GB1440776A - Electron-beam apparatus - Google Patents
Electron-beam apparatusInfo
- Publication number
- GB1440776A GB1440776A GB4577273A GB4577273A GB1440776A GB 1440776 A GB1440776 A GB 1440776A GB 4577273 A GB4577273 A GB 4577273A GB 4577273 A GB4577273 A GB 4577273A GB 1440776 A GB1440776 A GB 1440776A
- Authority
- GB
- United Kingdom
- Prior art keywords
- jaws
- wire
- current
- anode
- tip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 title abstract 3
- 230000005855 radiation Effects 0.000 abstract 3
- 101100188552 Arabidopsis thaliana OCT3 gene Proteins 0.000 abstract 1
- 101100234822 Caenorhabditis elegans ltd-1 gene Proteins 0.000 abstract 1
- 230000005540 biological transmission Effects 0.000 abstract 1
- 238000010276 construction Methods 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000003754 machining Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/075—Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
- H01J3/024—Electron guns using thermionic emission of cathode heated by electron or ion bombardment or by irradiation by other energetic beams, e.g. by laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/063—Electron sources
- H01J2237/06308—Thermionic sources
- H01J2237/06316—Schottky emission
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Particle Accelerators (AREA)
Abstract
1440776 Cathode constructions PHILIPS ELECTRONIC & ASSOCIATED INDUSTRIES Ltd 1 Oct 1973 [3 Oct 1972] 45772/73 Heading H1D An electron beam source comprises a field emission wire cathode 2, an anode 9, means for moving the wire to maintain its tip in a fixed position with a constant radius of curvature of 0À2 to 2 Á, and an auxiliary radiation source 8 which directs radiation on to the tip to heat it. The wire is supported and moved by two pairs of jaws 50, 51; 59, 60. Initially the lower jaws are open and the position of the tip determined by wire 58 which pulls 53 against springs 54, 55; 56, 57. When the limit of movement of support 53 is reached jaws 59, 60 close and the others open, support 53 returns to its original position and the process is repeated. The jaws are at right angles to ensure that the cathode is accurately positioned after a few operations. The jaws and position of support 53 are controlled by passing heating current through wires 62, 63 and 58. The current is determined by the difference between the measured and desired current to the first anode. This provides compensation for slowly varying parameters. Rapid adjustment is made using a shutter in the radiation path moved by a signal proportional to the current to the second anode. The device is used in scanning and transmission type electron microscopes, electron beam machining apparatus and microanalysers.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7213355A NL7213355A (en) | 1972-10-03 | 1972-10-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1440776A true GB1440776A (en) | 1976-06-23 |
Family
ID=19817064
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB4577273A Expired GB1440776A (en) | 1972-10-03 | 1973-10-01 | Electron-beam apparatus |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US3864572A (en) |
| JP (1) | JPS5241137B2 (en) |
| BE (1) | BE805539A (en) |
| CA (1) | CA992670A (en) |
| DE (1) | DE2349352C3 (en) |
| FR (1) | FR2201540B1 (en) |
| GB (1) | GB1440776A (en) |
| IT (1) | IT994357B (en) |
| NL (1) | NL7213355A (en) |
| SE (1) | SE384759B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6828565B2 (en) | 2002-09-26 | 2004-12-07 | Leo Elektronenmikroskopie Gmbh | Electron beam source, electron optical apparatus using such beam source and method of operating and electron beam source |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5533310U (en) * | 1978-08-24 | 1980-03-04 | ||
| JPS58126376U (en) * | 1982-02-20 | 1983-08-27 | 深沢 房次郎 | door stopper |
| US4496881A (en) | 1982-09-29 | 1985-01-29 | Tetra Pak Developpement Sa | Method of cold cathode replenishment in electron beam apparatus and replenishable cold cathode assembly |
| JPS59163506A (en) * | 1983-03-09 | 1984-09-14 | Hitachi Ltd | Electronic beam measuring device |
| US4762975A (en) * | 1984-02-06 | 1988-08-09 | Phrasor Scientific, Incorporated | Method and apparatus for making submicrom powders |
| US4829177A (en) * | 1986-09-11 | 1989-05-09 | Gregory Hirsch | Point projection photoelectron microscope with hollow needle |
| JPH02134503A (en) * | 1988-11-15 | 1990-05-23 | Mitsubishi Electric Corp | Scanning type tunnel microscope |
| DE3839707A1 (en) * | 1988-11-24 | 1990-05-31 | Integrated Circuit Testing | METHOD FOR OPERATING AN ELECTRON BEAM MEASURING DEVICE |
| JPH03190044A (en) * | 1989-12-19 | 1991-08-20 | Ebara Corp | Electron beam accelerator |
| US5015862A (en) * | 1990-01-22 | 1991-05-14 | Oregon Graduate Institute Of Science & Technology | Laser modulation of LMI sources |
| ES2029426A6 (en) * | 1991-03-22 | 1992-08-01 | Univ Madrid | Metal ion source with surface melting by application of an electric field. |
| DE69302084T2 (en) * | 1992-09-07 | 1996-09-12 | Stephan 72074 Tuebingen Kleindiek | ELECTROMECHANICAL POSITIONING DEVICE. |
| RU2145146C1 (en) * | 1998-03-31 | 2000-01-27 | Оборин Андрей Павлович | Method for converting power of electrons tunneled through polarized dielectric material |
| US6828996B2 (en) | 2001-06-22 | 2004-12-07 | Applied Materials, Inc. | Electron beam patterning with a heated electron source |
| US6847164B2 (en) * | 2002-12-10 | 2005-01-25 | Applied Matrials, Inc. | Current-stabilizing illumination of photocathode electron beam source |
| US11417492B2 (en) * | 2019-09-26 | 2022-08-16 | Kla Corporation | Light modulated electron source |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3388280A (en) * | 1966-04-19 | 1968-06-11 | Victor E. De Lucia | Laser energized hot cathode type of electron discharge device |
| US3678333A (en) * | 1970-06-15 | 1972-07-18 | American Optical Corp | Field emission electron gun utilizing means for protecting the field emission tip from high voltage discharges |
-
1972
- 1972-10-03 NL NL7213355A patent/NL7213355A/xx unknown
-
1973
- 1973-10-01 IT IT7352853A patent/IT994357B/en active
- 1973-10-01 CA CA182,224A patent/CA992670A/en not_active Expired
- 1973-10-01 SE SE7313345A patent/SE384759B/en unknown
- 1973-10-01 BE BE136239A patent/BE805539A/en unknown
- 1973-10-01 GB GB4577273A patent/GB1440776A/en not_active Expired
- 1973-10-02 US US402844A patent/US3864572A/en not_active Expired - Lifetime
- 1973-10-02 DE DE2349352A patent/DE2349352C3/en not_active Expired
- 1973-10-03 JP JP48110595A patent/JPS5241137B2/ja not_active Expired
- 1973-10-03 FR FR7335310A patent/FR2201540B1/fr not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6828565B2 (en) | 2002-09-26 | 2004-12-07 | Leo Elektronenmikroskopie Gmbh | Electron beam source, electron optical apparatus using such beam source and method of operating and electron beam source |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2349352A1 (en) | 1974-04-11 |
| JPS4993798A (en) | 1974-09-06 |
| SE384759B (en) | 1976-05-17 |
| IT994357B (en) | 1975-10-20 |
| CA992670A (en) | 1976-07-06 |
| NL7213355A (en) | 1974-04-05 |
| DE2349352C3 (en) | 1978-03-30 |
| BE805539A (en) | 1974-04-01 |
| JPS5241137B2 (en) | 1977-10-17 |
| FR2201540A1 (en) | 1974-04-26 |
| FR2201540B1 (en) | 1976-11-19 |
| US3864572A (en) | 1975-02-04 |
| DE2349352B2 (en) | 1977-07-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed [section 19, patents act 1949] | ||
| PCNP | Patent ceased through non-payment of renewal fee |