GB1447410A - Photocells - Google Patents
PhotocellsInfo
- Publication number
- GB1447410A GB1447410A GB4899773A GB4899773A GB1447410A GB 1447410 A GB1447410 A GB 1447410A GB 4899773 A GB4899773 A GB 4899773A GB 4899773 A GB4899773 A GB 4899773A GB 1447410 A GB1447410 A GB 1447410A
- Authority
- GB
- United Kingdom
- Prior art keywords
- layer
- substrate
- resistivity
- junction
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 abstract 4
- 238000009792 diffusion process Methods 0.000 abstract 2
- 230000035945 sensitivity Effects 0.000 abstract 2
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 239000000969 carrier Substances 0.000 abstract 1
- 238000002955 isolation Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
- H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
- H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
- H10F30/221—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes the potential barrier being a PN homojunction
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/206—Electrodes for devices having potential barriers
- H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F99/00—Subject matter not provided for in other groups of this subclass
Landscapes
- Light Receiving Elements (AREA)
- Photovoltaic Devices (AREA)
Abstract
1447410 Photocells FERRANTI Ltd 14 Oct 1974 [20 Oct 1973] 48997/73 Heading H1K A photocell responsive to ultra-violet and/or blue light comprises a thin N-type epitaxial layer 10 on a P-type substrate 11, the thickness of the layer 10 being in the range 0À1-1À0 mean minority carrier diffusion lengths. Minority carriers generated in the layer 10 by the absorption of ultra-violet or blue light can thus reach the junction 13. A suitable thickness of layer 10 is 0À1-10 Á (preferably 1 Á) for a resistivity of 0À1-10 #cm. (preferably 2 #cm). If red sensitivity is also desired the substrate resistivity is made at least 1À0 #cm. (preferably 10 #cm.), but if no red sensitivity is desired the substrate resistivity may be less than 0À1 #cm. (preferably 0À01 #cm).. The device shown includes diffused P<SP>+</SP>-type isolation walls 18 to laterally define the sensitive junction 13, but a conventional whole-area junction device with a comb-shaped upper electrode is also described. For a Si device the substrate 11 may be B-doped, since B diffusion upwards into the growing layer 10 will reduce the effective thickness of the layer 10.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB4899773A GB1447410A (en) | 1973-10-20 | 1973-10-20 | Photocells |
| DE19742447289 DE2447289A1 (en) | 1973-10-20 | 1974-10-03 | PHOTOCELL |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB4899773A GB1447410A (en) | 1973-10-20 | 1973-10-20 | Photocells |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1447410A true GB1447410A (en) | 1976-08-25 |
Family
ID=10450748
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB4899773A Expired GB1447410A (en) | 1973-10-20 | 1973-10-20 | Photocells |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE2447289A1 (en) |
| GB (1) | GB1447410A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4322571A (en) * | 1980-07-17 | 1982-03-30 | The Boeing Company | Solar cells and methods for manufacture thereof |
| US4367368A (en) * | 1981-05-15 | 1983-01-04 | University Patents Inc. | Solar cell |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2835136A1 (en) * | 1978-08-10 | 1980-02-14 | Fraunhofer Ges Forschung | SOLAR ELEMENT AND METHOD AND DEVICE FOR PRODUCING THE SAME BY MEANS OF ION IMPLANTATION |
| EP0178664B1 (en) * | 1984-10-18 | 1992-08-05 | Matsushita Electronics Corporation | Solid state image sensing device and method for making the same |
| DE4217428A1 (en) * | 1991-12-09 | 1993-06-17 | Deutsche Aerospace | High performance silicon crystalline solar cell structure - has more highly doped layer integrated in lightly doped layer in area below metallic contact |
-
1973
- 1973-10-20 GB GB4899773A patent/GB1447410A/en not_active Expired
-
1974
- 1974-10-03 DE DE19742447289 patent/DE2447289A1/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4322571A (en) * | 1980-07-17 | 1982-03-30 | The Boeing Company | Solar cells and methods for manufacture thereof |
| US4367368A (en) * | 1981-05-15 | 1983-01-04 | University Patents Inc. | Solar cell |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2447289A1 (en) | 1975-04-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |