GB1217685A - Improvements in or relating to methods and apparatus for sputtering of materials - Google Patents
Improvements in or relating to methods and apparatus for sputtering of materialsInfo
- Publication number
- GB1217685A GB1217685A GB25874/67A GB2587467A GB1217685A GB 1217685 A GB1217685 A GB 1217685A GB 25874/67 A GB25874/67 A GB 25874/67A GB 2587467 A GB2587467 A GB 2587467A GB 1217685 A GB1217685 A GB 1217685A
- Authority
- GB
- United Kingdom
- Prior art keywords
- sputtering
- targets
- deposited
- anode
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004544 sputter deposition Methods 0.000 title abstract 3
- 239000000463 material Substances 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- 229910018487 Ni—Cr Inorganic materials 0.000 abstract 2
- 239000012300 argon atmosphere Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 229910045601 alloy Inorganic materials 0.000 abstract 1
- 239000000956 alloy Substances 0.000 abstract 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 239000000969 carrier Substances 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 229910052737 gold Inorganic materials 0.000 abstract 1
- 239000012811 non-conductive material Substances 0.000 abstract 1
- 238000004804 winding Methods 0.000 abstract 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
- F16C33/02—Parts of sliding-contact bearings
- F16C33/04—Brasses; Bushes; Linings
- F16C33/06—Sliding surface mainly made of metal
- F16C33/10—Construction relative to lubrication
- F16C33/1025—Construction relative to lubrication with liquid, e.g. oil, as lubricant
- F16C33/106—Details of distribution or circulation inside the bearings, e.g. details of the bearing surfaces to affect flow or pressure of the liquid
- F16C33/1065—Grooves on a bearing surface for distributing or collecting the liquid
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C17/00—Sliding-contact bearings for exclusively rotary movement
- F16C17/10—Sliding-contact bearings for exclusively rotary movement for both radial and axial load
- F16C17/102—Sliding-contact bearings for exclusively rotary movement for both radial and axial load with grooves in the bearing surface to generate hydrodynamic pressure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
- F16C33/02—Parts of sliding-contact bearings
- F16C33/04—Brasses; Bushes; Linings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Fluid Mechanics (AREA)
- Physical Vapour Deposition (AREA)
Abstract
1,217,685. Coating by sputtering. SMITHS INDUSTRIES Ltd. May 31, 1968 [June 5, 1967], No.25874/67. Heading C7F. Material is sputtered from targets 7 on to substrates 10 of e.g. alumina on carriers 11 supported from hooks 8 by forming a plasma in an argon atmosphere between anode 1 and cathode 2, whilst maintaining the targets at a negative potential and controlling the plasma column with electro-magnets 19, 20 arranged with which are windings 25 in such a manner that the magnetic field is transverse to the plasma column and rotates about it. The substrates may first be cleaned by using the anode and cathode to form a glow discharge in an argon atmosphere at a pressure higher than that used for sputtering. A Ni-Cr alloy may be deposited first and then by rotating the targets 7 through 180 degrees, Cu or Au may be deposited on the Ni-Cr. The coatings may be subsequently heated at 150‹C, and etched non-conductive materials may also be deposited particularly when using a R. F. field.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB25874/67A GB1217685A (en) | 1967-06-05 | 1967-06-05 | Improvements in or relating to methods and apparatus for sputtering of materials |
| US733669A US3576729A (en) | 1967-06-05 | 1968-05-31 | Sputtering methods and apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB25874/67A GB1217685A (en) | 1967-06-05 | 1967-06-05 | Improvements in or relating to methods and apparatus for sputtering of materials |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1217685A true GB1217685A (en) | 1970-12-31 |
Family
ID=10234781
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB25874/67A Expired GB1217685A (en) | 1967-06-05 | 1967-06-05 | Improvements in or relating to methods and apparatus for sputtering of materials |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US3576729A (en) |
| GB (1) | GB1217685A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2144772A (en) * | 1983-07-19 | 1985-03-13 | Varian Associates | Magnetron sputter coating source for both magnetic and nonmagnetic target materials |
| CN101353781B (en) * | 2008-09-22 | 2010-06-02 | 河南理工大学 | A method for ion-plating a wear-resistant and anti-corrosion alloy on the surface of pure copper |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3869368A (en) * | 1967-12-29 | 1975-03-04 | Smiths Industries Ltd | Methods of sputter deposition of materials |
| US3669860A (en) * | 1970-04-01 | 1972-06-13 | Zenith Radio Corp | Method and apparatus for applying a film to a substrate surface by diode sputtering |
| CH540995A (en) * | 1971-03-22 | 1973-08-31 | Bbc Brown Boveri & Cie | Method for applying a protective layer to a body |
| US4068025A (en) * | 1971-03-22 | 1978-01-10 | Brown, Boveri & Company Limited | Method of applying a protective coating to a body |
| FR2129996B1 (en) * | 1971-03-25 | 1975-01-17 | Centre Nat Etd Spatiales | |
| US4157465A (en) * | 1972-01-10 | 1979-06-05 | Smiths Industries Limited | Gas-lubricated bearings |
| JPS6037188B2 (en) * | 1981-08-27 | 1985-08-24 | 三菱マテリアル株式会社 | sputtering equipment |
| US4885070A (en) * | 1988-02-12 | 1989-12-05 | Leybold Aktiengesellschaft | Method and apparatus for the application of materials |
| US4851095A (en) * | 1988-02-08 | 1989-07-25 | Optical Coating Laboratory, Inc. | Magnetron sputtering apparatus and process |
| US5225057A (en) * | 1988-02-08 | 1993-07-06 | Optical Coating Laboratory, Inc. | Process for depositing optical films on both planar and non-planar substrates |
| US5618388A (en) * | 1988-02-08 | 1997-04-08 | Optical Coating Laboratory, Inc. | Geometries and configurations for magnetron sputtering apparatus |
| US5798027A (en) * | 1988-02-08 | 1998-08-25 | Optical Coating Laboratory, Inc. | Process for depositing optical thin films on both planar and non-planar substrates |
| US6669824B2 (en) | 2000-07-10 | 2003-12-30 | Unaxis Usa, Inc. | Dual-scan thin film processing system |
| US6495010B2 (en) | 2000-07-10 | 2002-12-17 | Unaxis Usa, Inc. | Differentially-pumped material processing system |
| CN101818326B (en) * | 2009-02-26 | 2012-11-21 | 鸿富锦精密工业(深圳)有限公司 | Sputtering device |
| CN101698934B (en) * | 2009-10-23 | 2011-06-15 | 武汉大学 | Hollow cathode electric arc ion coating plating system |
| KR20120096788A (en) * | 2011-02-23 | 2012-08-31 | 삼성전자주식회사 | Surface coating method and surface coating device for exterior part product |
-
1967
- 1967-06-05 GB GB25874/67A patent/GB1217685A/en not_active Expired
-
1968
- 1968-05-31 US US733669A patent/US3576729A/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2144772A (en) * | 1983-07-19 | 1985-03-13 | Varian Associates | Magnetron sputter coating source for both magnetic and nonmagnetic target materials |
| CN101353781B (en) * | 2008-09-22 | 2010-06-02 | 河南理工大学 | A method for ion-plating a wear-resistant and anti-corrosion alloy on the surface of pure copper |
Also Published As
| Publication number | Publication date |
|---|---|
| US3576729A (en) | 1971-04-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1217685A (en) | Improvements in or relating to methods and apparatus for sputtering of materials | |
| GB1263830A (en) | Arc deposition process and apparatus | |
| GB1485331A (en) | Multitarget sequential sputtering apparatus | |
| US5215638A (en) | Rotating magnetron cathode and method for the use thereof | |
| GB1489807A (en) | Method for coating a substrate | |
| KR880009454A (en) | Sputter deposition method and apparatus therefor | |
| GB1406509A (en) | Coating of workpieces | |
| GB1343137A (en) | Sputtering apparatus | |
| GB1400371A (en) | Production of thin films of tantalum | |
| US4600490A (en) | Anode for magnetic sputtering | |
| GB1307956A (en) | Process for depositing precious metals on a metallic support | |
| GB1258301A (en) | ||
| GB1242492A (en) | Improvements relating to the coating of a substrate by r.f. sputtering | |
| GB1275428A (en) | Sputtering apparatus and method | |
| GB1132867A (en) | Improvements in or relating to apparatus for depositing thin films | |
| GB1054660A (en) | ||
| GB1191223A (en) | Magnetically Confined Electrical Discharge Getter Ion Vacuum Pumps | |
| GB1391842A (en) | Apparatus for coating substrates by cathode sputtering and for cleaning by ion bombardment in the same vacuum vessel | |
| GB1358411A (en) | Sputtering | |
| GB1270496A (en) | Ion source for slow-ion sputtering | |
| GB1333617A (en) | Cathode sputtering apparatus | |
| US3271285A (en) | Method for sputtering niobium or tantalum thin films | |
| GB1339910A (en) | Alloy deposition by liquid phase sputtering | |
| GB1284781A (en) | Depositing layers by cathode sputtering | |
| GB1447754A (en) | Apparatus for and process of metal coating |