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GB1376114A - Photoresist layer - Google Patents

Photoresist layer

Info

Publication number
GB1376114A
GB1376114A GB389273A GB389273A GB1376114A GB 1376114 A GB1376114 A GB 1376114A GB 389273 A GB389273 A GB 389273A GB 389273 A GB389273 A GB 389273A GB 1376114 A GB1376114 A GB 1376114A
Authority
GB
United Kingdom
Prior art keywords
jan
gamma
photo
water
polyvinyl alcohol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB389273A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of GB1376114A publication Critical patent/GB1376114A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Materials For Photolithography (AREA)

Abstract

1376114 Photo-resist materials containing alkoxysilanes HITACHI Ltd 25 Jan 1973 [26 Jan 1972] 3892/73 Heading G2C A photo-resist material contains a water-soluble polymer, a water-soluble bisazide and a watersoluble alkoxysilane selected from N-(betaaminoethyl)-gamma-aminopropyl (trimethoxy or methyl dimethoxy) silane and gamma-aminopropyltriethoxysilane. The silane improves adhesion to supports such as glass and zinc. Specified polymers are gelatine, polyacrylamide, polyvinyl alcohol, pyrrolidone or butyral, hydroxymethyl cellulose, poly-L-glutamic acid and its salts, acrylamide/ vinyl alcohol copolymer and polyvinyl alcohol grafted with acrylonitrile.
GB389273A 1972-01-26 1973-01-25 Photoresist layer Expired GB1376114A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47009095A JPS5119982B2 (en) 1972-01-26 1972-01-26

Publications (1)

Publication Number Publication Date
GB1376114A true GB1376114A (en) 1974-12-04

Family

ID=11711041

Family Applications (1)

Application Number Title Priority Date Filing Date
GB389273A Expired GB1376114A (en) 1972-01-26 1973-01-25 Photoresist layer

Country Status (3)

Country Link
JP (1) JPS5119982B2 (en)
FR (1) FR2169217B1 (en)
GB (1) GB1376114A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491629A (en) * 1982-02-22 1985-01-01 Tokyo Shibaura Denki Kabushiki Kaisha Water soluble photoresist composition with bisazide, diazo, polymer and silane
DE3500576A1 (en) * 1984-01-12 1985-07-25 Kabushiki Kaisha Toshiba, Kawasaki, Kanagawa PHOTORESIST CONNECTION
GB2154330A (en) * 1984-02-13 1985-09-04 British Telecomm Fabrication of semiconductor devices
EP0313912A3 (en) * 1987-10-15 1990-11-14 Hercules Incorporated Crosslinking of vinyl silane and azidosilane modified thermoplastic polymers by moisture

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2441315A1 (en) * 1974-08-29 1976-03-11 Hoechst Ag PRESSURE PLATE PRESENSITIZED WITH O-NAPHTHOQUINONDIAZIDE COMPOUND
JPS5741636A (en) * 1980-08-27 1982-03-08 Toshiba Corp Photoresist composition
NL8203980A (en) * 1982-10-15 1984-05-01 Philips Nv METHOD FOR THE PHOTOLITHOGRAPHIC TREATMENT OF A SUBSTRATE.
JPS6175304A (en) * 1984-09-21 1986-04-17 Casio Comput Co Ltd Color liquid crystal display element
US4950583A (en) * 1986-09-17 1990-08-21 Brewer Science Inc. Adhesion promoting product and process for treating an integrated circuit substrate therewith
AU603908B2 (en) * 1987-07-30 1990-11-29 Minnesota Mining And Manufacturing Company Subbing layers for photographic elements and photographic elements incorporating such layers
US4886739A (en) * 1988-08-10 1989-12-12 Eastman Kodak Company Thermally processable imaging element and process
CN101213491B (en) * 2005-06-30 2011-09-14 东丽株式会社 Photosensitive resin composition and adhesion enhancer

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494851A (en) * 1972-05-04 1974-01-17

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491629A (en) * 1982-02-22 1985-01-01 Tokyo Shibaura Denki Kabushiki Kaisha Water soluble photoresist composition with bisazide, diazo, polymer and silane
DE3500576A1 (en) * 1984-01-12 1985-07-25 Kabushiki Kaisha Toshiba, Kawasaki, Kanagawa PHOTORESIST CONNECTION
US4596755A (en) * 1984-01-12 1986-06-24 Kabushiki Kaisha Toshiba Photoresist composition with azide having alkoxy silane as adhesion agent for glass substrate
GB2154330A (en) * 1984-02-13 1985-09-04 British Telecomm Fabrication of semiconductor devices
EP0313912A3 (en) * 1987-10-15 1990-11-14 Hercules Incorporated Crosslinking of vinyl silane and azidosilane modified thermoplastic polymers by moisture

Also Published As

Publication number Publication date
FR2169217A1 (en) 1973-09-07
JPS5119982B2 (en) 1976-06-22
JPS4879617A (en) 1973-10-25
FR2169217B1 (en) 1983-05-27
DE2303671B2 (en) 1975-10-23
DE2303671A1 (en) 1973-08-09

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Legal Events

Date Code Title Description
PS Patent sealed
435 Patent endorsed 'licences of right' on the date specified (sect. 35/1949)
PCNP Patent ceased through non-payment of renewal fee