GB1483641A - Light-sensitive vesicular mediums - Google Patents
Light-sensitive vesicular mediumsInfo
- Publication number
- GB1483641A GB1483641A GB3333574A GB3333574A GB1483641A GB 1483641 A GB1483641 A GB 1483641A GB 3333574 A GB3333574 A GB 3333574A GB 3333574 A GB3333574 A GB 3333574A GB 1483641 A GB1483641 A GB 1483641A
- Authority
- GB
- United Kingdom
- Prior art keywords
- light
- copolymer
- methacrylonitrile
- vesicular
- matrix
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920001577 copolymer Polymers 0.000 abstract 4
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 abstract 3
- 239000011159 matrix material Substances 0.000 abstract 3
- 239000000203 mixture Substances 0.000 abstract 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 abstract 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract 2
- 229920003214 poly(methacrylonitrile) Polymers 0.000 abstract 2
- 239000004814 polyurethane Substances 0.000 abstract 2
- 229920002635 polyurethane Polymers 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 abstract 2
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 abstract 1
- -1 2,5-diethoxy-p-morpholinobenzene diazonium tetrafluorborate Chemical compound 0.000 abstract 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 abstract 1
- OYUNTGBISCIYPW-UHFFFAOYSA-N 2-chloroprop-2-enenitrile Chemical compound ClC(=C)C#N OYUNTGBISCIYPW-UHFFFAOYSA-N 0.000 abstract 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 abstract 1
- ZMCUKVHWGLAGMK-UHFFFAOYSA-N 4,4,4-trifluoro-2-methylidene-3-(trifluoromethyl)butanoic acid Chemical compound OC(=O)C(=C)C(C(F)(F)F)C(F)(F)F ZMCUKVHWGLAGMK-UHFFFAOYSA-N 0.000 abstract 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 abstract 1
- 239000004593 Epoxy Substances 0.000 abstract 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 abstract 1
- 229940106691 bisphenol a Drugs 0.000 abstract 1
- 229920001400 block copolymer Polymers 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000012954 diazonium Substances 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical compound [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 abstract 1
- 239000003822 epoxy resin Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 abstract 1
- 229920000647 polyepoxide Polymers 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 229920002959 polymer blend Polymers 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 229920002554 vinyl polymer Polymers 0.000 abstract 1
- 235000005074 zinc chloride Nutrition 0.000 abstract 1
- 239000011592 zinc chloride Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/60—Processes for obtaining vesicular images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
1483641 Light-sensitive vesicular polymer blends KALVAR CORP 29 July 1974 33335/74 Headings C3C and C3B [Also in Division G2] A light-sensitive vesicular medium has a matrix comprising a blend of polymethacrylonitrile with another compatible (as defined) resin which is (a) a vinyl polymer, (b) an epoxy polymer or (c) a copolymer with polyurethane segments, there being dispersed in the matrix a light-sensitive compound which is capable of decomposing to liberate gas when exposed to actinic radiation, the matrix being obtained from a single phase solution or mixture of solutions of the two resins. In the examples, 2,5-diethoxy-p-morpholinobenzene diazonium tetrafluorborate or pdimethylaminobenzene diazonium chloride (zinc chloride double salt) were dispersed in blends of polymethacrylonitrile and copolymers of acrylonitrile and vinylidene chloride, α-chloroacrylonitrile and methacrylonitrile, acrylonitrile and methacrylonitrile, a block copolymer of polyurethane, hydroxyethyl methacrylate and methaerylonitrile, poly - α - chloroacrylonitrile, a methyl vinyl ether or styrene/maleic anhydride copolymer, an epoxy resin made from epichlorohydrin and bisphenol-A, or a copolymer of methacrylonitrile and isobutyl acrylate or hexafluorisopropylacrylate. The vesicular mediums are used as photographic materials, and are developed, after exposure to image forming light by heating and/or overall exposure to light.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB3333574A GB1483641A (en) | 1974-07-29 | 1974-07-29 | Light-sensitive vesicular mediums |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB3333574A GB1483641A (en) | 1974-07-29 | 1974-07-29 | Light-sensitive vesicular mediums |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1483641A true GB1483641A (en) | 1977-08-24 |
Family
ID=10351616
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB3333574A Expired GB1483641A (en) | 1974-07-29 | 1974-07-29 | Light-sensitive vesicular mediums |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB1483641A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0036036A3 (en) * | 1980-03-19 | 1981-10-28 | R.Q.O. Holding Company,Inc. | Vesicular film compositions and elements |
| US4339520A (en) | 1980-04-16 | 1982-07-13 | Hoechst Aktiengesellschaft | Light-sensitive vesicular material |
| CN120349105A (en) * | 2025-06-25 | 2025-07-22 | 安徽信义光伏玻璃有限公司 | Dustproof photovoltaic anti-reflection coated glass and preparation method thereof |
-
1974
- 1974-07-29 GB GB3333574A patent/GB1483641A/en not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0036036A3 (en) * | 1980-03-19 | 1981-10-28 | R.Q.O. Holding Company,Inc. | Vesicular film compositions and elements |
| US4339520A (en) | 1980-04-16 | 1982-07-13 | Hoechst Aktiengesellschaft | Light-sensitive vesicular material |
| CN120349105A (en) * | 2025-06-25 | 2025-07-22 | 安徽信义光伏玻璃有限公司 | Dustproof photovoltaic anti-reflection coated glass and preparation method thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |