GB1602011A - Method and apparatus for producing and selectively directing x-rays to different points on an object - Google Patents

Description

(54) METHOD AND APPARATUS FOR PRODUCING AND SELECTIVELY DIRECTING X-RAYS TO DIFFERENT POINTS ON AN OBJECT (71) I, JACOB HAIMSON, an Australian citizen, of 400B Ortega 318, Mountain View, California 94040, United States of America, do hereby declare that the invention for which we pray that a patent may be granted to us and the method by which it is to be performed to be particularly described in and by the following statement:- This invention relates generally to apparatus and a method for generating and directing high intensity x-rays. More particularly, it relates to apparatus for producing and directing such high intensity x-rays to an object of interest from any of a plurality of preselected joints spaced from that object. More specifically, the invention relates to apparatus which is suitable for use in a computer tomography (CT) x-ray scanner.

Conventional high intensity x-ray scanning equipment, such as is used in conventional computer tomography scanners currently available, generally incorporate one or more x-ray sources and detectors which are mechanically rotated together about an axis generally extending horizontally through the apparatus and through the object of interest. However, since the x-ray producing and detecting apparatus which must be rotated is relatively large and heavy with the source and the detecting apparatus being spaced generally several feet apart, the accelerating, centrifugal, and braking forces which must be exerted to rotate and stop the apparatus for rapid and accurate repositioning at numerous points are necessarily great and apply large stresses to both the cathode and the target assemblies of the x-ray generating tube.

A possible approach to take to obtain further performance improvements in scan speed while avoiding these inertial limitations is through the use of an electronically scanned system which has no moving parts to present such limitations.

However, the physical properties of an electron beam suitable for the production of such x-rays, and the interaction of such a beam with the scanning elements present a number of problems which heretofor have defied solution and have impeded the development of an operable no-moving-part x-ray scanner of sufficient power to be useful, especially for computer tomography applications. The primary problems encountered have been those imposed upon focal source geometry by the space charge forces of the electron beam used to produce the x-rays and the field aberrations introduced into the beam by the beam deflecting elements.

For a high current, high voltage x-ray scanner incorporating an annular or ring target with an electron beam deflected to that target from an initial trajectory along the axis of the ring analysis shows that the concept of simply deflecting the electron beam the distances necessary for practical purposes will cause undesirable aberrations, largely relating to the spreading of the beam due to space charge defocusing forces.

Conventional focussing techniques would require an undesirably large drift space housing. Additionally, conventional focusing techniques would substantially aggravate beam aberration affects imposed on the beam by the necessary deflecting elements. Conventional practice has called for the user of a simple axial magnetic field to enable the beam cross-section to be controlled by compensating for the divergence caused by the space charge forces. However, the use of conventional extended solenoid coils located outside the vacuum chamber to create such a field would cause the electron beam to strike the target with large azimuthal velocity components (circumferential to the ring target), resulting in a substantial loss of xray intensity for a given electron beam energy.

Even if the various aberration affects caused by the deflection elements and the defocusing forces could be individually neutralized for a given position on the target (i.e., a specific deflection field configuration), the other azimuthal locations of the focal source, which require different deflection field configurations, would interact with the imperfect entry beam in a non-linear fashion to produce space- and time-dependent aberrations at the focal source. The degree of difficulty in overcoming these focal source distortions is increased even further by the need for designing an x-ray scanner for a CT system in which the electron beam can be switched rapidly, in microsystems, between widely spaced points on the target.

In view of the foregoing requirements it is an object of the present invention to provide a high power X-ray scanning apparatus having no moving parts. It is a further object of the invention to have such an apparatus which is designed specifically to minimize the restrictions imposed upon focal source geometry by space charge forces and field aberrations. It is a further object of the invention to provide such an apparatus which enables a high power electron beam to be deflected over long distances and directed onto a target circumscribing the axis of an object of interest. It is yet another object of the invention to provide such an apparatus which has a narrow focal source and allows a plurality of X-ray beams to be directed inward from a series of predetermined azimuthal positions around the periphery of such an annular target. It is yet a further object of this invention to provide a method of producing and directing such X-rays with nonmechanical scanning.

To achieve the above objects and others, the invention provides apparatus for producing high intensity X-rays and directing such X-rays toward an object of interest from any of a plurality of preselected coplanar points spaced from that object and spaced radially about a line extending through that object, said apparatus having no moving parts and comprising means producing a high voltage, high current electron beam, stationary target means encompassing said coplanar points which receives said electron beam and produces X-rays as a consequence of the impact of the beam, said target means directing said X-ray toward said object of interest, an evacuated housing containing said beam producing means adjacent one end and said target means adjacent the opposite end, means for directing the electron beam selectively to preselected said points on the target means, said directing means including beam-directing means for compensating said beam for the beam spreading effect of space charge forces acting on the beam, and beam shaping means for shaping said beam to a predetermined cross-sectional configuration at its points of incidence upon said target, said beam shaping means including beam shaping means for correcting beam aberrations, including sextupole aberrations, introduced by the beam directing means and by beam shaping means other than beam shaping means which corrects said beam aberrations.

Additionally, the invention provides a method of operating the apparatus of Claim 1 so as to produce high intensity X-rays which are directed towards an object of interest from a fixed target means arranged in an annul us spaced radially from a line extending through that object, which method comprises producing a high current electron beam directed towards said object of interest along a longitudinal axis generally parallel with said line through the object, selectively directing the electron beam to preselected points on the target means, and compensating for beam spreading space charge forces acting on the beam by selectively energising said beamdirecting means; and shaping the electron beam to said predetermined cross-sectional configuration at its points of incidence upon the target means, and correcting said beam aberrations, including sextupole operations, by selectively energising said beam shaping means.

Brief Description of the Drawings Figure 1 is a side sectional view of the one embodiment of the x-ray producing and directing apparatus of this invention; Figure la is a fragmentary side sectional view of a variation of the apparatus of Figure 1 with a beam collector mounted off the longitudinal axis: Figure 2 is a schematic, perspective plan view of the basic elements of the apparatus of Figure 1, illustrating the trajectory of an electron beam therethrough: Figure 3 is a schematic front perspective view illustrating the path of the beam of Figure 2 between the dipole assemblies and the target; Figure 4 is a front view, partially in section, of the apparatus of Figure 1: Figure 5 is a sectional view illustrating the multipole winding assembly of the apparatus of Figure 1, taken along line 5-5; Figure 6 is a sectional view of the multipole winding assembly of the apparatus of Figure 1, taken along line 6-6; Figure 7 is a sectional view illustrating the dipole assemblies of the apparatus of Figure 1, taken along line 7-7; Figure 8 is a sectional view, at an enlarged scale, of the target and collimating structure of the apparatus of Figure 4, taken along line 8-8; Figure 9 is a sectional view of a variation of the apparatus of Figure 8; Figure 10 is a sectional view of the apparatus of Figure 8, taken along line 10- 10; Figures 1 la-I le illustrate the effects upon the electron beam cross-section shape and orientation of the quadrupole assemblies of Figure l; Figures 12a-12e illustrate the effects upon the electron beam cross-section shape and orientation of the sextupole assemblies of Figure 1: Figure 13 is a side sectional view of a second preferred embodiment of the X-ray producing and directing apparatus of this invention; Figure 14 is a schematic, perspective plan view of the basic elements the apparatus of Figure 13, illustrating the trajectory of an electron beam therethrough; Figure 15 is a front view, partially in section, of the apparatus of Figure 13; Figure 16 is a sectional view, at an enlarged scale, of the target and beam collector structure of the apparatus of Figure 15 taken along line 16-16; Figure 17 is a sectional view of the apparatus of Figure 16 taken along line 1717; Figure 18 is a sectional view of a variation of the apparatus of Figures 16 and 17: Figure 19 is a side sectional view, corresponding to Figure 16, of another variation of the apparatus of Figure 16; Figure 20 is a side sectional view of another variation of the apparatus of Figure 16 in which the target includes alternating lands and recesses; Figure 21 is a sectional view of the apparatus of Figure 20 taken along line 2121; and Figure 22 is a side sectional view of a portion of the apparatus of Figure 16 illustrating the insertion of one of the beam sensors.

One preferred embodiment of the X-ray producing and directing apparatus of this invention is illustrated in the side sectional view of Figure 1 with its principal active components illustrated in the schematic perspective plan view of Figure 2. In this embodiment of the invention the basic components comprise an electron gun 2 for producing a high voltage, high current electron beam 3, an electromagnetic preliminary focussing coil 4, a multipole winding assembly 6 for shaping the beam and correcting for aberrations therein, a pair of electromagnetic field dipole assemblies 8 and 10 for deflecting the electron beam off the longitudinal axis, a target 16 for receiving the electron beam and producing X-rays therefrom, a pair of electromagnetic directing and focussing coils 12 and 14 for directing and focussing the electron beam on the target, and an evacuated housing 18 containing the foregoing elements with the electron gun adjacent one end and the target adjacent the opposite end. The electron gun is generally aligned along the longitudinal axis of the apparatus, Z-Z, which is illustrated as being substantially horizontal. Beam deflecting dipole assemblies 8 and 10 along with the directing and focussing coils 12 and 14 comprise the main electron beam directing means, and the preliminary focussing coil 4 and multipole winding assembly 6, described below, comprise the main beam shaping means.

The general manner of operation of this apparatus is as follows: the electron beam 3 is produced by the low emittance, long focal length, high voltage electron gun 2, passes through the preliminary focussing coil assembly 4 and multipole winding assembly 6. The beam 3 then enters the deflection system comprising the dipoles 8 and 10, which impart a relatively high radial momentum to the beam and cause it to be deflected from the axis Z-Z as it enters the large annular vacuum chamber 18, shown in Figure 1. As the deflected electron beam 3 approaches the outer wall of the chamber 18, it enters the weak focussing field of the large diameter electromagnetic coil 12, to which a direct current is applied to create an electromagnetic field. The radial and axial electromagnetic field components of this electrically charged coil 12 interact respectively with the axial and radial velocity components of the electron beam to impart an azimuthal, or circular, velocity to the beam, thus causing the beam to rotate about the axis Z-Z, as shown in Figures 2 and 3. This azimuthal motion of the beam interacts with the coil 12 axial field components to produce forces which both provide focussing, due to the field gradient acting on different portions of the beam with differing force, and counteract the radial velocity imparted by the dipole assemblies 8 and 10. Suitable adjustment of the DC current level in the coil 12 enables the radial velocity of the beam to be reduced to a very low value when passing through this field. Thus, the beam continues to drift through the field of the coil 12 with essentially axial and azimuthal velocity components until it enters the weak focussing field of the second large diameter focussing coil 14. This second focussing coil 14 is energized with a direct current having a polarity in opposition to that of the coil 12.

Additionally, the magnitude of the electromagnetic field of coil 12 preferably is adjusted such that the net axial electromagnetic field component acting upon the electron beam is reduced to about zero at the plane of the target 16, which is illustrated as being in close proximity to coil 14 in Figure 1. By arranging for the axial component of the electromagnetic field to be reduced to zero in this manner, the azimuthal beam velocity components introduced by each of the opposing lenses 12 and 14 cancel one another so that the net azimuthal velocity of the electron beam reduced substantially to zero as it strikes the incident surface of the x-ray target 16.

In traversing the second focusing coil 14, in which the direction of both the azimuthal acceleration and the actual magnetic field are reversed with respect to that of coil 12, the beam 3 continues to experience a net focusing force due to the field gradient of that coil. Thus, the beam 3 is subject to a continual focusing force from the beginning of its trajectory upon entering the electromagnetic field of coil 12 until it strikes the x-ray target 16 located adjacent the end of the vacuum chamber 18. By suitable choice of the number of turns in each focussing coil 12 and 14, and by locating these shielded coil assemblies at optimum locations, it is possible to use a single, constant current power supply to energize both focusing coil assemblies 12 and 14 to provide for simple operation over a range of different electron beam energies.

Thus, the combined action of the two large diameter, opposing field electromagnetic focusing coils 12 and 14 thereby provide not only a means of eliminating the undesirable azimuthal velocity component of the beam at the target plane, but also a means of controlling beam spreading due to the space charge forces. This is of substantial advantage in such an x-ray scanning system, since use of conventional solenoid focusing causes the electron to be incident on the annular target with large components of azimuthal velocity, which results in loss of intensity of the x-rays directed radially.

toward the patient. Additionally, a highly stable azimuthal position of a point focal source, or a radially oriented line source, as illustrated in Figures 8, 9 and 10, on the target becomes much more difficult to achieve with azimuthal velocity at the target.

The electron gun 2 is preferably one having low emittance characteristics, such as described by this inventor in Recent Advances in High Voltage Electron Beam Injectors, IEEE Transactions on Nuclear Science, NS-22, June 1975, pages 1354- 57. Current is provided to this electron gun from a suitable high voltage power source (not shown) at the opposite end of cable 20.

As described in the above referenced paper, a fiber optics light link 22 may suitably be provided for pulsing the electron gun, in a manner to be described below.

Vacuum chamber 18, which is generally bell-shaped with internal and external walls defining the evacuated chamber, also includes an elongated generally cylindrical neck portion 19 extending between the dipole assemblies 8 and 10 and the gun 2.

The bell portion of the vacuum chamber is preferably formed of a non-magnetic material such as stainless steel, with the neck 19 preferably being formed of a suitable dielectric material, such as glass.

The electron gun 2 and the drift space between the electron gun and the dipole assemblies 8 and 10 are provided with Helmholtz compensating coils 24 and 26, and the bell-shaped housing 18 is provided with magnetic shielding 28 to avoid undesirable beam steering effects due to local magnetic anomalies and the earth's stray magnetic field. A suitable vacuum pump 30 is mounted in communication with the interior of the vacuum chamber 18 to maintain the desired vacuum.

Target 16, shown more clearly in the fragmentary sectional views of Figures 8, 9 and 10, is positioned within the vacuum chamber adjacent the outer end of that horizontal, bell-shaped chamber 18 and encompasses the coplanar points from which x-rays are to be directed at the patient or other objects of interest.

Preferably, this target is a continuous ringlike annular member having an interior chamber 36 connected to an inlet 38 and an outlet (not shown) for passage of a cooling fluid, such as water, therethrough, to remove the heat generated by the impingement of the electron beam upon the target. Preferably, the target assembly 16 is formed primarily of copper to facilitate the transfer of heat to such cooling fluid. By the use of this relatively large area, continuous, fixed target, the average power density of the electron beam on the target is relatively low despite the high intensity of the beam at its point of impingement, thus avoiding the difficulties presently encountered with increased beam power in conventional rotating target x-ray rubes. On the portion of the target facing the impinging electron beam 3, which is indicated by the generally horizontal broken lines in Figures 8 and 9, is a target inlay 40, preferably of tungsten, for receiving the electron beam 3 and producing the desired x-rays 41 (the broken line beam extending generally downwardly in Figures 8, 9 and 10) therefrom.

Figure 8 represents a fragment of the target assembly illustrated in Figures 1 and 2, in which the angle between the incoming electron beam 3 and the tungsten target inlay 40 is set to direct the x-rays toward the axis Z-Z slightly longitudinally outwardly of the cavity 42 defined by the inner wall 44 of the vacuum housing 18. Collimating elements, in the form of apertures 46 in a ring radially inward of the target 16, are aligned with the x-ray beam emerging from the target inlay 40. A suitable x-raytransmissive window 50 covers and seals the radially inner end of each collimating element 46 to maintain the integrity of the vacuum chamber 18. Figure 10, the sectional view taken along line 10--10 of Figure 8, illustrates the projected image 52, which is a very narrow, generally eliptical shape approaching a line projection, of the electron beam on the angled target inlay 40 such that the projected x-ray beam may be round or slightly oval in cross-section as it comes off the target inlay 40, and is directed toward respectively opposed detectors 48.

Figure 9 illustrates a minor modification to the target structure described above, in which the target 16 is angled such that the xray beam is directed radially inwardly normal to the longitudinal axis Z-Z of the apparatus of Figure 1. Of course, in the place of continuous ring target assembly 16, a plurality of discrete target elements encompassing the same coplanar points of impingement of electron beam, spaced radially about the axis Z-Z, could be substituted with equal operability.

Figure 2 provides a top or plan perspective view, partially in section, of the principal active elements of the apparatus of this invention. The shaded beam 3 extending from one end of the electron gun 2 to the target 16 represents the electron beam of this apparatus being directed to one of the preselected points about the target from which x-rays are desired to be produced. For clarity the vacuum chamber 18 and its neck 19 have been omitted from this view, with their general outlines only illustrated in phantom. This beam position is exactly the same as is illustrated in the partial front perspective view of Figure 3 and as illustrated by the heavy broken line in Figure 4. These illustrations illustrate the apparatus used for directing and shaping the electron beam and for correcting aberrations introduced by the various active elements and compensating for the effect of space charge.

The basic elements used for deflecting the beam are the two electromagnetic field dipole assemblies 8 and 10. While either the electric field or magnetic field dipoles could be employed for this purpose, the preferred embodiment is illustrated with magnetic field dipoles in the form of electrically energized coil assemblies. These electromagnetic dipole assemblies 8 and 10 are arranged such that their poles are oriented orthogonally with respect to one another and with respect to the direction of the electron beam, so that by independently controlling the strength of each dipole field the beam can be deflected in any desired direction from the axis Z-Z. In this embodiment the first dipole assembly 8 is oriented about the axis Z-Z such that it has a pole lying in a horizontally extending plane, which is defined as the dipole reference plane 11 in Figure 3.

While a magnetic dipole can readily be obtained by locating two uniformly wound coils on diametrically opposite sides of the beam, the investigation of the beam after it has been deflected by such a dipole field will reveal distinct distortions of the beam crosssection due to the presence of higher order field modes or inhomogeneities. The severity of these beam distortions depends upon a variety of factors, the most important of which are the geometry of the various coil windings, the angle of deflection and the drift distance from the exit plane of the dipole to the plane of the application of the beam (the target). The two most dominant field aberrations that can be expected after interaction with a strong dipole field are those due to the quadrupole and sextupole higher order fields.

Theoretical analyses, such as found in W.

R. Smythe, Static and Dynamic Electricity, (New York: McGraw-Hill, 1950), p. 279, on means of producing homogeneous field distributions for multi-mode magnets formed around a cylinder and having windings which are approximately parallel to the axis of the cylinder indicate that electrical current sheets of small metal radial thickness should be formed on the cylindrical surface according to the function I,=Io na cos 2 where L is the current surface density, n is the number of poles and a is the angular position of any portion of the coil from an antipole. In the preferred embodiment the beam directing dipole comprises two such cosine current distribution dipole assemblies 8 and 10, having poles which are orthogonal to one another as well as to the beam axis Z-Z. With this arrangement the electron beam can be deflected rapidly to any azimuthal location on the target 16 by applying the appropriate positive or negative ratio of drive currents, described below, to each of the two magnetic dipole assemblies 8 and 10. It may be noted that, for a given beam energy and current, the location of and the current applied to the large diameter coils 12 and 14 remain constant. It may also be noted that, by, energizing each dipole assembly with drive currents having sinusoidally time-dependent amplitudes phased in quadrature, the electron beam will be deflected in such a manner as to be caused to rotate around the target at an angular frequency (w=2nf) where f is the periodicity of the dipole deflector drive currents.

From the foregoing it may thus be seen that the dipole assemblies 8 and 10 each are formed from a pair of electromagnetic dipole coils 8a, 8b and 10a, 10b, respectively (shown in Figure 7). These coils are formed around the surface of rotation which comprises the flared neck of the vacuum chamber 18 where it joins the generally cylindrical neck 19. The windings of each of these coils are approximately parallel to the beam path along with the axis Z-Z and are formed according to the above function such that the current surface density of each portion of each of the dipole coils is proportional to the cosine of the angle, taken about the longitudinal axis Z-Z, between such coil portion and an antipole of the coil. These coils then make up the dipole assemblies 8 and 10 which are the primary deflecting elements (functioning in combination with coils 12 and 14) for directing the electron beam 3 to various points on target 16.

Even with extreme care in the design and manufacture of the special current distribution dipole assemblies 8 and 10, residual aberrations of an unacceptable magnitude may still be present due to fringe field effects and imperfections, such as asymmetric charge distributions, of the beam entering the dipole assemblies. To provide a flexible means of compensating for these undesirable residual effects, as well as a means of independently adjusting the cross-sectional configuration and orientation of the focal source at any azimuthal position on the target 16, a multiple winding assembly 6 is used in conjunction with the preliminary focusing coil 4. This assembly 6, which can be located on either side of the coil 4 but is shown between that coil 4 and the dipole assemblies 8 and 10, comprises two electromagnetic quadrupole assemblies 52 and 54 and two electromagnetic sextupole assemblies 56 and 58 formed around the neck 19 of the vacuum chamber as illustrated in Figures 1 and 2 and in the sectional views of Figures 5 and 6.

The two quadrupole assemblies 52 and 54 are preferably formed of four electromagnetic coils each, 52a, 52b, 52c, 52d, and 54a, 54b, 54c, and 54d, respectively, which are formed about a surface of rotation, preferably the neck 19 of the vacuum chamber surrounding the beam path. Each of these coils has windings which extend approximately parallel to the beam path and, as illustrated in Figures 5 and 6, subtend sequentially adjacent arcs of approximately equal magnitude and thus of approximately 90" about the neck 19 of the chamber. Each of the coil windings 52a-d and 54a-d are formed in a manner well known to those skilled in coil design such that the current surface density of each portion of each coil is proportional to the cosine of the angle between such coil portion and an antipole of the coil. As illustrated in Figures 5 and 6 the first quadrupole assembly 52 is oriented about the longitudinal axis of the apparatus such that one pole of this quadrupole assembly 52 lies in the generally horizontal plane previously defined as the dipole reference plane 11. The second quadrupole assembly 54, also as illustrated in Figures 5 and 6, is concentric with the first quadrupole assembly 52 and is angularly displaced 45" about the longitudinal axis Z-Z with respect to the first quadrupole assembly 52.

The cosine function desired of the current surface density when the current is applied to the quadrupole coils is obtained by jig winding the coils in a manner known to skilled coil designers such that each coil has very few layers of winding near the center of the coil with increasing numbers and thus thickness of windings outwardly of the center of the coil, as illustrated in the sectional view of Figure 6, thus effecting the desired cosine function design.

The sextupole aberration correcting electromagnetic coil assemblies 56 and 58 are also illustrated in Figure 5 and 6. Each of these electromagnetic sextupole coil assemblies preferably is formed from six electromagnetic coils formed about a surface of rotation, preferably on proportional in each position of the coil to the cosine of the angle between such coil portion and an antipole of the sextupole coil. As illustrated most clearly in Figure 6, the first sextupole coil assembly 56 is oriented about the apparatus longitudinal axis such that one pole of this first sextupole coil assembly lies generally in the same horizontal plane which was previously defined as being the dipole reference plane 11. The second sextupole coil assembly 58 is preferably concentric with the first sextupole assembly 56 and is angularly displaced 30 about the longitudinal axis with respect to the first sextupole coil assembly.

To explain the function of the multipole windings assembly 6, which comprises the various quadrupole and sextupole coil assemblies, reference is made to Table 1 below and the respective Figures llalle and Figures 12a--12e, which illustrate the effects of various combinations of quadrupole and sextupole fields on the cross-section of the projected electron beam 3, disregarding the influences of the dipole assemblies 8 and 10 and the coils 12 and 14 for the moment for simplicity of explanation. The Figures 1 la-I ie and 12a--12e illustrate the effects upon beam shapes and beam orientation of the indicated electromagnetic fields produced by quadrupole assemblies 52 and 54 and sextupole assemblies 56 and 58 when the specified electromagnetic field amplitude and phases are produced in each of those assemblies by the application of predetermined electrical current to those assemblies, as will be described in more detail below.

Field Amplitude and Phase Electron beam Cross-Section Shape and Orientation Quadrupole 52 Quadrupole 54 Zero Zero Fig. lla +Max, (n/2) Zero Fig. lib Zero, (7t) +Max, (7t/2) Fig. 1 Ic -Max, (3n/2) Zero,(7r) Fig. lid Zero, (27r) -Max, (342) Fig. lie Sextupole 56 Sextupole 58 Zero Zero Fig. 12a +Max, (42) Zero Fig. 12b Zero,( +Max,(7r/2) Fig. 12c -Max, (3rr/2) Zero Fig. 12d Zero, (2n) -Max (342) Fig. 12e From the table and the Figures 11 and 12, it may be seen that, with the second quadrupole 54 de-energized (zero field amplitude), as the field strength of the first quadrupole 52 is increased from zero to a given positive maximum value, an initially circular cross-section beam will be transformed into a generally elliptical crosssection with the major axis oriented at an angle 0=450 to a horizontal datum, suitably the horizontal plane defined as the dipole.

reference plane 11, as illustrated in Figure l lb. The ratio of the major axis to the minor axis of this elliptical shape is a function of the power of the quadrupole assembly, the energy and diameter of the beam at entry to the quadrupole assemblies as determined by the preliminary focussing coil 4, and the subsequent action of the beam-spreading space charge forces. Reversal of the first quadrupole assembly 52 field, by passing it through zero and then to a given negative maximum value, will cause the beam crosssection to transform back to a circle and then to an elliptical shape again, with the major axis now oriented at 1350 to the datum, the dipole reference plane 11, as illustrated in Figure lld. Thus, there is a change of vet/2 in the spatial orientation of the focal source produced by a change of X in the quadrupole field direction. The second quadrupole assembly 54 electromagnetic fields will cause the beam focal source to exhibit similar characteristics, but with the pattern displaced in aximuth 45" with respect to the pattern produced by first quadrupole 52, due to the 45" angular displacement in the two quadrupole assembly windings.

In a manner similar to that described with respect to the quadrupole assemblies, when the sextupole assembly 58 is de-energized, increasing the field of the sextupole assembly 56 from zero to a given positive maximum value will tend to transform an initially circular cross-section beam (Figure 12a) into one having a cross-section which approximates an equilateral triangle oriented such that a line through the center and one apex of the triangle is approximately 30 above the datum, the dipole reference plane 11, as illustrated in Figure 12b. When the sextupole fields are reversed, going from a positive maximum value to a negative maximum value, the spatial orientation of the triangularly transformed beam cross-section will change 60O, as illustrated by the difference in orientation between Figures 12b, and 12d.

The beam cross-section patterns produced by variation of the fields of the individual sextupole coils 56 and 58 will be generally identical but displaced azimuthally with respect to each other by 30 , as illustrated by the difference in Figures 13b and 13c.

Thus, when the sextupole coils 56 and 58 are selectively energized, various desired triangular perturbations may be imposed upon the cross-sectional configuration of the electron beam to substantially cancel or compensate for any sextupole aberrations present in the beam from other sources.

From the foregoing it may be seen from Figures Ila--lle that, by maintaining the current applied to the first quadrupole assembly 52 generally proportional to the sine of twice the angle o of orientation of the ellipse and maintaining the current applied to the second quadrupole 54 generally proportional to the cosine of twice that angle, the generally elliptical cross-section may be caused to rotate about its center.

From these figures it may also be seen that two complete field change cycles are required to produce a 360" rotation of the elliptical focal source. Similarly, by varying currents applied to the sextupole assemblies 56 and 58 in a manner such that the current supplied to the first sextupole coil assembly 56 is generally proportional to the sine of three times the angle 0 and the current applied to second sextupole assembly 58 is generally proportional to the cosine of three times that angle fl, the triangular beam cross-section will be caused to rotate about its center, with three complete field change cycles being necessary to produce a 360" rotation of the focal source spacial orientation. Thus, the currents supplied to the various assemblies of the multiple winding assembly 6 are varied as follows, with 1052 and Ion representing the current flowing through the respective quadrupole coil assemblies 52 and 54 and 1555 and Iss8 representing the current supplied to and flowing through the respective sextupole coil assemblies 56 and 58: I,,,=I, sin 20 Io=I'oc COS 20 Io=Iso sin 30 I =I' cos 30 I and Iso represent reference current levels with the primed quantities I' < ,o and I,so taking account of the small differences which are required in the maximum current values for the paired quadrupole assemblies and paired sextupole assemblies, respectively, due mainly to the successively increasing diameter of the overlying multipole windings.

From the foregoing, it is apparent that, in combination with the preliminary focussing coil 4, the multipole winding assembly 6 when energized, will produce different degrees of beam cross-section ellipticity ranging selectively from circular to extremely narrow ellipses and that these cross-sections can be rotated 360" about their own centers and positioned at any given angle by suitable adjustment of the magnitude and polarity of the two quadrupole assembly fields. Similarly, triangular perturbations of the beam crosssection may be deliberately introduced and oriented at any desired angle of rotation around the center of the beam cross-section by adjustment of the magnitude and polarity of the two sextupole assembly fields. Thus, these perturbations can be superimposed upon the focal source in such a manner as to cancel out sextupole aberrations introduced by the action of the deflecting dipole assemblies 8 and 10 and the other focussing and beam directing elements in the system.

These quadrupole and sextupole assemblies comprise principal beam shaping elements for shaping the beam so as to correct such aberrations.

By virtue of the beam shaping elements and beam directing elements described above it becomes possible to select a focal source geometry, i.e., a configuration and orientation of the beam at its impingement with the target 16, which is desirable for high resolution x-ray procedures such as are necessary with computer tomography. For example, a focal source that is a very narrow ellipse that approaches a line source and has its major axis oriented in a plane extending radially outward from the longitudinal axis Z-Z at all azimuthal positions around the large diameter target 16 may be obtained.

With this radial line configuration and a suitable choice of the angle of incidence of the beam upon the target, the focal source may have a projected cross-section which appears essentially as a small circular or slightly elliptical source when viewed in the direction of the x-rays. In general, this configuration and orientation permit sharper collimation of the x-ray beam and minimize obilque absorption and penumbral contributions to the total integrated dosage of x-ray applied to the patient or other object of interest.

From the foregoing description of the apparatus and its general manner of operation, the manner in which the beam is directed to the various preselected points upon the target from which x-rays are to be produced to achieve the desired scanning may now be described. For the purpose of this description the reference electron bean will be assumed to be deflected by the dipole assemblies directly along the horizontal dipole reference plane 11, defined above, deflecting the beam directly into the plane of the paper in Figure 1 and parellel to the surface of the paper in Figure 2. This reference beam is that indicated by the solid line beam representation of Figure 3 and the heavy broken line representation of Figure 4. As illustrated in Figures 2--4 the azimuthal component of beam velocity introduced by the fields of large diameter coils 12 and 14 displace the beam angularly about the longitudinal axis Z--Z by an angle p measured from the dipole reference plane and thus strikes the target 16 at point PR.

Since, for a given electron beam energy, the fields produced by coils 12 and 14 will remain constant and will exert a constant displacing force on the electron beam, the point of impingement of an electron beam under a given condition will always be angularly displaced the same angle p from the plane of initial deflection by the dipole assemblies. Also, for pusposes of simplifying the description, the apparatus of this preferred embodiment has been configured so that first dipole assembly 8, first quadrupole assembly 52 and first sextupole assembly 56 all have a pole lying in the horizontal dipole reference plane 11, with second dipole 10, second quadrupole 54 and second sextupole 58 each having an antipole in that plane. In the reference situation the beam is deflected initially horizontally by the dipole assemblies to a fixed reference azimuthal and radial position PR on the annular target 16 by the correct adjustment of focussing coils 12 and 14. This arrangement produces a focal source on the annular target which is essentially a line lying in a radial plane instead of a point source. With this arrangement it is desirable that, at the exit from the dipole deflector assemblies 8 and 10, the beam be slightly convergent in the plane of deflection and divergent in the orthogonal plane. This is achieved by adjusting the current apolied to preliminary focussing coil 4 to produce a relatively large diameter, slightly convergent beam at entry to the multipole winding assembly 6 and adjusting the second quadrupole assembly 54 to provide the required convergent/divergent relationship. This adjustment is achieved by applying the proper current from the control (Figure 2) to the various coils in a manner known to those skilled in the art.

For this configuration the preliminary focussing coil 4 focal length is made approximately equal to the distance from that coil 4 to the electron gun 2, and the quadrupole assembly 54 focal length is made similar to the distance from the dipole assemblies to the target 16.

The focussing arrangement is also configured so that, after deflection by the dipole assemblies, a cross-over is produced in the radial plane in the region between the two large diameter opposing field coils 12 and 14. For a given beam energy and current the major and minor axes of the desired elliptical focal source at the annular target can be adjusted by controlling the diameter of the beam at entry to the dipole assemblies and by controlling the strength of the field of the quadrupole 54. However, depending upon the juxtaposition of the fields of the dipole assemblies and the quadrupole 54, even though the center of the focal source is correctly located on the target, the major axis of the generally elliptical beam shape may not be oriented in a desired radial direction at the target.

Adjustment of the first quadrupole 52 field now enables, the focal source to be rotated about its own center, as described above, and positioned so that its major axis is accurately aligned in a plane extending radially outward from the longitudinal axis Z-Z. The sextupole coil assemblies 56 and 58 are then adjusted, through the control of the currents applied thereto, to cancel focal source distortion present due to sextupole aberrations, all by straightforward adjustment of the current supplied to those sextupole assemblies.

Because the coil assemblies 4, 12 and 14 are circularly symmetric about the longitudinal axis Z-Z, this focal source geometry may be maintained for all other azimuthal positions around the target by simply maintaining the following relationship between the dipole, quadrupole and sextupole fields. These relationships are defined for the above described magnetic multipole elements with the respective dipole, quadrupole and sextupole coil currents defined as ID8X It10, Its2, I,, and Iss6 and I,,,, respectively. The reference currents, similar to those noted above, are denoted as IDO ITDOX 1oo, ISO0, ISO, and I,SO with the primed figures representing the slight adjustments necessary due to the overlying relationship of the second respective dipole, quadrupole and sextupole assemblies. The relationships thus become: ID8=IDo sin 47 10i0=1 'DO cos IA52=IQO sin (2(p+6) IQ54=ITQO cos (2q9+a) Iss6=Iso sin (3(p+J;) Is58=Itso cos (3P+y) In the above equations E iS a constant which makes allowance for nonorthogonality of the dipole, and a and y are constants which make allowance for beam rotation due to stray axial fields and for small misalignments of the various multipole coil assemblies.

Since the large diameter coils 12 and 14 rotate the beam by a constant azimuth angle p, if the dipole deflecting assemblies deflect the beam horizontally, the beam will not strike the target in a horizontal plane but in a plane 60 (Figure 3) rotated by the angle p from the horizontal and thus from the dipole reference plane 11. Thus, the center of this electron beam which is initially deflected horizontally in dipole reference plane 11 strikes the target 16 at azimuthal reference point P,, which lies in the intersection of the target 16 with the rotated plane 60. If the azimuthal position of the beam on the target at any desired point is measured relative to this rotated plane 60, then (p in the equations above may be considered to be the desired target position angle of the beam upon the target in a coordinate system rotated from the horizontal by the angle p. The angle (p, in the above equations obviously is also the angle between the plane of deflection 62 of the beam at exit from the, dipole assembly and the horizontal plane 11, as illustrated in Figures 3 and 4. Thus, the target position angle (p is defined as the angle about the longitudinal axis Z-Z between the reference point R, on the target 16 and any desired position P, to which it is desired to direct the electron beam 3 for production of x-rays from that point toward the object of interest lying along the axis Z-Z.

From the equations above it is thus apparent that the current to be applied to the first dipole assembly 8 is generally proportional to the sine of any desired target position angle, and the current applied to the second dipole assembly 10 is generally proportional to the cosine of that desired target position angle. Further, the currents applied to the respective quadrupole coil assemblies 52 and 54 are generally proportional, respectively, to the respective sine and cosine of twice the target position angle, with the current applied to the sextupole assemblies 56 and 58, respectively, being generally proportional to the respective sine and cosine of three times the target position angle.

By suitable variation of these sinusoidal functions the target position angle may be varied with time in any preselected manner to cause the x-rays to be directed at the object of interest from different points on the target in such a preselected sequence. If desired, the target positional angle may be varied by sequential incremental angular steps between successive angularly adjacent locations on the target to effect a generally continuously rotating scan. Alternatively, if desired, the target position angle variation may be made in any other manner, such as in sequential angular steps of slightly more than 1800 between successive points on the target 16 so that the application of the appropriate current will cause the x-rays to be directed at the object along the axis from sequential positions on the target with each successive position being almost directly across the longitudinal axis from the immediately preceding position, thus effecting a back and forth scan across the object while rotating it about the target. By suitable control of the target position angle any other scan pattern from uniformly spaced or nonuniformly spaced azimuthal target positions may be effected, including overlapping variable length sectors and, if desired, the use of physiological gating of the beam for triggering the scan.

It may be noted that, in Figure 1, the electron beam is illustrated as being deflected vertically upward and vertically downward by the dipole assemblies with the extensions of the beam 3 out to the target plane illustrating in side view the displacement of such beams in azimuth of the angle p. For purposes of illustration only of the manner of impingement of such beams upon the target 16, the extended beams 3' are illustrated as they might appear if "unwrapped", i.e., not displaced in azimuth about the axis Z-Z.

When the conventional, azimuthally rotating scan is desired, progressing from point to point around the annular target 16 at a constant annular speed w, the dipole assemblies 8 and 10 are excited by drive currents having sinusoidal time dependent amplitudes defined by setting the target position angle P equal to w t, where t is time.

By the use of a current stabilized, low distortion, phase coherent harmonic generator for excitation of the multipole windings and assembly 6, the relative radial orientation of the focal source may be held constant as the electron beam rotates around the annular water-cooled target 16.

The x-ray apparatus of this invention may have its beam pulsed onto the target 16 in either of two basic modes. In one arrangement, the electron gun is switched on and off in a succession of preprogrammed pulses while the beam directing elements are being activated to deflect the beam azimuthally about the annular target. In a second, and more preferred arrangement the electron gun may be driven for continuous emission of an electron beam during the full time of the scan with the beam directing elements providing an azimuthal scan by successively deflecting the beam onto and off the target with a preprogrammed azimuthal progression. In the former case the electron beam producing gun 2 which is used preferably is similar to that described in the above referenced article by this inventor, entitled Recent Advances in High Voltage Electron Beam Injectors. Such a gun incorporates a biased, nonintercepting extraction electrode which receives positive voltage pulses from a small hot-deck pulser housed in the gun terminal housing. This pulser contains bias and filament supplies and two planar triode switch tubes which are triggered by fiber optic light link 22 from ground potential logic which is designed to pulse the beam on and off rapidly, and to gate the x-ray detectors, over a wide range of pulse repetition frequencies and pulse widths. This arrangement, while providing electron beam pulses in a conventional manner, has a disadvantage in that, to maintain the required electron energy stability during the pulse, either an extremely large capacitor storage bank or a high power electronic voltage regulation system is required. Either requirement adds substantially to the expense, complexity and space requirement for the x-ray apparatus.

With the second mode of operation some of these disadvantageous requirements are avoided. With this second mode of operation, several seconds prior to executing the desired scan of the object of interest, the apparatus is "armed" by switching on a continuously emitting electron beam and directing it into a radiation shielded beam collector 32. The beam collector 32 of Figures 1 and 2 is positioned along the longitudinal axis Z-Z just past the dipole assemblies 8 and 10 and facing the electron gun 2. Since considerable energy will be directed into and absorbed by the beam collector 32, a suitable cooling fluid such as water is passed through an internal cavity, such as a series of tubes, within the beam collector to absorb and remove the heat generated by the electron beam impinging thereupon.

With the structure illustrated in Figures 1 and 2 the electron gun 2 may be energized for producing an electron beam a few seconds before the scan routine is to be executed and with the deflecting dipole assemblies 8 and 10 de-energized. Thus, when production of x-rays is not desired, the beam is never deflected off the longitudinal axis Z-Z but is directed straight through the multipole winding assembly 6 and the dipoles 8 and 10 into the beam collector 32 where the energy is absorbed by the cooling system. This arrangement enables the load on the high voltage power supply, which energizes the electron gun 2, to stabilize prior to the scan routine and then remain constant during the scan procedure when the dipole assemblies are activated. The beam requirements for a high resolution xray scanning system indicate the importance of this feature, since the quality of the results depends critically on maintaining a constant electron gun potential during the scan. With a high voltage system an ideal voltage stability of about 0.02% normally is extremely difficult to achieve and maintain when using a pulsed load of relatively high current, as occurs with a high intensity gridded gun x-ray tube. With the beam collector arrangement the necessity for large capacitors or voltage regulating systems is eliminated by loading down the high voltage power supply with a stable DC electron beam which may be absorbed in the collector 32' for several seconds until the switching transients and voltage regulation effects have decayed and a stable equilibrium level of high voltage is attained.

After reaching this stability, the azimuthal scan may rapidly be executed by pulsing the deflecting dipole assemblies 8 and 10 and the multipole winding assembly 6 while the electron gun source emission remains constant until completion of the scan, at which time the electron gun 2 is then switched off. For this type of operation, the direct current high voltage system is substantially simplified and the basic voltage uniformity requirement is reduced to satisfying a low ripple specification as can be readily obtained with conventional filter components included in the power supply system.

An alternative arrangement for the beam collector is illustrated in the fragmentary view of Figure 1 a in which a Y is provided in the neck 19 of the vacuum chamber. At the end, of the branch 64, which extends off the longitudinally extending neck 19, is provided a beam collector 66, which is generally similar in concept and structure to beam collector 32 of Figure 1. Selectively operable beam deflecting apparatus is included for selectively, either deflecting the electron beam into the collector member 66 or allowing it to continue along the longitudinal axis Z-Z for subsequent production of x-rays at the target. This selectively operable beam deflecting apparatus for deflecting the beam into the collector 66 suitably may comprise a DC biasing electromagnetic dipole assembly 68 mounted onto or adjacent the neck 19 and energized with direct current for providing a continuous biasing force tending to deflect the beam produced by the electron gun 2 off the longitudinal axis and into the collector member 66. Within the neck 19 and on opposite sides of the electron beam emitted by the gun 2 suitably may be placed electrostatic beam deflecting plates 70 which may be selectively energized or deenergized. With this structure, if desired, the beam shaping and directing elements, including the dipole assemblies 8 and 10, may be continuously energized, with the beam deflecting dipole assembly 68 providing an electromagnetic force deflecting the electron beam away from the longitudinal axis and into the beam collector 66 whenever the gun 2 is activated but x-rays are desired not to be produced.

Then, when it is desired to initiate the production of x-rays and to initiate the scan routine, the deflecting plates 70 may be energized, preferably with a suitable negative potential, to rapidly inflect the electron beam back to the longitudinal axis Z-Z so that the beam may travel down the neck 19 along that axis for shaping and direction by the various other electromagnetic elements. A generally similar and equivalent structure might dispense with the DC biasing elements 68 and use selective, suitable energization of the deflector plates 70 for selectively either deflecting the beam into the collector 66 or allowing it to continue along the longitudinal axis. This off-axis beam collector arrangement has the desirable feature of removing the beam collector from the position of Figure 1 in which it is generally adjacent a patient (shown in phantom), being examined by the apparatus.

A second preferred embodiment of the apparatus of this invention is illustrated in Figures 13 and 14. This second embodiment represents an imp will impinge simultaneously upon a plurality of detectors, a window and collimating structure such as illustrated in Figures 16 and 17 may be provided. In this structure the window again will be a thin metal member 84 disposed at the radially inner base of a channel in the vacuum housing, which channel is defined by narrowly spaced opposing sidewalls 86 and 88. The narrow spacing of the opposed sidewalls 86 and 88 serves to collimate the beam longitudinally of the axis and direct it towards the detectors 48. To provide the necessary strength to the vacuum housing, thin radially extending webs 90 are provided extending between walls 86 and 88. These webs 90 are very thin so as to cause as little interference as possible to the fan-shaped beam coming off the target and to permit the beam to pass through the web.

Obviously, either the fan-shaped beam or the thin pencil beam could be used with any of the embodiments of this apparatus, subject only to the use of the appropriate collimating structure.

As noted above, the electron beam emited from the gun 2 is formed and directed by the beam directing system to move in a generally circular path azimuthally about the longitudinal axis and around and impinging against portions of the beam collector 80, while in the standby or garaged condition. In this condition the beam preferably is directed to travel in the circular path impinging against the tungsten insert 82 in the collector. Projecting through the collector 80 in this embodiment is a beam trigger probe 92 and a plurality of beam shape and position monitoring probes 94, illustrated in Figures 15 and 22.

Preferably, four beam shape and position monitoring probes 94 are spaced equally about the beam collector 80, at 900 intervals. These probes 94 are illustrated in Figure 22 as comprising a copper rod 96 counterbored throughout most of its length and projecting through the end wall of the beam collector 80, with a ceramic insulator 97 electrically isolating the probe from the collector and providing for the necessary vacuum seal 98. At the inner end of the rod 96 the probe 94 is shaped to match the desired focal source size and orientation, suitably by providing such an appropriately shaped and dimensioned end piece 99.

Thus, by maintaining the beam stationary and directing it squarely at the end piece 99 of one of the probes 94, the beam shape and position may be detected and adjusted for optimum performance by simply maximizing an output signal from the probe. This adjustment procedure may be performed either under static conditions, with the beam stationary, or under dynamic conditions, with the beam moving azimuthally around the circular collector 80. Cooling water from a suitable source (not shown) may be circulated through the counterbore of the probe to remove the heat generated by the impingement of the electron beam against the end of the probe. The trigger probe 92 may be substantially similar to beam shape and position monitoring probes 94, although water cooling likely will not be necessary.

To provide the necessary output signal, the copper rod 96 of each of the probes 92 and 94 is electrically connected through a resistor to ground and also to the control unit of Figure 14.

By the provision of the sensors 92 and 94, each time the beam impinges upon one of those sensors an electrical signal proportional to the energy of the beam impinging thereupon will be sent to the control unit. Thus, the beam directing elements may be adjusted to center the beam during its impingement directly upon each of the beam position sensors 94, so that the beam will thus be describing a predetermined path, such as a circular path having a radius generally equal to the radial displacement of those sensors 94 from the longitudinal axis. The passage of the beam past trigger sensor 92 serves to provide a "clock" signal indicating the time and frequency of the passage of the beam thereby, so that the position of the beam at any time relative to that sensor 92 may easily be determined.

As described above, the energization of the electron gun 2 and the beam directing elements 8, 10, 12 and 14 serve to direct the beam around a circular path impinging against portions of the beam collector 80.

To produce x-rays from this beam, the beam is deflected from the collector 80 onto the target 16. To produce the effect of a number of closely spaced x-ray targets from a smooth-surfaced annular target 16, a high frequency secondary deflection field having a suitable time-dependent amplitude variation is rapidly superimposed upon the trajectory of this rotating standby beam to cause it to be radially deflected between the beam collector 80 and target 16, with each impingement upon the target 16 producing x-rays from that location.

Although magnetic fields could readily be employed as an equivalent to provide the high frequency "tickler" deflection between the beam collector 80 and the target 16 in this particularly preferred embodiment an electrostatic deflection system is incorporated and located inside the vacuum chamber to interact with the beam after the traversal of the beam through the dual dipole assembly 8 and 10. The deflector suitably comprises a pair of truncated, cone shaped members 100 and 102 positioned concentrically about the longitudinal axis of the apparatus. These members 100 and 102 are formed of a suitable material, such as copper or stainless steel, and formed by spinning into the desired configurations. In the embodiment of Figures 13 and 14 the inner high frequency deflection member 100 is held at ground potential with the outer member 102 being connected to an adjacent shielded high voltage power supply 103 and operated from the control unit. This deflection system, with its appropriate high voltage power supply (not shown), is designed to accommodate the large diameter beams of the apparatus and to provide a DC biased, periodically varying, transverse electrical field of adjustable frequency and amplitude. This transverse electrical field, in combination with the action of the large focusing coils 12 and 14, produces a radial deflection (X) of the beam at the target plane, as indicated in Figure 15.

In this preferred embodiment, the location and shape of the deflector plates may be chosen so that sufficient radial deflection amplitudes (X) may readily be achieved with peak-to-peak electric field strengths of less than one kV/cm for electron beam energies of up to 250 kV. The deflector high voltage power supply and the impedance of the deflection system are chosen, in a manner known to those skilled in the art, such that steady state electric field conditions can be established and/or terminated in a fraction of a cycle of the deflection frequency.

In Figure 17 is illustrated the typical movement of the beam between the collector 80 and the target 16 as the beam is simultaneously rotated and radially deflected. In this illustration a sinusoidally varying field is imposed upon the beam by the deflector members 100 and 102 and their associated power supply. For sequential source operation as shown, and a given target diameter, the number (n) of x-ray sources around the target and the spacing (P) between successively located sources is dependent only upon the ratio of frequencies of the secondary deflection field (from deflecting members 100 and 102) and the dual dipole assembly 8 and 10. For example, 150 equally spaced x-ray sources are provided with a beam rotation.

frequency of 60 Hz and a tickler deflection frequency of 9000 Hz. Thus, the 150 sequentially produced x-ray fields are provided during one revolution of the beam, which occurs in 16.7 milliseconds. If the beam were rotated at 30 Hz with a tickler frequency of 9000 Hz, 300 equally spaced xray sources would be achieved in a scan time of 33.3 milliseconds. Similarly, with the beam rotation again at 60 Hz and the tickler frequency increased to 18,000 Hz, 300 equally spaced x-ray sources could be achieved with the rotation of the beam maintained at the 16.7 millisecond period.

The x-ray duty factor associated with each revolution of the beam is determined by the total integrated charge intercepted by the target, which, in turn, is a function of the radial charge distribution and the dimensions of the focal source, the frequency and amplitude of the tickler deflection field, and the number of sources around the target.

To ensure accurate fiducial registering of the multi-source pattern around the target periphery, the high frequency deflection field is initiated by a trigger signal generated by the electron beam during rotation in the standby condition. This is achieved through the use of beam trigger 92 intercepting a portion of the beam to produce sharp signals at each rotation of the standby beam.

These signals are gated off until the beam position sensors 94 indicate that the energy level and positioning of the beam within the beam collector is suitable and that the garaged beam is thus ready and until all protective interlocks are satisfied. Such interlocks may include, among other things, signals fed back to the control unit to provide dipole undercurrent protection to rapidly terminate the beam emission if the current level in the dipole is insufficient to achieve the necessary deflection. Then, upon receiving a command to execute the xray scan, one of the sharp signals from the sensor 92 is selected to trigger the high voltage deflector high frequency field through a low level driver circuit incorporated within the high voltage power supply and control assembly. The annular array of target sources can then be azimuthally "tuned" to a given fiducial position on the target (to ensure spatial registration with respect to the patient and/or detectors) by an adjustable time delay at the driver level. Thus, for a given time delay setting, and by using a phase lock driver system to maintain the tickler deflector frequency at an exact multiple (n) of the frequency of the dual dipole assembly 8 and 10, the array of x-ray sources can be spatially locked, in azimuth, with respect to a predefined fiducial register. Since the power to deflection members 100 and 102 may be triggered on and off rapidly, the scan may be started and stopped at various points around the target, with the scan encompassing any fraction or plurality of fractions of the beam rotation around the annular target. Similarly, the beam may be directed onto the target at various azimuthal positions during several complete rotations of the beam around the annular target. All such beam deflection characteristics as well as the detector 48 gating and blanking are provided for within the appropriate control assembly. Immediately after completion of the desired scan the rotating beam may be returned to the annular collector if additional scanning is to be conducted immediately, or, the beam current may be terminated by de-energizing the electron gun 2.

While for the embodiment of Figures 13-17 a simple sinusoidal wave form is illustrated as controlling the high voltage power supply energizing the deflector members 100 and 102, obviously the scan control logic may provide for any other desired types of wave forms. For example, Figure 18 illustrates the use of alternate half cycles of a sine wave, which provides for the same x-ray duty factor on the target while using an annular collector 80' of substantially reduced width. Obviously any other wave form having any desired spacing could also be used with the apparatus of this invention.

While the annular beam collector 80 is illustrated in Figures 13-18 as being positioned a distance from the longitudinal axis greater than the distance to the target, it should be apparent that the teachings of this invention also encompass the opposite relative spacing in which the target 16 is positioned at a distance from the axis greater than that to the collector 80", as in Figure 19. The advantage of the arrangement of Figures 16-18 stems from the somewhat smaller diameter target, which may result in a greater x-ray intensity upon the object of interest. However, where other considerations, such as detector geometry, indicate the desirability of larger diameter targets, the collector may be located adjacent the inner rim of the target, as in Figure 19, with the beam then being deflected radially outward to intercept the target.

Another substantially different scanning arragement may be obtained by using a target structure similar to that illustrated in Figures 20 and 21. With this arrangement the collector is again positioned adjacent the outer periphery of the target, as with Figures 16 and 18. However, the target itself no longer presents a smooth and substantially continuous surface to the electron beam. Instead, the annular target 104 presents the impinging beam with azimuth ally alternating adjacent lands 106 and recesses 108. The lands 106, suitably comprising tungsten inserts, will serve to produce and direct toward the object of interest the desired x-rays, as with the previous embodiments. However, the recesses 108 are dimensioned deep enough to provide sufficient radiation shielding to cut off any external emission of x-rays, and thus themselves serve as small individual beam collectors. Suitably the lands 106 are dimensioned slightly larger than the oval or approximately elliptic cross-section of the beam. With this embodiment the scan from a plurality of sources is provided by deflecting the electron beam from the beam collector 80 onto the target 104 using a constant amplitude (DC) secondary deflection in a generally circular pattern azimuthally around the annular target 104.

Also, this embodiment provides for production of x-rays only from a number of predetermined positions around the circular target, thus permitting the use of larger and heavier reinforcing webs 110 in the window area without causing undue interference with the x-ray beams. If fan-shaped beams are desired, these webs 110 suitably may have a wedge-shaped cross-section, as shown in the section of Figure 21. Since only the lands 106 will produce and direct toward the object of interest the desired xrays, this variation will provide for as many x-ray sources during a complete rotation of the beam as there are lands 106 around the target. Sequential and random x-ray source distribution during a scan sequence would be achieved as with the other embodiments, by rapidly initiating and terminating the "DC" secondary deflection field by means of the low level driver. This perforated annular target structure allows the x-ray duty factor and the resolution to be maximized. Further, while this arrangement suffers from lack of flexibility, since the target hole pattern predetermines the array of x-ray sources, it offers the advantage of operational simplicity and a focal source width closely approximating the actual width of the electron beam.

From all the foregoing may be seen a number of advantages of this second preferred embodiment of the apparatus of this invention, in which the beam collector is a generally annular structure positioned adjacent the target. More specifically, any stray radiation produced by the standby beam will be produced from a source which is much further from the patient than in the embodiment of Figure 1, and thus easier to shield. Additionally, the shielding for the beam collector may be supported from the main frame of the apparatus rather than cantilevered from the inner shell of the vacuum chamber. Thus, only a small radiation shield 78 is necessary on axis to act as a safety backup.

By this structure the rotating standby electron beam may be deflected from the shielded annular beam collector 80 to the adjacent annular target 16 with a relatively low strength, high frequency secondary deflection field, which may be either magnetic or, as illustrated here, electrostatic. Since this high frequency secondary deflection, or tickler, field can be applied very rapidly, the electron beam may be sequentially or randomly deflected on and off the target during rotation of the beam. This arrangement also facilitates the use of physiological gating of the beam by the object of the interest. By the use of the internally located, conical shaped electrostatic deflection members, the required secondary deflection field may be produced with a single, low power, controlled amplitude power source. Thus, it may be seen that this second preferred embodiment of the invention provides for all of the benefits of the embodiment of Figures 1 and 2, while providing yet additional benefits.

To achieve yet additional benefits and a further improvement in efficiency of operation, the electron gun 2 may be operated in a pulsed manner under the control of a hot deck pulser triggered by the fiber optics light link 22, as described in the article Recent Advances in High Voltage Electron Beam Injectors referenced above.

With the electron gun being operated in the pulsed mode, being pulsed at a suitable pulse repetition frequency such as 9000 Hz, the beam may be directed into annular collector, such as collector 80, 80' or 80" concentric with and adjacent the continuous and relatively smooth ring targets, 16, 16' and 16n. As this pulsed beam is rotated about the beam collector, the beam characteristics may be adjusted and stabilized as desired. When such stabilization has been achieved, then the pulsed beam may be directed from the beam collector onto the target applying a constant amplitude (DC) secondary deflection field in the manner described with respect to Figures 20 and 21, or, when using a secondary deflection field of opposite polarity, by terminating such field, such that the beam will be caused to rotate in a generally circular pattern azimuthally around the annular target. By pulsing the electron gun, and thus the electron beam, at the desired frequency, such as 9000 Hz, xrays may be generated and directed toward the object of interest from the preselected points about the target at the pulse rate of and corresponding to the points of impingement of the pulsed beam.

By the use of the pulsed beam method of operation described above, the flexibility of the embodiment of Figures 14--19 may be achieved with the simplicity of the DC secondary deflection field of the embodiment of Figures 20 and 21. This embodiment also provides additional efficiency in that, during the x-ray scan, no portion of the beam is wasted by absorption into any beam collecting members either adjacent or spaced from the target. Thus, less current and correspondingly less energy are required for operation of this embodiment, and substantially less unnecessary radiation is developed which must be shielded and absorbed to protect operators and patients. Further, by simple adjustment of the pulse repetition frequency from the electron gun, the duty factor of the beam upon the target and thus the x-ray beam upon the object of interest may easily be adjusted. By this direct pulse of the gun protracted testing and experimental investigations are facilitated, since the rate of change of the secondary deflection field may be left constant with the pulse repetition frequency substantially reduced, thus causing the beam to impinge only upon preselected widely spaced targets around the collector or the target. By maintaining a short pulse duration and substantially reducing the pulse repetion frequency in this manner the apparatus may be tested with the beam at full peak power while maintaining a relatively low average power.

From the foregoing description it may be seen that this invention provides an electronically scanned x-ray apparatus for producing and nonmechanically scanning high intensity x-rays toward an object of interest from a plurality of different points about that object. While the apparatus and method of this invention have been described with respect to two particularly preferred embodiments, it is to be recognized that numerous modifications and variations of this struction and method, all within the scope of this invention, will readily become apparent to those skilled in the art. Accordingly, the foregoing descriptions of the preferred embodiments are to be considered illustrative only of the principles of the invention and are not to be considered limitative thereof. The scope of this invention is to be limited solely by the claims appended hereto.

WHAT I CLAIM IS: 1. Apparatus for producing high intensity X-rays and directing such X-rays toward an object of interest from any of a plurality of preselected coplanar points spaced from that object and spaced radially about a line extending through that object, said apparatus having no moving parts and comprising means producing a high voltage high current electron beam, stationary target means encompassing said coplanar points which receives said electron beam and produces X-rays as a consequence of the impact of the beam, said target means directing said X-rays toward said object of interest, an evacuated housing containing said beam producing means adjacent one end and said target means adjacent the

**WARNING** end of DESC field may overlap start of CLMS **.

Claims (1)

1. **WARNING** start of CLMS field may overlap end of DESC **.

   electrostatic. Since this high frequency secondary deflection, or tickler, field can be applied very rapidly, the electron beam may be sequentially or randomly deflected on and off the target during rotation of the beam. This arrangement also facilitates the use of physiological gating of the beam by the object of the interest. By the use of the internally located, conical shaped electrostatic deflection members, the required secondary deflection field may be produced with a single, low power, controlled amplitude power source. Thus, it may be seen that this second preferred embodiment of the invention provides for all of the benefits of the embodiment of Figures 1 and 2, while providing yet additional benefits.

   To achieve yet additional benefits and a further improvement in efficiency of operation, the electron gun 2 may be operated in a pulsed manner under the control of a hot deck pulser triggered by the fiber optics light link 22, as described in the article Recent Advances in High Voltage Electron Beam Injectors referenced above.

   With the electron gun being operated in the pulsed mode, being pulsed at a suitable pulse repetition frequency such as 9000 Hz, the beam may be directed into annular collector, such as collector 80, 80' or 80" concentric with and adjacent the continuous and relatively smooth ring targets, 16, 16' and 16n. As this pulsed beam is rotated about the beam collector, the beam characteristics may be adjusted and stabilized as desired. When such stabilization has been achieved, then the pulsed beam may be directed from the beam collector onto the target applying a constant amplitude (DC) secondary deflection field in the manner described with respect to Figures 20 and 21, or, when using a secondary deflection field of opposite polarity, by terminating such field, such that the beam will be caused to rotate in a generally circular pattern azimuthally around the annular target. By pulsing the electron gun, and thus the electron beam, at the desired frequency, such as 9000 Hz, xrays may be generated and directed toward the object of interest from the preselected points about the target at the pulse rate of and corresponding to the points of impingement of the pulsed beam.

   By the use of the pulsed beam method of operation described above, the flexibility of the embodiment of Figures 14--19 may be achieved with the simplicity of the DC secondary deflection field of the embodiment of Figures 20 and 21. This embodiment also provides additional efficiency in that, during the x-ray scan, no portion of the beam is wasted by absorption into any beam collecting members either adjacent or spaced from the target. Thus, less current and correspondingly less energy are required for operation of this embodiment, and substantially less unnecessary radiation is developed which must be shielded and absorbed to protect operators and patients. Further, by simple adjustment of the pulse repetition frequency from the electron gun, the duty factor of the beam upon the target and thus the x-ray beam upon the object of interest may easily be adjusted. By this direct pulse of the gun protracted testing and experimental investigations are facilitated, since the rate of change of the secondary deflection field may be left constant with the pulse repetition frequency substantially reduced, thus causing the beam to impinge only upon preselected widely spaced targets around the collector or the target. By maintaining a short pulse duration and substantially reducing the pulse repetion frequency in this manner the apparatus may be tested with the beam at full peak power while maintaining a relatively low average power.

   From the foregoing description it may be seen that this invention provides an electronically scanned x-ray apparatus for producing and nonmechanically scanning high intensity x-rays toward an object of interest from a plurality of different points about that object. While the apparatus and method of this invention have been described with respect to two particularly preferred embodiments, it is to be recognized that numerous modifications and variations of this struction and method, all within the scope of this invention, will readily become apparent to those skilled in the art. Accordingly, the foregoing descriptions of the preferred embodiments are to be considered illustrative only of the principles of the invention and are not to be considered limitative thereof. The scope of this invention is to be limited solely by the claims appended hereto.

   WHAT I CLAIM IS:

   1. Apparatus for producing high intensity X-rays and directing such X-rays toward an object of interest from any of a plurality of preselected coplanar points spaced from that object and spaced radially about a line extending through that object, said apparatus having no moving parts and comprising means producing a high voltage high current electron beam, stationary target means encompassing said coplanar points which receives said electron beam and produces X-rays as a consequence of the impact of the beam, said target means directing said X-rays toward said object of interest, an evacuated housing containing said beam producing means adjacent one end and said target means adjacent the

   opposite end, means for directing the electron beam selectively to preselected said points on the target means, said directing means including beam-directing means for compensating said beam for the beam spreading effect of space charge forces acting on the beam, and beam shaping means for shaping said beam to a predetermined cross-sectional configuration at its points of incidence upon said target, said beam shaping means including beam shaping means for correcting beam aberrations, including sextupole aberrations, introduced by the beam directing means and by beam shaping means other than beam shaping means which corrects said beam aberrations.

   2. The apparatus of Claim 1 wherein said electron beam producing means and said beam directing means are generally aligned along a longitudinal axis with said electron beam being produced generally along said axis for deflection to said target means.

   3. The apparatus of Claim 2 wherein said beam directing means comprises two electromagnetic field dipole assemblies having poled oriented orthogonally with respect to one another and with respect to the direction of said electron beam for deflecting said beam outwardly from said axis, said dipole assemblies having poles lying in planes extending radially outwardly of said longitudinal axis at predetermined orientations, with one said radially extending plane being defined as a dipole reference plane and being oriented at a predetermined angle about said axis with respect to an azimuthal reference plane extending radially outwardly of said axis through a point on said target means defined as the azimuthal reference point.

   4. The apparatus of Claim 3 wherein each said dipole assembly comprises a pair of electromagnetic dipole coils having electric current applied thereto and flowing therethrough to provide the electron beamdeflecting electromagnetic field, said coils being formed around a surface of rotation surrounding said electron beam path and having windings approximately parallel to said beam path and formed such that the current surface density of each portion of each coil is proportional to the cosine of the angle, taken about said longitudinal axis, between said coil portion and an antipole of said dipole coil.

   5. The apparatus of claim 4 wherein said current applied to and flowing through the first said dipole assembly is generally proportional to the sine of the desired target position angle, which is defined as the angle about said longitudinal axis between (a) a point on said target means to which it is desired to direct the centre of said electron beam, and (b) said azimuthal reference point, and wherein said current applied to and flowing through the second said dipole assembly is generally proportional to the cosine of said desired target position angle.

   6. The apparatus of Claim 5 wherein said target position angle varies with time in a preselected manner, whereby application of said current to the dipole assemblies causes the X-rays to be directed at the object from different points on the target means in a preselected sequence.

   7. The apparatus of Claim 6 wherein target position angle variation comprises sequential incremental angular steps between successive angularly adjacent locations on said target means about said object, whereby application of said current to the dipole assembly causes the X-rays to be directed at the object sequentially from those angularly adjacent locations.

   8. The apparatus of Claim 6 wherein said target position angle variation comprises sequential angular steps of slightly more than 180 degrees between successive said points on said target means, whereby application of said current to the dipole assembly causes the X-rays to be directed at the object from sequential positions on the target means with each successive position being almost directly across said longitudinal axis from the immediately preceding said position.

   9. The apparatus of Claim 8 wherein said beam directing means includes electromagnetic beam focussing means defined by at least one coil having a current passing therethrough, said focussing means surrounding a portion of the electron beam path and positioned axially between said dipole assemblies and the target means to provide an electromagnetic field through which said electron beam path passes.

   10. The apparatus of Claim 9 wherein said focussing means electromagnetic field is of a predetermined strength and distribution to substantially cancel at the plane of the target means any radial component of the velocity of said electron beam passing therethrough.

   11, The apparatus of Claim 9 wherein said electromagnetic focussing means comprises two said coils spaced apart from one another along said longitudinal axis with the first said coil axially proximal said dipole assemblies and the second said coil axially proximal said target means.

   12. The apparatus of Claim 11 wherein the first said coil has a current of a predetermined polarity and a first predetermined magnitude passing therethrough and the second said coil has a current of the opposite polarity and a second predetermined magnitude passing therethrough, such that the combined net axial field components of said coils are reduced to zero adjacent said target means, whereby the azimuthal beam velocity components introduced by each of the two electrically energized coils on the electron beam substantially cancel one another and the net azimuthal velocity of the electron beam is reduced substantially to zero as the beam strikes the target means.

   13. The apparatus of Claim 12 wherein said second current magnitude is substantially equal to said first current magnitude, whereby a single, constant current power supply may be used for both coils.

   14. The apparatus of Claim 3 or any claim appendant thereto wherein said beam shaping means comprises an electromagnetic preliminary focussing element defined by at least one coil having a current passing therethrough, said preliminary focussing element surrounding a portion of said electron beam path and positioned axially between said electron beam producing means said dipole assemblies.

   15. The apparatus of Claim 3 or any of Claims 4 to 13 when appendant to Claim 3 wherein said beam shaping means comprises means for shaping said electron beam into a generally elliptical cross-section at its point of elliptical figure lying generally in a plane extending radially outwardly of said longitudinal axis.

   16. The apparatus of Claim 15 wherein said elliptical shaping means comprises at least one electromagnetic quadrupole assembly formed around the electron beam path between said electron beam producing means and said dipole assemblies to provide an electron beam-shaping electromagnetic field.

   17. The apparatus of Claim 16 wherein said quadrupole assembly comprises four electromagnetic coils having electrical current applied thereto and flowing therethrough to provide said electron beamshaping electromagnetic field, said coils being formed about a surface of rotation surrounding said beam path, said coils each having windings extending approximately parallel to said beam path and subtending sequentially adjacent arcs of approximately 90 degrees about said surface of rotation, said coil windings being formed such that the current density of each portion of each said coil is proportional to the cosine of the angle between said coil portion and an antipole of said quadrupole coil.

   18. The apparatus of Claim 16 wherein said elliptical shaping means comprises two said electromagnetic quadrupole assemblies, the first said quadrupole assembly being oriented about said longitudinal axis such that one pole of said first quadrupole assembly lies generally in said dipole reference plane, and the second said quadrupole assembly being concentric with the first said quadrupole assembly and being angularly displaced 45 degrees about said longitudinal axis with respect to said first quadrupole assembly.

   19. The apparatus of Claim 18 wherein said current applied to and flowing through said first quadrupole assembly is generally proportional to the sine of twice the desired target position, which is defined as the angle about said longitudinal axis between (a) a point on said target means to which it is desired to direct the centre of said electron beam and (b) said azimuthal reference point, and wherein said current applied to and flowing through said second quadrupole assembly is generally proportional to the cosine of twice said desired target position angle.

   20. The apparatus of Claim 3 to 13 wherein said sextupole aberration correcting means comprises at least one electromagnetic sextupole coil assembly formed around said electron beam path between said electron beam producing means and said dipole assemblies to provide an electromagnetic field for controlling and introducing preselected triangular perturbations into the cross-section configuration of said electron beam to substantially cancel any sextupole aberrations present in said electron beam.

   21. The apparatus of Claim 20 wherein each said sextupole coil assembly comprises six electromagnetic coils having electrical current applied thereto and flowing therethrough to provide said perturbation controlling and introducing field, said coils being formed about a surface of rotation surrounding said beam path, said coils each having windings extending approximately parallel to said beam path and subtending sequentially adjacent arcs of approximately 60 degrees about said surface of rotation, with said coil windings being formed such that the current surface density of each portion of each said coil is generally proportional to the cosine of the angle between said coil portion and an antipole of said sextupole coil.

   22. The apparatus of Claim 21 wherein said sextupole aberration correcting means comprises two said sextupole coil assemblies, the first said sextupole coil assembly being oriented about said longitudinal axis such that one pole of said first sextupole assembly lies generally in said dipole reference plane, and the second said sextupole coil assembly being concentric with the first said sextupole coil assembly and being angularly displaced 30 degrees about said longitudinal axis with respect to said first sextupole coil asssembly.

   23. The apparatus of Claim 22 wherein said current applied to and flowing through said first sextupole coil assembly is generally proportional to the sine of three times the desired target position angle, which is defined as the angle about said longitudinal axis between (a) a point on said target means to which it is desired to direct the centre of said electron beam and (b) said azimuthal reference point, and wherein said current applied to and flowing through said second sextupole assembly is generally proportional to the cosine of three times said desired target position angle.

   24. The apparatus of Claim 2 or any claim appendant thereto further comprising X-ray shielded beam collector means for receiving said electron beam whenever said electron beam is not directed to said target means.

   25. The apparatus of Claim 24 wherein said beam collector means comprises a member having an internal cavity connected to an inlet and an outlet for passage of a cooling fluid therethrough.

   26. The apparatus of Claim 24 or Claim 25 further comprising means for selectively directing said beam away from said beam collector means to said target means, whereby an electron beam may be produced and received into said beam collector and then, after a desired period of time suitable for stabilizing the electron beam voltage, may be directed to any selected portion of the target means to produce a generally stabilized output level of X-rays for a predetermined duration until the beam is permitted to return to the beam collector means.

   27. The apparatus of any of Claims 24 to 26 wherein said beam collector means comprises a collector member positioned on said longitudinal axis distil said beam producing means whereby the beam may be received into the beam collector whenever the beam producing means is activated and the beam directing means is not activated to deflect the beam off that axis to the target means.

   28. The apparatus of any of Claims 24 to 26 wherein said beam collector means comprises a collector member displaced from said longitudinal axis and selectively operable beam collector beam deflecting means for selectively either deflecting said electron beam from said longitudinal axis to said collector member or allowing said electron beam to continue along said longitudinal axis past said collector member, whereby the beam may be allowed to pass along the longitudinal axis past the collector when X-rays are desired to be produced from the target means but may be deflected into the collector member when X-rays are not to be produced from the target means while the beam producing means is activated.

   29. The apparatus according to any preceding claim wherein said electron beam producing means includes means for pulsing said electron beam on and off for predetermined periods of time while said beam directing means is being activated to.

   direct said electron beam to preselected points on said target mean, whereby electron beam pulses of predetermined duration may be directed to the preselected points on the target means for production of pulses of X-rays thereat.

   30. The apparatus according to any preceding claim wherein said target means comprises at least a sector of a generally annular structure spaced from said object of interest in a generally radial direction.

   31. The apparatus to any of Claims 1 to 29 wherein said target means comprises an annular structure spaced from said object of interest in a generally radial direction.

   32. The apparatus of Claim 31 wherein the annular structure comprises at least one member having an interior chamber connected to an inlet and an outlet for passage of a cooling fluid therethrough.

   33. The apparatus of Claims 31 or 32 wherein the annular structure comprises a member having a generally smooth surface, whereby the electron beam may be directed to produce X-rays from substantially any point on such surface.

   34. The apparatus of Claim 31 or 32 wherein the annular structure comprises a member having a plurality of adjacent lands and recesses spaced around the annulus which face and receive said electron beam and produce X-rays therefrom, with only said lands being positioned to produce and direct toward said object of interest X-rays from said electron beam.

   35. The apparatus according to any preceding claim wherein said evacuated housing includes, at the end adjacent said target means, a cavity open at its outer end and extending inwardly of said housing and being defined by a wall extending about said axis from said housing end, past the target plane and part-way to said electron beam producing means, whereby the object of interest may be inserted into the cavity for reception of the X-rays from the target means.

   36. The apparatus of Claim 35 further comprising X-ray window means in said housing and positioned between said target means and said cavity for permitting passage therethrough of said X-rays from said target means to said object of interest.

   37. The apparatus of Claim 36 further comprising means positioned between said target means and said object of interest for collimating said X-rays along a predetermined path.

   38. The apparatus of Claim 37 wherein said collimating means comprises a plurality of elements spaced apart around the periphery of said cavity-defining wall so as to direct said X-ray beam substantially radially inward of said target means.

   39. The apparatus of Claim 38 further comprising a plurality of X-ray detectors mounted adjacent said cavity-defining wall and angularly positioned between adjacent said collimating means elements.

   40. The apparatus of Claim 38 or Claim 39 wherein said collimating means are configured to direct said X-ray beam slightly longitudinally outwardly of said cavity.

   41. The apparatus of Claim 39 or Claim 40 wherein said X-ray detectors are mounted across said axis from and aligned with said collimating means.

   42. Apparatus according to Claim 24 or any claim appendant thereto wherein said evacuated housing has a predetermined longitudinal axis with said beam producing means provided for production of said electron beam generally along said axis, and said X-ray shielded beam collector means is positioned generally adjacent and concentric to said target means for receiving said electron beam whenever said electron beam is not directed to said target means.

   43. The apparatus of Claim 42 wherein said generally concentric beam collector means is positioned radially farther from said axis than said target means.

   44. The apparatus of Claim 42 wherein said generally concentric beam collector is positioned radially closer to said axis than said target means.

   45. The apparatus of any of claims 42--44 wherein said beam collector means comprises an annular structure.

   46. The apparatus of any of claims 42--45 wherein said beam directing means comprises means for directing said electron beam in a generally circular path azimuthally about said axis and around and impinging against portions of said beam collector means.

   47. The apparatus of Claim 46 further comprising at least one beam position sensing means positioned adjacent said beam collector means for sensing the passage of said beam during the movement of said beam around said path, whereby the time of passage of the beam past the position sensing means and the period of its travel around the generally circular path may be determined to facilitate determination of the location of the beam around the path at any given time.

   48. The apparatus of Claim 46 or Claim 47 wherein said beam directing means further comprises high frequency beam deflection means for directing said electron beam selectively against either portions of said beam collector means or portions of said target means.

   49. The apparatus of Claim 48 wherein said high frequency beam deflection means comprises selectively energizable electrostatic plate means, whereby the electron beam may be deflected in accordance with the polarity and magnitude of the electrostatic charge applied to the electrostatic plate means.

   50. The apparatus of Claim 48 or Claim 49 further comprising beam alignment sensing means for sensing the alignment of said electron beam with a predetermined desired path around and impinging against predetermined portions of said beam collector means, whereby the beam may be aligned as desired with the beam collector means before it is directed against the target means.

   51. The apparatus of Claim 46 wherein said beam directing means comprises means for directing said electron beam around a path azimuthally about said axis with said beam impinging selectively upon said beam collector means or upon said target means, whereby X-rays may be produced from predetermined points each time the beam impinges upon the target means.

   52. The apparatus of Claim 51 wherein said beam directing means further comprises means for causing said beam to impinge upon a predetermined number of generally equally spaced X-ray producing portions of said target means, where X-rays may be directed toward the object of interest from such predetermined equally spaced points about the target means.

   53. The apparatus of Claim 51 or Claim 52 wherein said selective impingement of said electron beam comprises alternately impinging upon said beam collector means and upon said target means.

   54. The apparatus of Claim 52 or Claim 53 when appendant to Claim 52 wherein said beam directing means further comprises means for selectively changing the diameter of said circular azimuthal path about said axis, whereby said electron beam may be directed selectively about a path impinging upon the beam collector means or about a path impinging upon the target means.

   55. The apparatus of Claim 52 wherein said beam producing means comprises means for producing said electron beam in the form of a plurality of pulses of predetermined duration and at predetermined intervals, whereby the production of beam pulses while the electron beam is being directed about a path impinging upon the target means will produce pulses of X-rays from the target locations upon which the electron beam impinges.

   56. The method of operating the apparatus of Claim 1 so as to produce high intensity X-rays which are directed towards an object of interest from a fixed target means arranged in an annulus spaced radially from a line extending through that object, which method comprises producing a high current electron beam directed towards said object of interest along a longitudinal axis generally parallel with said line through the object, selectively directing the electron beam to preselected points on the target means, and compensating for beam spreading space charge forces acting on the beam by selectively energising said beam-directing means; and shaping the electron beam to said predetermined crosssectional configuration at its points of incidence upon the target means, and correcting said beam aberrations, including sextupole operations, by selectively energising said beam shaping means.

   57. The method according to Claim 56 wherein the beam is shaped by means of quadrupole and sextupole fields and the interaction of the quadrupole and the sextupole fields serves to correct for higher order aberrations introduced into the beam.

   58. The method according to Claim 56 or 57 wherein the beam-directing means comprise electromagnetic elements the energisation of which is adjusted so as to apply a radial outward velocity component to the beam to deflect the beam away from the longitudinal axis and towards the target means.

   59. The method of Claim 58 wherein said beam directing further comprises substantially neutralizing said radially outward beam velocity components a predetermined radial distance outward of said longitudinal axis.

   60. The method of Claim 58 or Claim 59 wherein a focussing force is applied to the beam by electrically energizing at least one circumferentially extending coil located radially outward of said deflected electron beam.

   61. The method of Claim 60 further comprising substantially neutralizing any azimuthal beam velocity components directed circumferentially about said longitudinal axis prior to said beam reaching said target means, whereby the electron beam strikes the annular target with substantially no azimuthal velocity.

   62. The method of Claim 61 wherein said azimuthal beam velocity components are neutralized by application of an electromagnetic field of predetermined magnitude and direction to said electron beam.

   63. The method of Claim 62 wherein said azimuthal beam velocity-neutralizing field is applied to said electron beam by electrically energizing with currents of predetermined magnitude and polarity two circumferentially extending coils spaced apart along said longitudinal axis and located radially outward of said deflected electron beam.

   64. The method of any of Claims 5d63 comprising shaping said electron beam into a generally circular cross-section at a point adjacent its point of incidence upon said target means.

   65. The method of any of Claims 5663 comprising shaping said electron beam into a generally elliptical cross-section at a point adjacent its point of incidence upon said target means.

   66. The method of Claim 65 wherein said generally elliptical cross-section has its major axis lying generally in a plane extending radially outwardly of said longitudinal axis.

   67. The method of Claim 66 wherein said beam is directed slightly radially inwardly at its point of incidence upon said target means, and wherein said target means is angled radially inwardly such that the projected image of said X-rays onto said object of interest is substantially cir intermittently at preselected intervals for preselected periods, whereby the electron beam impinges upon the target means inpulses to produce intermittent pulses of X-rays of predetermined duration at predetermined intervals therefrom.

   74. The method of Claim 72 wherein said electron beam is received into said beam collector when said beam is initially produced, and then, when the voltage of said beam has stabilized, said beam directing elements are energised to direct said beam to said target means for the production of X-rays, whereby a generally stabilized output level of X-rays is produced from the target means.

   75. The method of Claim 74 wherein said electron beam is deflected into said beam collector prior to its reaching said beam directing elements.

   76. The method of any of Claims 72-75 wherein said electron beam is selectively directed at preselected times off said longitudinal axis and into said beam collector prior to reaching said target means and at other times along said longitudinal axis for subsequent deflection to said target means, whereby the selected deflection off the longitudinal axis enables the beam directing elements to remain activated during periods when the electron beam is being produced but X-rays are not desired to be produced from the target.

   77. The method of Claim 56 wherein said electron beam is produced in intermittent pulses of predetermined duration, whereby pulses of X-rays of predetermined duration may be produced from preselected target points by the impingement of the electron beam pulses thereupon.

   78. The method of Claim 71 wherein said beam collector is adjacent and concentric to said target means and further comprising directing said beam to describe a generally circular path about said axis while impinging upon portions of said beam collector, and selectively deflecting said beam to impinge upon either portions of said beam collector or upon portions of said target means corresponding to said preselected points, whereby the selective impingement of the beam upon those portions of the target means may serve to produce X-rays from those preselected points and direct such X-rays toward the object of interest.

   79. The method of Claim 78 wherein beam production is initiated before X-rays are to be directed toward said object of interest and said beam is directed to impinge upon only said beam collector until said X-rays are to be directed toward said object of interest, whereby the operating parameters of the beam may be allowed to stabilize with the beam impinging upon the beam collector before production of X-rays is begun.

   80. The method of Claim 79 wherein said beam directing force comprises an electrostatic field.

   81. The method of Claim 80 wherein said electrostatic field is selectively varied to provide for said selective deflection of said beam between said beam collector and said target means.

   82. The method of Claim 81 wherein said electrostatic field is varied periodically such that said beam is deflected onto said target means periodically during its travel about said circular path, whereby X-rays are produced and directed at the object of interest from points on the target means corresponding to the locations of such periodic impingement of the beam upon the target means.

   83. The method of Claim 82 wherein said electrostatic field is varied sinusoidally.

   84. The method of Claim 83 wherein said electrostatic field is varied in a manner corresponding to alternate half cycles of a sine wave, whereby the total excursion of the beam may be about half the total excursion of a beam deflected by a full, corresponding sine wave.

   85. The method of Claim 84 wherein said deflection causes said electron beam to be deflected about a circular path of predetermined diameter azimuthally about said axis impinging upon spaced, X-ray producing portions of said target means, whereby X-rays may be produced and directed toward the object of interest from such spaced portions of the target means.

   86. The method of Claim 85 wherein said electron beam is produced in the form of a plurality of pulses of predetermined duration and at predetermined intervals, whereby the impingement of each such pulse of the electron beam upon the target means will produce a pulse of X-rays from the portion of the target means upon which the beam is directed.

   87. The method of any of Claims 81-86 wherein said target means comprises a plurality of spaced portions for producing and directing X-rays toward the object of interest when struck by said beam separated by portions which do not produce and direct X-rays toward the object of interest when struck by said beam and wherein said X-rays are produced by deflecting said beam to describe a circular path impinging substantially continuously against said target means during the time said X-rays are desired to be produced, whereby the impingement of the beam against the X-ray producing portions of the target means will provide for direction of X-rays toward the object of interest from those target portions.

   88. The method of any of Claims 78-87 wherein the alignment of said beam circular path is sensed with respect to a predetermined desired path azimuthally about said axis, whereby it may be determined if the beam is properly positioned with respect to the axis to produce the desired pattern of X-rays upon its deflection to the target means.

   89. The method of Claim 88 further comprising the adjustment of said beam direction to correct for any misalignment of said beam with respect to said predetermined desired path, whereby the beam may be properly aligned with the desired path to produce the desired pattern of X-rays.

   90. The method of any of Claims 78-89 further comprising sensing the passage of said beam past a predetermined point on said circular path, whereby that path point may serve as a point of reference with respect to the beam about the path for determination of the time desired for initiation of the deflection of the beam from the beam collector to the target means.

   91. The method of any of Claims 85-90 wherein said beam is directed around said circular path at a predetermined rate, whereby the position of the beam on the path with respect to the predetermined point of reference is a function of time such that the position of the beam on the path at any time may be determined.

   92. Apparatus substantially as described herein with reference to Figures 1--12e or Figures 13-22 of the accompanying drawings.