GB1234094A - - Google Patents
Info
- Publication number
- GB1234094A GB1234094A GB1234094DA GB1234094A GB 1234094 A GB1234094 A GB 1234094A GB 1234094D A GB1234094D A GB 1234094DA GB 1234094 A GB1234094 A GB 1234094A
- Authority
- GB
- United Kingdom
- Prior art keywords
- discharge
- cathode
- ions
- argon
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract 6
- 239000007789 gas Substances 0.000 abstract 4
- 150000002500 ions Chemical class 0.000 abstract 4
- 229910052786 argon Inorganic materials 0.000 abstract 3
- 239000011261 inert gas Substances 0.000 abstract 2
- 239000004020 conductor Substances 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 229910052734 helium Inorganic materials 0.000 abstract 1
- 239000001307 helium Substances 0.000 abstract 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 abstract 1
- 229910052743 krypton Inorganic materials 0.000 abstract 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 229910052754 neon Inorganic materials 0.000 abstract 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 abstract 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
- 239000010937 tungsten Substances 0.000 abstract 1
- 229910052724 xenon Inorganic materials 0.000 abstract 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/032—Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
1,234,094. Lasers. PERKIN-ELMER CORP. 26 July, 1968 [26 July, 1967], No. 35870/68. Heading H1C. In an inert gas laser in which the inert gas flows through a discharge tube provided with an anode and cathode for maintaining a discharge the cathode includes electron emissive material which when bombarded by ions from the discharge emits electrons which excite ions in the discharge to produce a population inversion. Argon, krypton, xenon, helium or neon is introduced into glass enclosure 10 through gas inlet 28 and hollow cathode 20 of tantalum, tungsten or other thermionic emitter and is removed from outlet 29. In operation a D.C. field is provided between the anode 19 and cathode 20 and a discharge is initiated by establishing a temporary RF field in the gas stream which discharge is restricted to an axial path between the anode and the cathode by discs 32 of thermally conductive material apertured at the centre and at the circumference and is also subjected to a magnetic field from solenoid 30 or a permanent magnet. Ions from the discharge re-enter the cathode 20 against the flow direction of the gas and strike its intemal surface thereby heating the cathode to emit electrons which are accelerated into the discharge region and collide with the ions to excite them to a raised energy level and form an inverted population. The discharge may be started with argon and then argon is replaced by another gas for lasing purposes. Reflected shield 31 reduces radiative heat loss and sputtering damage.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US65615767A | 1967-07-26 | 1967-07-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1234094A true GB1234094A (en) | 1971-06-03 |
Family
ID=24631881
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1234094D Expired GB1234094A (en) | 1967-07-26 | 1968-07-26 |
Country Status (2)
| Country | Link |
|---|---|
| FR (1) | FR1575157A (en) |
| GB (1) | GB1234094A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2117558A (en) * | 1982-03-31 | 1983-10-12 | Coherent Inc | High power fundamental mode laser |
| DE3614471A1 (en) * | 1986-04-29 | 1987-11-05 | Elcede Gmbh | GAS LASER WITH HIGH FREQUENCY EXCITATION |
| GB2198577A (en) * | 1986-06-14 | 1988-06-15 | English Electric Valve Co Ltd | Laser apparatus |
| GB2205991A (en) * | 1987-05-15 | 1988-12-21 | Galram Technology Ind Ltd | Gas discharge laser |
| CN119212194A (en) * | 2024-10-12 | 2024-12-27 | 迈胜医疗设备有限公司 | Particle source, particle generation method, and particle accelerator |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3771066A (en) * | 1970-02-24 | 1973-11-06 | Hewlett Packard Co | Gas laser |
-
1968
- 1968-07-26 GB GB1234094D patent/GB1234094A/en not_active Expired
- 1968-07-26 FR FR1575157D patent/FR1575157A/fr not_active Expired
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2117558A (en) * | 1982-03-31 | 1983-10-12 | Coherent Inc | High power fundamental mode laser |
| DE3614471A1 (en) * | 1986-04-29 | 1987-11-05 | Elcede Gmbh | GAS LASER WITH HIGH FREQUENCY EXCITATION |
| US4730333A (en) * | 1986-04-29 | 1988-03-08 | Elcede Gmbh | Gas laser with high-frequency excitation |
| GB2198577A (en) * | 1986-06-14 | 1988-06-15 | English Electric Valve Co Ltd | Laser apparatus |
| GB2205991A (en) * | 1987-05-15 | 1988-12-21 | Galram Technology Ind Ltd | Gas discharge laser |
| GB2205991B (en) * | 1987-05-15 | 1991-12-11 | Galram Technology Ind Ltd | Gas discharge laser |
| CN119212194A (en) * | 2024-10-12 | 2024-12-27 | 迈胜医疗设备有限公司 | Particle source, particle generation method, and particle accelerator |
Also Published As
| Publication number | Publication date |
|---|---|
| FR1575157A (en) | 1969-07-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PLNP | Patent lapsed through nonpayment of renewal fees |