GB1524264A - Photopolymerizable compositions - Google Patents
Photopolymerizable compositionsInfo
- Publication number
- GB1524264A GB1524264A GB2770376A GB2770376A GB1524264A GB 1524264 A GB1524264 A GB 1524264A GB 2770376 A GB2770376 A GB 2770376A GB 2770376 A GB2770376 A GB 2770376A GB 1524264 A GB1524264 A GB 1524264A
- Authority
- GB
- United Kingdom
- Prior art keywords
- parts
- photopolymerizable compositions
- july
- per
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000203 mixture Substances 0.000 title abstract 4
- 150000001875 compounds Chemical class 0.000 abstract 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract 1
- 206010034960 Photophobia Diseases 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 abstract 1
- 208000013469 light sensitivity Diseases 0.000 abstract 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
1524264 Photopolymerizable compositions E I DU PONT DE NEMOURS & CO 2 July 1976 [3 July 1975] 27703/76 Heading C3V Photopolymerizable compositions, which do not lose light-sensitivity on storage and which produce flexible polymeric products on exposure, comprise an organic polymeric binder (e.g. a methyl methacrylate polymer); 5-90 parts (per 100 parts by weight of the composition) of an addition polymerizable compound of the formula where R is H or methyl and X is phenylene or -(CH2)n-2- where m and n are each 2-10; and 0À001-20 parts (per 100 parts by weight of the polymerizable compound) of a photoinitiator.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US59310675A | 1975-07-03 | 1975-07-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1524264A true GB1524264A (en) | 1978-09-13 |
Family
ID=24373410
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB2770376A Expired GB1524264A (en) | 1975-07-03 | 1976-07-02 | Photopolymerizable compositions |
Country Status (5)
| Country | Link |
|---|---|
| JP (2) | JPS529091A (en) |
| BE (1) | BE843723A (en) |
| DE (1) | DE2628562B2 (en) |
| FR (1) | FR2316627A1 (en) |
| GB (1) | GB1524264A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2628562B2 (en) * | 1975-07-03 | 1979-03-01 | E.I. Du Pont De Nemours And Co., Wilmington, Del. (V.St.A.) | Photopolymerizable compositions and their use |
| DE2933827A1 (en) * | 1979-08-21 | 1981-03-12 | Siemens AG, 1000 Berlin und 8000 München | METHOD FOR PRODUCING HIGH-TEMPERATURE-RESISTANT RELIEF STRUCTURES AND THE USE THEREOF. |
| DE2952697A1 (en) * | 1979-12-29 | 1981-07-02 | Hoechst Ag, 6230 Frankfurt | POLYMERIZABLE MIXTURE BY RADIATION AND RADIATION-SENSITIVE COPY MATERIAL MADE THEREFOR |
| US4322490A (en) * | 1980-11-17 | 1982-03-30 | Eastman Kodak Company | Photopolymerizable compositions featuring improved monomers |
| JPS57196229A (en) * | 1981-05-26 | 1982-12-02 | Horizons Research Inc | Plasma developable photosensitive composition and formation and development of image |
| JP2826331B2 (en) * | 1988-12-15 | 1998-11-18 | ダイセル化学工業株式会社 | Photopolymerizable composition |
| JPH038314A (en) * | 1989-06-06 | 1991-01-16 | Matsushita Electric Ind Co Ltd | Aluminum case for electrolytic capacitor |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE604100A (en) * | 1960-06-03 | |||
| GB1235769A (en) * | 1969-03-20 | 1971-06-16 | Ppg Industries Inc | Highly radiation-sensitive telomerized polyesters |
| JPS5034444B2 (en) * | 1971-08-20 | 1975-11-08 | ||
| JPS5340537B2 (en) * | 1974-12-27 | 1978-10-27 | ||
| DE2628562B2 (en) * | 1975-07-03 | 1979-03-01 | E.I. Du Pont De Nemours And Co., Wilmington, Del. (V.St.A.) | Photopolymerizable compositions and their use |
-
1976
- 1976-06-25 DE DE19762628562 patent/DE2628562B2/en not_active Withdrawn
- 1976-06-30 FR FR7619907A patent/FR2316627A1/en active Granted
- 1976-07-02 BE BE168586A patent/BE843723A/en not_active IP Right Cessation
- 1976-07-02 GB GB2770376A patent/GB1524264A/en not_active Expired
- 1976-07-02 JP JP7797076A patent/JPS529091A/en active Pending
-
1979
- 1979-03-15 JP JP3100279A patent/JPS5540485A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2316627A1 (en) | 1977-01-28 |
| JPS5540485A (en) | 1980-03-21 |
| JPS529091A (en) | 1977-01-24 |
| FR2316627B1 (en) | 1981-10-30 |
| DE2628562A1 (en) | 1977-01-27 |
| DE2628562B2 (en) | 1979-03-01 |
| BE843723A (en) | 1977-01-03 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |