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GB1356769A - Apparatus and method for depositing thin layers on a substrate - Google Patents

Apparatus and method for depositing thin layers on a substrate

Info

Publication number
GB1356769A
GB1356769A GB1954472A GB1954472A GB1356769A GB 1356769 A GB1356769 A GB 1356769A GB 1954472 A GB1954472 A GB 1954472A GB 1954472 A GB1954472 A GB 1954472A GB 1356769 A GB1356769 A GB 1356769A
Authority
GB
United Kingdom
Prior art keywords
chamber
plasma
substrate
evaporant
april
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1954472A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel CIT SA
Nokia Inc
Original Assignee
Compagnie Industrielle de Telecommunication CIT Alcatel SA
Nokia Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Compagnie Industrielle de Telecommunication CIT Alcatel SA, Nokia Inc filed Critical Compagnie Industrielle de Telecommunication CIT Alcatel SA
Priority claimed from BE129306A external-priority patent/BE797385R/en
Publication of GB1356769A publication Critical patent/GB1356769A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3471—Introduction of auxiliary energy into the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

1356769 Plasma vapour deposition apparatus COMPAGNIE INDUSTRIELLE DES TELECOMMUNICATIONS CIT-ALCATEL 27 April 1972 [27 April 1971] 19544/72 Heading C7F An evaporation coating apparatus comprises a chamber 2 lined on the inside with an evaporant, or with malts made of the evaporant, an aperture 3 facing the substrate 7, conduit 11 for injecting gas into the chamber and a device 5 to generate on alternating electromagnetic field in the chamber to form a plasma. The device 5 may be a HF voltage connected to an induction coil surrounding the chamber 2 or surrounding the vacuum container 1 enclosing the chamber. Alternatively the chamber may be a resonant cavity coupled to a micro wave generator by a waveguide. A spark electrode 12 may be used to excite the plasma and the chamber may be subdivided with apertures corresponding to several substrates which may be heated electrically by 8. The apparatus is used to deposit zinc oxide using oxygen as the gas for the plasma.
GB1954472A 1973-03-27 1972-04-27 Apparatus and method for depositing thin layers on a substrate Expired GB1356769A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE129306A BE797385R (en) 1971-04-27 1973-03-27 Thin mineral film deposition appts - using plasma excited by rf induction

Publications (1)

Publication Number Publication Date
GB1356769A true GB1356769A (en) 1974-06-12

Family

ID=3841811

Family Applications (2)

Application Number Title Priority Date Filing Date
GB1954472A Expired GB1356769A (en) 1973-03-27 1972-04-27 Apparatus and method for depositing thin layers on a substrate
GB1337874A Expired GB1419239A (en) 1973-03-27 1974-03-26 Apparatus for the vacuum deposition of thin layers on the surface of a substrate

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB1337874A Expired GB1419239A (en) 1973-03-27 1974-03-26 Apparatus for the vacuum deposition of thin layers on the surface of a substrate

Country Status (7)

Country Link
US (1) US3922214A (en)
JP (1) JPS5026778A (en)
CH (1) CH581198A5 (en)
DE (1) DE2412928A1 (en)
GB (2) GB1356769A (en)
IT (1) IT1007402B (en)
NL (1) NL178700C (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0011148A1 (en) * 1978-11-13 1980-05-28 Siemens Aktiengesellschaft CVD-device for coating small articles and its use for coating gripping devices of dental turbines

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2324755A1 (en) * 1975-09-19 1977-04-15 Anvar HIGH SPEED OF DEPOSIT CATHODIC SPRAY DEVICE
JPS5435178A (en) * 1977-08-23 1979-03-15 Matsushita Electric Ind Co Ltd Ultrafine particle depositing apparatus
DE2941908C2 (en) * 1979-10-17 1986-07-03 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Method for producing a solar cell having a silicon layer
FR2480552A1 (en) * 1980-04-10 1981-10-16 Anvar PLASMA GENERATOR
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
DE3117070A1 (en) * 1981-04-29 1982-11-18 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt METHOD FOR PRODUCING A SEMICONDUCTOR LAYER SOLAR CELL
US4929322A (en) * 1985-09-30 1990-05-29 Union Carbide Corporation Apparatus and process for arc vapor depositing a coating in an evacuated chamber
US4895765A (en) * 1985-09-30 1990-01-23 Union Carbide Corporation Titanium nitride and zirconium nitride coating compositions, coated articles and methods of manufacture
US4839245A (en) * 1985-09-30 1989-06-13 Union Carbide Corporation Zirconium nitride coated article and method for making same
US5037522B1 (en) * 1990-07-24 1996-07-02 Vergason Technology Inc Electric arc vapor deposition device
CA2065581C (en) 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
DE19635669C1 (en) * 1996-09-03 1997-07-24 Fraunhofer Ges Forschung Coating large area substrate by gas flow sputtering
DE59702419D1 (en) 1997-07-15 2000-11-09 Unaxis Trading Ag Truebbach Sputter coating method and apparatus
IT1310029B1 (en) 1999-02-26 2002-02-05 Ist Naz Fisica Della Materia PULSED MICROPLASMA VAPORIZER.
US20120048723A1 (en) * 2010-08-24 2012-03-01 Varian Semiconductor Equipment Associates, Inc. Sputter target feed system
WO2015064195A1 (en) 2013-10-30 2015-05-07 トヨタ自動車株式会社 Vehicle, and method of manufacturing same
JP6124020B2 (en) 2014-08-29 2017-05-10 トヨタ自動車株式会社 Charged charge reduction device for vehicles
JP6128093B2 (en) 2014-10-16 2017-05-17 トヨタ自動車株式会社 Vehicle intake system
JP6160603B2 (en) 2014-12-19 2017-07-12 トヨタ自動車株式会社 Vehicle cooling device
JP6201980B2 (en) 2014-12-25 2017-09-27 トヨタ自動車株式会社 Vehicle intake system
JP6115559B2 (en) 2014-12-26 2017-04-19 トヨタ自動車株式会社 Vehicle exhaust system
JP6183383B2 (en) 2015-01-13 2017-08-23 トヨタ自動車株式会社 vehicle
JP6365316B2 (en) 2015-01-19 2018-08-01 トヨタ自動車株式会社 Lubricating oil or fuel supply device for vehicles
EP3048017B1 (en) 2015-01-23 2017-11-08 Toyota Jidosha Kabushiki Kaisha Damping force generation device for vehicle
JP6281501B2 (en) 2015-01-29 2018-02-21 トヨタ自動車株式会社 Vehicle wheel support device
JP6248962B2 (en) 2015-02-10 2017-12-20 トヨタ自動車株式会社 Vehicle braking force generator
US11257663B2 (en) * 2017-09-11 2022-02-22 Agency For Science, Technology And Research Sputtering system and method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3408283A (en) * 1966-09-15 1968-10-29 Kennecott Copper Corp High current duoplasmatron having an apertured anode positioned in the low pressure region
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
BE766345A (en) * 1971-04-27 1971-09-16 Universitaire De L Etat A Mons DEVICE FOR MANUFACTURING THIN LAYERS OF MINERAL SUBSTANCES.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0011148A1 (en) * 1978-11-13 1980-05-28 Siemens Aktiengesellschaft CVD-device for coating small articles and its use for coating gripping devices of dental turbines

Also Published As

Publication number Publication date
NL178700C (en) 1986-05-01
JPS5026778A (en) 1975-03-19
CH581198A5 (en) 1976-10-29
NL7404173A (en) 1974-10-01
IT1007402B (en) 1976-10-30
GB1419239A (en) 1975-12-24
US3922214A (en) 1975-11-25
NL178700B (en) 1985-12-02
DE2412928A1 (en) 1974-10-03

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee