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GB1003023A - Process for the production of doped semiconductor materials - Google Patents

Process for the production of doped semiconductor materials

Info

Publication number
GB1003023A
GB1003023A GB36872/63A GB3687263A GB1003023A GB 1003023 A GB1003023 A GB 1003023A GB 36872/63 A GB36872/63 A GB 36872/63A GB 3687263 A GB3687263 A GB 3687263A GB 1003023 A GB1003023 A GB 1003023A
Authority
GB
United Kingdom
Prior art keywords
semi
conductor material
elements
gallium
aluminium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB36872/63A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens and Halske AG
Siemens Corp
Original Assignee
Siemens and Halske AG
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DES81606A external-priority patent/DE1292258B/en
Application filed by Siemens and Halske AG, Siemens Corp filed Critical Siemens and Halske AG
Publication of GB1003023A publication Critical patent/GB1003023A/en
Expired legal-status Critical Current

Links

Classifications

    • H10P95/00
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01SRADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S7/00Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
    • G01S7/02Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S13/00
    • G01S7/28Details of pulse systems
    • G01S7/2806Employing storage or delay devices which preserve the pulse form of the echo signal, e.g. for comparing and combining echoes received during different periods
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Radar, Positioning & Navigation (AREA)
  • Remote Sensing (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Bipolar Transistors (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

1,003,023. Semi-conductor devices. SIEMENS & HALSKE. Sept. 19, 1963 [Sept. 21, 1962], No. 36872/63. Drawings to Specification. Heading H1K. A semi-conductor material is highly doped with two or more elements which produce the same type of conductivity, the total solubility of the doping elements in the semi-conductor material being greater than that of any one alone. Each doping element forms a eutectic mixture with the semi-conductor material, and the mean of the atomic radii of the doping elements is approximately equal to the atomic radius of the semi-conductor material (if this is an element) or of the element which is replaced in the semi-conductor crystal lattice (if the semi-conductor material is a compound). Examples given of suitable combinations of doping elements in silicon or germanium include phosphorus with arsenic, aluminium with gallium, boron and indium with either aluminium or gallium, lithium with either phosphorus or arsenic, and copper or zinc with either boron or aluminium or gallium. At least two elements from Group II or from Group VI may be incorporated as doping elements in an A III B V compound. Embodiments described include a tunnel diode and the emitter zone of a transistor.
GB36872/63A 1962-09-21 1963-09-19 Process for the production of doped semiconductor materials Expired GB1003023A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES81606A DE1292258B (en) 1962-09-21 1962-09-21 Method for producing a higher degree of doping in semiconductor materials than the solubility of a foreign substance in the semiconductor material allows

Publications (1)

Publication Number Publication Date
GB1003023A true GB1003023A (en) 1965-09-02

Family

ID=7509728

Family Applications (1)

Application Number Title Priority Date Filing Date
GB36872/63A Expired GB1003023A (en) 1962-09-21 1963-09-19 Process for the production of doped semiconductor materials

Country Status (3)

Country Link
CH (1) CH443233A (en)
GB (1) GB1003023A (en)
NL (1) NL297953A (en)

Also Published As

Publication number Publication date
NL297953A (en)
CH443233A (en) 1967-09-15

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