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GB1318771A - Apparatus for and method of cleaning an article and coating the article by sputtering - Google Patents

Apparatus for and method of cleaning an article and coating the article by sputtering

Info

Publication number
GB1318771A
GB1318771A GB2673470A GB2673470A GB1318771A GB 1318771 A GB1318771 A GB 1318771A GB 2673470 A GB2673470 A GB 2673470A GB 2673470 A GB2673470 A GB 2673470A GB 1318771 A GB1318771 A GB 1318771A
Authority
GB
United Kingdom
Prior art keywords
blades
article
shroud
target
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2673470A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Warner Lambert Co LLC
Original Assignee
Warner Lambert Co LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Warner Lambert Co LLC filed Critical Warner Lambert Co LLC
Publication of GB1318771A publication Critical patent/GB1318771A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/36—Gas-filled discharge tubes for cleaning surfaces while plating with ions of materials introduced into the discharge, e.g. introduced by evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

1318771 Coating by sputtering WARNER LAMBERT CO 3 June 1970 [3 June 1969] 26734/70 Heading C7F An article is cleaned and sputter-coated whilst being kept free from atmospheric contamination by putting the article (e. g. a stack of razor blades 32) within a shroud (e. g. concentric cylindrical walls 80, 82) within an enclosed region,evacuating the region and introducing inert gas (e. g. Ar, Ne, or Kr), establishing an electrical potential (D.C. or R.F.) on the article and on the shroud means to surface-clean the article by removal of atoms and coating the article by sputtering from target 108, the vacuum being maintained throughout. As shown, stacks of blades 32 on bayonets 42 are rotated by a chain 54 Fig.2., (not shown) coacting with fixed sprocket 56 and sprockets 52 as motor 68, via pinion 36, rotates the assembly 28 on which the blades are mounted. Potential is applied to shroud 80, 82, which may have hollow walls containing heaters 120, 122, to clean the blades, and then door 98 in the shroud Fig.2, (not shown) is opened and the blades are coated by sputtering from target 108, e. g. of Cr, the blades being rotated so as to present opposite faces in sequence to the target. Alternative means for turning the blades round without continuous rotation are described with reference to Figs.7 and 8, (not shown). The target may be cleaned by reverse sputtering or the inside of the shroud may be covered with coating material and thus used as target .
GB2673470A 1969-06-03 1970-06-03 Apparatus for and method of cleaning an article and coating the article by sputtering Expired GB1318771A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US82990669A 1969-06-03 1969-06-03

Publications (1)

Publication Number Publication Date
GB1318771A true GB1318771A (en) 1973-05-31

Family

ID=25255867

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2673470A Expired GB1318771A (en) 1969-06-03 1970-06-03 Apparatus for and method of cleaning an article and coating the article by sputtering

Country Status (8)

Country Link
US (1) US3723276A (en)
JP (2) JPS5136236B1 (en)
CA (1) CA949021A (en)
DE (1) DE2027301C3 (en)
ES (1) ES380347A1 (en)
FR (1) FR2049889A5 (en)
GB (1) GB1318771A (en)
NL (1) NL169349C (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2154249A (en) * 1984-02-11 1985-09-04 Glyco Metall Werke Cathode sputtering

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4151059A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Method and apparatus for sputtering multiple cylinders simultaneously
US4896813A (en) * 1989-04-03 1990-01-30 Toyo Kohan Co., Ltd. Method and apparatus for cold rolling clad sheet
US5961798A (en) * 1996-02-13 1999-10-05 Diamond Black Technologies, Inc. System and method for vacuum coating of articles having precise and reproducible positioning of articles

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2154249A (en) * 1984-02-11 1985-09-04 Glyco Metall Werke Cathode sputtering

Also Published As

Publication number Publication date
NL169349C (en) 1982-07-01
DE2027301A1 (en) 1970-12-10
JPS5313591B1 (en) 1978-05-11
NL7008076A (en) 1970-12-07
CA949021A (en) 1974-06-11
ES380347A1 (en) 1973-04-16
DE2027301B2 (en) 1980-09-11
US3723276A (en) 1973-03-27
DE2027301C3 (en) 1981-05-27
JPS5136236B1 (en) 1976-10-07
FR2049889A5 (en) 1971-03-26
NL169349B (en) 1982-02-01

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee