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GB2044533B - Semiconductor device and method of manufactguring same - Google Patents

Semiconductor device and method of manufactguring same

Info

Publication number
GB2044533B
GB2044533B GB8007004A GB8007004A GB2044533B GB 2044533 B GB2044533 B GB 2044533B GB 8007004 A GB8007004 A GB 8007004A GB 8007004 A GB8007004 A GB 8007004A GB 2044533 B GB2044533 B GB 2044533B
Authority
GB
United Kingdom
Prior art keywords
manufactguring
same
semiconductor device
semiconductor
manufactguring same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8007004A
Other versions
GB2044533A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Publication of GB2044533A publication Critical patent/GB2044533A/en
Application granted granted Critical
Publication of GB2044533B publication Critical patent/GB2044533B/en
Expired legal-status Critical Current

Links

Classifications

    • H10P14/6923—
    • H10P14/662—
    • H10P14/69433—
    • H10P95/00—
    • H10W20/092—
    • H10P14/6334—
    • H10P14/6682—
GB8007004A 1979-03-05 1980-02-29 Semiconductor device and method of manufactguring same Expired GB2044533B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US1710079A 1979-03-05 1979-03-05

Publications (2)

Publication Number Publication Date
GB2044533A GB2044533A (en) 1980-10-15
GB2044533B true GB2044533B (en) 1983-12-14

Family

ID=21780714

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8007004A Expired GB2044533B (en) 1979-03-05 1980-02-29 Semiconductor device and method of manufactguring same

Country Status (7)

Country Link
JP (1) JPS55121669A (en)
DE (1) DE3007500A1 (en)
FR (1) FR2451103A1 (en)
GB (1) GB2044533B (en)
IT (1) IT1140645B (en)
NL (1) NL8001310A (en)
YU (1) YU61180A (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4542037A (en) * 1980-04-28 1985-09-17 Fairchild Camera And Instrument Corporation Laser induced flow of glass bonded materials
CA1174285A (en) * 1980-04-28 1984-09-11 Michelangelo Delfino Laser induced flow of integrated circuit structure materials
JPS581878A (en) * 1981-06-26 1983-01-07 Fujitsu Ltd Production of bubble memory device
DE3130666A1 (en) * 1981-08-03 1983-02-17 Siemens AG, 1000 Berlin und 8000 München Method for fabricating integrated MOS field effect transistors having a phosphosilicate glass layer as an intermediary oxide layer
DE3131050A1 (en) * 1981-08-05 1983-02-24 Siemens AG, 1000 Berlin und 8000 München Process for fabricating integrated MOS field effect transistors, employing a surface layer consisting of phosphosilicate glass on the intermediary oxide between polysilicon plane and metal conductor track plane
DE3133516A1 (en) * 1981-08-25 1983-03-17 Siemens AG, 1000 Berlin und 8000 München Process for rounding the intermediary oxide between the polysilicon plane and metal conductor track plane when fabricating integrated n-type channel MOS field-effect transistors
JPS5898934A (en) * 1981-12-08 1983-06-13 Matsushita Electronics Corp Manufacture of semiconductor device
US4686000A (en) * 1985-04-02 1987-08-11 Heath Barbara A Self-aligned contact process
JPH088246A (en) * 1994-06-21 1996-01-12 Nippon Motorola Ltd Method for forming metal wiring of semiconductor device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3627598A (en) * 1970-02-05 1971-12-14 Fairchild Camera Instr Co Nitride passivation of mesa transistors by phosphovapox lifting
US3917495A (en) * 1970-06-01 1975-11-04 Gen Electric Method of making improved planar devices including oxide-nitride composite layer
US3943621A (en) * 1974-03-25 1976-03-16 General Electric Company Semiconductor device and method of manufacture therefor
US4005240A (en) * 1975-03-10 1977-01-25 Aeronutronic Ford Corporation Germanium device passivation
US4273805A (en) * 1978-06-19 1981-06-16 Rca Corporation Passivating composite for a semiconductor device comprising a silicon nitride (Si1 3N4) layer and phosphosilicate glass (PSG) layer

Also Published As

Publication number Publication date
GB2044533A (en) 1980-10-15
DE3007500A1 (en) 1980-09-18
NL8001310A (en) 1980-09-09
IT1140645B (en) 1986-10-01
FR2451103A1 (en) 1980-10-03
IT8020023A1 (en) 1981-08-19
IT8020023A0 (en) 1980-02-19
YU61180A (en) 1983-02-28
JPS55121669A (en) 1980-09-18

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee