GB1131675A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- GB1131675A GB1131675A GB30144/67A GB3014467A GB1131675A GB 1131675 A GB1131675 A GB 1131675A GB 30144/67 A GB30144/67 A GB 30144/67A GB 3014467 A GB3014467 A GB 3014467A GB 1131675 A GB1131675 A GB 1131675A
- Authority
- GB
- United Kingdom
- Prior art keywords
- semi
- conductor
- prevented
- conductors
- igfet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/102—Constructional design considerations for preventing surface leakage or controlling electric field concentration
- H10D62/112—Constructional design considerations for preventing surface leakage or controlling electric field concentration for preventing surface leakage due to surface inversion layers, e.g. by using channel stoppers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
-
- H10W15/00—
-
- H10W15/01—
-
- H10W20/40—
-
- H10W74/43—
Landscapes
- Junction Field-Effect Transistors (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
1,131,675. Semi-conductor devices. HITACHI Ltd. 29 June, 1967 [11 July, 1966], No. 30144/67. Heading H1K. Regions of enhanced conductivity are provided at the surface of a semi-conductor body to prevent current passing between separated devices by an inversion layer which would otherwise be formed under metallic tracks running across the passivation. As shown in Fig. 3 a NOT unit is formed by a P-channel enhancement mode IGFET 12a, 14b, 13a the maximum gate potential of which is clamped to the breakdown voltage of a diode 16a, 11a. Parasitic IGFET action (16a, 17b, 12a) is prevented by the provision of a N<SP>+</SP> region 11b. Particularly if the extent beneath the surface conductors of the highly doped region is large, sharp capacitance variations between conductors and the semi-conductor substrate are also prevented. Reference has been directed by the Comptroller to Specifications 1,059,739 and 1,051,720.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4480466 | 1966-07-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1131675A true GB1131675A (en) | 1968-10-23 |
Family
ID=12701595
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB30144/67A Expired GB1131675A (en) | 1966-07-11 | 1967-06-29 | Semiconductor device |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE1589891B (en) |
| GB (1) | GB1131675A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2029058A1 (en) * | 1969-06-26 | 1971-01-07 | N V Philips Gloeilampenfabne ken, Eindhoven (Niederlande) | Semiconductor arrangement with a field effect transistor with an isolated gate electrode |
| DE2044027A1 (en) * | 1969-09-05 | 1971-03-25 | Hitachi Ltd | Semiconductor arrangement for suppressing the formation of interference MOSFETs in integrated circuits |
| FR2063062A1 (en) * | 1969-09-29 | 1971-07-02 | Sony Corp | |
| US3649885A (en) * | 1969-07-03 | 1972-03-14 | Philips Corp | Tetrode mosfet with gate safety diode within island zone |
| FR2323232A1 (en) * | 1975-09-08 | 1977-04-01 | Siemens Ag | MOUNTING TO PROTECT INPUTS OF INTEGRATED MOS CIRCUITS |
| EP0072690A3 (en) * | 1981-08-17 | 1983-11-09 | Fujitsu Limited | A mis device and a method of manufacturing it |
| EP0360998A3 (en) * | 1988-09-27 | 1990-06-06 | Kabushiki Kaisha Toshiba | Semiconductor device having improved element isolation area |
| EP0515833A1 (en) * | 1991-05-02 | 1992-12-02 | Nec Corporation | Semiconductor integrated circuit device having wells biased with different voltage levels |
| US5192993A (en) * | 1988-09-27 | 1993-03-09 | Kabushiki Kaisha Toshiba | Semiconductor device having improved element isolation area |
-
1967
- 1967-06-29 GB GB30144/67A patent/GB1131675A/en not_active Expired
- 1967-07-11 DE DE19671589891D patent/DE1589891B/en active Pending
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2029058A1 (en) * | 1969-06-26 | 1971-01-07 | N V Philips Gloeilampenfabne ken, Eindhoven (Niederlande) | Semiconductor arrangement with a field effect transistor with an isolated gate electrode |
| FR2047958A1 (en) * | 1969-06-26 | 1971-03-19 | Philips Nv | |
| US3649885A (en) * | 1969-07-03 | 1972-03-14 | Philips Corp | Tetrode mosfet with gate safety diode within island zone |
| DE2044027A1 (en) * | 1969-09-05 | 1971-03-25 | Hitachi Ltd | Semiconductor arrangement for suppressing the formation of interference MOSFETs in integrated circuits |
| FR2068743A1 (en) * | 1969-09-05 | 1971-09-03 | Hitachi Ltd | |
| FR2063062A1 (en) * | 1969-09-29 | 1971-07-02 | Sony Corp | |
| FR2323232A1 (en) * | 1975-09-08 | 1977-04-01 | Siemens Ag | MOUNTING TO PROTECT INPUTS OF INTEGRATED MOS CIRCUITS |
| EP0072690A3 (en) * | 1981-08-17 | 1983-11-09 | Fujitsu Limited | A mis device and a method of manufacturing it |
| EP0360998A3 (en) * | 1988-09-27 | 1990-06-06 | Kabushiki Kaisha Toshiba | Semiconductor device having improved element isolation area |
| US5192993A (en) * | 1988-09-27 | 1993-03-09 | Kabushiki Kaisha Toshiba | Semiconductor device having improved element isolation area |
| EP0515833A1 (en) * | 1991-05-02 | 1992-12-02 | Nec Corporation | Semiconductor integrated circuit device having wells biased with different voltage levels |
Also Published As
| Publication number | Publication date |
|---|---|
| DE1589891B (en) | 1970-11-26 |
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