GB1543845A - Production of a narrow opening to a surface of a material - Google Patents

Production of a narrow opening to a surface of a material

Info

Publication number: GB1543845A
Authority: GB; United Kingdom
Prior art keywords: production; narrow opening; narrow; opening
Prior art date: 1975-05-27
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

GB18186/76A

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Fairchild Semiconductor Corp

Original Assignee

Fairchild Camera and Instrument Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1975-05-27

Filing date

1976-05-04

Publication date

1979-04-11

1975-10-06 Priority claimed from US05/619,735 external-priority patent/US4063992A/en

1976-05-04 Application filed by Fairchild Camera and Instrument Corp filed Critical Fairchild Camera and Instrument Corp

1979-04-11 Publication of GB1543845A publication Critical patent/GB1543845A/en

Status Expired legal-status Critical Current

Classifications

- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D44/00—Charge transfer devices
- H10D44/40—Charge-coupled devices [CCD]
- H10D44/45—Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes
- H10D44/462—Buried-channel CCD
- H10D44/466—Three-phase CCD
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D44/00—Charge transfer devices
- H10D44/40—Charge-coupled devices [CCD]
- H10D44/45—Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes
- H10D44/462—Buried-channel CCD
- H10D44/464—Two-phase CCD
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0198—Integrating together multiple components covered by H10D44/00, e.g. integrating charge coupled devices
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
- H10P95/00—
- H10W20/40—

GB18186/76A 1975-05-27 1976-05-04 Production of a narrow opening to a surface of a material Expired GB1543845A (en)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US58138975A	1975-05-27	1975-05-27
US05/619,735 US4063992A (en)	1975-05-27	1975-10-06	Edge etch method for producing narrow openings to the surface of materials

Publications (1)

Publication Number	Publication Date
GB1543845A true GB1543845A (en)	1979-04-11

Family

ID=27078310

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
GB18186/76A Expired GB1543845A (en)	1975-05-27	1976-05-04	Production of a narrow opening to a surface of a material

Country Status (6)

Country	Link
JP (1)	JPS51145274A (en)
CA (1)	CA1076934A (en)
DE (1)	DE2622790A1 (en)
FR (1)	FR2312856A1 (en)
GB (1)	GB1543845A (en)
NL (1)	NL7605549A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2939488A1 (en) *	1979-09-28	1981-04-16	Siemens AG, 1000 Berlin und 8000 München	METHOD FOR PRODUCING INTEGRATED SEMICONDUCTOR CIRCUITS, IN PARTICULAR CCD CIRCUITS, WITH SELF-ADJUSTED, NON-OVERLAPPING POLY-SILICON ELECTRODES
DE2939456A1 (en) *	1979-09-28	1981-04-16	Siemens AG, 1000 Berlin und 8000 München	METHOD FOR PRODUCING INTEGRATED SEMICONDUCTOR CIRCUITS, IN PARTICULAR CCD CIRCUITS, WITH SELF-ADJUSTED, NON-OVERLAPPING POLY-SILICON ELECTRODES
EP0068846A1 (en) *	1981-06-26	1983-01-05	Fujitsu Limited	Forming a pattern of metal elements on a substrate
US7863654B2 (en)	1998-12-21	2011-01-04	Megica Corporation	Top layers of metal for high performance IC's

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS544570A (en) *	1977-06-13	1979-01-13	Nec Corp	Production of semiconductor devices
JPS5533064A (en) *	1978-08-29	1980-03-08	Chiyou Lsi Gijutsu Kenkyu Kumiai	Method of manufacturing semiconductor device
FR2454698A1 (en) *	1979-04-20	1980-11-14	Radiotechnique Compelec	METHOD FOR PRODUCING INTEGRATED CIRCUITS USING A MULTILAYER MASK AND DEVICES OBTAINED BY THIS METHOD
US4317690A (en)	1980-06-18	1982-03-02	Signetics Corporation	Self-aligned double polysilicon MOS fabrication
US4318759A (en) *	1980-07-21	1982-03-09	Data General Corporation	Retro-etch process for integrated circuits
US5126811A (en) *	1990-01-29	1992-06-30	Mitsubishi Denki Kabushiki Kaisha	Charge transfer device with electrode structure of high transfer efficiency
RU2112300C1 (en) *	1995-03-10	1998-05-27	Институт физики полупроводников СО РАН	Protective mask manufacturing process for nanolithography

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NL7005296A (en) *	1969-04-15	1970-10-19
JPS4874178A (en) *	1971-12-29	1973-10-05
MX3855E (en) *	1975-03-21	1981-08-20	Western Electric Co	IMPROVEMENTS IN THE METHOD FOR MANUFACTURING TRANSISTOR STRUCTURES

1976
- 1976-05-04 GB GB18186/76A patent/GB1543845A/en not_active Expired
- 1976-05-21 DE DE19762622790 patent/DE2622790A1/en not_active Withdrawn
- 1976-05-24 NL NL7605549A patent/NL7605549A/en not_active Application Discontinuation
- 1976-05-25 FR FR7615774A patent/FR2312856A1/en active Granted
- 1976-05-26 CA CA253,422A patent/CA1076934A/en not_active Expired
- 1976-05-27 JP JP51060708A patent/JPS51145274A/en active Granted

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2939488A1 (en) *	1979-09-28	1981-04-16	Siemens AG, 1000 Berlin und 8000 München	METHOD FOR PRODUCING INTEGRATED SEMICONDUCTOR CIRCUITS, IN PARTICULAR CCD CIRCUITS, WITH SELF-ADJUSTED, NON-OVERLAPPING POLY-SILICON ELECTRODES
DE2939456A1 (en) *	1979-09-28	1981-04-16	Siemens AG, 1000 Berlin und 8000 München	METHOD FOR PRODUCING INTEGRATED SEMICONDUCTOR CIRCUITS, IN PARTICULAR CCD CIRCUITS, WITH SELF-ADJUSTED, NON-OVERLAPPING POLY-SILICON ELECTRODES
EP0068846A1 (en) *	1981-06-26	1983-01-05	Fujitsu Limited	Forming a pattern of metal elements on a substrate
US7863654B2 (en)	1998-12-21	2011-01-04	Megica Corporation	Top layers of metal for high performance IC's
US7884479B2 (en)	1998-12-21	2011-02-08	Megica Corporation	Top layers of metal for high performance IC's
US7999384B2 (en)	1998-12-21	2011-08-16	Megica Corporation	Top layers of metal for high performance IC's
US8022545B2 (en)	1998-12-21	2011-09-20	Megica Corporation	Top layers of metal for high performance IC's
US8415800B2 (en)	1998-12-21	2013-04-09	Megica Corporation	Top layers of metal for high performance IC's
US8471384B2 (en)	1998-12-21	2013-06-25	Megica Corporation	Top layers of metal for high performance IC's
US8531038B2 (en)	1998-12-21	2013-09-10	Megica Corporation	Top layers of metal for high performance IC's

Also Published As

Publication number	Publication date
AU1437576A (en)	1977-12-01
DE2622790A1 (en)	1976-12-09
FR2312856B1 (en)	1982-11-05
CA1076934A (en)	1980-05-06
JPS51145274A (en)	1976-12-14
FR2312856A1 (en)	1976-12-24
NL7605549A (en)	1976-11-30
JPS5711505B2 (en)	1982-03-04

Publication	Publication Date	Title
JPS51118763A (en)	1976-10-18	Production of alkylenecarbonate
JPS5271528A (en)	1977-06-15	Production of coated material
JPS5236683A (en)	1977-03-22	Production of riphamycin
PT65746A (en)	1976-11-01	Production of pulp
GB1543845A (en)	1979-04-11	Production of a narrow opening to a surface of a material
JPS5241643A (en)	1977-03-31	Production of coated material
JPS51131873A (en)	1976-11-16	Production of 44loneralkyll 55cyanoooxazole
JPS51131876A (en)	1976-11-16	Production of 55 acetoacetylaminobenzimidazolone
JPS51115473A (en)	1976-10-12	Production of lower alkylimidazolecarboxylate
JPS51115465A (en)	1976-10-12	Production of 55phenyll 22framidoxime
JPS5251047A (en)	1977-04-23	Production of bread material
JPS51115456A (en)	1976-10-12	Production of 44 acylaminoanthrone
JPS51143658A (en)	1976-12-10	Production of 55222 dihalovynyl*444dimethyll 22oxotetrafuran
JPS5273858A (en)	1977-06-21	Production of phospholenee 11calcogenite
JPS5257157A (en)	1977-05-11	Production of 22 alkyl indane
IL50828A (en)	1979-11-30	Process for the production of a fire-extinguishing composition and composition obtained
JPS5221409A (en)	1977-02-18	Production of specific paper
JPS5257173A (en)	1977-05-11	Production of thiazole
JPS5238049A (en)	1977-03-24	Production of food material
JPS5246113A (en)	1977-04-12	Production of transpalent paper
JPS5212310A (en)	1977-01-29	Production of transpalent paper
JPS5411210A (en)	1979-01-27	Production of surface material
JPS5238048A (en)	1977-03-24	Production of food material
JPS5210263A (en)	1977-01-26	Production of 33444 tetrachlorotetrahydrothiophenee 111dioxide
JPS5263410A (en)	1977-05-25	Production of paper

Legal Events

Date	Code	Title	Description
1979-06-27	PS	Patent sealed [section 19, patents act 1949]
1986-01-15	PCNP	Patent ceased through non-payment of renewal fee