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GB1351513A - Reflecting mirror type electron microscope - Google Patents

Reflecting mirror type electron microscope

Info

Publication number
GB1351513A
GB1351513A GB2129171A GB2129171A GB1351513A GB 1351513 A GB1351513 A GB 1351513A GB 2129171 A GB2129171 A GB 2129171A GB 2129171 A GB2129171 A GB 2129171A GB 1351513 A GB1351513 A GB 1351513A
Authority
GB
United Kingdom
Prior art keywords
electrons
reflected
specimen
semi
detector means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2129171A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP45010813A external-priority patent/JPS4831685B1/ja
Priority claimed from JP45026777A external-priority patent/JPS498449B1/ja
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Publication of GB1351513A publication Critical patent/GB1351513A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/29—Reflection microscopes
    • H01J37/292—Reflection microscopes using scanning ray
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2441—Semiconductor detectors, e.g. diodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2444—Electron Multiplier
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H01J2237/24465—Sectored detectors, e.g. quadrants
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

1351513 Electron microscopes; semi-conductor targets NIHON DENSHI KK 19 April 1971 [7 Feb 1970 30 March 1970] 21291/71 Headings HlD and HlK In a scanning reflection type electron microscope an electron beam is focused by a lens 4 on to a specimen 6 which is held at a high negative potential to cause the electrons to be reflected to a detector means responsive to the intensity of the reflected electron beam. The detector means may consist of an aperture plate 5 which emits secondary electrons which are multiplied by a multiplier 10 connected to the grid of a cathode ray tube 12 whose scanning is synchronized with that of the microscope. Alternatively an image is formed by the electrons passing through the plate 5 on a fluorescent screen 2. The screen 2 may be situated away from the incident beam by providing a magnetic field (16), Fig. 3 (not shown), to separate incident and reflected electrons. A semi-conducting detecting device may be used consisting of a disc of N- type material (26), Fig. 6 (not shown), on which are diffused sectors of P-type material (27a to 27n) to provide several P-N junctions each providing a separate output signal. These signals can be combined to produce effects analogous to different conditions of illumination of the specimen.
GB2129171A 1970-02-07 1971-04-19 Reflecting mirror type electron microscope Expired GB1351513A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP45010813A JPS4831685B1 (en) 1970-02-07 1970-02-07
JP45026777A JPS498449B1 (en) 1970-03-30 1970-03-30

Publications (1)

Publication Number Publication Date
GB1351513A true GB1351513A (en) 1974-05-01

Family

ID=26346152

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2129171A Expired GB1351513A (en) 1970-02-07 1971-04-19 Reflecting mirror type electron microscope

Country Status (4)

Country Link
US (1) US3714425A (en)
DE (1) DE2105455A1 (en)
GB (1) GB1351513A (en)
NL (1) NL7100609A (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1447983A (en) * 1973-01-10 1976-09-02 Nat Res Dev Detector for electron microscopes
FR2220871B1 (en) * 1973-07-27 1978-01-20 Jeol Ltd
JPS5243058B2 (en) * 1974-04-22 1977-10-28
US4376249A (en) * 1980-11-06 1983-03-08 International Business Machines Corporation Variable axis electron beam projection system
DE3888712D1 (en) * 1987-02-02 1994-05-05 Integrated Circuit Testing Detector lens for scanning microscopes.
JP2927627B2 (en) * 1992-10-20 1999-07-28 株式会社日立製作所 Scanning electron microscope
EP0769799B1 (en) * 1995-10-19 2010-02-17 Hitachi, Ltd. Scanning electron microscope
DE19543652C1 (en) * 1995-11-23 1997-01-09 Focus Gmbh Reflection electron microscope
WO1999009582A1 (en) 1997-08-19 1999-02-25 Nikon Corporation Object observation device and object observation method
JP3534582B2 (en) * 1997-10-02 2004-06-07 株式会社日立製作所 Pattern defect inspection method and inspection device
JP4093662B2 (en) * 1999-01-04 2008-06-04 株式会社日立製作所 Scanning electron microscope
US6633034B1 (en) * 2000-05-04 2003-10-14 Applied Materials, Inc. Method and apparatus for imaging a specimen using low profile electron detector for charged particle beam imaging apparatus including electrostatic mirrors
EP1255278B1 (en) * 2001-04-24 2005-06-15 Advantest Corporation Scanning particle mirror microscope
JP3996774B2 (en) * 2002-01-09 2007-10-24 株式会社日立ハイテクノロジーズ Pattern defect inspection method and pattern defect inspection apparatus
DE60323909D1 (en) * 2002-08-13 2008-11-20 Zeiss Carl Nts Gmbh Particle-optic apparatus and its use as an electron-microscopic system
US7138629B2 (en) * 2003-04-22 2006-11-21 Ebara Corporation Testing apparatus using charged particles and device manufacturing method using the testing apparatus
JP2004363085A (en) * 2003-05-09 2004-12-24 Ebara Corp Inspection apparatus by charged particle beam and method for manufacturing device using inspection apparatus

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2464419A (en) * 1947-12-26 1949-03-15 Rca Corp Method of and apparatus for selectively achieving electronic darkfield and bright field illumation
US2901627A (en) * 1953-02-19 1959-08-25 Leitz Ernst Gmbh Method of and apparatus for the electronic magnification of objects
FR1306719A (en) * 1961-09-07 1962-10-19 Csf Detection and measurement of high energy particle beams
NL285495A (en) * 1961-11-18
GB1058037A (en) * 1964-11-03 1967-02-08 Jeol Ltd Electron beam apparatus
US3614311A (en) * 1968-02-28 1971-10-19 Hitachi Ltd Apparatus for simultaneously displaying a plurality of images of an object being analyzed in an electron beam device

Also Published As

Publication number Publication date
US3714425A (en) 1973-01-30
NL7100609A (en) 1971-08-10
DE2105455A1 (en) 1971-08-19

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees