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GB1330013A - Deposition of titanium oxides - Google Patents

Deposition of titanium oxides

Info

Publication number
GB1330013A
GB1330013A GB6154270A GB6154270A GB1330013A GB 1330013 A GB1330013 A GB 1330013A GB 6154270 A GB6154270 A GB 6154270A GB 6154270 A GB6154270 A GB 6154270A GB 1330013 A GB1330013 A GB 1330013A
Authority
GB
United Kingdom
Prior art keywords
tio
atmosphere
content
coating
dec
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB6154270A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Electronics UK Ltd
Original Assignee
Philips Electronic and Associated Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronic and Associated Industries Ltd filed Critical Philips Electronic and Associated Industries Ltd
Publication of GB1330013A publication Critical patent/GB1330013A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/30—Coatings
    • H10F77/306—Coatings for devices having potential barriers
    • H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
    • H10F77/315—Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Physical Vapour Deposition (AREA)
  • Photovoltaic Devices (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

1330013 Depositing titanium oxides PHILIPS ELECTRONIC & ASSOCIATED INDUSTRIES Ltd 29 Dec 1970 [31 Dec 1969] 61542/70 Heading C7F Thin layers of binary compounds of titanium and oxygen are deposited on a substrate by sputtering titanium monoxide in an oxidising atmosphere. Typically, TiO powder held in an Al 2 O 3 or Al 2 O 3 - coated crucible standing on the cathode is sputtered using A. C. of 3-30MHz and 2À2-6À6 KV peak-to-peak at power 50-500W in an atmosphere of pressure 10<SP>-3</SP> to 10<SP>-2</SP> mm Hg of argon containing 1À5 to 5 volume % oxygen, so that TiO, TiO 2 , or a species having a composition between these O- content limits is deposited on a substrate held on the anode. The coating may be used as an anti-reflecting layer in a photo-voltaic cell; its refractive index increases linearly with O 2 content of the coating atmosphere but remains constant with increasing deposition time at constant O 2 content; the coating thickness varies linearly with deposition time.
GB6154270A 1969-12-31 1970-12-29 Deposition of titanium oxides Expired GB1330013A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR6945676A FR2071512A5 (en) 1969-12-31 1969-12-31

Publications (1)

Publication Number Publication Date
GB1330013A true GB1330013A (en) 1973-09-12

Family

ID=9045482

Family Applications (1)

Application Number Title Priority Date Filing Date
GB6154270A Expired GB1330013A (en) 1969-12-31 1970-12-29 Deposition of titanium oxides

Country Status (4)

Country Link
JP (1) JPS5039075B1 (en)
DE (1) DE2062664B2 (en)
FR (1) FR2071512A5 (en)
GB (1) GB1330013A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0058560A3 (en) * 1981-02-18 1982-12-01 Hitachi, Ltd. Sputtering apparatus

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2527184C3 (en) * 1975-06-18 1981-07-02 Philips Patentverwaltung Gmbh, 2000 Hamburg Apparatus for the production of targets for cathode sputtering
US4142958A (en) * 1978-04-13 1979-03-06 Litton Systems, Inc. Method for fabricating multi-layer optical films
JPS5654791A (en) * 1979-10-09 1981-05-14 Fuji Photo Optical Co Ltd Light source driving circuit
JPS5793416A (en) * 1980-11-28 1982-06-10 Shimadzu Corp Regulated power supply circuit for light source

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0058560A3 (en) * 1981-02-18 1982-12-01 Hitachi, Ltd. Sputtering apparatus

Also Published As

Publication number Publication date
DE2062664B2 (en) 1980-10-02
FR2071512A5 (en) 1971-09-17
JPS5039075B1 (en) 1975-12-13
DE2062664A1 (en) 1971-07-08

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee