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GB1026338A - Semiconductor strain-gauge - Google Patents

Semiconductor strain-gauge

Info

Publication number
GB1026338A
GB1026338A GB1258163A GB1258163A GB1026338A GB 1026338 A GB1026338 A GB 1026338A GB 1258163 A GB1258163 A GB 1258163A GB 1258163 A GB1258163 A GB 1258163A GB 1026338 A GB1026338 A GB 1026338A
Authority
GB
United Kingdom
Prior art keywords
indium
wafer
strain gauge
resistivity
march
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1258163A
Inventor
Patrick Joseph Augusti Mckeown
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
Standard Telephone and Cables PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Standard Telephone and Cables PLC filed Critical Standard Telephone and Cables PLC
Priority to GB1258163A priority Critical patent/GB1026338A/en
Publication of GB1026338A publication Critical patent/GB1026338A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/16Measuring arrangements characterised by the use of electric or magnetic techniques for measuring the deformation in a solid, e.g. by resistance strain gauge

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Pressure Sensors (AREA)

Abstract

1,026,338. Semi-conductor strain gauges. STANDARD TELEPHONES & CABLES Ltd. March 25, 1964 [March 29, 1963], No. 12581/63. Heading H1K. A strain gauge comprises a body of singlecrystal silicon doped with indium. As shown, a strain gauge is manufactured by evaporating a layer of indium on to the major faces of a wafer of monocrystalline silicon, heating to diffuse-in the indium, and then masking and etching the surfaces to produce a narrow resistive strip (shown cross-hatched) containing indium on both major faces of the wafer. Contacts 1, 2, 4, 5 are made to the ends of the resistive strips and a contact 3 is made to the bulk of the wafer. The strain gauge is connected in a bridge circuit, Fig. 6 (not shown). The indium doped layer may also be produced by epitaxial deposition, and the Specification also states that slices cut from a crystal drawn from a melt containing indium may be used as strain gauges. It is stated that in silicon containing indium and having a resistivity in the range 0À001 to 100 ohm/cm., the resistivity is substantially invariable with temperature over the range 0‹ C. to 100‹ C.
GB1258163A 1963-03-29 1963-03-29 Semiconductor strain-gauge Expired GB1026338A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB1258163A GB1026338A (en) 1963-03-29 1963-03-29 Semiconductor strain-gauge

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1258163A GB1026338A (en) 1963-03-29 1963-03-29 Semiconductor strain-gauge

Publications (1)

Publication Number Publication Date
GB1026338A true GB1026338A (en) 1966-04-20

Family

ID=10007271

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1258163A Expired GB1026338A (en) 1963-03-29 1963-03-29 Semiconductor strain-gauge

Country Status (1)

Country Link
GB (1) GB1026338A (en)

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