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GB1534450A - Exposure apparatus - Google Patents

Exposure apparatus

Info

Publication number
GB1534450A
GB1534450A GB34360/77A GB3436077A GB1534450A GB 1534450 A GB1534450 A GB 1534450A GB 34360/77 A GB34360/77 A GB 34360/77A GB 3436077 A GB3436077 A GB 3436077A GB 1534450 A GB1534450 A GB 1534450A
Authority
GB
United Kingdom
Prior art keywords
stencil
cooled
mounting
thermostat
aug
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB34360/77A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Elektromat VEB
Original Assignee
Elektromat VEB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elektromat VEB filed Critical Elektromat VEB
Publication of GB1534450A publication Critical patent/GB1534450A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B17/00—Details of cameras or camera bodies; Accessories therefor
    • G03B17/55—Details of cameras or camera bodies; Accessories therefor with provision for heating or cooling, e.g. in aircraft
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Metallurgy (AREA)
  • Atmospheric Sciences (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Fastening Of Light Sources Or Lamp Holders (AREA)

Abstract

1534450 Cooling exposing apparatus ELEKTROMAT VEB 16 Aug 1977 [17 Aug 1976] 34360/77 Heading G2A Exposing apparatus especially for use in the production of microelectronics has a stencil 3 located between a light source and a mounting 1 for a photo-sensitive substrate (not shown), both the stencil 3 and the mounting 1 being cooled by a thermostatically controlled device. As shown, mounting 1 is cooled by circulating fluid under the control of a thermostat 5. Stencil 3 is cooled by gas supplied by a nozzle 14. The temperature of the gas is controlled by a thermostat 9 and by a control unit 7. Unit 7 receives an input from a sensor 6 and from a shutter 13, since the temperature rises when the shutter opens.
GB34360/77A 1976-08-17 1977-08-16 Exposure apparatus Expired GB1534450A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD19435876A DD127137B1 (en) 1976-08-17 1976-08-17 DEVICE FOR COMPENSATING THE HEAT EFFECT ON ADJUSTING AND EXPOSURE DEVICES

Publications (1)

Publication Number Publication Date
GB1534450A true GB1534450A (en) 1978-12-06

Family

ID=5505450

Family Applications (1)

Application Number Title Priority Date Filing Date
GB34360/77A Expired GB1534450A (en) 1976-08-17 1977-08-16 Exposure apparatus

Country Status (6)

Country Link
CS (1) CS206603B1 (en)
DD (1) DD127137B1 (en)
DE (1) DE2735043A1 (en)
FR (1) FR2362419A1 (en)
GB (1) GB1534450A (en)
SU (1) SU664245A1 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2204705A (en) * 1987-04-21 1988-11-16 Brother Ind Ltd Exposure device for an image recording apparatus
US5063582A (en) * 1988-09-02 1991-11-05 Canon Kabushiki Kaisha Liquid cooled x-ray lithographic exposure apparatus
US5093579A (en) * 1989-07-13 1992-03-03 Canon Kabushiki Kaisha Exposure apparatus with a substrate holding mechanism
US5138643A (en) * 1989-10-02 1992-08-11 Canon Kabushiki Kaisha Exposure apparatus
US10048602B2 (en) 2004-02-04 2018-08-14 Nikon Corporation Exposure apparatus, exposure method, and method for producing device

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1578259A (en) * 1977-05-11 1980-11-05 Philips Electronic Associated Methods of manufacturing solid-state devices apparatus for use therein and devices manufactured thereby
DE2922642C2 (en) * 1979-06-02 1981-10-01 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe Process for the manufacture of plates for the construction of separation nozzle elements
DD150263A1 (en) * 1980-05-02 1981-08-19 Schneider Hans Joachim TEMPERATING DEVICE, ESPECIALLY FOR LITHOGRAPHIC DEVICES
US4391034A (en) * 1980-12-22 1983-07-05 Ibm Corporation Thermally compensated shadow mask
JPS57169244A (en) * 1981-04-13 1982-10-18 Canon Inc Temperature controller for mask and wafer
DD160756A3 (en) * 1981-04-24 1984-02-29 Gudrun Dietz ARRANGEMENT FOR IMPROVING PHOTOCHEMICAL IMPLEMENTATION PROCESSES IN PHOTORESIS LAYERS
DE3306999A1 (en) * 1982-03-31 1983-10-06 Censor Patent Versuch Fixture for clamping a workpiece
EP0349208A3 (en) * 1988-06-27 1991-01-16 Seiko Instruments Inc. Image forming apparatus
JPH0276212A (en) * 1988-09-13 1990-03-15 Canon Inc Multiple exposure method
IT1235478B (en) * 1989-09-26 1992-08-19 Achille Fiorentini BACK WITH HEATING ELEMENTS FOR IMMEDIATE DEVELOPMENT FILM.
DE29704681U1 (en) * 1997-03-14 1998-07-16 Wündsch, Dieter, 50259 Pulheim Cooling device for film projectors

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2204705A (en) * 1987-04-21 1988-11-16 Brother Ind Ltd Exposure device for an image recording apparatus
US4864356A (en) * 1987-04-21 1989-09-05 Brother Kogyo Kabushiki Kaisha Exposure device for image recording apparatus
GB2204705B (en) * 1987-04-21 1991-06-19 Brother Ind Ltd Exposure device for an image recording apparatus
US5063582A (en) * 1988-09-02 1991-11-05 Canon Kabushiki Kaisha Liquid cooled x-ray lithographic exposure apparatus
US5093579A (en) * 1989-07-13 1992-03-03 Canon Kabushiki Kaisha Exposure apparatus with a substrate holding mechanism
US5138643A (en) * 1989-10-02 1992-08-11 Canon Kabushiki Kaisha Exposure apparatus
US10048602B2 (en) 2004-02-04 2018-08-14 Nikon Corporation Exposure apparatus, exposure method, and method for producing device

Also Published As

Publication number Publication date
CS206603B1 (en) 1981-06-30
FR2362419A1 (en) 1978-03-17
SU664245A1 (en) 1979-05-25
DD127137A1 (en) 1977-09-07
FR2362419B3 (en) 1980-07-11
DE2735043A1 (en) 1978-02-23
DD127137B1 (en) 1979-11-28

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee