GB1396355A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- GB1396355A GB1396355A GB4159772A GB4159772A GB1396355A GB 1396355 A GB1396355 A GB 1396355A GB 4159772 A GB4159772 A GB 4159772A GB 4159772 A GB4159772 A GB 4159772A GB 1396355 A GB1396355 A GB 1396355A
- Authority
- GB
- United Kingdom
- Prior art keywords
- polyvinyl
- diazo resin
- vinyl
- benzoate
- vinyl alcohol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 abstract 4
- 239000011347 resin Substances 0.000 abstract 4
- 229920005989 resin Polymers 0.000 abstract 4
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical group OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 abstract 3
- 239000000463 material Substances 0.000 abstract 3
- 229920002554 vinyl polymer Polymers 0.000 abstract 3
- 239000004372 Polyvinyl alcohol Substances 0.000 abstract 2
- 239000007864 aqueous solution Substances 0.000 abstract 2
- -1 benzal Chemical class 0.000 abstract 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 abstract 2
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 abstract 2
- 239000000178 monomer Substances 0.000 abstract 2
- 229920002451 polyvinyl alcohol Polymers 0.000 abstract 2
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 abstract 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 abstract 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 abstract 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 abstract 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 abstract 1
- 239000004141 Sodium laurylsulphate Substances 0.000 abstract 1
- 125000004036 acetal group Chemical group 0.000 abstract 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 abstract 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 abstract 1
- 239000003945 anionic surfactant Substances 0.000 abstract 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 125000003963 dichloro group Chemical group Cl* 0.000 abstract 1
- HBGGXOJOCNVPFY-UHFFFAOYSA-N diisononyl phthalate Chemical compound CC(C)CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC(C)C HBGGXOJOCNVPFY-UHFFFAOYSA-N 0.000 abstract 1
- 150000002148 esters Chemical class 0.000 abstract 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical compound [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 abstract 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- 239000000049 pigment Substances 0.000 abstract 1
- 239000002244 precipitate Substances 0.000 abstract 1
- 235000019333 sodium laurylsulphate Nutrition 0.000 abstract 1
- 229920001897 terpolymer Polymers 0.000 abstract 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 abstract 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
- G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Molecular Biology (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
Abstract
1396355 Photo-resist materials SCOTT PAPER CO 7 Sept 1972 [13 Sept 1971 (4)] 41597/72 Heading G2C [Also in Division C3] A negative working photo-resist material comprises a water-insoluble diazo resin and (a) a polyvinyl alcohol which has been esterified or acetalized and in which the ester or acetal contains more than 50% aromatic ester or acetal groups and in which there are 9-25% vinyl alcohol groups or (b) a copolymer of (a) containing up to 10% of a carboxyl-containing copolymerizable monomer. The diazo resin may be the reaction product of an anionic surfactant and a diazo resin as in Specification 1388038. The copolymerizable monomer may be acrylic, methacrylic, maleic or crotonic acid and (a) may be polyvinyl benzoate, polyvinyl (2-chloro or 2, 4 dichloro) benzoate, polyvinyl benzal or polyvinyl-4-chlorobenzal with the appropriate proportion of vinyl alcohol groups. In the examples, an aqueous solution of a diazo resin and an aqueous solution of sodium lauryl sulphate are mixed to deposit a precipitate which is dissolved in organic solvents and admixed with vinyl alcohol/crotonic acid/vinyl benzoate or vinyl 4-chlorobenzal (24/5/71) terpolymer and a pigment (e.g. copper phthalocyanine) and coated on a support which may be subbed with a polyvinyl alcohol layer. The material may be imagewise exposed and developed to produce a lithographic printing plate.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US18012471A | 1971-09-13 | 1971-09-13 | |
| US18020071A | 1971-09-13 | 1971-09-13 | |
| US18010371A | 1971-09-13 | 1971-09-13 | |
| US18010471A | 1971-09-13 | 1971-09-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1396355A true GB1396355A (en) | 1975-06-04 |
Family
ID=27497386
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB4159772A Expired GB1396355A (en) | 1971-09-13 | 1972-09-07 | Photosensitive composition |
Country Status (8)
| Country | Link |
|---|---|
| JP (1) | JPS5110121B2 (en) |
| BE (1) | BE788679A (en) |
| CH (1) | CH559921A5 (en) |
| DE (1) | DE2245433C3 (en) |
| FR (1) | FR2152884B1 (en) |
| GB (1) | GB1396355A (en) |
| IT (1) | IT969430B (en) |
| NL (1) | NL158300B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4774161A (en) * | 1986-01-21 | 1988-09-27 | Fuji Photo Film Co., Ltd. | Light-sensitive composition with polyvinyl acetal resin and diazo resin salt of long chain aliphatic benzene sulfonate |
| US5700619A (en) * | 1995-07-07 | 1997-12-23 | Sun Chemical Corporation | Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates |
| US5925491A (en) * | 1996-10-25 | 1999-07-20 | Kodak Polychrome Graphics Llc | Amido substituted acetal polymer binders and their use in photosensitive compositions |
| US6808858B2 (en) | 2000-03-09 | 2004-10-26 | Kodak Polychrome Graphics Llc | Use of carboxyl group-containing acetal polymers in light-sensitive compositions and lithographic printing plates |
| EP2006307A4 (en) * | 2006-04-12 | 2010-01-20 | Kuraray Co | DISPERSION STABILIZER |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0216083B1 (en) * | 1985-08-02 | 1990-12-27 | Hoechst Celanese Corporation | Polyvinyl acetal and photosensitive composition containing it |
| US5120772A (en) * | 1985-08-02 | 1992-06-09 | Walls John E | Radiation-polymerizable composition and element containing a photopolymerizable mixture |
| EP0221651A1 (en) * | 1985-09-27 | 1987-05-13 | Kao Corporation | Water soluble polyvinyl alcohol derivative |
| DE3644162A1 (en) * | 1986-12-23 | 1988-07-07 | Hoechst Ag | POLYVINYL ACETAL, THIS CONTAINING LIGHT SENSITIVE MIXTURE AND RECORDING MATERIAL MADE THEREOF |
| DE4406789A1 (en) * | 1994-03-02 | 1995-09-07 | Basf Ag | Process for the preparation of piperid-2-one |
-
0
- BE BE788679D patent/BE788679A/en unknown
-
1972
- 1972-09-07 GB GB4159772A patent/GB1396355A/en not_active Expired
- 1972-09-12 FR FR7232300A patent/FR2152884B1/fr not_active Expired
- 1972-09-12 NL NL7212376A patent/NL158300B/en not_active IP Right Cessation
- 1972-09-13 DE DE19722245433 patent/DE2245433C3/en not_active Expired
- 1972-09-13 CH CH1338872A patent/CH559921A5/xx not_active IP Right Cessation
- 1972-09-13 JP JP47092193A patent/JPS5110121B2/ja not_active Expired
- 1972-09-13 IT IT5270972A patent/IT969430B/en active
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4774161A (en) * | 1986-01-21 | 1988-09-27 | Fuji Photo Film Co., Ltd. | Light-sensitive composition with polyvinyl acetal resin and diazo resin salt of long chain aliphatic benzene sulfonate |
| US5700619A (en) * | 1995-07-07 | 1997-12-23 | Sun Chemical Corporation | Acetal polymers and use thereof in photosensitive compositions and lithographic printing plates |
| US5925491A (en) * | 1996-10-25 | 1999-07-20 | Kodak Polychrome Graphics Llc | Amido substituted acetal polymer binders and their use in photosensitive compositions |
| US6808858B2 (en) | 2000-03-09 | 2004-10-26 | Kodak Polychrome Graphics Llc | Use of carboxyl group-containing acetal polymers in light-sensitive compositions and lithographic printing plates |
| EP2006307A4 (en) * | 2006-04-12 | 2010-01-20 | Kuraray Co | DISPERSION STABILIZER |
| US8426518B2 (en) | 2006-04-12 | 2013-04-23 | Kuraray Co., Ltd. | Dispersion stabilizer |
Also Published As
| Publication number | Publication date |
|---|---|
| DE2245433A1 (en) | 1973-03-29 |
| DE2245433B2 (en) | 1978-11-23 |
| IT969430B (en) | 1974-03-30 |
| FR2152884B1 (en) | 1977-08-05 |
| JPS5110121B2 (en) | 1976-04-01 |
| JPS4838716A (en) | 1973-06-07 |
| DE2245433C3 (en) | 1979-08-02 |
| CH559921A5 (en) | 1975-03-14 |
| NL158300B (en) | 1978-10-16 |
| NL7212376A (en) | 1973-03-15 |
| BE788679A (en) | 1973-03-12 |
| FR2152884A1 (en) | 1973-04-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |