative contact with the hole injection layer, the second layer being of a halogen-doped selenium arsenic alloy, wherein the percentage by weight of selenium is 99.5 percent to 99.9 percent, and the percentage by weight of arsenic is from 0.1 percent to 0.5 percent, and the halogen is present in an amount of from 10 parts per million to 200 parts per million;;
(c) a charge-generation layer of a third material being coated on the hole-transport layer and comprising an alloy of selenium and tellurium, the charge-generation layer ranging in thickness of from 0.1 microns to 5 microns, and
(d) a layer of electrical insulation organic resin overlaying the charge-generation layer.
2. A layered photoresponsive device in accordance with claim 1, in which the hole-injection layer is of trigonal selenium, and the insulation material is a polyester or polyurethane resin.
3. A layered inorganic photoresponsive device in accordance with claim 1 or 2, in which the thickness of the hole-injection layer is between 0.5 and 10 microns, and of the insulation layer is between 5 and 25 microns.
4. A device as claimed in any preceding claim, in which one surface of the first layer is in intimate contact with a substrate.
5. A layered photoresponsive device in accordance with claim 3, in which the substrte is aluminum, the
hole-transport layer consists of 99.9 percent selenium, 0.1 percent arsenic, and 50 parts per million to 100
parts per million of halogen, and in which the insulation layer is of a polyester resin.
6. A device as claimed in any preceding claim, in which a layer of hole-trapping material is interposed
between the charge-generation and insulation layers.
7. An electrophotographic imaging method comprising the steps of charging a photoresponsive device
as claimed in any preceding claim with negative electrostatic charges; charging the device with positive
electrostatic charges in order substantially to neutralize the negative charge residing on the surface of the
device; exposing the device to an imagewise pattern of electromagnetic radiation to which the charge carrier
generating material is responsive, whereby there is formed an electrostatic latent image on the
photoresponsive device, and optionally transferring the electrostatic latent image to a permanent substrate
subsequent to its development.
8. A photoresponsive device substantially as described herein with reference to, and as shown in, the
accompanying drawing.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/127,174 US4297424A (en) | 1980-03-05 | 1980-03-05 | Overcoated photoreceptor containing gold injecting layer |
| US06/127,176 US4287279A (en) | 1980-03-05 | 1980-03-05 | Overcoated inorganic layered photoresponsive device and process of preparation |
| US06/127,177 US4286033A (en) | 1980-03-05 | 1980-03-05 | Trapping layer overcoated inorganic photoresponsive device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| GB2070797A true GB2070797A (en) | 1981-09-09 |
| GB2070797B GB2070797B (en) | 1984-09-12 |
Family
ID=27383537
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB8106951A Expired GB2070797B (en) | 1980-03-05 | 1981-03-05 | Electrophotographic materials |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE3108156A1 (en) |
| GB (1) | GB2070797B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2219867A (en) * | 1988-06-16 | 1989-12-20 | Fuji Electric Co Ltd | Electrophotographic photoreceptor |
| EP0456979A1 (en) * | 1990-03-13 | 1991-11-21 | Matsushita Electric Industrial Co., Ltd. | Electrophotosensitive member |
-
1981
- 1981-03-04 DE DE19813108156 patent/DE3108156A1/en not_active Withdrawn
- 1981-03-05 GB GB8106951A patent/GB2070797B/en not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2219867A (en) * | 1988-06-16 | 1989-12-20 | Fuji Electric Co Ltd | Electrophotographic photoreceptor |
| GB2219867B (en) * | 1988-06-16 | 1993-01-06 | Fuji Electric Co Ltd | Electrophotographic photoreceptor |
| EP0456979A1 (en) * | 1990-03-13 | 1991-11-21 | Matsushita Electric Industrial Co., Ltd. | Electrophotosensitive member |
Also Published As
| Publication number | Publication date |
|---|---|
| DE3108156A1 (en) | 1981-12-24 |
| GB2070797B (en) | 1984-09-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PCNP | Patent ceased through non-payment of renewal fee |