GB2070064A - Electrochemical Grinding Electrode - Google Patents
Electrochemical Grinding Electrode Download PDFInfo
- Publication number
- GB2070064A GB2070064A GB8105471A GB8105471A GB2070064A GB 2070064 A GB2070064 A GB 2070064A GB 8105471 A GB8105471 A GB 8105471A GB 8105471 A GB8105471 A GB 8105471A GB 2070064 A GB2070064 A GB 2070064A
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- GB
- United Kingdom
- Prior art keywords
- workpiece
- electrode body
- grinding
- electrode
- electrically conductive
- Prior art date
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- Granted
Links
- 238000000227 grinding Methods 0.000 title claims description 67
- 239000011159 matrix material Substances 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims abstract description 22
- 239000006061 abrasive grain Substances 0.000 claims abstract description 21
- 238000003754 machining Methods 0.000 claims description 25
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 claims description 18
- 229910033181 TiB2 Inorganic materials 0.000 claims description 18
- 239000002245 particle Substances 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 11
- 238000012544 monitoring process Methods 0.000 claims description 10
- 239000011244 liquid electrolyte Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 5
- 229910003460 diamond Inorganic materials 0.000 claims description 5
- 239000010432 diamond Substances 0.000 claims description 5
- 150000004767 nitrides Chemical class 0.000 claims description 5
- 239000011347 resin Substances 0.000 claims description 5
- 229920005989 resin Polymers 0.000 claims description 5
- 239000005060 rubber Substances 0.000 claims description 5
- 229910052719 titanium Inorganic materials 0.000 claims description 5
- 239000010936 titanium Substances 0.000 claims description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 4
- 229910052735 hafnium Inorganic materials 0.000 claims description 4
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052582 BN Inorganic materials 0.000 claims description 3
- 150000001247 metal acetylides Chemical class 0.000 claims description 3
- -1 boron carbides Chemical class 0.000 claims description 2
- 238000005520 cutting process Methods 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 1
- 229910052796 boron Inorganic materials 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 description 11
- 239000000203 mixture Substances 0.000 description 9
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 9
- 229910010271 silicon carbide Inorganic materials 0.000 description 9
- 239000003082 abrasive agent Substances 0.000 description 7
- 239000003792 electrolyte Substances 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 229910052580 B4C Inorganic materials 0.000 description 3
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000006722 reduction reaction Methods 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 235000014692 zinc oxide Nutrition 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- 229910003862 HfB2 Inorganic materials 0.000 description 2
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
- 238000005056 compaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 239000010433 feldspar Substances 0.000 description 2
- 235000013980 iron oxide Nutrition 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229920001800 Shellac Polymers 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000003190 augmentative effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- RCJVRSBWZCNNQT-UHFFFAOYSA-N dichloridooxygen Chemical compound ClOCl RCJVRSBWZCNNQT-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000012799 electrically-conductive coating Substances 0.000 description 1
- 239000006181 electrochemical material Substances 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 102220259718 rs34120878 Human genes 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 238000005063 solubilization Methods 0.000 description 1
- 230000007928 solubilization Effects 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
- B23H5/00—Combined machining
- B23H5/06—Electrochemical machining combined with mechanical working, e.g. grinding or honing
- B23H5/08—Electrolytic grinding
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
The electrode consists essentially of electrically conductive abrasive grains bonded together with an essentially nonconductive bonding matrix. The abrasive grains are admixed with an amount of 10 to 30% by volume of the bonding matrix and sintered together to form the porous, homogeneous electrode body, e.g. in the form of a wheel, having a specific resistivity not greater than 100 ohm- cm, preferably between 0.1 and 10 ohm-cm. Methods and apparatus utilizing such electrode bodies are disclosed.
Description
SPECIFICATION
Electrochemical Grinding Wheel, Method and
Apparatus
The present invention relates generally to the art of electrochemical grinding (ECG), also called electrolytic grinding (ELG). More particularly, the invention relates to an improved electrochemical grinding electrode body, e.g. in the form of a wheel, as well as an improved method of and apparatus for the electrochemical grinding of an electrically conductive workpiece using a rotating wheel electrode constituted by such an improved electrode body.
Electrochemical grinding is a machining process in which two distinct machining actions, in combination, are simultaneously exerted upon an electrically conductive workpiece: the electrolytic dissolution of material from the conductive workpiece produced when a highdensity electric current is passed between the workpiece and a tool electrode through an electrolyte that serves as an electrochemical machining medium; and the mechanical abrading of the tool surface against the workpiece. In a finishing operation subsequent to the machining process, only the mechanical action may be utilized using the same tool to give the machined body a shining finish. It is desired therefore that the tool be of an electrode body having both good electrical conducting and satisfactory abrading capabilities.
Electrode bodies conventionally used for electrochemically grinding an electrically conductive workpiece consist of a structure of portions functionally divided from one another as regards the conductivity and abrasivity. Thus, typical electrochemical grinding tool electrodes are metal bonded diamond or other abrasive wheels which consist of electrically nonconductive abrasive particles constituting mechanical tools that are supported on and in a metal matrix providing the path for the electrochemical machining current. These bodies are, however, not of sufficient bond strength.
Abrasive particles tend to dislodge rather quickly from the metal substrate and therefore the tool body as a whole undergoes considerable wear in the course of a machining operation. In addition, they are comparatively expensive to manufacture and poor in shapability. In another class of conventional electrochemical grinding electrode bodies, a commercially available purely abrasive porous wheel (e.g. vitrified, silicate, rubber, resinoid, shellac or oxychloride abrasive of silicon carbide, boron nitride, boron carbide, aluminum oxide, zirconium oxide, zinc oxide, titanium oxide or diamond) acquires electrical conductivity by having its inner interconnected pores impregnated with conductive materials.The impregnation may be effected with a chemical plating solution so that an electrically conductive coating builds up on the wall portions of the pores by chemical reduction of a metal from the solution. In use of the wheel, the conductive coating provides paths for the electrochemical machining current. The bond between the conductive coating and the abrasive matrix is, however, comparatively poor. Furthermore, the chemically plated coating tends to suffer aging changes and to be oxidized and corroded, and the pores tend to be clogged with oxidation and corrosion products in use of the wheel. As a result, the wheel becomes degenerated rather quickly as to both mechanical and electrochemical capabilities.
The present invention therefore seeks to provide an improved electrochemical grinding electrode body which is excellent in shapability and superior in electrochemical and mechanical or abrasive capabilities, economical in manufacture and less liable to suffer aging degradation. The present invention also seeks to provide an improved method of electrochemically grinding a conductive workpiece which allows the workpiece to be machined with an increased efficiency and operational stability; and in addition to provide an electrochemical grinding apparatus for carrying out the improved method.
Other objectives will become apparent as the description hereinafter proceeds.
In accordance with the present invention, in a first aspect thereof, there is provided an electrochemical grinding electrode body consisting essentially of electrically conductive abrasive grains bonded together with an essentially electrically nonconductive bonding matrix, the abrasive grains being admixed with an amount, preferably between 10 and 30%, of the bonding matrix and sintered together to form the electrode body having a specific resistivity not greater to form the electrode body having a specific resistivity not greater than 100 ohm-cm.
In contradistinction with the earlier belief that the electrical conductivity and the abrasivity should be served by separate media forming an integral structure, e.g. a metal matrix and abrasive particles in a metal-bonded wheel, and a nonconductive porous abrasive skelton and conductive coatings formed on the wall portions of the pores therein in a plated abrasive wheel, it has now been found that grains of an electrically conductive and abrasive material merely bonded together by a bonding material independent of the conductivity may be used to constitute an integrated electrochemical and abrasive medium with the result that all of the requirements are substantially met.
The invention also provides, in a second aspect thereof, a method of electrochemically grinding an electrically conductive workpiece with a rotating wheel constituted by the electrode body, which method comprises: repetitively displacing the workpiece transversely relative to the rotating wheel along a straight path, and in each run of the repetition setting the depth of cut at a value not greater than 5 micrometers. The electrochemical machining current passed between the workpiece and the rotating wheel electrode in each run is preferably in the form or a succession of electrical pulses.
Specifically, the improved method of electrochemical grinding of an electrically conductive workpiece is carried out with a rotating wheel electrode which is preferably but not exclusively constituted by an electrode body defined in the foregoing and makes, in the usual way, use of an electrochemical grinding current, preferably in the form of a succession of pulses, passed through a grinding interface defined between the workpiece and the rotating wheel electrode and flushed with a liquid electrolyte.
The method, in accordance with this aspect of the invention, however, comprises: causing the workpiece to traverse the rotating wheel electrode along a predetermined rectilinear path repeatedly over a predetermined number of successive runs; setting, in each of the runs, the depth of cut by the rotating wheel electrode in the workpiece as determined by the position of the workpiece traversing the rotating wheel electrode along the said path to be not greater than 5 micrometers; and repeating the said each run so as to complete the said successive runs whereby to cumulatively achieve a desired depth of cut in the workpiece.
In an apparatus aspect, the invention also provides an improved apparatus for electrochemically grinding an electrically conductive workpiece with a rotating wheel electrode, the apparatus comprising: a power supply for passing an electrochemical grinding current through a grinding interface defined between the workpiece and the rotating wheel electrode and flushed with a liquid electrolyte; drive means for causing the workpiece to traverse the rotating wheel electrode along a predetermined rectilinear path repeatedly over a predetermined number of successive runs; and positioning means for locating, in each of the successive runs, the position of the workpiece traversing the rotating wheel electrode along the said path so as to set the depth of cut by the rotating wheel electrode in the workpiece to be not greater than 5 micrometers; and control means for permitting the said each run to be repeated to complete the said predetermined number of the successive runs whereby to cumulatively achieve a desired depth of cut in the workpiece.
These and other features and advantages of the present invention will be more readily appreciated from the following description of certain embodiments thereof. In the accompanying drawing:- Fig. 1 is a schematic view of an electrochemical grinding arrangement for the explanation of a method of the invention;
Fig. 2 is a graph illustrating how the depth of cut (grinding depth) set in each run or pass of the repeated and successive pass traverse grinding operation affects the ratio of the spindle (for wheel electrode) drive power to the wheel diameter and the grinding feed rate and their relationship which has been experimentally found as a basis of the method of the invention; and
Fig. 3 is a schematic view of an electrochemical grinding arrangement including novel means for monitoring the wear of the rotating wheel electrode.
The invention provides as improved electrode body for electrochemical grinding, consisting essentially of electrically conductive abrasive grains bonded together by an essentially electrically nonconductive bonding matrix, the abrasive grains being admixed with an amount less than 30%, preferably between 10 and 25% by volume, of the bonding matrix and sintered together to form the electrode body having a specific resistivity not greater than 100 ohm-cm.
The individual electrically conductive abrasive grains may essentially consist of a substance selected from the group consisting of carbides, nitrides and borides of titanium and hafnium and which may be TiC, TiB2,TiN, HfC, TiBC, TiCN,
TiHfC, (TiB2)C, (TiB2)N, TiCB4C, TiNB4C, TiCB13C2, TiNB,3C2, TiCWC, B4CWC and/or B4CSiC.
While conventional abrasive materials such as
SiC and Al2O3 forming the abrasive particles in a metal-bonded wheel or the abrasive skelton in a plated electrochemical grinding wheel are of a specific resistivity of 1010 upcm and hence are essentially nonconductive, such as abrasive material as defined or listed above has a specific resistivity in the order of uncm (for example, TiC 70 to 1 70 ,uS2cm) and it has been found that such materials of a low electrical resistivity can be bonded together with a nonconductive binder to provide an excellent electrode body of an overall resistivity not greater than 100 Qcm, preferably 0.1 to 10 Qcm. These materials advantageously have also a great hardness and crushing strength, for example for TiC the crushing strength amounts to 2900 to 3200 kg/mm2, and for TiB2 that strength amounts to 3300 to 3450 kg/mm2. A carbide and nitride of TiB2,viz. (TiB2)C and (TiB2)N have a similar crushing strength and electrical resistivity, and have been found to be examples of highly satisfactory conductive abrasive material.
The conductive abrasive grains may be bonded together with nonconductive abrasive grains such as B4C, CBN (cubic boron nitride) and diamond.
Other conductive or semiconductive abrasives such as WC, SiC, ZrC may also be added.
Sometimes, it has been found to be suitable to further include a compound or compounds of La,
Y, Ce and other rare-earth elements. The bonding matrix may be an inorganic glass material, resin or rubber. The conductive abrasive grains and such a bonding matrix when bonded or sintered together have an extreme high bonding strength. An optimum porosity, bond strength and electrical conductivity of the electrode body is obtained when the amount of the bonding matrix ranges between 10 to 25% by volume.
Example I
A mixture of 33% by volume of TiC of a grain size of 140 ,u, 20% by volume of TiN of a grain size of 140 yç5,30% by volume of SiC of a grain size of 120 ju) and as a bonding matrix 17% by volume of a frit was sintered with an electrical sintering arrangement by passing an electric current of 3600 amperes through the mixture for a period of 30 minutes under an initial pressure of 10 kg/cm2 for a period of 20 minutes at a temperature of 1 3000C. The sintered body was shaped into a wheel of an outer diameter of 100 mm and a thickness of 10 mm. the wheel has a specific resistivity of 0.5 Qcm uniform throughout the entire body and was found to be excellent for both electrochemical and mechanical capabilities and to yield, without clogging, an extremely high operational stability. The frit used as the bonding matrix contained, by weight, 3.8 parts of Na20, 5.8 parts of K20, 2.5 parts of MgO, 3.5 parts of
CaO, 8.6 parts of B20, 31.5 parts of Al2O3,41.9 parts of SiO2, 5.9 parts of PbO, 3.6 parts of feldspar, 19 parts of clay, 1 7 parts of iron oxide and 26 parts of zinc white.
Example II
The wheel prepared in Example I was used for electrochemically grinding a workpiece of WC-6%
Co with an electrolyte consisting of an aqueous solution of 1 5% NaNo3 and using a machining current of 2 amperes. The wheel was rotated at 1000 rpm and the workpiece was urged against the rotating wheel at a force of 500 grams. The material removal proceeded at a rate of 30 mg/min and the workpiece had a machined surface roughness of 3 yRmax. For comparison, it should be noted that the material-removal rate and the surface roughness with a conventional copper-electroplated wheel were 10 mg/min and 5 juRmax, respectively.
In the subsequent purely mechanical operation wherein the machining current was cut off and the same rotating wheel continued to be in engagement, the workpiece was machined at a removal rate of 8 mg/min.
Example Ill
A matrix of the same composition as in
Example I was electrically sintered with the initial pressure of 10 kg/cm2 continued throughout an entire period of 10 minutes of the sintering operation. The resulting wheel has a specific resistivity of 1.3 Qcm and showed excellent machining performance similar to that in Example
II.
Example IV
The proportions of the mixture of Example I were modified to include by volume 45% TiC, 10% TiN,30% SiC and 15% the frit The mixture was sintered in the same manner of Example Ill and the resulting wheel had a specific resistivity of 2.6 Qcm and showed similar excellent machining performance.
Example V
A mixture containing by volume 40% Ti B2, 10% TiN,30% SiC and 20% the frit was electrically sintered using an initial pressure of 10 kg/cm2 and a sintering current of 3200 amperes passed over a period of 30 minutes. When the temperature reached 12000 C, a final compaction pressure of 80 kg/cm2 was applied to the body for a period of 20 minutes. The resulting wheel had a specific resistivity of 2.8 Qcm and showed excellent machining performance.
The invention also provides an improved electrode body for electrochemical grinding, consisting essentially of electrically conductive abrasive grains bonded together with an essentially electrically nonconductive bonding matrix, the abrasive grains being admixed with an amount, preferably of 10 to 25% by volume, of the bonding matrix and sintered together to form the homogeneous electrode body having a specific resistivity not greater than 100 ohm-cm, preferably between 0.1 and 10 ohm-cm.The individual electrically conductive abrasive grains may essentially consist of a substance selected from the group consisting of a carbide, nitride and/or boride of titanium and hafnium and which may be TiC, TiB2,TiN, HfC, Ti BC, TiCN, TiHfC, (TiB2)C, (TiB2)N, TiCB4C, TiNB4C, TiCB13C2, TiNBr3C2, TiCWC, B4CWC and/or B4CSiC.
Thus, for example, TiC has a specific resistivity of 70 to 170,uQcm, TiB about 40 ssQcm, TiB2 6 to 20 ssQcm, TiN 20 to 130 yQcm, HfC 60,uQcm, HfB2 about 40 uQcm, TiB2C about 120 juQcm, TiB2N 260 MQcm, TiCN 300 MQcm and TiHfC 40 to 50,uQcm. These materials have also favorable values of hardness and crushing strength. Thus, for example, TiC has a crushing strength of 2900 to 3200 kg/mm2, TiB 2700 to 2800 kg/mm2, TiB2 3300 to 3450 kg/mm2, HfC 2500 to 3200
Kg/mm2, HfC 2500 to 3200 Kgjmm2 and HfB2 2500 to 3500 kg/mm2.TiN has a relatively low crushing strength of 1800 to 2100 kg/mm2 and such conductive abrasive materials may be used together with hard abrasive materials of less conductivity such as B4C (2400 to 3700 kg/mm2),
SiC (3000 to 3500 kg/mm2), CBN and diamond.
The bonding matrix may be a phenol resin, urea resin, vinylidene resin or the like resin and may also be a ceramic (glassy) or a rubber.
The porosity of the electrode body is required to provide desired chip pockets therein and should be in a range between 20 to 40%.
The particle size of the electrically conductive abrasive particles should preferably be 8000 to 500 meshes. The grain size of the electrically conductive abrasive grains formed from these particles bonded with the bonding medium such as a synthetic resin or glassy ceramic should preferably be 200 to 10 meshes. These grains may be sintered together with the bonding matrix to provide an electrode body of a porosity of 20 to 40%.
Example VI
A mixture containing by volume 33% TiC of 10 #, 25% TiN of 10 #, 30% SiC of 7 # and 12% a frit was sinter-bonded and crushed to form grains of a grain size of 140 0u. Then, a mixture containing by volume 83% the grains and 17% a frit was electrically sintered using an initial pressure of 10 kg/cm2 and a sintering current of 3600 amperes applied for a period of 30 minutes.
After a temperature of 1 3000C was reached, a final compaction pressure of 70 kg/cm2 was applied to the body for a period of 20 minutes.
The sintered body was shaped into a wheel of an outer diameter of 100 mm and a thickness of 10 mm. It was found that the wheel was homogeneous with chip pockets uniformly distributed over the entire body, had a specific resistivity of 0.5 Qcm and showed excellent electrochemical grinding performance. The frit contained 3.8 parts Na2O, 5.8 parts K2O,2.5 parts MgO, 3.5 parts CaO, 8.6 parts B2O,31.5 parts
Al2O3, 41.9 parts Six,, 5.9 parts PbO, 3.6 parts of feldspar, 1 9 parts of clay, 1 7 parts of iron oxides and 26 parts of zinc white.
Example VII
Using the wheel prepared in Example VI, a workpiece composed of S55C material and having a Rockwell hardness Rc65 was mechanically ground. The wheel was rotated at 1000 rpm and the workpiece was urged at a pressure of 1.5 to 2 kg/cm2against the rotating wheel while a table carrying the workpiece was fed at a rate of 0.2 mm/min. It was found that the removal rate was 8 mg/min.
Example VIII
With the wheel prepared in Example VI, the same workpiece of Example VII was electrochemically ground using a 15% NaNO3 aqueous solution and a machining current of 2 amperes. The removal rate was 30 mg/min, and the surface roughness 1.5 yRmax. There was observed no wavy formation on the machined workpiece surface.
Example IX
A mixture containing by volume 33% TiC of 140 , TiN of 140 140,u0,30% 30% SiC of 150 and 17% the frit was used as a starting material of Example VI and a wheel was prepared therefrom in a similar manner described therein.
Similar machining performance described in that
Example was found to be obtained.
The invention also provides an improved method of electrochemically grinding an electrically conductive workpiece with a rotating wheel constituted by an electrode body as hereinbefore described. In the improved method, the workpiece is repetitively displaced transversely to the rotating wheel electrode along a straight relative path and the depth of cut in each of the successive runs repeated is set at a value not greater than 5 micrometers.
Fig. 1 shows an electrochemical grinding apparatus for performing the improved method. A worktable 1 is displaced by a feed drive 2, e.g. a hydraulic cylinder drive arrangement, in a horizontal plane. A workpiece 3 is securely mounted on the worktable 1. A rotary wheel 4 constituted favorably by an electrode body as hereinbefore described is secured on a shaft 5 rotated by a rotary drive 9. The shaft 5 is also arranged to be displaceable vertically to set a vertical position of the wheel electrode 4 relative to the workpiece 3. A vertical feed drive to this end is therefore provided although not shown. A power supply 6 is connected on one hand to the workpiece 3 via the worktable 1 and on the other hand to the wheel electrode 4 via a brush 7 to apply an electrochemical machining current between the wheel electrode 4 and the workpiece 3.The machining current is poled to make the workpiece 3 anodic and the wheel 4 cathodic, and is preferably in the form of a succession of pulses. A nozzle 8 delivers a liquid electrolyte on the surface of the wheel electrode 4. As the wheel 4 rotates, the electrolyte is entrained thereon and supplied to the grinding interface formed between the wheel 4 and the workpiece 3. A control unit 10 is provided to control the feed rate of the table drive 2 so as to maintain the wattage (power) of the wheel rotary drive 9 substantially constant.
In operation, the workpiece 3 is located transversely relative to the wheel electrode 4 in a relative vertical position adjusted so as to give a depth of cut G, this being achieved by the vertical feed drive for the wheel electrode 4. Then the liquid electrolyte is supplied from the nozzle 8 to the wheel electrode 4 which is rotated by the rotary drive 9. The machining current is delivered from the power supply 6 to pass between the workpiece 3 and the rotating wheel electrode 4.
Then, the worktable 1 is displaced by the horizontal feed drive 2 to bring the workpiece 3 into an electrochemical grinding relationship with the rotating wheel 4. Material removal from the workpiece 3 is produced by a combination of electrolytic solubilization caused through the electrolyte and mechanical abrading action by abrasive grains projecting from the surface of the wheel 4, possibly also due to micro-discharges which may develop uniformly throughout the electrode interface. The control unit 10 acts on the horizontal feed drive 2 to maintain the drive power of the spindle 5 driven by the rotary drive substantially constant.
The depth of cut G effected by the rotary wheel 4 in the workpiece 3 in a single run of the horizontal displacement is set, in accordance with the present invention, to be not greater 5 microns.
By iimiting the cut depth G to be so small, it is possible to minimize the spindle drive power, hence the wattage required for the motor 9 in rotating the wheel 4. Consequently, the rate of grinding feed effected by the feed drive 2 while maintaining the spindle drive power at a predetermined minimum can markedly be enhanced. Fig. 2 shows a graph plotting the ratio of the spindle drive power/the wheel diameter along the ordinate, and the grinding feed rate along the abscissa, the curves therein showing the relationship for the varying depths of cut indicated. It is seen that, for example, with the ratio being 1, a cut of depth of 1 ym yielded a grinding feed rate of 10 m/min, while a cut of depth of 4 to 5 Hm yielded a grinding feed rate of
1 m/min.
The increase in the feed rate means a quicker displacement of the working zone in the workpiece. As a result, the electrolytic decomposition products are carried away and replaced by a freshel ectrolyte at an increased facility in the grinding interface. An extremely high concentration of ions is thus furnished and the machining current allowed to be delivered at an increased density through the interface, so that the electrolytic contribution to material removal is greatly augmented enough to minimize the mechanical wear of the wheel electrode. Thus, since both the increase in electrochemical material removal and the reduction in mechanical wheel wear are attained, the grinding ratio (the amount of workpiece material removal divided by the amount of wheel wear) is markedly increased.
From Fig. 2, it can be seen that there occurs a sharp reduction in the grinding feed rate when the depth of cut exceeds 5 ,um. For example, with the depth of cut increased to 20 um, it is shown that the grinding feed rate is reduced to nearly 10 cm/min,
Example X
A wheel prepared in Example I is used for electrochemically grinding an Fe/Cr/Co magnetic alloy material. The electrolyte used is an aqueous solution of 10% by weight NaNo3 and the machining current is passed at a current density of 0.6 ampere/mm2.The following relationship between the grinding ratio and the depth of cut is observed:
Depth of Cut Grinding Ratio
0.5 45
1.0 42
3.0 26
5.0 22
10.0 18
25.0 14
The apparatus shown in Fig. 3 in which the same numerals are used to designate the same parts or components as in Fig. 1 includes means for sensing the wear of the wheel electrode 4 to allow the workpiece 3 to be electrochemically ground and finished with a highest degree of precision. In this arrangement, the power supply 6 of DC output is connected to the workpiece 3 and the wheel electrode 4 via a switch 11 which may be a transistor or a bank of transistors to provide across the machining interface a succession of electrochemical grinding current pulses.
A monitoring power supply 12 of DC output is also connected to the workpiece 3 and the wheel electrode 4 via a switch 1 3 which may again be a transistor or a bank or transistors and a sensing resistor 14 connected in series. The switches 11 and 1 3 are turned on alternately by a common signal source 15 which may be a free-running multivibrator. Thus, only when the switch 11 is in the off state or the machining pulse is off, the switch 13 is turned on and the output of the monitoring power supply is effective across the machining interface; then a monitoring pulse is applied to the machining interface.
A discriminator circuit 16, e.g. a Schmitttrigger circuit, is connected to the sensing resistor 14 to discriminate the sensing voltage developed thereat proportionally in magnitude to the gap resistance in the monitoring period secured by the monitoring pulse between the workpiece 3 and the wheel electrode 4. The discriminator circuit 1 6 has an output connected to a control circuit 1 7 designed to act on a vertical feed drive 18 for adjusting the vertical position of the workpiece 3 relative to the rotating wheel electrode 4.
The voltage developed at the sensing resistor 14 represents the contact resistance between the workpiece 3 and the wheel electrode 4 and hence generally the wear of the wheel electrode 4. The discriminator 1 6 has a predetermined threshold value preset therein. Thus, when the wear signal at the sensing resistor 14 exceeds the threshold value, the discriminator 1 6 is operated to furnish a control signal to the control circuit 17. The latter is then actuated to operate the vertical drive 18 to control the vertical position of the workpiece 3 relative to the wheel electrode 4 or the cutting depth G. The control circuit 1 7 may incorporate a counter for accumulating the output signals of the discriminator 1 6 which are developed in the form of pulses and may operate the vertical drive 18 when the accumulated signal pulses reach a preselected number.
There is thus provided, in accordance with the present invention, an improved electrochemical grinding electrode body as well as an improved method of and apparatus for electrochemically grinding an electrically conductive workpiece with a wheel electrode advantageously constituted by the improved electrode body.
Claims (28)
1. An electrochemical grinding electrode body essentially consisting of electrically conductive abrasive grains bonded together with an essentially electrically nonconductive bonding matrix, said abrasive grains being admixed with an amount of 10 to 30% by volume of said bonding matrix and sintered together to form said electrode body having a specific resistivity not greater than 100 ohm-cm.
2. The electrode body defined in claim 1 wherein said amount is not greater than 25%.
3. The electrode body defined in claim 1 or claim 2 wherein said specific resistivity is between 0.1 to 10 ohm-cm.
4. The electrode body defined in any preceding claim, having a porosity of 10 to 40% by volume.
5. The electrode body defined in claim 4 wherein said porosity is not greater than 25% by volume.
6. The electrode body defined in any preceding claim wherein said individual grains essentially consist of a substance selected from the group which consists of carbides, nitrides and borides of titanium and hafnium.
7. The electrode body defined in claim 6 wherein said substance is selected from the group consisting of TiC, TiB2,TiN, Hf C, TiBC, TiCN,
TiHfC, (TiB2)C, (TiB2)N, TiCB4C, TiNB4C, TiCB13C2,
TiNB,3C2, TiCWC,B4CWCandB4CSiC.
8. The electrode body defined in any preceding claim wherein said bonding matrix is of a substance selected from the group which consists of a resin, ceramic, frit and rubber.
9. The electrode body defined in any preceding claim, further containing electrically nonconductive abrasive grains.
10. The electrode body defined in claim 9 wherein said electrically nonconductive abrasive grains are of a substance selected from the group consisting of diamond, boron carbides and boron nitrides.
11. The electrode body defined in any preceding claim, further containing essentially non-abrasive electrically conductive particles.
12. The electrode body defined in claim 11 wherein said particles are of a substance selected from the group consistsing of a metal and carbon.
13. The electrode body defined in any preceding claim wherein said electrically conductive abrasive grains are of a grain size in the range between 10 and 200 meshes.
14. The electrode body defined in claim 13 wherein said electrically conductive abrasive grains are prepared by bonding electrically conductive abrasive particles of a particle size in the range between 500 and 8000 meshes with an essentially electrically nonconductive bonding medium.
15. The electrode body defined in claim 14 wherein said individual particles essentially consist of a substance selected from the group which consists of carbides, nitrides and borides of titanium and hafnium.
1 6. The electrode body defined in claim 15 wherein said substance is selected from the group consisting of TiC, TiB2, TiN, HfC, TiBCt TiCN,
TiHfC, (TiB2)C, (TiB2)N, TiCB4C, TiNB4C, TiCB13C TiNB13C2,TiCWC, B4CWC and B4CSiC.
1 7. The electrode body defined in any one of the claims 14 to 16 wherein said bonding medium is of a substance selected from the group which consists of a resin, ceramic, frit and rubber.
18. A method of electrochemically grinding an electrically conductive workpiece with a rotating wheel electrode constituted by an electrode body as defined in any preceding claim wherein an electrochemical grinding current is passed between the workpiece and the rotating wheel electrode through a grinding interface flushed with a liquid electrolyte, the method comprising: causing the workpiece to traverse the rotating wheel electrode along a predetermined rectilinear path repeatedly and over successive runs; in each run, setting the depth of cut by the rotating wheel electrode in the workpiece as determined by the position of the workpiece traversing the rotating wheel electrode along said path to be not greater than 5 micrometers; and repeating said each run to complete said successive runs whereby to cumulatively achieve a desired depth of cut in the workpiece.
1 9. The method defined in claim 18 wherein said electrochemical grinding current is passed in the form of a succession of electrical pulses.
20. The method defined in claim 19, further comprising: applying a monitoring pulse during at least a portion of the off-time of said electrochemical grinding current pulses across said grinding interface and sensing an electrical magnitude of said grinding interface resulting from said monitoring pulse, thereby determining the wear of said wheel electrode.
21. An apparatus for electrochemically grinding an electrically conductive workpiece with a rotating wheel electrode constituted by an electrode body defined in claim 1, including a power supply for passing an electrochemical grinding current through a grinding interface defined between the workpiece and the rotating wheel electrode and flushed with a liquid electrolyte, drive means for causing the workpiece to traverse the rotating wheel electrode along a predetermined rectilinear path repeatedly and over a predetermined a number of successive runs, positioning means for locating, in each of said successive runs, the position of the workpiece traversing the rotating wheel electrode along said path so as to set the depth of cut by the rotating wheel electrode in the workpiece to be not greater than 5 micrometers, and control means for permitting said each run to be repeated to complete said predetermined number of the successive runs whereby to cumulatively achieve a desired depth of cut in the workpiece.
22. The apparatus defined in claim 21 further comprising: means associated with said machining power supply for intermittently cutting off said electrochemical grinding current, an auxiliary power supply for applying across said grinding interface a monitoring pulse during at least a portion of the off-time of said electrochemical grinding current, and means for sensing an electrical magnitude of said grinding interface resulting from the application of said monitoring pulse, thereby determining the wear of said wheel electrode.
23. An electrode body according to any one of the claims 1 to 17, substantially as hereinbefore described.
24. An electrode body substantially as hereinbefore described in any one of the examples Ill, IV, V, VI and IX.
25. A method of electrochemically grinding an electrically conductive workpiece according to any one of the claims 18 to 20, substantially as hereinbefore described, or as hereinbefore described with reference to the accompanying drawings.
26. A method of electrochemically grinding an electrically conductive workpiece, substantially as hereinbefore described in any one of the examples
II, VII, and VIII.
27. An apparatus for electrochemically grinding an electrically conductive workpiece, according to claim 21 or 22, substantially as hereinbefore described with reference to, and as illustrated by the accompanying drawings.
28. A workpiece having a surface electrochemically ground by a method according to any one of the claims 18 to 20, 25 and 26, or by means of an apparatus according to any one of the claims 21, 22 and 27, or by means of an electrode body according to any one of the claims 1 to 17,23and24.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2195480A JPS56119319A (en) | 1980-02-22 | 1980-02-22 | Grinding method |
| JP2357380A JPS56119320A (en) | 1980-02-26 | 1980-02-26 | Wastage detector for grinding wheel electrode of electrolytic grinding apparatus |
| JP14151880A JPS5952919B2 (en) | 1980-10-08 | 1980-10-08 | electrolytic grinding wheel |
| JP14847180A JPS5771774A (en) | 1980-10-22 | 1980-10-22 | Manufacture of grindstone |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| GB2070064A true GB2070064A (en) | 1981-09-03 |
| GB2070064B GB2070064B (en) | 1983-12-14 |
Family
ID=27457663
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB8105471A Expired GB2070064B (en) | 1980-02-22 | 1981-02-20 | Electrochemical grinding electrode |
Country Status (4)
| Country | Link |
|---|---|
| DE (1) | DE3106639A1 (en) |
| FR (1) | FR2476522B1 (en) |
| GB (1) | GB2070064B (en) |
| IT (1) | IT1209845B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58114857A (en) * | 1981-12-26 | 1983-07-08 | Inoue Japax Res Inc | Surface grinding method |
| JPS58223564A (en) * | 1982-05-10 | 1983-12-26 | Toshiba Corp | Whetstone and method for manufacture thereof |
| JPH0343144A (en) * | 1989-07-06 | 1991-02-25 | Olympus Optical Co Ltd | Method and device for grinding lens |
| JPH085011B2 (en) * | 1989-07-10 | 1996-01-24 | オリンパス光学工業株式会社 | Grinding machine |
| DE4023730C2 (en) * | 1989-07-26 | 1993-11-11 | Olympus Optical Co | Method and device for processing optical components |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB763109A (en) * | 1953-05-19 | 1956-12-05 | Boart Products South Africa Lt | Improvements in dressing abrasive tools by electric means |
| GB1149682A (en) * | 1966-08-12 | 1969-04-23 | Hammond Machinery Builders Inc | An abrasive device for use in an electro-chemical grinding procedure |
| GB1227793A (en) * | 1968-04-11 | 1971-04-07 | ||
| US3694340A (en) * | 1969-12-08 | 1972-09-26 | Toyoda Machine Works Ltd | Electrolytic grinding machine |
| JPS5143289A (en) * | 1974-10-09 | 1976-04-13 | Inoue Japax Res | DENKAIKENSAKUYOTOISHINO SEIKEIHOHO |
-
1981
- 1981-02-20 GB GB8105471A patent/GB2070064B/en not_active Expired
- 1981-02-23 FR FR8103556A patent/FR2476522B1/en not_active Expired
- 1981-02-23 IT IT8147869A patent/IT1209845B/en active
- 1981-02-23 DE DE19813106639 patent/DE3106639A1/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| IT8147869A0 (en) | 1981-02-23 |
| FR2476522B1 (en) | 1986-01-24 |
| FR2476522A1 (en) | 1981-08-28 |
| DE3106639A1 (en) | 1982-01-14 |
| GB2070064B (en) | 1983-12-14 |
| IT1209845B (en) | 1989-08-30 |
| DE3106639C2 (en) | 1988-12-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19950220 |