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GB1131675A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
GB1131675A
GB1131675A GB30144/67A GB3014467A GB1131675A GB 1131675 A GB1131675 A GB 1131675A GB 30144/67 A GB30144/67 A GB 30144/67A GB 3014467 A GB3014467 A GB 3014467A GB 1131675 A GB1131675 A GB 1131675A
Authority
GB
United Kingdom
Prior art keywords
semi
conductor
prevented
conductors
igfet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB30144/67A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of GB1131675A publication Critical patent/GB1131675A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/102Constructional design considerations for preventing surface leakage or controlling electric field concentration
    • H10D62/112Constructional design considerations for preventing surface leakage or controlling electric field concentration for preventing surface leakage due to surface inversion layers, e.g. by using channel stoppers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D89/00Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
    • H10D89/60Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
    • H10D89/601Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
    • H10W15/00
    • H10W15/01
    • H10W20/40
    • H10W74/43

Landscapes

  • Junction Field-Effect Transistors (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

1,131,675. Semi-conductor devices. HITACHI Ltd. 29 June, 1967 [11 July, 1966], No. 30144/67. Heading H1K. Regions of enhanced conductivity are provided at the surface of a semi-conductor body to prevent current passing between separated devices by an inversion layer which would otherwise be formed under metallic tracks running across the passivation. As shown in Fig. 3 a NOT unit is formed by a P-channel enhancement mode IGFET 12a, 14b, 13a the maximum gate potential of which is clamped to the breakdown voltage of a diode 16a, 11a. Parasitic IGFET action (16a, 17b, 12a) is prevented by the provision of a N<SP>+</SP> region 11b. Particularly if the extent beneath the surface conductors of the highly doped region is large, sharp capacitance variations between conductors and the semi-conductor substrate are also prevented. Reference has been directed by the Comptroller to Specifications 1,059,739 and 1,051,720.
GB30144/67A 1966-07-11 1967-06-29 Semiconductor device Expired GB1131675A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4480466 1966-07-11

Publications (1)

Publication Number Publication Date
GB1131675A true GB1131675A (en) 1968-10-23

Family

ID=12701595

Family Applications (1)

Application Number Title Priority Date Filing Date
GB30144/67A Expired GB1131675A (en) 1966-07-11 1967-06-29 Semiconductor device

Country Status (2)

Country Link
DE (1) DE1589891B (en)
GB (1) GB1131675A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2029058A1 (en) * 1969-06-26 1971-01-07 N V Philips Gloeilampenfabne ken, Eindhoven (Niederlande) Semiconductor arrangement with a field effect transistor with an isolated gate electrode
DE2044027A1 (en) * 1969-09-05 1971-03-25 Hitachi Ltd Semiconductor arrangement for suppressing the formation of interference MOSFETs in integrated circuits
FR2063062A1 (en) * 1969-09-29 1971-07-02 Sony Corp
US3649885A (en) * 1969-07-03 1972-03-14 Philips Corp Tetrode mosfet with gate safety diode within island zone
FR2323232A1 (en) * 1975-09-08 1977-04-01 Siemens Ag MOUNTING TO PROTECT INPUTS OF INTEGRATED MOS CIRCUITS
EP0072690A3 (en) * 1981-08-17 1983-11-09 Fujitsu Limited A mis device and a method of manufacturing it
EP0360998A3 (en) * 1988-09-27 1990-06-06 Kabushiki Kaisha Toshiba Semiconductor device having improved element isolation area
EP0515833A1 (en) * 1991-05-02 1992-12-02 Nec Corporation Semiconductor integrated circuit device having wells biased with different voltage levels
US5192993A (en) * 1988-09-27 1993-03-09 Kabushiki Kaisha Toshiba Semiconductor device having improved element isolation area

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2029058A1 (en) * 1969-06-26 1971-01-07 N V Philips Gloeilampenfabne ken, Eindhoven (Niederlande) Semiconductor arrangement with a field effect transistor with an isolated gate electrode
FR2047958A1 (en) * 1969-06-26 1971-03-19 Philips Nv
US3649885A (en) * 1969-07-03 1972-03-14 Philips Corp Tetrode mosfet with gate safety diode within island zone
DE2044027A1 (en) * 1969-09-05 1971-03-25 Hitachi Ltd Semiconductor arrangement for suppressing the formation of interference MOSFETs in integrated circuits
FR2068743A1 (en) * 1969-09-05 1971-09-03 Hitachi Ltd
FR2063062A1 (en) * 1969-09-29 1971-07-02 Sony Corp
FR2323232A1 (en) * 1975-09-08 1977-04-01 Siemens Ag MOUNTING TO PROTECT INPUTS OF INTEGRATED MOS CIRCUITS
EP0072690A3 (en) * 1981-08-17 1983-11-09 Fujitsu Limited A mis device and a method of manufacturing it
EP0360998A3 (en) * 1988-09-27 1990-06-06 Kabushiki Kaisha Toshiba Semiconductor device having improved element isolation area
US5192993A (en) * 1988-09-27 1993-03-09 Kabushiki Kaisha Toshiba Semiconductor device having improved element isolation area
EP0515833A1 (en) * 1991-05-02 1992-12-02 Nec Corporation Semiconductor integrated circuit device having wells biased with different voltage levels

Also Published As

Publication number Publication date
DE1589891B (en) 1970-11-26

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