GB1411966A - Photosensitive polyamide compositions - Google Patents
Photosensitive polyamide compositionsInfo
- Publication number
- GB1411966A GB1411966A GB5819672A GB5819672A GB1411966A GB 1411966 A GB1411966 A GB 1411966A GB 5819672 A GB5819672 A GB 5819672A GB 5819672 A GB5819672 A GB 5819672A GB 1411966 A GB1411966 A GB 1411966A
- Authority
- GB
- United Kingdom
- Prior art keywords
- sulphonate
- meth
- polyamide
- derivatives
- groups
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004952 Polyamide Substances 0.000 title abstract 5
- 229920002647 polyamide Polymers 0.000 title abstract 5
- 239000000203 mixture Substances 0.000 title abstract 3
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 abstract 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 abstract 4
- 150000001875 compounds Chemical class 0.000 abstract 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 abstract 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 abstract 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 abstract 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 abstract 2
- 239000000376 reactant Substances 0.000 abstract 2
- -1 triazine compound Chemical class 0.000 abstract 2
- IAHOUQOWMXVMEH-UHFFFAOYSA-N 2,4,6-trinitroaniline Chemical compound NC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O IAHOUQOWMXVMEH-UHFFFAOYSA-N 0.000 abstract 1
- TYMLOMAKGOJONV-UHFFFAOYSA-N 4-nitroaniline Chemical compound NC1=CC=C([N+]([O-])=O)C=C1 TYMLOMAKGOJONV-UHFFFAOYSA-N 0.000 abstract 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 abstract 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 abstract 1
- 239000004342 Benzoyl peroxide Substances 0.000 abstract 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 abstract 1
- 229920002292 Nylon 6 Polymers 0.000 abstract 1
- 229920002302 Nylon 6,6 Polymers 0.000 abstract 1
- 244000028419 Styrax benzoin Species 0.000 abstract 1
- 235000000126 Styrax benzoin Nutrition 0.000 abstract 1
- 235000008411 Sumatra benzointree Nutrition 0.000 abstract 1
- 239000007983 Tris buffer Substances 0.000 abstract 1
- 229910052783 alkali metal Inorganic materials 0.000 abstract 1
- 150000001340 alkali metals Chemical class 0.000 abstract 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 abstract 1
- 150000004056 anthraquinones Chemical class 0.000 abstract 1
- 150000008378 aryl ethers Chemical class 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- JXLHNMVSKXFWAO-UHFFFAOYSA-N azane;7-fluoro-2,1,3-benzoxadiazole-4-sulfonic acid Chemical compound N.OS(=O)(=O)C1=CC=C(F)C2=NON=C12 JXLHNMVSKXFWAO-UHFFFAOYSA-N 0.000 abstract 1
- DMKGSUIMVRYBCS-UHFFFAOYSA-N benzhydryl(methyl)diazene Chemical compound C=1C=CC=CC=1C(N=NC)C1=CC=CC=C1 DMKGSUIMVRYBCS-UHFFFAOYSA-N 0.000 abstract 1
- 229960002130 benzoin Drugs 0.000 abstract 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 abstract 1
- 239000012965 benzophenone Substances 0.000 abstract 1
- 235000019400 benzoyl peroxide Nutrition 0.000 abstract 1
- 150000001768 cations Chemical class 0.000 abstract 1
- 125000000524 functional group Chemical group 0.000 abstract 1
- 235000019382 gum benzoic Nutrition 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- 239000003112 inhibitor Substances 0.000 abstract 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 125000001453 quaternary ammonium group Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
- C08G69/42—Polyamides containing atoms other than carbon, hydrogen, oxygen, and nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/04—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polycarbonamides, polyesteramides or polyimides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polyamides (AREA)
- Graft Or Block Polymers (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
Abstract
1411966 Photopolymerizable compositions containing polyamides UNITIKA Ltd 15 Dec 1972 [15 Dec 1971] 58196/72 Headings C3P and C3R [Also in Divisions G2 and C2] Photosensitive compositions useful in the production of printing plates comprise one or more polyamides having pendant sulphonate salt groups, one or more unsaturated compounds having at least two polymerizable ethylenic double bonds, and one or more photoinitiators. The polyamide sulphonate can be prepared by reacting a polyamide-forming reactant with a polyfunctional compound having a sulphonate salt group, e.g. a triazine compound containing aromatic ether (and optionally also hydroxyl group) and sulphonate substituents; or by reacting a polyamide-forming reactant with an aromatic or aliphatic sulphonate salt having two amide-forming functional groups. Preferred polyamides into which the sulphonate groups are introduced are copolyamides of nylon 6, nylon 66 and poly-(hexamethylene-(5-sodiumsulpho)-isophthalamide). The cation of the sulphonate salt groups is preferably alkali metal ammonium, or quaternary ammonium. Suitable unsaturated compounds include bis-(alk)-acrylamides, glycol di - (meth) - acrylates, tris - N- (meth) - acryloyl - hexahydrotriazine, pentaerythritol tetra-(meth)-acrylate, glycerol tri-(meth)- acrylate and O,N - diacryloyl - m - aminophenol. Examples of photoinitiators are benzoyl peroxide, azobisisobutyronitrile, diphenylazomethane, benzophenone and derivatives, benzoin and derivatives, anthraquinone, p-nitro aniline and picramide. Optional components include polymerization inhibitors, compounds containing only one polymerizable ethylenic double bond, e.g. acrylamide and its derivatives and glycol mono-(meth)-acrylates.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB5190974A GB1463900A (en) | 1971-12-15 | 1974-11-29 | Photosensitive polyamide composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP46101680A JPS516562B2 (en) | 1971-12-15 | 1971-12-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1411966A true GB1411966A (en) | 1975-10-29 |
Family
ID=14307047
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB5819672A Expired GB1411966A (en) | 1971-12-15 | 1972-12-15 | Photosensitive polyamide compositions |
| GB5190974A Expired GB1463900A (en) | 1971-12-15 | 1974-11-29 | Photosensitive polyamide composition |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB5190974A Expired GB1463900A (en) | 1971-12-15 | 1974-11-29 | Photosensitive polyamide composition |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS516562B2 (en) |
| DE (1) | DE2261494C2 (en) |
| FR (1) | FR2163703B1 (en) |
| GB (2) | GB1411966A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0775773A4 (en) * | 1994-08-09 | 1998-08-26 | Asahi Chemical Ind | Adhesive padding cloth, method of manufacturing the same and bonding agent for adhesive cloths |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49127708A (en) * | 1973-04-16 | 1974-12-06 | ||
| JPS5092996A (en) * | 1973-12-22 | 1975-07-24 | ||
| JPS50105126A (en) * | 1974-01-26 | 1975-08-19 | ||
| JPS50108003A (en) * | 1974-02-01 | 1975-08-26 | ||
| JPS5149803A (en) * | 1974-10-28 | 1976-04-30 | Unitika Ltd | KANKOSEIJUSHISOSEIBUTSUNO NENCHAKUSEIBOSHIHOHO |
| CA1149985A (en) * | 1980-04-26 | 1983-07-12 | Takashi Okamoto | Resin composition comprising water-soluble polyamide and vinyl alcohol-based polymer |
| GB2092164B (en) * | 1980-12-17 | 1984-12-05 | Hitachi Ltd | Loght or radiation-sensitive polymer composition |
| JPS5967258U (en) * | 1982-10-27 | 1984-05-07 | 東レ株式会社 | stamp |
| JPS6030965U (en) * | 1983-08-05 | 1985-03-02 | 三菱重工業株式会社 | Refrigeration equipment |
| GB2235927B (en) * | 1989-09-14 | 1992-10-21 | Asahi Chemical Ind | A sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same |
| DE69413762T2 (en) * | 1993-07-20 | 1999-03-04 | Toray Industries, Inc., Tokio/Tokyo | Photosensitive polymer composition |
| US6010821A (en) * | 1997-05-23 | 2000-01-04 | Minnesota Mining And Manufacturing Company | Aqueous developable color proofing elements |
| US6569602B1 (en) * | 1998-10-05 | 2003-05-27 | E. I. Du Pont De Nemours And Company | Ionization radiation imageable photopolymer compositions |
| US6890701B2 (en) | 2001-09-11 | 2005-05-10 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
| ATE402236T1 (en) * | 2005-02-10 | 2008-08-15 | Bozzetto Gmbh | CROSS-LINKABLE HOT-HOT ADHESIVE MIXTURE |
| DE102006017346B4 (en) * | 2006-04-11 | 2011-01-27 | Cpp Creative - Polymers - Produktions Gmbh | Migration-stable masterbatch with improved crosslinking properties, process for its preparation and use thereof |
| JP2008273453A (en) * | 2007-05-02 | 2008-11-13 | Hinomoto Osaka:Kk | Wheel for bag |
| US9828467B2 (en) | 2016-02-05 | 2017-11-28 | International Business Machines Corporation | Photoresponsive hexahydrotriazine polymers |
-
1971
- 1971-12-15 JP JP46101680A patent/JPS516562B2/ja not_active Expired
-
1972
- 1972-12-15 FR FR7244824A patent/FR2163703B1/fr not_active Expired
- 1972-12-15 GB GB5819672A patent/GB1411966A/en not_active Expired
- 1972-12-15 DE DE19722261494 patent/DE2261494C2/en not_active Expired
-
1974
- 1974-11-29 GB GB5190974A patent/GB1463900A/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0775773A4 (en) * | 1994-08-09 | 1998-08-26 | Asahi Chemical Ind | Adhesive padding cloth, method of manufacturing the same and bonding agent for adhesive cloths |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2163703B1 (en) | 1981-06-26 |
| DE2261494A1 (en) | 1973-07-05 |
| JPS4868302A (en) | 1973-09-18 |
| JPS516562B2 (en) | 1976-02-28 |
| DE2261494C2 (en) | 1982-03-04 |
| FR2163703A1 (en) | 1973-07-27 |
| GB1463900A (en) | 1977-02-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |