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GB1194582A - Ultrahigh-Vacuum Device - Google Patents

Ultrahigh-Vacuum Device

Info

Publication number
GB1194582A
GB1194582A GB29363/67A GB2936367A GB1194582A GB 1194582 A GB1194582 A GB 1194582A GB 29363/67 A GB29363/67 A GB 29363/67A GB 2936367 A GB2936367 A GB 2936367A GB 1194582 A GB1194582 A GB 1194582A
Authority
GB
United Kingdom
Prior art keywords
valve
pump
vacuum
regions
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB29363/67A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Electronics UK Ltd
Original Assignee
Philips Electronic and Associated Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronic and Associated Industries Ltd filed Critical Philips Electronic and Associated Industries Ltd
Publication of GB1194582A publication Critical patent/GB1194582A/en
Expired legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006Processes utilising sub-atmospheric pressure; Apparatus therefor
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04FPUMPING OF FLUID BY DIRECT CONTACT OF ANOTHER FLUID OR BY USING INERTIA OF FLUID TO BE PUMPED; SIPHONS
    • F04F9/00Diffusion pumps
    • F04F9/04Diffusion pumps in combination with fore pumps, e.g. use of isolating valves

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)

Abstract

1,194,582. Vacuum systems. PHILIPS ELECTRONIC & ASSOCIATED INDUSTRIES Ltd. June 26, 1967 [June 27, 1966], No.29363/67. Heading F1N. A vacuum chamber is divided into two regions 1a, 1b having a valve member 2a therebetween, whereby, with the valve member in an open position 2a 3 , both regions are initially evacuated through a duct 8, 10, and with the valve in a closed postion 2a 1 , the region 1a is further evacuated by an ionization pump 3 connected thereto. The initial evacuation through the ducts 10, 8 is achieved by a diffusion pump 57 connected to a primary pump 52 via a vacuum chamber 54, a valve 64 and a trap 53. A piston 12 slidable in a cylinder in response to pressure or vacuum connected to cylinder chambers 13, 14 is connected by a rod 7 to cause operation of the valve 2a. The rod 7 passes into the chamber region 1b through a sealed chamber 17 permanently connected to the vacuum chamber 54 through a conduit 21. If the valve is moved to a position 2a 2 both regions may be subjected to a preliminary vacuum by the primary pump 52 acting through a line 20 having a valve 65 which is closed before the diffusion pump 57 is operated. When the valve is moved to the position 2a<SP>3</SP>, tubing 19 is filled with liquid hydrogen by a pump 59.
GB29363/67A 1966-06-27 1967-06-26 Ultrahigh-Vacuum Device Expired GB1194582A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR67078A FR1494152A (en) 1966-06-27 1966-06-27 Very high vacuum device

Publications (1)

Publication Number Publication Date
GB1194582A true GB1194582A (en) 1970-06-10

Family

ID=8611868

Family Applications (1)

Application Number Title Priority Date Filing Date
GB29363/67A Expired GB1194582A (en) 1966-06-27 1967-06-26 Ultrahigh-Vacuum Device

Country Status (6)

Country Link
US (1) US3446422A (en)
BE (1) BE700515A (en)
DE (1) DE1628443A1 (en)
FR (1) FR1494152A (en)
GB (1) GB1194582A (en)
NL (1) NL6708746A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3687570A (en) * 1969-08-11 1972-08-29 Vacuum Atmospheres Corp Pneumatic control valve for vacuum chambers
US4850806A (en) * 1988-05-24 1989-07-25 The Boc Group, Inc. Controlled by-pass for a booster pump
FR2872555B1 (en) * 2004-06-30 2006-10-06 Sidel Sas VACUUM PUMPING CIRCUIT AND CONTAINER TREATMENT MACHINE EQUIPPED WITH SAID CIRCUIT
US8192547B2 (en) * 2006-09-25 2012-06-05 Veeco Instruments Inc. Thermally isolated cryopanel for vacuum deposition systems
US8658004B2 (en) * 2008-11-14 2014-02-25 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Vapor-barrier vacuum isolation system
CN104988462B (en) * 2015-07-23 2017-05-31 京东方科技集团股份有限公司 A kind of crucible device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2826353A (en) * 1950-03-22 1958-03-11 Alois Vogt Apparatus for high vacuum pumps
US2806644A (en) * 1953-08-13 1957-09-17 Cons Electrodynamics Corp Vacuum system apparatus
US2935243A (en) * 1955-12-09 1960-05-03 N G N Electrical Ltd Vacuum pumping apparatus
US3144199A (en) * 1961-07-20 1964-08-11 Isen Ind Inc Method of evacuating treating chambers

Also Published As

Publication number Publication date
US3446422A (en) 1969-05-27
BE700515A (en) 1967-12-27
FR1494152A (en) 1967-09-08
NL6708746A (en) 1967-12-28
DE1628443A1 (en) 1971-08-19

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees